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    • 61. 发明申请
    • ELECTRODE FOR GENERATING PLASMA, ELEMENT FOR BURYING ELECTRODE, AND METHOD FOR MANUFACTURING THE ELECTRODE AND THE ELEMENT
    • 用于产生等离子体的电极,用于充电电极的元件以及用于制造电极和元件的方法
    • WO1995014308A1
    • 1995-05-26
    • PCT/JP1994001063
    • 1994-06-30
    • NGK INSULATORS, LTD.NIORI, YusukeUMEMOTO, KoichiUSHIKOSHI, Ryusuke
    • NGK INSULATORS, LTD.
    • H01L21/205
    • H01J37/32009H01J37/32559
    • This apparatus comprises a substrate (31) made of fine ceramic, and an electrode (55) buried in the substrate (31) and electrically insulated in it, wherein a plasma is produced on the substrate. The apparatus includes a layer (37) permeable to electromagnetic waves, and preferably, the average thickness of the layer is 0.5 mm or more. The electrode (55) is a flat electrode formed by a bulk metal. The substrate which encloses the electrode is a product integrally formed by sintering without junctions. This structure can also be utilized for an electric dust collector, an electromagnetic shielding device, and an electrostatic chuck. These devices can be preferably installed in an apparatus using a corrosive halogen gas for fabricating semiconductors or the like. A compact, together with a flat bulk metal electrode, is sintered by a hot press with a pressure in the thickness direction of the electrode in such a manner that the electrode is buried integrally in a fine ceramic substrate without junctions. A material permeable to electromagnetic waves is used for an apparatus for generating plasma by applying a high-frequency power to a gas. At least the surface of this material, which is in contact with the plasma atmosphere, is made of the aluminum nitride whose dielectric loss tan delta is 10 or less, and thermal resistance shock DELTA Tc is 300 DEG or more.
    • 该装置包括由精细陶瓷制成的基板(31)和埋在基板(31)中并在其中电绝缘的电极(55),其中在基板上产生等离子体。 该装置包括可透过电磁波的层(37),优选该层的平均厚度为0.5mm以上。 电极(55)是由块状金属形成的扁平电极。 包围电极的基板是通过烧结而不结合地整体形成的产品。 该结构也可用于电除尘器,电磁屏蔽装置和静电吸盘。 这些装置可以优选地安装在使用腐蚀性卤素气体制造半导体等的装置中。 通过在压电体的厚度方向的压力下,通过热压机将扁平状块状金属电极与扁平体状金属电极一起烧结,使得电极一体地嵌入微细的陶瓷基板中而没有结。 通过向气体施加高频电力,可以将电磁波透过的材料用于产生等离子体的装置。 至少与等离子体气氛接触的材料的表面由介电损耗tanδ为10 -2以下,耐热冲击△DTA为300℃以上的氮化铝制成。
    • 70. 发明公开
    • METHOD OF BLASTING PROCESS
    • 喷砂方法
    • KR20070090772A
    • 2007-09-06
    • KR20070020131
    • 2007-02-28
    • NGK INSULATORS LTD
    • KIKU TAIJI
    • B24C1/00B24C3/00
    • B24C3/02B24C11/00
    • A blast processing method is provided to prevent a blast material from being remained on a surface and to use a ceramic heater repeatedly and adequately. In a blast control method, the blast material injected to the surface of the processed material formed by nitride aluminum is made of silicon carbide or aluminum oxide and made of the abrasive grain whose grain size is in the range of #400~#800. The blast pressure generated when contacting the blast material with the surface of the controlled material is set at the range of 40~150 gf/cm^2.
    • 提供喷砂处理方法以防止喷砂材料残留在表面上并反复充分地使用陶瓷加热器。 在喷砂控制方法中,喷射到由氮化铝形成的处理材料的表面的喷砂材料由碳化硅或氧化铝制成,并且由粒度在#400〜#800范围内的磨粒制成。 将鼓风材料与受控材料的表面接触时产生的鼓风压力设定在40〜150gf / cm ^ 2的范围内。