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51. 发明授权

US06210491B1 Pickling process 失效
标题翻译：酸洗过程
公开(公告)号：US06210491B1
公开(公告)日：2001-04-03
申请号：US09283991
申请日：1999-04-01
申请人： Sarah J. Colgan , Neil J. Sanders
发明人： Sarah J. Colgan , Neil J. Sanders
IPC分类号： B08B310
CPC分类号： B01F5/0212 , B01F5/10 , C23G1/08 , C23G1/086 , C23G1/36 , C23G3/00
摘要： In the invention pickling process, steel and nickel or chromium alloys are pickled with an acidic pickling solution employing an oxidant, particularly hydrogen peroxide, and in which liquor is recirculated through inlets comprising a nozzle feeding liquor into a diffuser such that liquor is withdrawn from the bath and the volume of liquor flowing through the diffuser is a multiple of flow through the nozzle. Steel or the alloys are pickled with an acidic solution containing iron and free hydrogen peroxide at a concentration of up to 0.1 gpl. The process can operate effectively at a free fluoride concentration of from 20 to 30 gpl and a sulphuric acid concentration of from 80 to 110 gpl. The lifetime of the bath before it needs to be replaced can be lengthened by the process compared with using an air agitation system.
摘要翻译：在本发明酸洗方法中，使用氧化剂，特别是过氧化氢的酸性酸洗溶液酸洗钢和镍或铬合金，并且其中液体通过包括喷嘴的入口再循环到扩散器中，使得液体从浴，并且流过扩散器的液体的体积是流过喷嘴的多倍。钢或合金用浓度高达0.1gpl的铁和游离过氧化氢的酸性溶液酸洗。该方法可以在20至30gp1的自由氟化物浓度和80至110gp1的硫酸浓度下有效地操作。与使用空气搅拌系统相比，浴缸需要更换之前的使用寿命可以延长。

52. 发明授权

US06802907B2 Removing radar absorbing coatings 失效
标题翻译：去除雷达吸收涂层
公开(公告)号：US06802907B2
公开(公告)日：2004-10-12
申请号：US10320699
申请日：2002-12-16
申请人： David Lewis, III , Arne W. Fliflet , Ralph W. Bruce
发明人： David Lewis, III , Arne W. Fliflet , Ralph W. Bruce
IPC分类号： B08B310
CPC分类号： B08B7/0035
摘要： Process for removing microwave energy absorbing material disposed on a substrate without thermally and/or mechanically damaging the substrate and with reduced production of volatile matter comprising the steps of directing microwave energy at the coating of sufficient power to damage the coating and removing the damaged coating from the substrate.
摘要翻译：用于去除设置在基板上的微波能量吸收材料的方法，而不会热和/或机械地损坏基底并且减少挥发物的产生，包括以下步骤：在施加足够的能量的微波能量下引导微波能量以损坏涂层并从底物。

53. 发明授权

US06780253B2 Gradient dragout system in a continuous plating line 有权
标题翻译：梯度拉拔系统在连续电镀线中
公开(公告)号：US06780253B2
公开(公告)日：2004-08-24
申请号：US10189611
申请日：2002-07-03
申请人： Paul R. Moehle , David M. Drew , Eiman A. Hegazi
发明人： Paul R. Moehle , David M. Drew , Eiman A. Hegazi
IPC分类号： B08B310
CPC分类号： C25D21/18 , B01B1/00 , B01B1/005 , C25D21/20
摘要： An enhanced gradient dragout system conserves plating chemicals, including precious metals by providing a series of tanks with cascading rinse solutions having a flow rate controlled by heating the first tank to increase the evaporation rate. A portion of the concentrated solution in the heated tank is returned to the process tank. The system minimizes the requirements for clean rinse water, and the need for emptying contaminated rinse tanks with associated recovery and disposal environmental and cost issues. The low cost system is flexible and the process is adapted to the material and process requirements of the plating line.
摘要翻译：增强的梯度牵引系统通过提供具有通过加热第一罐来控制的流速的级联冲洗溶液来提供蒸发速率来提供一系列具有级联冲洗溶液的罐，从而节省了电镀化学品，包括贵金属。加热槽中的一部分浓缩溶液返回处理罐。该系统最大限度地减少了清洁冲洗水的要求，并且需要清空受污染的冲洗池，并具有相关的回收和处理环境和成本问题。低成本系统是灵活的，该工艺适应电镀线的材料和工艺要求。

54. 发明授权

US06619301B2 Ultrasonic processing device and electronic parts fabrication method using the same 有权
标题翻译：超声波处理装置及使用其的电子部件制造方法
公开(公告)号：US06619301B2
公开(公告)日：2003-09-16
申请号：US09738851
申请日：2000-12-15
申请人： Kazuki Kobayashi , Hitoshi Ono , Yasunobu Tagusa , Tomomi Hikida , Yuichi Maida
发明人： Kazuki Kobayashi , Hitoshi Ono , Yasunobu Tagusa , Tomomi Hikida , Yuichi Maida
IPC分类号： B08B310
CPC分类号： H01L21/67051 , B08B3/123 , G03F7/428 , H05K3/0085 , H05K3/26 , Y10S134/902
摘要： To provide an ultrasonic processing device that is capable of effectively carrying out a cleaning operation, a resist-stripping operation, etc. by projecting ultrasonic uniformly over an entirety of the ultrasonic processing target region by means of ultrasonic oscillation elements each having a width smaller than an ultrasonic processing target region of a processing object, as well as to provide an electronic parts fabrication method using the foregoing device, a plurality of ultrasonic oscillation elements are arranged so as to planarly extend in a glass substrate transport direction and in a glass substrate width direction, and projected figures obtained by projecting said ultrasonic oscillation elements to a plane perpendicular to the glass substrate transport direction form a single belt-like region of a width exceeding a width of the ultrasonic processing target region. The foregoing arrangement causes ultrasonic-projected regions of the ultrasonic oscillation elements to partly overlap each other on a surface of the glass substrate when the glass substrate is transported by transport rollers in the transport direction, thereby enabling ultrasonic projection over the complete entirety of the ultrasonic processing target region.
摘要翻译：为了提供能够通过超声波振荡元件均匀地超声波超声波处理对象区域的超声波均匀化而进行清洗动作，抗蚀剂剥离动作等的超声波处理装置。处理对象的超声波处理对象区域，以及提供使用上述装置的电子部件制造方法，多个超声波振荡元件被布置成在玻璃基板输送方向和玻璃基板宽度上平面地延伸通过将所述超声波振动元件投射到与玻璃基板输送方向垂直的平面而获得的方向和投影图形形成宽度超过超声波处理对象区域的宽度的单个带状区域。当玻璃基板由输送辊沿输送方向输送时，上述布置使得超声波振荡元件的超声波投影区域在玻璃基板的表面上部分地彼此重叠，从而能够超过整个超声波的超声波投影加工目标区域。

55. 发明授权

US06464799B1 Method for managing a fluid level associated with a substrate processing tank 失效
标题翻译：用于管理与衬底处理槽相关联的液面的方法
公开(公告)号：US06464799B1
公开(公告)日：2002-10-15
申请号：US09580881
申请日：2000-05-30
申请人： Alexander Lerner , Brian J. Brown , Boris Fishkin , Jonathan S. Frankel
发明人： Alexander Lerner , Brian J. Brown , Boris Fishkin , Jonathan S. Frankel
IPC分类号： B08B310
CPC分类号： B08B3/00 , B08B3/12 , G05D9/12 , G05D21/02 , G05D23/19 , G05D27/02 , H01L21/67253
摘要： An improved method and apparatus for adjusting chemistry concentrations and temperatures within a substrate processing tank is provided. A first aspect may include checking the fluid level within the tank, and, if the level is higher than a predetermined upper level, bleeding an amount of fluid from the tank; if the level is lower than a predetermined lower level, flowing an amount of fluid to the tank, and if the level is between the predetermined upper and lower levels, bleeding an amount of fluid from the tank and flowing an amount of fluid to the tank. A second aspect may include flowing water into the tank at a flow rate at least equivalent to the flow rate of water required to achieve a chemistry spike of a predetermined concentration and volume prior to beginning the flow of chemicals. A third aspect may include a method and apparatus for heating or cooling chemistry to a predetermined temperature as the chemistry is recirculated.
摘要翻译：提供了用于调整基板处理槽内的化学浓度和温度的改进方法和装置。第一方面可以包括检查罐内的液位，并且如果液位高于预定的上限，则从罐中排出一定量的流体; 如果水平低于预定的较低水平，则将一定量的流体流向罐，并且如果水平在预定的上下水平之间，则从罐中排出一定量的流体并将一定量的流体流向罐。第二方面可以包括以至少等于在开始化学品流动之前实现预定浓度和体积的化学峰值所需的水的流速至少等于流量的水流入罐中。第三方面可以包括当化学物质再循环时将化学物质加热或冷却至预定温度的方法和装置。

56. 发明授权

US06432218B1 Multi-step flow cleaning method and multi-step flow cleaning apparatus 失效
标题翻译：多步流动清洗方法和多步流动清洗装置
公开(公告)号：US06432218B1
公开(公告)日：2002-08-13
申请号：US09402877
申请日：1999-12-07
申请人： Masatoshi Hirokawa , Haruki Sonoda , Yusuke Abe , Tetsuji Oishi , Masashi Omori , Hiroshi Tanaka
发明人： Masatoshi Hirokawa , Haruki Sonoda , Yusuke Abe , Tetsuji Oishi , Masashi Omori , Hiroshi Tanaka
IPC分类号： B08B310
CPC分类号： B08B3/10 , Y10S134/902
摘要： A multi-step flow cleaning method and a multi-step flow cleaning apparatus are provided which effectively clean workpieces with a stream of a cleaning solution and to suppress an increase of foreign matters adhering to the surfaces of the workpieces. A cleaning tank 10 for holding workpieces is provided, a supply line 14 for supplying a cleaning solution such as pure water from the bottom surface of the cleaning tank is provided, and a valve 12 for adjusting the flow of the cleaning solution is disposed in the middle of the supply line 14. The valve 12 is equipped with a switching section 12a for controlling the outflow of the cleaning solution by opening or closing the supply line 14, and a bypass 12b for supplying the cleaning solution, bypassing the switching section 12a. The valve 12 is provided such that it is able to adjust in two steps the supply flow of the cleaning solution supplied to the cleaning tank 10 by using the supply flow fed through the bypass 12b and the supply flow fed through the switching section 12a.
摘要翻译：提供了一种多级流动清洗方法和多级流动清洁装置，其用清洁液流清洁工件，并且抑制附着在工件表面上的异物的增加。设置有用于保持工件的清洁槽10，用于从清洗槽的底面供给纯净水等清洗液的供给管路14，将清洗液的流量调整用阀12配置在阀12配备有用于通过打开或关闭供应管线14来控制清洗溶液的流出的切换部分12a和绕过切换部分12a的清洁溶液供给的旁路12b。阀12设置成使得能够通过使用通过旁路12b供给的供给流和通过切换部12a供给的供给流，分两步调整供给到清洗槽10的清洗溶液的供给流。

57. 发明授权

US06432215B1 Fully automatic plating wax removing device and method thereof 失效
标题翻译：全自动电镀除蜡装置及其方法
公开(公告)号：US06432215B1
公开(公告)日：2002-08-13
申请号：US09438434
申请日：1999-11-12
申请人： Roger A. Gamache , Claude Perreault
发明人： Roger A. Gamache , Claude Perreault
IPC分类号： B08B310
CPC分类号： B08B3/10 , B01D17/0214 , C23G1/00 , C23G3/00 , F01D25/002
摘要： An improved method for removing and collecting plating wax from waxed components such as turbine engines components from aircraft, and an improved collector for reducing this method to practice. Collectors known in the art generally have 1) a process tank filled with a remover solution into which the waxed component is fully immersed and the wax is removed; 2) a wax separator tank connected to the process tank for receiving therefrom an overflow of remover solution and removed wax; and 3) a circulating pump for pumping the wax remover solution from the wax separator tank back to the process tank. The collector of the invention further has a level controller operating with microwaves for monitoring the level of remover solution in the wax separator tank and a chemical pump connected to and controlled by the level controller in order to maintain the level of wax remover solution in the wax separator tank close to a preset level by pumping a new batch of remover solution in the wax separator tank. Accordingly, unlike known collectors, the collector of the invention is fully automatic.
摘要翻译：一种用于从打蜡组件如飞机上的涡轮发动机部件去除和收集电镀蜡的改进方法，以及用于减少该方法来实施的改进的收集器。本领域已知的收集器通常具有1）填充有去除剂溶液的处理槽，其中被蜡组分完全浸入其中并除去蜡; 2）连接到处理罐的蜡分离器罐，用于从其中接收除去剂溶液和除去的蜡的溢出物; 和3）用于将蜡去除剂溶液从蜡分离器罐泵送回处理罐的循环泵。本发明的收集器还具有用微波操作的液位控制器，用于监测蜡分离器罐中的去除剂溶液的水平以及连接到液位控制器并由液位控制器控制的化学泵，以便将蜡去除剂溶液的水平保持在蜡中通过在蜡分离罐中泵送新的一批去除剂溶液，分离罐接近预设水平。因此，与已知的收集器不同，本发明的收集器是全自动的。

58. 发明授权

US06412501B1 Drying apparatus and drying method 失效
标题翻译：干燥装置和干燥方法
公开(公告)号：US06412501B1
公开(公告)日：2002-07-02
申请号：US09527840
申请日：2000-03-17
申请人： Hajime Onoda , Kazutoshi Watanabe , Hiroki Takahashi
发明人： Hajime Onoda , Kazutoshi Watanabe , Hiroki Takahashi
IPC分类号： B08B310
CPC分类号： H01L21/67034 , Y10S134/902
摘要： A drying apparatus comprises a drying vessel, a treatment liquid feeder-discharger for feeding pure water into the drying vessel, a vapor supplier for supplying an organic solvent vapor to the space over the pure water, inert gas suppliers for supplying an inert gas with which the organic solvent vapor is diluted, and a heated organic solvent supplier for forming a film of the organic solvent on a liquid level of the pure water. After the wafer is immersed in the pure water, the pure water is gradually discharged from the drying vessel by means of the treatment liquid feeder-discharger. Since the wafer passes through the organic solvent film as it is exposed above the liquid level, the organic solvent of the film adheres to the surface of the wafer, and the organic solvent vapor is condensed on the surface of the wafer that is exposed above the liquid level.
摘要翻译：干燥装置包括：干燥容器，用于将纯水供给到干燥容器中的处理液供给器排出器，用于向纯水供应有机溶剂蒸气的蒸气供给装置，用于供给惰性气体的惰性气体供给装置，稀释有机溶剂蒸气，以及加热的有机溶剂供应器，用于在纯水的液面上形成有机溶剂的膜。将晶片浸入纯水中后，通过处理液供给器 - 放电器将纯水从干燥容器逐渐排出。由于晶片在液面以上暴露时通过有机溶剂膜，因此膜的有机溶剂附着于晶片的表面，有机溶剂蒸气在露出于晶片上方的晶片的表面上会聚液位。

59. 发明授权

US06378536B1 Ultrasonic cleaning device fault detector 失效
标题翻译：超声波清洗装置故障检测器
公开(公告)号：US06378536B1
公开(公告)日：2002-04-30
申请号：US09708173
申请日：2000-11-07
申请人： Shen-Tai Liaw , Chien-Rong Huang
发明人： Shen-Tai Liaw , Chien-Rong Huang
IPC分类号： B08B310
CPC分类号： B08B3/12 , B06B2201/71 , G01H3/00 , G01V1/001 , Y10S134/902
摘要： An ultrasonic cleaning device fault detector, comprising an ultrasonic wave converter, an amplifier, a band-pass filter, and an integrator. The ultrasonic wave converter operates at the same central frequency as the ultrasonic cleaning device and is able to sense the intensity of ultrasonic waves generated by the ultrasonic cleaning device and to produce an analog signal therefrom. The amplifier amplifies the analog signal generated by the ultrasonic wave converter. The band-pass filter filters out noise in the analog signal, eliminating electric noise and other external noise that are sensed by the ultrasonic wave converter. The integrator converts the analog signal cleaned in the band-pass filter into an electric voltage digital signal output, thereby indicating whether the vibrating device of the ultrasonic cleaning device is working properly.
摘要翻译：一种超声波清洗装置故障检测器，包括超声波转换器，放大器，带通滤波器和积分器。超声波转换器以与超声波清洗装置相同的中心频率工作，能够感测超声波清洗装置产生的超声波的强度，并从其产生模拟信号。放大器放大由超声波转换器产生的模拟信号。带通滤波器滤除模拟信号中的噪声，消除由超声波变换器感测到的电噪声和其他外部噪声。积分器将在带通滤波器中清洁的模拟信号转换为电压数字信号输出，从而指示超声波清洗装置的振动装置是否正常工作。

60. 发明授权

US06345630B2 Method and apparatus for cleaning the edge of a thin disc 失效
标题翻译：用于清洁薄盘边缘的方法和装置
公开(公告)号：US06345630B2
公开(公告)日：2002-02-12
申请号：US09738797
申请日：2000-12-15
申请人： Boris Fishkin , Jianshe Tang , Brian J. Brown
发明人： Boris Fishkin , Jianshe Tang , Brian J. Brown
IPC分类号： B08B310
CPC分类号： H01L21/67051 , H01L21/67046 , Y10S134/902
摘要： An inventive edge cleaning device is provided for cleaning the edge a thin disc such as a semiconductor wafer. The inventive edge cleaning device has a sonic nozzle positioned so as to direct a liquid jet at the edge surface of the thin disc. Preferably the sonic nozzle is radially spaced from the thin disc's edge so that scrubbing, spin rinsing or spin cleaning may be simultaneously performed on the major surfaces of the thin disc as the thin disc edge is cleaned by the sonic nozzle. The liquid jet may include deionized water, NH4OH, KOH, TMAH, HF, citric acid, a surfactant, or other similar cleaning solutions, and the nozzle may remain stationary as the thin disc rotates or the nozzle may scan the circumference of the thin disc to clean the entire edge of the thin disc.
摘要翻译：提供了一种创新的边缘清洁装置，用于清洁边缘诸如半导体晶片的薄盘。本发明的边缘清洁装置具有定位成在薄盘的边缘表面处引导液体射流的声波喷嘴。优选地，声波喷嘴与薄盘的边缘径向间隔开，使得当由声波喷嘴清洁薄盘边缘时，可以在薄盘的主表面上同时进行洗涤，旋转漂洗或旋转清洁。液体射流可以包括去离子水，NH 4 OH，KOH，TMAH，HF，柠檬酸，表面活性剂或其他类似的清洁溶液，并且当薄盘旋转时喷嘴可以保持静止，或者喷嘴可以扫描薄盘的圆周以清洁薄片的整个边缘。

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