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21. 发明申请

WO1997002917A1 HIGHLY EFFICIENT PROCESSING METHOD BASED ON HIGH DENSITY RADICAL REACTION AND USING ROTARY ELECTRODE, APPARATUS THEREFOR AND ROTATING ELECTRODE USED THEREFOR 审中-公开
标题翻译：基于高密度雷达反应和使用旋转电极的高效加工方法及其使用的旋转电极及其旋转电极
公开(公告)号：WO1997002917A1
公开(公告)日：1997-01-30
申请号：PCT/JP1996001953
申请日：1996-07-11
申请人： RESEARCH DEVELOPMENT CORPORATION OF JAPAN , MORI, Yuzo , ISHIKAWA, Toshio
发明人： RESEARCH DEVELOPMENT CORPORATION OF JAPAN
IPC分类号： B23H01/00
CPC分类号： B23H7/12 , B23H1/00 , H05H1/46 , H05H2001/466 , Y10T83/0414
摘要： A highly efficient processing method based on a high density radical reaction and using a rotating electrode, comprising supplying a large amount of a reaction gas to a processing gap between a processing electrode and an object being processed in a controlled state, increasing a limit value of an input power to increase a density of a neutral radical to sharply enhance a processing speed 10 to 100 times, preventing arc discharge and attaining thermal stability, an apparatus therefor and a rotating electrode used therefor. The method comprises arranging an endless processing electrode and an object being processed in a gas atmosphere containing a reaction gas and an inert gas with a processing gap formed, supplying a high-frequency electric power to the processing electrode, rotating the processing electrode at high speeds to move a surface of the processing electrode relative to that portion of the object being processed, which is being processed, at high speeds and to cause the gases to be entrained at the surface of the processing electrode to thereby form a gas flow crossing the processing gap, and vaporizing and removing a volatile matter produced by a radical reaction between a neutral radical produced in a plasma generated in the processing gap and atoms or molecules, which constitute the object being processed, to facilitate processing.
摘要翻译：一种基于高密度自由基反应和使用旋转电极的高效加工方法，包括向处理电极和被处理物体之间的处理间隙供给大量的反应气体，所述处理间隙处于受控状态，增加极限值用于增加中性自由基的密度的输入功率，以将其处理速度急剧增加10至100倍，防止电弧放电和获得热稳定性，其设备和用于其的旋转电极。该方法包括在包含反应气体和惰性气体的气体气氛中配置循环处理电极和被处理物体，形成有处理间隙，向处理电极提供高频电力，高速旋转处理电极使处理电极的表面相对于正在被处理的被处理物体的高速部分移动，并使气体夹带在处理电极的表面，从而形成与加工电极相交的气流间隙，蒸发除去由处理间隙中产生的等离子体中产生的中性自由基与构成待处理对象的原子或分子之间的自由基反应产生的挥发性物质，以便于处理。

22. 发明授权

EP1139400B1 METHOD FOR MACHINING/CLEANING BY HYDROXIDE ION IN ULTRAPURE WATER 有权
标题翻译：机床/清洁过程中使用的超纯水中的氢氧根离子
公开(公告)号：EP1139400B1
公开(公告)日：2009-03-18
申请号：EP99958483.2
申请日：1999-12-07
申请人： Mori, Yuzo
发明人： MORI, Yuzo , ISHIKAWA, Toshio
IPC分类号： H01L21/306 , B08B3/02 , C25D11/32 , C25F1/00 , H01L21/00
CPC分类号： H01L21/67051 , C25D11/32 , C25F1/00 , C25F3/00 , Y10S134/902 , Y10S438/906
摘要： A highly efficient method for clean machining a work only by hydroxide ions in ultrapure water without leaving any impurities on the surface of the work, or cleaning the surface of a work by completely removing minute impurity metals adhering to the surface. Readhesion of impurity metals is prevented by increasing the density of hydroxide ions and by quickly removing the reaction substances produced when impurity metals are bonded to hydroxide ions from the surface. A work and a high-pressure nozzle are opposed to each other at a predetermined interval in an ultrapure water bath. An ion exchange material or catalyst material for increasing hydroxide ions is disposed between the surface of the work and the end of the nozzle opposed to the work. A voltage is applied between the nozzle serving as a cathode and the work serving as an anode. Ultrapure water is jetted from the nozzle to form a high-speed shear flow near the surface of the work, and hence hydroxide ions are supplied to the surface. Thus, material removal or oxide coating formation can be effected by chemical elution or oxidation by hydroxide ions, or minute impurity metals adhering to the surface of a work are separated and removed.

23. 发明授权

EP1170083B1 Electrochemical machining method and apparatus 有权
标题翻译：用于电化学治疗的方法和装置
公开(公告)号：EP1170083B1
公开(公告)日：2008-09-10
申请号：EP01116344.1
申请日：2001-07-05
申请人： EBARA CORPORATION , Mori, Yuzo
发明人： Mori, Yuzo , Kobata, Itsuki , Shirakashi, Mitsuhiko , Saito, Takayuki , Toma, Yasushi
IPC分类号： B23H3/08 , C25F3/00
CPC分类号： B23H3/08

24. 发明公开

EP1170083A3 Electrochemical machining method and apparatus 有权
标题翻译：电化学加工方法和设备
公开(公告)号：EP1170083A3
公开(公告)日：2002-09-04
申请号：EP01116344.1
申请日：2001-07-05
申请人： EBARA CORPORATION , Mori, Yuzo
发明人： Mori, Yuzo , Kobata, Itsuki , Shirakashi, Mitsuhiko , Saito, Takayuki , Toma, Yasushi
IPC分类号： B23H3/08 , C25F3/00
CPC分类号： B23H3/08
摘要： An electrochemical machining apparatus comprises a machining chamber for holding ultrapure water, a cathode/anode immersed in the ultrapure water held in the machining chamber, and a workpiece holding portion for holding a workpiece at a predetermined distance from the cathode/anode so that a surface, to be machined, of the workpiece is brought into contact with the ultrapure water. The electrochemical machining apparatus further comprises an anode/cathode contact brought into contact with the workpiece held by the workpiece holding portion so that the workpiece serves as an anode/cathode, a catalyst having a strongly basic anion exchange function or a strongly acidic cation exchange function, a power source for applying a voltage between the cathode/anode and the workpiece, and a moving mechanism for relatively moving the workpiece and the catalyst. The catalyst is disposed between the cathode/anode and the workpiece held by the workpiece holding portion.
摘要翻译：一种电解加工装置，其特征在于，包括：保持超纯水的加工室;浸渍在保持在加工室内的超纯水中的阴极/阳极;以及保持工件的工件保持部，该工件保持部与阴极/阳极隔开规定的距离，待加工的工件与超纯水接触。电化学加工设备还包括与由工件保持部分保持的工件接触的阳极/阴极触点，使得工件用作阳极/阴极，具有强碱性阴离子交换功能或强酸性阳离子交换功能的催化剂，用于在阴极/阳极和工件之间施加电压的电源，以及用于使工件和催化剂相对移动的移动机构。催化剂布置在阴极/阳极和由工件保持部分保持的工件之间。

25. 发明公开

EP0513634A3 High-speed film-forming processes by plasma CVD and Radical CVD under high pressure 失效
标题翻译：通过等离子体CVD和高压下的自由基CVD的高速成膜工艺
公开(公告)号：EP0513634A3
公开(公告)日：1994-08-31
申请号：EP92107566.9
申请日：1992-05-05
申请人： Mori, Yuzo , UHA MIKAKUTO PRECISION ENGINEERING RESEARCH INSTITUTE Co., Ltd.
发明人： Mori, Yuzo
IPC分类号： C23C16/44 , C23C16/50 , H01J37/34
CPC分类号： H01J37/32256 , C23C16/452 , H01J37/32357 , H01J2237/3326
摘要： High-speed film-forming processes by plasma CVD and radical CVD under a high pressure which enable the formation of a crystalline thin film by only heating the substrate to a temperature which does not cause thermal damage to the substrate. The long-life neutral radicals of an inert gas are generated by excitation by plasma or light under a high pressure such as several Torr to several atm, and the neutral radicals are reacted with reaction gas molecules so as to decompose or activate reaction nuclei. The neutral radicals of the reaction gas generated thereby are introduced onto the substrate, thereby forming a thin film thereon.
摘要翻译：在高压下通过等离子体CVD和自由基CVD的高速成膜过程，其通过仅将基板加热至不会导致基板热损伤的温度而形成结晶薄膜。惰性气体的长寿命中性自由基是由等离子体或光在高压（例如几Torr至几个大气压）下激发产生的，并且中性自由基与反应气体分子反应以分解或激活反应核。由此产生的反应气体的中性自由基被引入到基板上，从而在其上形成薄膜。

26. 发明公开

EP0513634A2 High-speed film-forming processes by plasma CVD and Radical CVD under high pressure 失效
标题翻译：快速膜使用等离子体辅助CVD和自由基在高压下形成方法。
公开(公告)号：EP0513634A2
公开(公告)日：1992-11-19
申请号：EP92107566.9
申请日：1992-05-05
申请人： Mori, Yuzo , UHA MIKAKUTO PRECISION ENGINEERING RESEARCH INSTITUTE Co., Ltd.
发明人： Mori, Yuzo
IPC分类号： C23C16/44 , C23C16/50 , H01J37/34
CPC分类号： H01J37/32256 , C23C16/452 , H01J37/32357 , H01J2237/3326
摘要： High-speed film-forming processes by plasma CVD and radical CVD under a high pressure which enable the formation of a crystalline thin film by only heating the substrate to a temperature which does not cause thermal damage to the substrate. The long-life neutral radicals of an inert gas are generated by excitation by plasma or light under a high pressure such as several Torr to several atm, and the neutral radicals are reacted with reaction gas molecules so as to decompose or activate reaction nuclei. The neutral radicals of the reaction gas generated thereby are introduced onto the substrate, thereby forming a thin film thereon.
摘要翻译：高速成膜仅通过基板加热到不引起的温度的高的压力，这使能高速制膜而对一个基板和薄膜的多晶化或结晶的限制很少形成下通过等离子体CVD和自由基CVD工艺在衬底上的热损伤。惰性气体的大气压的长寿命的中性基被等离子体或光的激励在高压下产生的：例如几Torr〜数，和中性游离基与反应气体分子反应以分解或活化反应核。由此产生的反应气体的中性自由基被引入到基片，从而在其上形成薄膜。

27. 发明公开

EP0300224A3 Strainless precision after-treatment process by radical reaction 失效
标题翻译：无级精度后处理过程的辐射反应
公开(公告)号：EP0300224A3
公开(公告)日：1990-11-28
申请号：EP88110108.3
申请日：1988-06-24
申请人： Mori, Yuzo , UHA MIKAKUTO PRECISION ENGINEERING RESEARCH INSTITUTE Co., Ltd.
发明人： Mori, Yuzo , Yamauchi, Kazuto
IPC分类号： C30B33/00 , B23K26/12
CPC分类号： B28D5/00 , C30B33/00
摘要： The invention relates to a precision process, wherein a radical reaction of a radical produced from a gas on discharge or laser beam excitation in a gaseous atmosphere with an atom or molecule constituting a workpiece is utilized, a compound produced according to the reaction is vaporized and removed, and thus a workpiece such as silicon single crystal, ceramics material or the like can be smoothed, cut, bored, grooved and so forth without leaving a residual defect such as residual crack, thermally affected layer or the like on the surface.

28. 发明公开

EP0300224A2 Strainless precision after-treatment process by radical reaction 失效
标题翻译： Pr ises。ies Nachbehandlungsverfahren durch Radikalreaktionen。
公开(公告)号：EP0300224A2
公开(公告)日：1989-01-25
申请号：EP88110108.3
申请日：1988-06-24
申请人： Mori, Yuzo , UHA MIKAKUTO PRECISION ENGINEERING RESEARCH INSTITUTE Co., Ltd.
发明人： Mori, Yuzo , Yamauchi, Kazuto
IPC分类号： C30B33/00 , B23K26/12
CPC分类号： B28D5/00 , C30B33/00
摘要： The invention relates to a precision process, wherein a radical reaction of a radical produced from a gas on discharge or laser beam excitation in a gaseous atmosphere with an atom or molecule constituting a workpiece is utilized, a compound produced according to the reaction is vaporized and removed, and thus a workpiece such as silicon single crystal, ceramics material or the like can be smoothed, cut, bored, grooved and so forth without leaving a residual defect such as residual crack, thermally affected layer or the like on the surface.
摘要翻译：本发明涉及一种精密方法，其中利用气体在气体气氛中产生的自由基与气体气氛中的激光束与构成工件的原子或分子的自由基反应，根据反应产生的化合物被蒸发，因此能够平滑，切割，钻孔，开槽等工件，例如硅单晶，陶瓷材料等，而不会在表面上留下残余裂纹，热影响层等残留缺陷。

29. 发明公开

EP1920883A4 ELECTRON BEAM ASSISTED EEM METHOD 有权
标题翻译：电子助EEM程序
公开(公告)号：EP1920883A4
公开(公告)日：2011-06-15
申请号：EP06782248
申请日：2006-08-03
申请人： MORI YUZO
发明人： MORI YUZO
IPC分类号： B24B1/00 , B24B19/22 , B24B31/06 , B24B31/116 , B24B37/00 , B24C1/08 , G02B5/08 , G21K1/06
CPC分类号： G21K1/06 , B23H5/04 , B23H7/38 , B23K15/00 , B24B31/10 , B24C1/08 , G21K2201/064 , G21K2201/067 , Y10S451/908

30. 发明公开

EP1920883A1 ELECTRON BEAM ASSISTED EEM METHOD 有权
标题翻译： ELEKTRONENSTRAHLUNTERSTÜTZTESEEM-VERFAHREN
公开(公告)号：EP1920883A1
公开(公告)日：2008-05-14
申请号：EP06782248.6
申请日：2006-08-03
申请人： Mori, Yuzo
发明人： Mori, Yuzo
IPC分类号： B24B1/00 , B24B19/22 , B24B31/06 , B24B37/00
CPC分类号： G21K1/06 , B23H5/04 , B23H7/38 , B23K15/00 , B24B31/10 , B24C1/08 , G21K2201/064 , G21K2201/067 , Y10S451/908
摘要： To provide an electron beam assisted EEM method that can realize ultraprecision machining of workpieces, including glass ceramic materials, in which at least two component materials different from each other in machining speed in a machining process are present in a refined mixed state and the surface state is not even, to a surface roughness of 0.2 to 0.05 nm RMS. The EEM method comprises a working process in which a workpiece and chemically reactive fine particles are allowed to flow along the working face to remove atoms on the working face chemically bonded to the fine particles together with the fine particles through chemical interaction between the fine particles and the working face interface. The workpiece comprises at least two component materials present in a refined mixed state and different from each other in machining speed in the machining process. After the exposure of the workpiece in its working face to an electron beam to conduct modification so that the machining speed of the surface layer part in the working face is substantially even, ultraprecision smoothening is carried out by working process.
摘要翻译：提供一种能够实现包括玻璃陶瓷材料的工件的超精密加工的电子束辅助EEM方法，其中在加工过程中以加工速度彼此不同的至少两种组分材料以精细混合状态存在，并且表面状态不均匀，表面粗糙度为0.2〜0.05nm RMS。 EEM方法包括一个工作过程，其中允许工件和化学反应性微粒沿着工作面流动，以通过细颗粒与细颗粒之间的化学相互作用将微粒与化学键合的工作面上的原子除去工作面界面。工件包括以精加工的混合状态存在并且在加工过程中加工速度彼此不同的至少两种组分材料。在将工件的工作面暴露于电子束进行变形，使得工作面中的表面层部的加工速度基本均匀的情况下，通过工作过程进行超精密平滑化。

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