专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP0858615A4 THERMOSETTING ANTI-REFLECTIVE COATINGS AND METHOD FOR MAKING SAME 失效
标题翻译： THERMISCHHÄRTBAREANTIREFLEXIONS BESCHICHUNGEN UND VERFAHREN ZUR HERSTELLUNG DERSELBEN
公开(公告)号：EP0858615A4
公开(公告)日：1998-10-14
申请号：EP95944193
申请日：1995-12-14
申请人： FLAIM TONY D , MEADOR JIM D , SHAO XIE , BREWER TERRY L
发明人： FLAIM TONY D , MEADOR JIM D , SHAO XIE , BREWER TERRY L
IPC分类号： C08G59/14 , C08G59/16 , C08G59/40 , C08G59/68 , C08L63/00 , C09D163/00 , G03F7/09 , G03F7/00
CPC分类号： G03F7/091 , C08G59/1455 , C08G59/68 , C08L63/00 , Y10S430/136 , Y10S522/904 , C08L61/20
摘要： A thermosetting anti-reflective coating and method for making and using the same is disclosed for a broad range of exposure wave-lengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 2.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast cross-linking agent, all present in a low-to-medium alcohol-containing solvent.
摘要翻译：公开了用于宽范围曝光波长的热固性抗反射涂层及其制造和使用方法，所述涂层含有活性固化催化剂，衍生自环氧官能度大于2.0的醚或酯键，染料接枝羟基官能低聚物和烷基化氨基塑料交联剂，都存在于低含量的含醇溶剂中。

2. 发明公开

EP0858615A1 THERMOSETTING ANTI-REFLECTIVE COATINGS AND METHOD FOR MAKING SAME 失效
标题翻译：可热固化的防反射涂层和方法生产同样
公开(公告)号：EP0858615A1
公开(公告)日：1998-08-19
申请号：EP95944193.0
申请日：1995-12-14
申请人： Flaim, Tony D. , Meador, Jim D. , Shao, Xie , Brewer, Terry L.
发明人： Flaim, Tony D. , Meador, Jim D. , Shao, Xie , Brewer, Terry L.
IPC分类号： C08G59 , C08L63 , C09D163 , G03F7
CPC分类号： G03F7/091 , C08G59/1455 , C08G59/68 , C08L63/00 , Y10S430/136 , Y10S522/904 , C08L61/20
摘要： A thermosetting anti-reflective coating and method for making and using the same is disclosed for a broad range of exposure wave-lengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 2.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast cross-linking agent, all present in a low-to-medium alcohol-containing solvent.

3. 发明申请

WO2013006865A3 METHODS OF TRANSFERRING DEVICE WAFERS OR LAYERS BETWEEN CARRIER SUBSTRATES AND OTHER SURFACES 审中-公开
公开(公告)号：WO2013006865A3
公开(公告)日：2013-01-10
申请号：PCT/US2012/045980
申请日：2012-07-09
申请人： BREWER SCIENCE INC. , MCCUTCHEON, Jeremy , FLAIM, Tony D. , BAILEY, Susan
发明人： MCCUTCHEON, Jeremy , FLAIM, Tony D. , BAILEY, Susan
IPC分类号： H01L21/301 , H01L21/02
摘要： New temporary bonding methods and articles formed from those methods are provided. In one embodiment, the methods comprise coating a device or other ultrathin layer on a growth substrate with a rigid support layer and then bonding that stack to a carrier substrate. The growth substrate can then be removed and the ultrathin layer mounted on a final support. In another embodiment, the invention provides methods of handling device layers during processing that must occur on both sides of the fragile layer without damaging it. This is accomplished via the sequential use of two carriers, one on each side of the device layer, bonded with different bonding compositions for selective debonding.

4. 发明申请

WO2009097436A2 ON-TRACK PROCESS FOR PATTERNING HARDMASK BY MULTIPLE DARK FIELD EXPOSURES 审中-公开
标题翻译：用于通过多个深色场景曝光来绘制HARDMASK的轨道过程
公开(公告)号：WO2009097436A2
公开(公告)日：2009-08-06
申请号：PCT/US2009/032446
申请日：2009-01-29
申请人： BREWER SCIENCE INC. , SUN, Sam, X. , XU, Hao , FLAIM, Tony, D.
发明人： SUN, Sam, X. , XU, Hao , FLAIM, Tony, D.
IPC分类号： G03F7/26 , H01L21/02
CPC分类号： H01L21/0332 , G03F7/0752 , G03F7/094 , G03F7/11 , H01L21/0271 , H01L21/0337 , H01L21/0338 , H01L21/312
摘要： This invention provides methods of creating via or trench structures on a developer- soluble hardmask layer using a multiple exposure-development process. The hardmask layer is patterned while the imaging layer is developed. After the imaging layer is stripped using organic solvents, the same hardmask can be further patterned using subsequent exposure-development processes. Eventually, the pattern can be transferred to the substrate using an etching process.
摘要翻译：本发明提供了使用多次曝光显影工艺在显影剂可溶硬化掩模层上产生通孔或沟槽结构的方法。在成像层被开发的同时硬化掩模层被图案化。在使用有机溶剂剥离成像层之后，可以使用随后的曝光显影工艺进一步图案化相同的硬掩模。最终，可以使用蚀刻工艺将图案转移到衬底。

5. 发明申请

WO2008127785A1 ALKALINE-RESISTANT NEGATIVE PHOTORESIST FOR SILICON WET-ETCH WITHOUT SILICON NITRIDE 审中-公开
标题翻译：无硅氮氧化物的硅氧化锌耐碱性负离子
公开(公告)号：WO2008127785A1
公开(公告)日：2008-10-23
申请号：PCT/US2008/054885
申请日：2008-02-25
申请人： BREWER SCIENCE INC. , ZHONG, Xing-fu , FLAIM, Tony, D. , MALHOTRA, Jyoti
发明人： ZHONG, Xing-fu , FLAIM, Tony, D. , MALHOTRA, Jyoti
IPC分类号： G03F7/004
CPC分类号： G03F7/0752 , G03F7/0045 , G03F7/0382 , G03F7/0751 , Y10S430/108 , Y10S430/115
摘要： A removable build box for a three dimensional printer comprises a build box tray defining a build chamber for part assembly and a material feed chamber for supplying powder material to the build chamber. The build and feed chambers have lower piston stops. A build chamber piston engages with the build chamber and with the build chamber piston stops at a lowermost position. A feed chamber piston engages with the feed chamber and with the feed chamber piston stops at a lowermost position. A quick connection coupling is between the build chamber piston and a build chamber z-axis actuator configured to move the build chamber piston when connected thereto. A quick connection coupling is between the feed chamber piston and a feed chamber z-axis actuator configured to move the feed chamber piston when connected thereto. The build box tray may be easily removed from the three dimensional printer.
摘要翻译：用于三维打印机的可拆卸构造盒包括限定用于部件组装的构建室的构建箱托盘和用于将粉末材料供应到构建室的材料馈送室。建造和进料室具有较低的活塞止挡。建筑室活塞与建造室接合，建筑室活塞停在最低位置。进料室活塞与进料室接合，并且进料室活塞停止在最低位置。构建室活塞和构造室z轴致动器之间的快速连接联接器被配置成当连接到构建室活塞时移动构建室活塞。进料室活塞和进料室z轴致动器之间的快速连接耦合被配置为当连接到进料室活塞时移动进料室活塞。构建盒托盘可以容易地从三维打印机中移除。

6. 发明申请

WO2004065428A3 HYBRID ORGANIC-INORGANIC POLYMER COATINGS WITH HIGH REFRACTIVE INDICES 审中-公开
公开(公告)号：WO2004065428A3
公开(公告)日：2004-08-05
申请号：PCT/US2004/001480
申请日：2004-01-16
申请人： BREWER SCIENCE, INC. , FLAIM, Tony, D. , WANG, Yubao , MERCADO, Ramil-Marcelo, L.
发明人： FLAIM, Tony, D. , WANG, Yubao , MERCADO, Ramil-Marcelo, L.
IPC分类号： B05D03/02
摘要： Novel compositions and methods of using those compositions to form metal oxide films or coatings are provided. The compositions comprise an organometallic oligomer and an organic polymer dispersed or dissolved in a solvent system. The compositions have long shelf lives and can be prepared by easy and reliable preparation procedures. The compositions can be cured to cause conversion of the compositions into films of metal oxide interdispersed with organic polymer or oligomer. The cured films have high refractive indices, high optical clarities, and good mechanical stabilities at film thickness of greater than about 1 µm.

7. 发明申请

WO2011034897A3 SCRATCH-RESISTANT COATINGS FOR PROTECTING FRONT-SIDE CIRCUITRY DURING BACKSIDE PROCESSING 审中-公开
标题翻译：背面处理时用于保护前端电路的抗刮擦涂层
公开(公告)号：WO2011034897A3
公开(公告)日：2011-07-14
申请号：PCT/US2010048899
申请日：2010-09-15
申请人： BREWER SCIENCE INC , YESS KIMBERLY A , DAILY MADISON M JR , FLAIM TONY D
发明人： YESS KIMBERLY A , DAILY MADISON M JR , FLAIM TONY D
IPC分类号： H01L21/48 , C08J5/18 , C09D125/12
CPC分类号： H01L21/561 , H01L23/293 , H01L23/3121 , H01L2924/0002 , H01L2924/09701 , H01L2924/00
摘要： Scratch-resistant coatings for protecting front-side microelectromechanical and semiconductor device features during backside processing are provided, along with methods of using the same. The coatings are non-photosensitive, removable, and tolerate high processing temperatures. These coatings also eliminate the need for a separate etch stop layer in the device design. The coatings are formed from a composition comprising a component dissolved or dispersed in a solvent system. The component is selected from the group consisting of styrene-acrylonitrile copolymers and aromatic sulfone polymers.
摘要翻译：提供了用于在背面处理期间保护正面微机电和半导体器件特征的耐刮擦涂层以及使用该涂层的方法。该涂层是非光敏的，可移除的，并且可以承受高的加工温度。这些涂层也消除了在器件设计中需要单独的蚀刻停止层。该涂层由包含溶解或分散在溶剂体系中的组分的组合物形成。该组分选自苯乙烯 - 丙烯腈共聚物和芳族砜聚合物。

8. 发明申请

WO2009035866A3 SPIN-ON PROTECTIVE COATINGS FOR WET-ETCH PROCESSING OF MICROELECTRONIC SUBSTRATES 审中-公开
标题翻译：微电子基片湿蚀刻加工的SPIN-ON保护涂层
公开(公告)号：WO2009035866A3
公开(公告)日：2009-05-14
申请号：PCT/US2008074773
申请日：2008-08-29
申请人： BREWER SCIENCE INC , XU GU , YESS KIMBERLY A , FLAIM TONY D
发明人： XU GU , YESS KIMBERLY A , FLAIM TONY D
IPC分类号： C08L25/04 , C09D125/04
CPC分类号： H01L21/0271 , B81C1/00801 , C08L63/04 , C09D125/12 , Y10T428/31511 , Y10T428/31663 , C08L2666/14
摘要： New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer which may or may not be crosslinked upon heating.
摘要翻译：提供了用于半导体和MEMS器件生产期间的湿法蚀刻工艺的新的保护涂层。这些层包括底漆层，第一保护层和任选的第二保护层。底漆层优选在溶剂体系中包含有机硅烷化合物。第一保护层包括由苯乙烯，丙烯腈和相容性化合物如单体，低聚物和包含环氧基团的聚合物制备的热塑性共聚物; 聚（苯乙烯 - 共 - 烯丙醇）; 和它们的混合物。第二保护层包含高度卤化的聚合物，例如氯化聚合物，其可以在加热时交联或不交联。

9. 发明申请

WO2008100460A1 TWO-LAYER TRANSPARENT ELECTROSTATIC CHARGE DISSIPATING COATING 审中-公开
标题翻译：双层透明静电电荷消耗涂料
公开(公告)号：WO2008100460A1
公开(公告)日：2008-08-21
申请号：PCT/US2008/001771
申请日：2008-02-11
申请人： GRAHAM, Charles, R. , KINLEN, Patrick, J. , FLAIM, Tony, D.
发明人： GRAHAM, Charles, R. , KINLEN, Patrick, J. , FLAIM, Tony, D.
IPC分类号： H01B1/12
CPC分类号： H05K9/0067 , Y10T428/265 , Y10T428/31504 , Y10T428/31511 , Y10T428/31551 , Y10T428/31855
摘要： A transparent two-layer electrostatic dissipating coating includes a first layer comprising a transparent first binder polymer and a first intrinsically conducting polymer (ICP) in an amount sufficient to provide the first layer with a surface resistance of from about 103 to about 105 Ω/α; and a second layer in direct contact with the first layer and comprising a transparent second binder polymer and a second ICP in an amount sufficient to provide the second layer with a surface resistance of from about 106 to about 1010 Ω/α, wherein the coating has a light transmission of at least about 70% at a wavelength of 600 nm. Methods of making and using the coating are also described.
摘要翻译：透明的双层静电消散涂层包括第一层，其包含透明的第一粘合剂聚合物和第一本征导电聚合物（ICP），其量足以使第一层的表面电阻为约103至约105O / a ; 以及与所述第一层直接接触的第二层，并且包括足以使所述第二层具有约106至约1010O / a的表面电阻的量的透明第二粘合剂聚合物和第二ICP，其中所述涂层具有在600nm的波长下透光率至少为约70％。还描述了制备和使用涂层的方法。

10. 发明申请

WO1997007145A1 THERMOSETTING ANTI-REFLECTIVE COATINGS AND METHOD FOR MAKING SAME 审中-公开
标题翻译：热敏防反射涂料及其制备方法
公开(公告)号：WO1997007145A1
公开(公告)日：1997-02-27
申请号：PCT/US1995016728
申请日：1995-12-14
申请人： FLAIM, Tony, D. , MEADOR, Jim, D. , SHAO, Xie , BREWER, Terry, L.
IPC分类号： C08F24/46
CPC分类号： G03F7/091 , C08G59/1455 , C08G59/68 , C08L63/00 , Y10S430/136 , Y10S522/904 , C08L61/20
摘要： A thermosetting anti-reflective coating and method for making and using the same is disclosed for a broad range of exposure wave-lengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 2.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast cross-linking agent, all present in a low-to-medium alcohol-containing solvent.
摘要翻译：公开了一种热固性抗反射涂层及其制造和使用方法，用于宽范围的曝光波长，所述涂层含有活性固化催化剂，衍生自大于2.0的环氧官能团的醚或酯键，染料接枝羟基官能低聚物和烷基化氨基塑料交联剂，均存在于低至中等含醇溶剂中。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式