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31. 发明申请

WO2013100365A1 하드마스크 조성물용 모노머, 상기 모노머를 포함하는 하드마스크 조성물 및 상기 하드마스크 조성물을 사용하는 패턴형성방법 审中-公开
标题翻译： HARDMASK组合物的单体，包括单体的HARDMASK组合物和使用HARDMASK组合物的图案形成方法
公开(公告)号：WO2013100365A1
公开(公告)日：2013-07-04
申请号：PCT/KR2012/009870
申请日：2012-11-21
申请人： 제일모직 주식회사
发明人： 최유정 , 권효영 , 조연진 , 김윤준 , 김영민 , 윤용운 , 이충헌
IPC分类号： G03F7/11 , G03F7/004 , G03F7/26 , C07C35/44
CPC分类号： C07C39/14 , B05D1/005 , B05D3/007 , B05D3/0254 , B05D3/06 , C07C39/12 , C07C2603/50 , C07C2603/54 , C09D173/00 , G03F7/004 , G03F7/0752 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36
摘要： 하기 화학식 1로 표현되는 하드마스크 조성물용 모노머, 상기 모노머를 포함하는 하드마스크 조성물 및 이를 사용한 패턴 형성 방법에 관한 것이다.
摘要翻译：本发明涉及由化学式1表示的硬掩模组合物单体，包含该单体的硬掩模组合物和使用其的图案形成方法。

32. 发明申请

US20180101096A1 MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD 审中-公开
公开(公告)号：US20180101096A1
公开(公告)日：2018-04-12
申请号：US15565018
申请日：2016-04-07
申请人： Mitsubishi Gas Chemical Company, Inc.
发明人： Kana OKADA , Takashi MAKINOSHIMA , Masatoshi ECHIGO , Go HIGASHIHARA , Atsushi OKOSHI
IPC分类号： G03F7/11 , C07C261/02 , C07D311/78 , C07C39/15 , C09D173/00 , C09D165/00 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32 , G03F7/039 , H01L21/308
CPC分类号： G03F7/11 , C07C39/15 , C07C261/02 , C07D311/78 , C09D165/00 , C09D173/00 , G03F7/039 , G03F7/162 , G03F7/168 , G03F7/2037 , G03F7/322 , G03F7/38 , H01L21/3081 , H01L21/3086
摘要： A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m1 is independently an integer of 0 to 4, in which at least one m1 is an integer of 1 to 4, each m2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

33. 发明授权

US09447504B1 Method of etching using inkjet printing 有权
标题翻译：使用喷墨印刷的蚀刻方法
公开(公告)号：US09447504B1
公开(公告)日：2016-09-20
申请号：US14867730
申请日：2015-09-28
申请人： XEROX CORPORATION
发明人： James R. Larson , Jeffrey J. Folkins , Chu-Heng Liu , Wayne A. Buchar , Mandakini Kanungo , Santokh Badesha
IPC分类号： H01B13/00 , C23F1/14 , B41J2/01
CPC分类号： C23F1/14 , C09D173/00
摘要： A process of patterning a conductive film. The process comprises providing a substrate comprising a conductive film positioned on a surface of the substrate. A hydrophilic primer layer is coated on the conductive film. Droplets of etchant are ejected from an inkjet printer in an imagewise pattern onto the primer layer to pattern the conductive film. The primer layer is removed from the substrate.
摘要翻译：图案化导电膜的工艺。该方法包括提供包括位于基底表面上的导电膜的基底。在导电膜上涂布亲水性底漆层。蚀刻剂液滴以成像图案从喷墨打印机喷射到底漆层上以对导电膜进行图案化。底物层从基底上去除。

34. 发明申请

US20160215163A1 COATING MATERIAL COMPOSITIONS AND LOW-TEMPERATURE-CURABLE COATINGS PRODUCED THEREFROM, AND USE THEREOF 有权
标题翻译：涂覆材料组合物和生产的低温可固化涂料及其用途
公开(公告)号：US20160215163A1
公开(公告)日：2016-07-28
申请号：US15023903
申请日：2014-08-07
申请人： BASF COATINGS GMBH
发明人： Peter HOFFMANN , Rainer KLOPSCH , Matthijs GROENEWOLT , Elisabeth WESSLING , Aaron FLORES-FIGUEROA , Kristin MICHEL
IPC分类号： C09D133/14 , B05D7/00
CPC分类号： C09D133/14 , B05D7/574 , C08F8/00 , C08F8/32 , C08F220/08 , C08F220/28 , C08G12/02 , C08G71/04 , C09D133/00 , C09D173/00 , C08F2220/281 , C08F212/08 , C08F220/14 , C08F2220/1825
摘要： The present invention relates to a nonaqueous coating material composition comprising at least one compound (A) having at least two amino groups, and at least one oligomeric and/or polymeric compound (B) having at least two alkylidene-1,3-dioxolan-2-one groups, wherein the compound (B) is obtainable using at least one monomer (B1) of the formula (I) where R1, R2 independently of one another are hydrogen, C1-C6 alkyl, C1-C4 alkoxy-C1-C4 alkyl, C5-C6 cycloalkyl, phenyl or phenyl-C1-C4 alkyl; R3 is hydrogen, C1-C6 alkyl, C1-C4 alkoxy-C1-C4 alkyl, C5-C6 cycloalkyl, phenyl, or phenyl-C1-C4 alkyl, R3 more particularly being hydrogen; R4 is hydrogen, C1-C4 alkyl, CH2COOR8, phenyl or phenyl-C1-C4 alkyl; R5, R6 independently of one another are hydrogen or C1-C4 alkyl or else one of the radicals, R5 or R6, may be COOR8 or CH2COOR8; A is a chemical bond or C1-C4 alkanediyl, A more particularly being C1-C4 alkanediyl; X is O or NR7; Z is a chemical bond, PO2, SO2, or C═O, Z more particularly being C═O; Y is a chemical bond, CH2, or CHCH3; R7 where present is C1-C6 alkyl; and R8 where present is hydrogen or C1-C6 alkyl; and at least two different comonomers (B2) and (B3) which are each different from the monomer (B1). The present invention further provides the coatings produced from these coating material compositions, and also the use thereof.
摘要翻译：本发明涉及包含至少一种具有至少两个氨基的化合物（A）和至少一种具有至少两个亚烷基-1,3-二氧戊环的化合物（B）的至少一种低聚和/或高分子化合物（B）其中化合物（B）可以使用至少一种式（I）的单体（B1）获得，其中R 1，R 2彼此独立地为氢，C 1 -C 6烷基，C 1 -C 4烷氧基-C 1〜 C4烷基，C5-C6环烷基，苯基或苯基-C1-C4烷基; R 3是氢，C 1 -C 6烷基，C 1 -C 4烷氧基-C 1 -C 4烷基，C 5 -C 6环烷基，苯基或苯基-C 1 -C 4烷基，R 3更特别是氢; R4是氢，C1-C4烷基，CH2COOR8，苯基或苯基-C1-C4烷基; R5，R6彼此独立地是氢或C1-C4烷基，或者基团R5或R6中的一个可以是COOR8或CH2COOR8; A是化学键或C 1 -C 4烷二基，更特别是C 1 -C 4烷二基; X为O或NR7; Z是化学键，PO2，SO2或C = O，Z更特别是C = O; Y是化学键，CH2或CHCH3; 存在的R 7为C 1 -C 6烷基; 其中存在的R 8为氢或C 1 -C 6烷基; 和至少两种不同于单体（B1）的共聚单体（B2）和（B3）。本发明还提供了由这些涂料组合物制备的涂料及其用途。

35. 发明申请

US20150008212A1 MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION 有权
标题翻译： HARDMASK组合物的单体，包括单体的HARDMASK组合物和使用HARDMASK组合物的图案形成方法
公开(公告)号：US20150008212A1
公开(公告)日：2015-01-08
申请号：US14365751
申请日：2012-11-21
申请人： Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
发明人： Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
IPC分类号： C07C39/14 , B05D3/06 , B05D1/00 , B05D3/02 , C09D173/00 , B05D3/00
CPC分类号： C07C39/14 , B05D1/005 , B05D3/007 , B05D3/0254 , B05D3/06 , C07C39/12 , C07C2603/50 , C07C2603/54 , C09D173/00 , G03F7/004 , G03F7/0752 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36
摘要： Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
摘要翻译：公开了由化学式1表示的硬掩模组合物的单体，包含单体的硬掩模组合物和形成图案的方法。

36. 发明授权

US2495285A Wax and polymeric polyketone compositions and articles coated therewith 失效
标题翻译：蜡和聚合聚酮组合物和涂覆的制品
公开(公告)号：US2495285A
公开(公告)日：1950-01-24
申请号：US8351349
申请日：1949-03-25
申请人： DU PONT
发明人： HOEHN HARVEY H
IPC分类号： C08L23/08 , C08L91/00 , C09D123/08 , C09D173/00 , C09D191/06 , D21H19/18 , D21H19/22 , D21H19/24
CPC分类号： C09D191/06 , C08L23/0846 , C08L91/00 , C09D123/0846 , C09D173/00 , D21H19/18 , D21H19/22 , D21H19/24 , Y10S524/914 , C08L73/00 , C08L91/06 , C08L2666/06 , C08L2666/04

37. 发明授权

US2442082A Internal-combustion engine 失效
公开(公告)号：US2442082A
公开(公告)日：1948-05-25
申请号：US53089544
申请日：1944-04-13
申请人： FRENCH LOUIS O
发明人： FRENCH LOUIS O
IPC分类号： C09D173/00 , F01L5/04
CPC分类号： C09D173/00 , F01L5/04

38. 发明申请

US20160289457A1 HIGH GAIN DURABLE ANTI-REFLECTIVE COATING 有权
标题翻译：高增益耐反射涂层
公开(公告)号：US20160289457A1
公开(公告)日：2016-10-06
申请号：US15182729
申请日：2016-06-15
申请人： Enki Technology, Inc.
发明人： Sina Maghsoodi , Brenor L. Brophy , Thomas E. Colson , Peter R. Gonsalves , Ze'ev R. Abrams
IPC分类号： C09D5/00 , G02B1/111 , C03C17/30 , C09D183/08 , C09D7/12
CPC分类号： C09D5/006 , C03C17/007 , C03C17/30 , C03C2217/20 , C03C2217/425 , C03C2217/45 , C03C2217/465 , C03C2217/47 , C03C2217/732 , C08K3/36 , C09D7/61 , C09D173/00 , C09D183/04 , C09D183/08 , G02B1/11 , G02B1/111 , G02B1/12 , G02B1/14 , G02B5/021 , G02B5/0215 , G02B5/0221 , H01L31/02168 , H01L31/18 , H01L33/005 , H01L33/44 , Y02E10/50 , Y02P20/582
摘要： Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers, Si—OH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.
摘要翻译：本文公开了基于聚倍半硅氧烷的抗反射涂层（ARC）组合物，制备方法和沉积在基材上的方法。在一个实施方案中，本公开的聚倍半硅氧烷是以有机烷氧基硅烷的酸催化水解的两步法制备的，然后加入基于Si-NMR产生具有> 40mol％硅烷醇的硅氧烷聚合物的四氢化烷氧基硅烷。这些高硅烷醇硅氧烷聚合物是稳定的，并且在室温下在极性有机溶剂中具有长的保质期。还公开了由具有和不具有添加剂的这些组合物制成的低折射率ARC，例如致孔剂，模板，热自由基引发剂，光自由基引发剂，交联剂，Si-OH缩合催化剂和纳米填料。还公开了用于将涂层施加到平面基板上的方法和装置，包括基板预处理工艺，涂覆工艺和涂层固化工艺，包括使用热风刀的皮肤固化。还公开了用于高度可调，耐用，高耐磨性的功能化抗反射涂层的涂料组合物和制剂。

39. 发明授权

US09399720B2 High gain durable anti-reflective coating 有权
标题翻译：高增益耐用抗反射涂层
公开(公告)号：US09399720B2
公开(公告)日：2016-07-26
申请号：US14799507
申请日：2015-07-14
申请人： Enki Technology, Inc.
发明人： Sina Maghsoodi , Brenor L. Brophy , Thomas E. Colson , Peter R. Gonsalves , Ze'ev R. Abrams
IPC分类号： C09D183/00 , C09D173/00 , C09D5/00 , G02B1/11 , C03C17/30 , C09D183/08 , G02B1/111 , G02B1/12 , H01L31/0216 , H01L31/18 , H01L33/00 , H01L33/44
CPC分类号： C09D5/006 , C03C17/007 , C03C17/30 , C03C2217/20 , C03C2217/425 , C03C2217/45 , C03C2217/465 , C03C2217/47 , C03C2217/732 , C08K3/36 , C09D7/61 , C09D173/00 , C09D183/04 , C09D183/08 , G02B1/11 , G02B1/111 , G02B1/12 , G02B1/14 , G02B5/021 , G02B5/0215 , G02B5/0221 , H01L31/02168 , H01L31/18 , H01L33/005 , H01L33/44 , Y02E10/50 , Y02P20/582
摘要： Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers, Si—OH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.
摘要翻译：本文公开了基于聚倍半硅氧烷的抗反射涂层（ARC）组合物，制备方法和沉积在基材上的方法。在一个实施方案中，本公开的聚倍半硅氧烷是以有机烷氧基硅烷的酸催化水解的两步法制备的，然后加入基于Si-NMR产生具有> 40mol％硅烷醇的硅氧烷聚合物的四氢化烷氧基硅烷。这些高硅烷醇硅氧烷聚合物是稳定的，并且在室温下在极性有机溶剂中具有长的保质期。还公开了由具有和不具有添加剂的这些组合物制成的低折射率ARC，例如致孔剂，模板，热自由基引发剂，光自由基引发剂，交联剂，Si-OH缩合催化剂和纳米填料。还公开了用于将涂层施加到平面基板上的方法和装置，包括基板预处理工艺，涂覆工艺和涂层固化工艺，包括使用热风刀的皮肤固化。还公开了用于高度可调，耐用，高耐磨性的功能化抗反射涂层的涂料组合物和制剂。

40. 发明授权

US09376589B2 High gain durable anti-reflective coating with oblate voids 有权
标题翻译：高增益耐用抗反射涂层，带有扁平空隙
公开(公告)号：US09376589B2
公开(公告)日：2016-06-28
申请号：US14799479
申请日：2015-07-14
申请人： Enki Technology, Inc.
发明人： Sina Maghsoodi , Brenor L. Brophy , Thomas E. Colson , Peter R. Gonsalves , Ze'ev R. Abrams
IPC分类号： C09D173/00 , C09D5/00 , G02B1/11
CPC分类号： C09D5/006 , C03C17/007 , C03C17/30 , C03C2217/20 , C03C2217/425 , C03C2217/45 , C03C2217/465 , C03C2217/47 , C03C2217/732 , C08K3/36 , C09D7/61 , C09D173/00 , C09D183/04 , C09D183/08 , G02B1/11 , G02B1/111 , G02B1/12 , G02B1/14 , G02B5/021 , G02B5/0215 , G02B5/0221 , H01L31/02168 , H01L31/18 , H01L33/005 , H01L33/44 , Y02E10/50 , Y02P20/582
摘要： Disclosed herein are single layer transparent coatings with an anti-reflective property, a hydrophobic property, and that are highly abrasion resistant. The single layer transparent coatings contain a plurality of oblate voids. At least 1% of the oblate voids are open to a surface of the single layer transparent coatings.
摘要翻译：本文公开了具有抗反射性，疏水性，并且具有高耐磨性的单层透明涂层。单层透明涂层含有多个扁圆形的空隙。至少1％的扁圆形空隙对单层透明涂层的表面开放。

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