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11. 发明授权

US06475575B1 Pellicle and method for manufacture thereof 失效
标题翻译：防护薄膜及其制造方法
公开(公告)号：US06475575B1
公开(公告)日：2002-11-05
申请号：US09831360
申请日：2001-08-06
申请人： Yoshiaki Ikuta , Shinya Kikugawa , Hitoshi Mishiro , Hiroshi Arishima , Kaname Okada , Katsuhiro Matsumoto
发明人： Yoshiaki Ikuta , Shinya Kikugawa , Hitoshi Mishiro , Hiroshi Arishima , Kaname Okada , Katsuhiro Matsumoto
IPC分类号： A47G112
CPC分类号： G03F1/62 , C03B33/082 , C03B2201/04
摘要： It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80%/cm at a wavelength of 157 nm.
摘要翻译：其特征在于，具有由OH基浓度为100ppm以下且基本上不含缺氧缺陷的合成石英玻璃制成的防护薄片。特别优选OH基浓度为10ppm以下，内部透射率为157nm以上至少80％/ cm 3。

12. 发明授权

US08323856B2 Mask blanks 有权
标题翻译：面具空白
公开(公告)号：US08323856B2
公开(公告)日：2012-12-04
申请号：US12941491
申请日：2010-11-08
申请人： Shinya Kikugawa , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
发明人： Shinya Kikugawa , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
IPC分类号： G03F1/22
CPC分类号： C03C3/06 , C03C17/09 , C03C2201/12 , C03C2201/23 , C03C2217/26 , C03C2218/154 , G03F1/60
摘要： The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the mask blank has a birefringence, as measured at a wavelength of 193 nm, of 1 nm or less per substrate thickness. According to the present invention, mask blanks suitable for use in the immersion exposure technique and the polarized illumination technique are provided.
摘要翻译：本发明提供一种掩模板，其包括由合成石英玻璃制成的基板和层叠在基板的表面上的遮光膜，并且用于使用200nm或更短的曝光光波长的半导体器件制造技术其中掩模坯料在193nm波长下测得的每个基片厚度为1nm或更小的双折射。根据本发明，提供适用于浸渍曝光技术和偏振照明技术的掩模坯料。

13. 发明申请

US20100323873A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME 失效
标题翻译：含有二氧化硅的硅胶玻璃和光学元件用于使用它的光刻
公开(公告)号：US20100323873A1
公开(公告)日：2010-12-23
申请号：US12870156
申请日：2010-08-27
申请人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/04
CPC分类号： C03B19/1461 , C03B19/1453 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2203/46 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ΔT, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.
摘要翻译：本发明提供了一种TiO 2 -SiO 2玻璃，其在高EUV能量光照射时的线性热膨胀系数基本为零，这适合作为EUVL用曝光工具的光学部件。本发明涉及卤素含量为100ppm以上的含TiO 2的二氧化硅玻璃，假想温度为1100℃或更低; 20〜100℃范围内的平均线性热膨胀系数为30ppb /℃以下; 5℃以上的线性热膨胀系数为0±5ppb /℃的温度宽度＆amp; T; T; 以及线性热膨胀系数为0ppb /℃的温度在30〜150℃的范围内。

14. 发明申请

US20090242387A1 PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 审中-公开
标题翻译：生产含有二氧化硅玻璃的工艺，含有二氧化硅的二氧化硅玻璃的光学材料和含有二氧化硅的二氧化硅玻璃的光学材料
公开(公告)号：US20090242387A1
公开(公告)日：2009-10-01
申请号：US12466032
申请日：2009-05-14
申请人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
发明人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
IPC分类号： C23C14/34
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/21 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/42 , G03F7/70958
摘要： The claimed invention relates to a process for producing an optical material for EUV lithography, wherein the optical material contains a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass. The process including coating a multilayer film on the silica glass by ion beam sputtering.
摘要翻译：所要求保护的发明涉及一种用于制造用于EUV光刻的光学材料的方法，其中所述光学材料包含玻璃中TiO 2浓度为3至12质量％且氢分子含量小于5×10 17分子/ cm 3的二氧化硅玻璃。该方法包括通过离子束溅射在二氧化硅玻璃上涂覆多层膜。

15. 发明授权

US07585800B2 Silica glass and optical material 失效
标题翻译：二氧化硅玻璃和光学材料
公开(公告)号：US07585800B2
公开(公告)日：2009-09-08
申请号：US11962936
申请日：2007-12-21
申请人： Mitsuhiro Kawata , Akira Takada , Hideaki Hayashi , Naoki Sugimoto , Shinya Kikugawa
发明人： Mitsuhiro Kawata , Akira Takada , Hideaki Hayashi , Naoki Sugimoto , Shinya Kikugawa
IPC分类号： C03C3/06 , C03B20/00 , H05B33/10
CPC分类号： C03C3/06 , C03C4/0085 , C03C2201/30 , C03C2201/42
摘要： It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness.A silica glass containing from 0.1 to 10 mass % of Sn calculated as SnO2 and from 3 to 10 mass % of Ti calculated as TiO2, which has a homogeneity of the coefficient of thermal expansion from 0 to 100° C. to the temperature of from 50 to 200 ppb/° C., a coefficient of thermal expansion from 0 to 100° C. of 0±250 ppb/° C., and a Vickers hardness of at most 650.
摘要翻译：获得适合作为构成用于EUVL的光学系统的光学材料的石英玻璃，其具有0至100℃的低热膨胀系数，并且其中凹陷缺陷的形成被抑制在抛光步骤中达到高水平的平整度。含有0.1〜10质量％的以SnO 2计的Sn和3〜10质量％的作为TiO 2计算的Ti的二氧化硅玻璃，其具有0〜100℃的热膨胀系数的均匀性 50至200ppb /℃，0至100ppb /℃的0至100℃的热膨胀系数，以及至多650的维氏硬度。

16. 发明申请

US20080032213A1 MASK BLANKS 审中-公开
公开(公告)号：US20080032213A1
公开(公告)日：2008-02-07
申请号：US11836304
申请日：2007-08-09
申请人： Shinya KIKUGAWA , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
发明人： Shinya KIKUGAWA , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
IPC分类号： G03F1/00
CPC分类号： C03C3/06 , C03C17/09 , C03C2201/12 , C03C2201/23 , C03C2217/26 , C03C2218/154 , G03F1/60
摘要： The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the mask blank has a birefringence, as measured at a wavelength of 193 nm, of 1 nm or less per substrate thickness. According to the present invention, mask blanks suitable for use in the immersion exposure technique and the polarized illumination technique are provided.
摘要翻译：本发明提供一种掩模板，其包括由合成石英玻璃制成的基板和层叠在基板的表面上的遮光膜，并且用于使用200nm或更短的曝光光波长的半导体器件制造技术其中掩模坯料在193nm波长下测得的每个基片厚度为1nm或更小的双折射。根据本发明，提供适用于浸渍曝光技术和偏振照明技术的掩模坯料。

17. 发明申请

US20070042893A1 Silica glass containing TiO2 and process for its production 有权
标题翻译：含二氧化硅的硅玻璃及其生产工艺
公开(公告)号：US20070042893A1
公开(公告)日：2007-02-22
申请号：US11589875
申请日：2006-10-31
申请人： Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
IPC分类号： C03C3/06 , C03B19/00 , C03B23/00 , C03B32/00
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C2201/12 , C03C2201/23 , C03C2201/42
摘要： It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.
摘要翻译：提供含有TiO 2的二氧化硅玻璃，其具有宽的温度范围，其中热膨胀系数基本上为零。含有TiO 2浓度为3〜10质量％，OH基浓度为600质量ppm以下且Ti 3 +浓度为70质量ppm以下，其特征在于，假想温度为1200℃以下，0〜100℃的热膨胀系数为0±150ppb /℃。并且在400至700nm的波长范围内每1mm厚度的内部透射率T 400-700 至少为80％。一种制备含有TiO 2的二氧化硅玻璃的方法，其包括多孔玻璃体形成步骤，F掺杂步骤，氧处理步骤，致密化步骤和玻璃化步骤。

18. 发明授权

US06795170B2 Structure for attaching a pellicle to a photo-mask 失效
标题翻译：用于将防护薄膜组件附接到光掩模的结构
公开(公告)号：US06795170B2
公开(公告)日：2004-09-21
申请号：US10299705
申请日：2002-11-20
申请人： Hitoshi Mishiro , Shinya Kikugawa , Kaname Okada , Takayuki Kawahara , Morio Terakado
发明人： Hitoshi Mishiro , Shinya Kikugawa , Kaname Okada , Takayuki Kawahara , Morio Terakado
IPC分类号： G03B2762
CPC分类号： G03F1/64 , G03F7/70983
摘要： A structure for attaching a pellicle to a photomask, the pellicle comprising a pellicle frame and a pellicle sheet attached to an opening portion formed in the pellicle frame, wherein at least a portion of the pellicle frame surface in contact with the photo-mask has a direct contact with the photo-mask without interposing an adhesive.
摘要翻译：一种用于将防护薄膜组件附接到光掩模的结构，所述防护薄膜组件包括防护薄膜组件框架和附着到形成在所述防护薄膜框架中的开口部分的防护薄膜组件，其中所述防护薄膜组件框架表面中的与所述光掩模接触的部分具有直接接触光罩而不插入胶粘剂。

19. 发明授权

US06744562B2 Pellicle 失效
标题翻译：薄膜
公开(公告)号：US06744562B2
公开(公告)日：2004-06-01
申请号：US10206086
申请日：2002-07-29
申请人： Kaname Okada , Shinya Kikugawa
发明人： Kaname Okada , Shinya Kikugawa
IPC分类号： G02B2714
CPC分类号： G03F1/64
摘要： A pellicle comprising a box-shaped pellicle frame having top and bottom openings, and a pellicle sheet bonded to the pellicle frame to cover one of the openings of the pellicle frame, wherein the pellicle frame is made of quartz glass, a plurality of vent holes are formed as distributed on opposing side walls of the pellicle frame, and the size of the vent holes in the direction of the height of the pellicle frame is at most ⅗ of the height of the pellicle frame.
摘要翻译：一种防护薄膜组件，包括具有顶部和底部开口的盒形防护薄膜框架，以及防粘膜框架结合到防护薄膜组件框架上以覆盖防护薄膜组件框架中的一个开口的防护薄膜组件框架，其中防护薄膜框架由石英玻璃制成，多个通气孔被形成为分布在防护薄膜组件框架的相对侧壁上，并且防尘薄膜组件框架的高度方向上的通气孔的尺寸至少为防护薄膜组件框架的高度的3/5。

20. 发明授权

US06713200B2 Pellicle and method of using the same 失效
标题翻译：薄膜及其使用方法
公开(公告)号：US06713200B2
公开(公告)日：2004-03-30
申请号：US09795329
申请日：2001-03-01
申请人： Hiroshi Arishima , Shinya Kikugawa , Hitoshi Mishiro
发明人： Hiroshi Arishima , Shinya Kikugawa , Hitoshi Mishiro
IPC分类号： B32B900
CPC分类号： G03F1/62 , G03F1/64 , Y10T428/26 , Y10T428/265
摘要： A pellicle formed by bonding a pellicle membrane composed of synthesized glass on a pellicle frame by an adhesive wherein a light shielding member for shielding ultra-violet rays irradiated to the adhesive is provided at a portion where the pellicle membrane is bonded to the pellicle frame, whereby the adhesive for bonding the pellicle membrane to the pellicle frame is prevented from being deteriorated due to the irradiation of ultra-violet rays for cleaning.
摘要翻译：在防护薄膜组件框架上通过将防护薄膜组件的防护薄膜组合物粘贴在防护薄膜组件框架上的部分上，通过粘合剂将用于遮蔽紫外线的遮光部件粘接在粘合剂上的粘合剂形成的防护薄膜组件，由此防止了用于将防护薄膜组件粘贴到防护薄膜组件框架上的粘合剂由于紫外线的照射被清洁而劣化。

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