专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08921831B2 Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method 有权
标题翻译：薄膜沉积装置，使用该装置的有机发光显示装置的制造方法以及使用该方法制造的有机发光显示装置
公开(公告)号：US08921831B2
公开(公告)日：2014-12-30
申请号：US12836760
申请日：2010-07-15
申请人： Jong-Heon Kim , Hyun-Sook Park , Jae-Kwang Ryu , Hee-Cheol Kang , Ji-Sook Oh
发明人： Jong-Heon Kim , Hyun-Sook Park , Jae-Kwang Ryu , Hee-Cheol Kang , Ji-Sook Oh
IPC分类号： H01L51/05 , C23C14/04 , C23C14/12 , C23C14/24 , H01L51/56 , H01L51/00
CPC分类号： C23C14/042 , C23C14/12 , C23C14/243 , H01L51/0011 , H01L51/56
摘要： A thin film deposition apparatus that includes a thin film deposition assembly incorporating: a deposition source that discharges a deposition material; a deposition source nozzle unit that is disposed at a side of the deposition source and includes a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet that is disposed opposite to the deposition source nozzle unit and includes a plurality of patterning slits arranged in the first direction; and a barrier plate assembly including a plurality of barrier plates that are disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, and partition a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces, wherein each of the barrier plates is separate from the patterning slit sheet.
摘要翻译：一种薄膜沉积设备，包括：薄膜沉积组件，其包括：沉积源，其沉积沉积材料; 沉积源喷嘴单元，其设置在沉积源的一侧并且包括沿第一方向布置的多个沉积源喷嘴; 图案化缝隙片，其与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的多个图案化狭缝; 以及阻挡板组件，其包括沿着所述第一方向设置在所述沉积源喷嘴单元和所述图案化缝隙片之间的多个阻挡板，并且将所述沉积源喷嘴单元和所述图案化缝隙片之间的空间分隔成多个子 - 沉积空间，其中每个阻挡板与图案化缝隙片分离。

2. 发明授权

US08193011B2 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same 有权
标题翻译：薄膜沉积装置及使用该有机发光显示装置的方法
公开(公告)号：US08193011B2
公开(公告)日：2012-06-05
申请号：US13277112
申请日：2011-10-19
申请人： Hee-Cheol Kang , Hyun-Sook Park , Jae-Kwang Ryu , Yong-Sup Choi , Yun-Mi Lee , Sang-Soo Kim
发明人： Hee-Cheol Kang , Hyun-Sook Park , Jae-Kwang Ryu , Yong-Sup Choi , Yun-Mi Lee , Sang-Soo Kim
IPC分类号： H01L33/26 , C23C16/44 , H01L21/76 , C23C16/00
CPC分类号： C23C14/044 , C23C14/12 , C23C14/243 , C23C14/568 , H01L51/001 , H01L51/0081 , H01L51/56 , Y10S414/135 , Y10T279/23
摘要： A thin film deposition apparatus and an organic light-emitting display device by using the same. The thin film deposition apparatus includes an electrostatic chuck, a plurality of chambers; at least one thin film deposition assembly; a carrier; a first power source plug; and a second power source plug. The electrostatic chuck includes a body having a supporting surface that contacts a substrate to support the substrate, wherein the substrate is a deposition target; an electrode embedded into the body and applying an electrostatic force to the supporting surface; and a plurality of power source holes formed to expose the electrode and formed at different locations on the body.
摘要翻译：一种薄膜沉积装置和使用该薄膜沉积装置的有机发光显示装置。薄膜沉积装置包括静电卡盘，多个室; 至少一个薄膜沉积组件; 承运人第一个电源插头; 和第二电源插头。静电卡盘包括具有与基板接触以支撑基板的支撑表面的主体，其中基板是沉积靶; 电极，其嵌入到所述主体中并向所述支撑表面施加静电力; 以及形成为暴露电极并形成在身体上的不同位置处的多个电源孔。

3. 发明申请

US20110165327A1 THIN FILM DEPOSITION APPARATUS 审中-公开
标题翻译：薄膜沉积装置
公开(公告)号：US20110165327A1
公开(公告)日：2011-07-07
申请号：US12979656
申请日：2010-12-28
申请人： Hyun-Sook PARK , Chang-Mog JO , Hee-Cheol KANG , Yun-Mi LEE , Un-Cheol SUNG , Yong-Sun CHOI , Jong-Heon KIM , Jae-Kwang RYU
发明人： Hyun-Sook PARK , Chang-Mog JO , Hee-Cheol KANG , Yun-Mi LEE , Un-Cheol SUNG , Yong-Sun CHOI , Jong-Heon KIM , Jae-Kwang RYU
IPC分类号： C23C16/44 , C23C16/04
CPC分类号： C23C14/24 , C23C14/042 , H01L51/001
摘要： A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.
摘要翻译：一种薄膜沉积装置，其可以简单地应用于大规模生产大尺寸显示装置并且提高制造产量。薄膜沉积装置包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 以及与沉积源喷嘴单元相对设置并包括沿垂直于第一方向的第二方向布置的多个图案化狭缝的图案化缝隙片。当基板或薄膜沉积装置在第一方向上相对移动时进行沉积，并且沉积源，沉积源喷嘴单元和图案化缝隙片彼此一体地形成。

4. 发明申请

US20110053301A1 THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE SAME 审中-公开
标题翻译：薄膜沉积装置及使用其制造有机发光显示装置的方法
公开(公告)号：US20110053301A1
公开(公告)日：2011-03-03
申请号：US12868099
申请日：2010-08-25
申请人： Hee-Cheol KANG , Jong-Heon Kim , Ji-Sook Oh , Sang-Soo Kim
发明人： Hee-Cheol KANG , Jong-Heon Kim , Ji-Sook Oh , Sang-Soo Kim
IPC分类号： H01L51/30
CPC分类号： C23C14/50 , C23C14/12 , C23C14/24 , C23C14/56
摘要： A thin film deposition apparatus that is suitable for production of large-sized substrates with fine patterns includes: an electrostatic chuck including a body that contacts a substrate that constitutes a deposition target and including a supporting surface supporting the substrate, an electrode installed in the body to generate an electrostatic force on the supporting surface, and a battery that is electrically connected to the electrode in the body; a plurality of chambers that are maintained in vacuum states; at least one thin film deposition assembly disposed in one of the plurality of chambers, separated by a predetermined distance from the substrate, and forming a thin film on the substrate supported by the electrostatic chuck; and a carrier moving the electrostatic chuck through the chambers.
摘要翻译：适合于生产具有精细图案的大尺寸基板的薄膜沉积装置包括：静电卡盘，其包括与构成沉积靶的基板接触并包括支撑基板的支撑表面的主体，安装在主体中的电极在所述支撑面上产生静电力，以及与所述电极电连接的电池; 维持在真空状态的多个室; 至少一个薄膜沉积组件，其设置在与所述基板隔开预定距离的多个室之一中，并且在由所述静电卡盘支撑的所述基板上形成薄膜; 以及将静电卡盘移动通过室的载体。

5. 发明申请

US20110042659A1 THIN FILM DEPOSITION APPARATUS, METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE APPARATUS, AND ORGANIC LIGHT-EMITTING DISPLAY DEVICE MANUFACTURED BY USING THE METHOD 有权
标题翻译：薄膜沉积装置，使用装置制造有机发光显示装置的方法，以及使用该方法制造的有机发光显示装置
公开(公告)号：US20110042659A1
公开(公告)日：2011-02-24
申请号：US12836760
申请日：2010-07-15
申请人： Jong-Heon KIM , Hyun-Sook PARK , Jae-Kwang RYU , Hee-Cheol KANG , Ji-Sook OH
发明人： Jong-Heon KIM , Hyun-Sook PARK , Jae-Kwang RYU , Hee-Cheol KANG , Ji-Sook OH
IPC分类号： H01L51/05 , C23C16/04 , B05D5/12 , H01L51/40
CPC分类号： C23C14/042 , C23C14/12 , C23C14/243 , H01L51/0011 , H01L51/56
摘要： A thin film deposition apparatus that includes a thin film deposition assembly incorporating: a deposition source that discharges a deposition material; a deposition source nozzle unit that is disposed at a side of the deposition source and includes a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet that is disposed opposite to the deposition source nozzle unit and includes a plurality of patterning slits arranged in the first direction; and a barrier plate assembly including a plurality of barrier plates that are disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, and partition a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces, wherein each of the barrier plates is separate from the patterning slit sheet.
摘要翻译：一种薄膜沉积设备，包括：薄膜沉积组件，其包括：沉积源，其沉积沉积材料; 沉积源喷嘴单元，其设置在沉积源的一侧并且包括沿第一方向布置的多个沉积源喷嘴; 图案化缝隙片，其与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的多个图案化狭缝; 以及阻挡板组件，其包括沿着所述第一方向设置在所述沉积源喷嘴单元和所述图案化缝隙片之间的多个阻挡板，并且将所述沉积源喷嘴单元和所述图案化缝隙片之间的空间分隔成多个子 - 沉积空间，其中每个阻挡板与图案化缝隙片分离。

6. 发明授权

US07718031B2 Mask frame and method of fixing mask on the mask frame 有权
标题翻译：掩模框和将掩模固定在掩模框上的方法
公开(公告)号：US07718031B2
公开(公告)日：2010-05-18
申请号：US11325560
申请日：2006-01-05
申请人： Hee-Cheol Kang , Jin-Kyoo Kim
发明人： Hee-Cheol Kang , Jin-Kyoo Kim
IPC分类号： C23F1/00 , H01L21/306 , B29D11/00 , H01J9/12
CPC分类号： C23C14/042 , H01L51/0011
摘要： A mask frame on which a mask, having a pattern area and a mask edge defining the pattern area, is fixed comprises: a through opening corresponding to the pattern area; and a base corresponding to the mask edge. The base is provided with discharging holes formed therein, and a vacuum pump is coupled to the discharging holes so that the mask is fixed to the mask frame without damaging the pattern formed on the pattern area of the mask.
摘要翻译：其上具有限定图案区域的图案区域和掩模边缘的掩模固定在其上的掩模框包括：对应于图案区域的通孔; 和对应于掩模边缘的基座。底座上形成有排放孔，真空泵联接到排放孔，使得掩模固定在掩模框架上，而不会损害形成在掩模图案区域上的图案。

7. 发明授权

US07548304B2 Chuck plate assembly with cooling means 有权
标题翻译：带冷却装置的卡盘组件
公开(公告)号：US07548304B2
公开(公告)日：2009-06-16
申请号：US11298566
申请日：2005-12-12
申请人： Sang Jin Han , Sung Ho Lee , Myung Soo Huh , Seok Heon Jeong , Kwan Seop Song , Hee Cheol Kang
发明人： Sang Jin Han , Sung Ho Lee , Myung Soo Huh , Seok Heon Jeong , Kwan Seop Song , Hee Cheol Kang
IPC分类号： G03B27/62 , G03B27/52 , C23C14/00 , C23C16/00
CPC分类号： C03C17/28 , C03C17/001 , C03C17/002 , C23C14/042 , C23C14/541
摘要： The invention provides a chuck plate assembly that includes a shadow mask formed with a predetermined pattern; a shadow mask frame holding the shadow mask and having heat-radiating and cooling functions; a substrate aligned with the shadow mask and onto which deposition materials from a deposition source are deposited; and a chuck plate, attaching the substrate to the shadow mask, that includes a refrigerant circulating duct. The temperature of the substrate is optimized in consideration of the temperature of the shadow mask so that an alignment error due to thermal deformation is minimized. That is, the temperature of the shadow mask itself is prevented from rising, and thereby prevents deformation of the shadow mask due to thermal expansion, which improves the precision of a substrate pattern position.
摘要翻译：本发明提供一种卡盘板组件，其包括以预定图案形成的荫罩; 保持荫罩并具有散热和冷却功能的荫罩框架; 与荫罩对准的衬底，沉积来自沉积源的沉积材料; 以及夹持板，将基板安装在荫罩上，该荫罩包括制冷剂循环管道。考虑到荫罩的温度来优化衬底的温度，使得由于热变形引起的取向误差最小化。也就是说，防止荫罩本身的温度上升，从而防止由于热膨胀而引起的荫罩的变形，这提高了基板图案位置的精度。

8. 发明申请

US20070065976A1 Method and apparatus for fabricating organic light emitting display device 审中-公开
标题翻译：用于制造有机发光显示装置的方法和装置
公开(公告)号：US20070065976A1
公开(公告)日：2007-03-22
申请号：US11503171
申请日：2006-08-14
申请人： Ji-Yong Lee , Won-Woong Jung , Hee-Cheol Kang
发明人： Ji-Yong Lee , Won-Woong Jung , Hee-Cheol Kang
IPC分类号： H01L51/40 , H01L29/08
CPC分类号： H01L51/56 , H01L51/5246 , H01L51/5259
摘要： A method and an apparatus for fabricating an organic light emitting display, in which a large-sized transmissible film is fabricated to be easily used in an affixing process for a large-sized substrate. The apparatus includes: a first chamber including a plurality of first through holes and having a first transmissible film sealing the plurality of first through holes, the first chamber adapted to affix a first substrate having an Organic Light Emitting Diode (OLED) to a second substrate having a desiccant agent; and a second chamber having a second through hole in a predetermined region and having a second transmissible film sealing the second through hole, the second chamber adapted to harden a sealant interposed between the first and second substrates to seal the first substrate to the second substrates.
摘要翻译：一种用于制造有机发光显示器的方法和装置，其中制造大尺寸透射膜以容易地用于大尺寸基板的固定工艺中。该装置包括：第一室，包括多个第一通孔，并且具有密封多个第一通孔的第一可透膜，第一室适于将具有有机发光二极管（OLED）的第一衬底固定到第二衬底具有干燥剂; 以及第二室，其具有在预定区域中的第二通孔，并且具有密封所述第二通孔的第二可透膜，所述第二室适于硬化插入在所述第一和第二基板之间的密封剂，以将所述第一基板密封到所述第二基板。

9. 发明申请

US20060254513A1 Catalyst enhanced chemical vapor deposition apparatus and deposition method using the same 有权
标题翻译：催化剂增强化学气相沉积装置及其沉积方法
公开(公告)号：US20060254513A1
公开(公告)日：2006-11-16
申请号：US11405552
申请日：2006-04-18
申请人： Hee-Cheol Kang , Kazuo Furuno , Han-Ki Kim , Myoung-Soo Kim
发明人： Hee-Cheol Kang , Kazuo Furuno , Han-Ki Kim , Myoung-Soo Kim
IPC分类号： C23C16/00
CPC分类号： C23C16/44 , C23C16/46
摘要： A catalyst-enhanced chemical vapor deposition (CECVD) apparatus and a deposition method, in which tension is applied to a catalyst wire in order to prevent the catalyst wire from sagging due to thermal deformation, and additional gas is used to prevent foreign material from being generated. The CECVD apparatus may be constructed with a process chamber, a showerhead to introduce process gas into process chamber, a tensile catalyst wire structure provided in the process chamber to decompose the gas introduced from the showerhead, and a substrate on which the gas decomposed by the catalyst wire structure is deposited, so that the tension is applied to a catalyst wire in order to prevent the catalyst wire from sagging due to thermal deformation, and additional gas is used to prevent foreign material from being generated, thereby eliminating occurrences of non-uniform temperatures of a substrate and non-uniform film growth, and concomitantly enhancing the durability of the catalyst wire.
摘要翻译：催化剂增强化学气相沉积（CECVD）装置和沉积方法，其中向催化剂丝施加张力以防止催化剂丝由于热变形而下垂，并且使用另外的气体来防止异物生成。 CECVD装置可以构造有处理室，将工艺气体引入处理室的喷头，设置在处理室中的分解从喷头引入的气体的拉伸催化剂丝线结构以及由其分解的气体催化剂丝线结构被沉积，使得张力被施加到催化剂丝上，以防止催化剂丝由于热变形而下垂，并且使用额外的气体来防止产生异物，从而消除不均匀的发生底物的温度和不均匀的膜生长，并且伴随地提高催化剂丝的耐久性。

10. 发明申请

US20060148368A1 Mask frame and method of fixing mask on the mask frame 有权
标题翻译：掩模框和将掩模固定在掩模框上的方法
公开(公告)号：US20060148368A1
公开(公告)日：2006-07-06
申请号：US11325560
申请日：2006-01-05
申请人： Hee-Cheol Kang , Jin-Kyoo Kim
发明人： Hee-Cheol Kang , Jin-Kyoo Kim
IPC分类号： H01J9/12
CPC分类号： C23C14/042 , H01L51/0011
摘要： A mask frame on which a mask, having a pattern area and a mask edge defining the pattern area, is fixed comprises: a through opening corresponding to the pattern area; and a base corresponding to the mask edge. The base is provided with discharging holes formed therein, and a vacuum pump is coupled to the discharging holes so that the mask is fixed to the mask frame without damaging the pattern formed on the pattern area of the mask.
摘要翻译：其上具有限定图案区域的图案区域和掩模边缘的掩模固定在其上的掩模框包括：对应于图案区域的通孔; 和对应于掩模边缘的基座。底座上形成有排放孔，真空泵联接到排放孔，使得掩模固定在掩模框架上，而不会损害形成在掩模图案区域上的图案。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式