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    • 1. 发明申请
    • CAVITATION JET PERFORMANCE ESTIMATION SYSTEM
    • 空气弹射性能估计系统
    • WO2013125463A3
    • 2013-10-17
    • PCT/JP2013053678
    • 2013-02-15
    • UNIV TOHOKU
    • SOYAMA HITOSHI
    • G06F19/00B23P17/00F15D1/00
    • G01M99/008B05B1/00G06F17/17
    • The present invention sets formula (1) for calculating an estimated cavitation jet performance (E). On the basis of data pertaining to a jet pressure (p1), a nozzle diameter (d) and a cavitation number (sigma), and data pertaining to a cavitation jet performance (ERmax) for such data, the present invention specifies, in formula (1), the power index n(sigma) of the term Xn(sigma) pertaining to the power law of the jet pressure (p1) of the cavitation jet, and the power index m(sigma) of the term Ym(sigma) pertaining to the power law of the nozzle diameter (d) generating the cavitation jet. The present invention finds the estimated cavitation jet performance (E) using the above data pertaining to the jet pressure (p1), the nozzle diameter (d) and the cavitation number (sigma), as well as formula (1) and the functions n(sigma) and m(sigma) for the specified power indices.
    • 本发明设定用于计算估计的空化射流性能(E)的公式(1)。 根据与这些数据有关的喷射压力(p1),喷嘴直径(d)和空化数(σ)以及与空化射流性能有关的数据(ERmax)的数据,本发明在公式 (1)中,与空化射流的射流压力(p1)的幂定律有关的项Xn(sigma)的幂指数n(sigma)和项Ym(sigma)的幂指数m(sigma) 关于喷嘴直径的幂定律(d)产生空化射流。 本发明利用与喷射压力(p1),喷嘴直径(d)和空化数(σ)以及公式(1)有关的上述数据和公式(1)以及函数n (西格玛)和m(西格玛)为指定的功率指数。
    • 2. 发明申请
    • PLANAR LIGHT SOURCE ELEMENT ARRAY AND IMAGE DISPLAY DEVICE
    • 平面光源元件阵列和图像显示装置
    • WO2009047891A9
    • 2009-11-26
    • PCT/JP2008002820
    • 2008-10-07
    • KURARAY COUNIV TOHOKUABE KOJIUCHIDA TATSUO
    • ABE KOJIUCHIDA TATSUO
    • F21S2/00F21Y101/02G02F1/13357H01L33/00
    • G02F1/133606G02B6/0021G02B6/0053G02F1/133603G02F1/133611G02F2001/133607G02F2001/133613
    • Provided is a planar light source element array which radiates light having uniform luminance within a surface without generating a lamp image, even a thickness between a target surface and a light emitting element arrangement surface is small. The planar light source element array is provided with a plurality of planar light source elements (5). The planar light source element is provided with a light guide body (1), at least one light emitting element (2) arranged inside the light guide body, a light control member (4) arranged on the bottom surface or the like of the light guide body (1), and a reflecting member (3) arranged on the side surface side or the like of the light guide body. It is so set that the half or more of the light radiated from the light emitting element (2) enters at an angle to be totally reflected inside the light guide body (1) and that the reflecting member (3) returns light into the light guide body (1) by reflection. The light control member (4) is set to change the traveling direction of the reflected light and output the light to the external of the light guide body.
    • 提供一种平面光源元件阵列,即使目标表面和发光元件配置表面之间的厚度较小,也不产生灯图像地在表面内发射具有均匀亮度的光。 平面光源元件阵列设置有多个平面光源元件(5)。 该面状光源元件具备导光体(1),配置在该导光体内部的至少一个发光元件(2),配置在该灯的底面等上的光控制部件(4) 导光体(1),配置在该导光体的侧面等的反射部件(3)。 如此设定:从发光元件(2)辐射的一半或更多的光以一定角度入射,以在光导体(1)内全反射,并且反射构件(3)将光返回到光 引导体(1)反射。 光控制部件(4)被设定为改变反射光的行进方向并将其输出到导光体的外部。
    • 4. 发明申请
    • MANUFACTURING METHOD FOR STRONTIUM TITANATE FINE PARTICLES, AND STRONTIUM TITANATE FINE PARTICLES
    • 钛酸锶微粒和钛酸锶微粒的制造方法
    • WO2015122181A4
    • 2015-10-01
    • PCT/JP2015000618
    • 2015-02-10
    • FUJIFILM CORPUNIV TOHOKU
    • SASAKI TSUTOMUTANAKA ATSUSHISUZUKI MASAYUKIADSCHIRI TADAFUMI
    • C01G23/00B01J3/00
    • C01G23/006C01P2004/03C01P2004/38Y02P20/544
    • [Problem] To provide: a manufacturing method for strontium titanate fine particles which enables the high yield manufacture of strontium titanate fine particles having a controlled shape; and strontium titanate fine particles. [Solution] A manufacturing method for strontium titanate fine particles comprising: step A1, in which an Sr-containing aqueous solution and a Ti-containing aqueous solution are prepared; step B1, in which the Sr-containing aqueous solution and the Ti-containing aqueous solution are mixed to prepare a mixed solution; step C1, in which a basic compound is added to the mixed solution to adjust the mixed solution so as to be basic, and a reaction solution is prepared; a step D1, in which the reaction solution is subjected to a sub-critical or super-critical reaction; and a step E1, in which, prior to the implementation of step D1, an amphipathic compound, which has a carboxyl group, and an organic basic compound, which does not contain a metallic element, are added to the Sr-containing aqueous solution, the Ti-containing aqueous solution, the mixed solution, or the reaction solution. The pH of the reaction solution used in step D1 is greater than 10.
    • 本发明提供一种钛酸锶微粒的制造方法,其特征在于,能够高收率地制造具有受控形状的钛酸锶微粒; 和钛酸锶细颗粒。 [解决方案]一种钛酸锶微粒的制造方法,其特征在于,包括:制备含有Sr的水溶液和含Ti水溶液的工序A1, 步骤B1,其中将含Sr水溶液和含Ti水溶液混合以制备混合溶液; 步骤C1,其中向混合溶液中加入碱性化合物以将混合溶液调节至碱性,制备反应溶液; 步骤D1,其中反应溶液经受亚临界或超临界反应; 步骤E1,其中在实施步骤D1之前,将含有羧基的两亲性化合物和不含金属元素的有机碱性化合物加入到含Sr水溶液中, 含钛水溶液,混合溶液或反应溶液。 步骤D1中使用的反应溶液的pH大于10。
    • 5. 发明申请
    • PLASMA PROCESSING APPARATUS
    • 等离子体加工设备
    • WO2009151009A3
    • 2010-01-28
    • PCT/JP2009060345
    • 2009-06-05
    • TOKYO ELECTRON LTDUNIV TOHOKUHIRAYAMA MASAKIOHMI TADAHIRO
    • HIRAYAMA MASAKIOHMI TADAHIRO
    • H05H1/46H01L21/265H01L21/3065H01L21/31
    • H05H1/46H01J37/32192H01J37/3222H01J37/32238
    • The objective is to improve the processing uniformity for a substrate. Disclosed is a plasma processing apparatus equipped with a metallic processing chamber (4) which houses a substrate (G) being processed with plasma, an electromagnetic source (85) which supplies the electromagnetic waves required to excite a plasma in processing chamber (4), and multiple dielectric bodies (25), which transmit the electromagnetic waves supplied by electromagnetic source (85) into the interior of processing chamber (85) and a portion of which are exposed to the interior of processing chamber (4), on the underside of the cover (3) of processing chamber (4). A metal electrode (27) which is electrically connected to the cover (3) is provided on the underside of the dielectric bodies (25). The portion of dielectric bodies (25) exposed between metal electrode (27) and cover (3) form an essentially polygonal shape when viewed from the interior of processing chamber (4). In addition, the multiple dielectric bodies (25) are disposed with the apex angles of the polygonal shapes adjacent to each other, and surface wave propagation parts which propagate electromagnetic waves are arranged on the underside of cover (3) and the underside of metal electrode (27) exposed to the interior of processing chamber (4).
    • 目的是提高基材的加工均匀性。 公开了一种配备有容纳用等离子体处理的基板(G)的金属处理室(4)的等离子体处理装置,提供在处理室(4)中激发等离子体所需的电磁波的电磁源(85) 以及多个电介质体(25),其将由电磁源(85)提供的电磁波传送到处理室(85)的内部并且其一部分暴露于处理室(4)的内部,位于 处理室(4)的盖(3)。 在电介质体(25)的下侧设置与盖(3)电连接的金属电极(27)。 当从处理室(4)的内部观察时,暴露在金属电极(27)和盖(3)之间的电介质体(25)的部分形成基本上多边形的形状。 此外,多个电介质体(25)以多边形的顶角彼此相邻地设置,并且传播电磁波的表面波传播部分布置在盖(3)的下侧和金属电极的下侧 (27)暴露于处理室(4)的内部。