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1. 发明申请

WO2014178884A1 SPRING LOCK 审中-公开
标题翻译：弹簧锁
公开(公告)号：WO2014178884A1
公开(公告)日：2014-11-06
申请号：PCT/US2013/039551
申请日：2013-05-03
申请人： UTAH STATE UNIVERSITY RESEARCH FOUNDATION
发明人： DAVIDSON, Morgan, E. , WATSON, Mike, S.
IPC分类号： H05K7/04 , H05K7/12 , G06F1/16
CPC分类号： H05K7/1418 , G06F1/184 , H05K7/1404 , H05K7/1405
摘要： A spring lock includes a sinusoidal spring that has one or more crests and troughs formed along a length of the sinusoidal spring, the length extending along a sliding axis, the one or more crests and troughs forming a sinusoidal spring profile. The spring lock further includes a lock bar that has a track extending along the sliding axis, the track being configured to hold the sinusoidal spring and allow the sinusoidal spring to move along the sliding axis, the track further including one or more depressions and plateaus with the depressions and plateaus forming a lock bar profile, wherein the spring lock is locked when the sinusoidal spring profile and the lock bar profile are out-of-phase and the spring lock is unlocked when the sinusoidal spring profile and the lock bar profile are in-phase.
摘要翻译：弹簧锁包括正弦弹簧，其具有沿着正弦弹簧的长度形成的一个或多个波峰和槽，该长度沿着滑动轴线延伸，所述一个或多个波峰和波谷形成正弦弹簧轮廓。弹簧锁进一步包括锁杆，该锁杆具有沿着滑动轴线延伸的轨道，轨道被构造成保持正弦弹簧并允许正弦弹簧沿着滑动轴线移动，轨道还包括一个或多个凹陷和平台，凹陷和平台形成锁杆型材，其中当正弦弹簧型材和锁定杆型材不相位时，弹簧锁定被锁定，并且当正弦弹簧型材和锁杆型材处于 -相。

2. 发明申请

WO2003049665A1 GASTROSTOMY DEVICE PACKAGE AND METHOD OF ASSEMBLY 审中-公开
标题翻译：气体装置包装和组装方法
公开(公告)号：WO2003049665A1
公开(公告)日：2003-06-19
申请号：PCT/US2002/037963
申请日：2002-11-27
申请人： APPLIED MEDICAL RESEARCH
发明人： PICHA, George, J. , MANDIC, Davor, G.
IPC分类号： A61J15/00
CPC分类号： A61J15/0015 , A61J15/0038 , A61J15/0061
摘要： A gastrostomy device having a tubular portion with a longitudinal axis and an internal bolster having a radial wing secured to the tubular portion. The bolster is capable of elastic deformation between a first orientation with the wing wrapped into a generally cylindrical configuration aligned with the axis and a second orientation with the wing unfurled transverse to the axis. A constraining member retains the bolster in the first orientation and covers a major portion of the wrapped wing. The removal of the constraining member permits the bolster to deploy, such that it moves from the first orientation to the second orientation. The constraining member may be removed by the use of a ripcord to tear through the constraining member, deploying the bolster within a patient's stomach. Alternatively, the bolster may be deployed within the stomach by the constraining member being dissolved by the patient's gastrointestinal fluids.
摘要翻译：一种胃造口术装置，其具有具有纵向轴线的管状部分和具有固定到管状部分的径向翼片的内部枕垫。枕头能够在第一方向与翼部之间弹性变形，该方向被包裹成与轴线对准的大致圆柱形构型，并且第二方向与翼部横向于轴线展开。约束构件将枕头保持在第一取向并且覆盖被包裹翼的主要部分。约束构件的移除允许支架展开，使得其从第一取向移动到第二定向。约束构件可以通过使用撕开来移除，以撕开约束构件，将枕垫部署在病人的胃中。或者，垫块可以由约束构件在胃中部署，由约束构件被患者的胃肠液体溶解。

3. 发明授权

US11637026B2 Substrate liquid processing apparatus 有权
公开(公告)号：US11637026B2
公开(公告)日：2023-04-25
申请号：US16150513
申请日：2018-10-03
申请人： Tokyo Electron Limited
发明人： Hiroyuki Masutomi , Takashi Ikeda
IPC分类号： H01L21/67 , H01L21/677
摘要： A substrate liquid processing apparatus includes an inner tub 34A having a top opening and storing a processing liquid therein; an outer tub 34B provided outside the inner tub; a first cover body 71 configured to move between a closing position where a first region of the top opening is closed and an opening position where the first region is opened; and a second cover body 72 configured to move between a closing position where a second region of the top opening is closed and an opening position where the second region is opened. The first cover body has a bottom wall 711R and a sidewall 712R extended upwards therefrom, and the second cover body has a bottom wall 721R and a sidewall 722R extended upwards therefrom. Further, when being placed at the closing positions, the sidewalls closely face each other with a gap G having a height H.

4. 发明授权

US11637025B2 Apparatus for selectively etching first region made of silicon nitride against second region made of silicon oxide 有权
公开(公告)号：US11637025B2
公开(公告)日：2023-04-25
申请号：US16794391
申请日：2020-02-19
申请人： Tokyo Electron Limited
发明人： Masahiro Tabata , Sho Kumakura
IPC分类号： C23C16/00 , H01L21/306 , H01L21/67 , H01L21/311 , H01J37/32 , H01J37/00
摘要： Generation of a deposit can be suppressed and high selectivity can be acquired when etching a first region made of silicon nitride selectively against a second region made of silicon oxide. A method includes preparing a processing target object having the first region and the second region within a chamber provided in a chamber main body of a plasma processing apparatus; generating plasma of a first gas including a gas containing hydrogen within the chamber to form a modified region by modifying a part of the first region with active species of the hydrogen; and generating plasma of a second gas including a gas containing fluorine within the chamber to remove the modified region with active species of the fluorine.

5. 发明授权

US11633895B2 System of injection-moulding machine closing units 有权
公开(公告)号：US11633895B2
公开(公告)日：2023-04-25
申请号：US16615187
申请日：2018-05-16
申请人： KRAUSSMAFFEI TECHNOLOGIES GMBH
发明人： Patrick Schweissthal
IPC分类号： B29C45/66 , B29C45/17
摘要： A system of injection-moulding machine closing units is provided. In addition to two closing units of a first kind and third kind in a standard program, the closing units having closing forces F1 and F2, a further closing unit of a second kind having a closing force F1 is provided. The closing unit of the second kind forms an intermediate variable and is formed from components of the closing units of the first and third kind provided. The platens and the support plate with the dimensions of the closing unit of the third kind (closing force F2) and the toggle lever mechanism of the closing unit of the first kind (closing force F1) and the drive thereof are combined with one another. The articulated levers of the toggle lever mechanism of the closing unit of the second kind are hinged to the support plate and movable platen at a greater distance from the axis of symmetry than the articulated levers of the toggle lever mechanism of the closing unit of the first kind. The articulated levers themselves are identical. At the same time, the crosshead of the closing unit of the second kind is larger in the direction of the articulated levers of the toggle lever mechanism than the crosshead of the closing unit of the first kind such that the toggle lever mechanisms of the two closing units have the same kinematics.

6. 发明授权

US11626899B2 Radio-frequency signal sending/receiving circuit and radio-frequency signal sending/receiving device 有权
公开(公告)号：US11626899B2
公开(公告)日：2023-04-11
申请号：US17241809
申请日：2021-04-27
申请人： Murata Manufacturing Co., Ltd.
发明人： Hitoshi Akamine , Satoshi Sakurai
IPC分类号： H04B1/44 , H04B1/40 , H04B1/00 , H04B1/401
摘要： A radio-frequency signal sending/receiving circuit includes a low-noise amplifier electrically connected to a first terminal, a first switch electrically connected to the input terminal of the low-noise amplifier, a band pass filter electrically connected at one end to the other end of the first switch and at the other end to a first antenna via a fourth terminal, a power amplifier electrically connected to a second terminal, a second switch electrically connected at one end to the output terminal of the power amplifier and at the other end to the band pass filter, a third switch electrically connected at one end to the output terminal of the power amplifier and at the other end to a fifth terminal, and a fourth switch electrically connected at one end to a third terminal and at the other end to the fifth terminal.

7. 发明授权

US11626294B2 Substrate processing method, substrate processing apparatus and recording medium 有权
公开(公告)号：US11626294B2
公开(公告)日：2023-04-11
申请号：US16802936
申请日：2020-02-27
申请人： Tokyo Electron Limited
发明人： Takumi Honda , Koji Kagawa
IPC分类号： H01L21/3213 , H01L21/67 , H01L21/306
摘要： A substrate processing method includes etching a substrate having a first film and a second film at a first etching rate; changing an etching rate from the first etching rate to a second etching rate; and etching the substrate at the second etching rate.

8. 发明授权

US11621496B2 Antenna device 有权
公开(公告)号：US11621496B2
公开(公告)日：2023-04-04
申请号：US17136184
申请日：2020-12-29
申请人： Murata Manufacturing Co., Ltd.
发明人： Takaya Nemoto , Hideki Ueda
IPC分类号： H01Q19/26 , H01Q1/48 , H01Q19/24 , H01Q21/00 , H01Q21/06
摘要： An antenna device includes a substrate, a first antenna element extending in a direction perpendicular to a first surface of the substrate and functioning as a monopole antenna, a second antenna element provided adjacent to the first antenna element, extending in the direction perpendicular to the first surface of the substrate, and functioning as a monopole antenna, a ground layer provided in or on the substrate, a connection wire provided in or on the substrate and connecting the first antenna element and the second antenna element to each other, a power feeding line provided in or on the substrate and connected to the connection wire, and a first reflector provided in a direction in which the first antenna element and the second antenna element are adjacent to each other and facing the first antenna element and the second antenna element.

9. 发明授权

US11621179B2 Substrate processing apparatus and irradiation position adjusting method 有权
公开(公告)号：US11621179B2
公开(公告)日：2023-04-04
申请号：US16874730
申请日：2020-05-15
申请人： Tokyo Electron Limited
发明人： Satoshi Suzuki
IPC分类号： H01L21/67 , H01L21/3065 , H01L21/304 , H01L21/677 , H01L21/683
摘要： A substrate processing apparatus includes a placing table, having a first placing surface on which a substrate is placed and a rear surface opposite to the first placing surface, provided with a first window which allows the first placing surface and the rear surface to communicate with each other and which is configured to transmit light; a first adjusting device configured to hold a first light irradiation unit configured to irradiate light toward the first window and configured to adjust an irradiation position of the light on the rear surface; and a first reflection member, having retroreflection property, disposed at the rear surface of the placing table to enclose the first window, and configured to reflect a part of the light and return reflection light indicating a deviation between the irradiation position of the light and a position of the first window to the first light irradiation unit.

10. 发明授权

US11620742B2 Computer implemented methods for training or using a software infrastructure based on machine learning techniques 有权
公开(公告)号：US11620742B2
公开(公告)日：2023-04-04
申请号：US16928385
申请日：2020-07-14
申请人： MICROTEC S.R.L.
发明人： Enrico Ursella , Enrico Vicario , Federico Giudiceandrea
IPC分类号： G06T7/00 , G06N20/00 , G01N23/046
摘要： Computer implemented method for training a software infrastructure based on machine learning techniques and intended for analysis of data obtained from a three-dimensional tomographic inspection of objects of a predetermined type, such as logs, with the aim of determining information about internal characteristics of interest of the self-same objects, wherein, once a training set comprising a plurality of objects of the same predetermined type has been selected, for each object the software infrastructure is supplied with training input data and corresponding training output data, which are processed by the software infrastructure for setting internal processing parameters of the software infrastructure which correlate the training input data with the training output data; where the training input data comprise data obtained from a three-dimensional tomographic inspection of the object, and the training output data comprise information about internal characteristics of interest assessed at internal points of the object, and where the information about the internal characteristics of interest is at least partly assessed at real internal points of the object, previously made accessible by cutting or breaking the object.

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