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1. 发明申请

US20130181159A1 SURFACE TREATMENT COMPOSITION AND SURFACE TREATMENT METHOD USING SAME 有权
标题翻译：表面处理组合物和表面处理方法
公开(公告)号：US20130181159A1
公开(公告)日：2013-07-18
申请号：US13824778
申请日：2011-09-23
申请人： Kohsuke Tsuchiya , Hitoshi Morinaga , Noboru Yasufuku , Shuhei Takahashi , Tomohiro Imao
发明人： Kohsuke Tsuchiya , Hitoshi Morinaga , Noboru Yasufuku , Shuhei Takahashi , Tomohiro Imao
IPC分类号： C09K13/00 , C11D1/825
CPC分类号： C09K13/00 , C09G1/02 , C09K3/1463 , C11D1/72 , C11D1/722 , C11D1/825 , C11D11/0047 , H01L21/02024 , H01L21/02052
摘要： A surface treatment composition of the present invention contains a first surfactant, a second surfactant, a basic compound, and water. The surface treatment composition has a pH of 8 or more. The second surfactant has a weight-average molecular weight one-half or less that of the first surfactant. The sum of the content of the first surfactant and the content of the second surfactant is 0.00001 to 0.1% by mass.
摘要翻译：本发明的表面处理组合物含有第一表面活性剂，第二表面活性剂，碱性化合物和水。表面处理组合物的pH为8以上。第二表面活性剂的重均分子量为第一表面活性剂的二分之一以下。第一表面活性剂的含量和第二表面活性剂的含量之和为0.00001〜0.1质量％。

2. 发明申请

US20130134107A1 FILTRATION METHOD FOR NON-DEAIRED LIQUID 审中-公开
标题翻译：非液体液体过滤方法
公开(公告)号：US20130134107A1
公开(公告)日：2013-05-30
申请号：US13581922
申请日：2011-02-23
申请人： Hitoshi Morinaga , Hiroyasu Sugiyama , Naoya Miwa
发明人： Hitoshi Morinaga , Hiroyasu Sugiyama , Naoya Miwa
IPC分类号： B01D37/00
CPC分类号： B01D37/00 , B01D2239/0428 , B01D2239/0618 , B24B57/02
摘要： Disclosed is a filtration method that extends filter life and achieves high filtration efficiency, and also abrasive slurry produced by the method. In this filtration method, deaired solvent is passed through a filter before a non-deaired liquid is filtered by the filter, after which the filter is used for filtering.
摘要翻译：公开了一种延长过滤器寿命并实现高过滤效率的过滤方法，以及通过该方法生产的磨料浆料。在这种过滤方法中，在使用过滤器过滤未经过干燥的液体之前，将经过过滤的溶剂通过过滤器，然后过滤。

3. 发明申请

US20120329284A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND METHOD FOR REDUCING MICROROUGHNESS OF SEMICONDUCTOR SURFACE 审中-公开
标题翻译：半导体器件制造方法和减少半导体表面微观的方法
公开(公告)号：US20120329284A1
公开(公告)日：2012-12-27
申请号：US13601157
申请日：2012-08-31
申请人： Tadahiro Ohmi , Hitoshi Morinaga
发明人： Tadahiro Ohmi , Hitoshi Morinaga
IPC分类号： H01L21/306
CPC分类号： H01L21/02052 , H01L21/02074
摘要： Surface treatment is performed with a liquid, while shielding a semiconductor surface from light. When the method is employed for surface treatment in wet processes such as cleaning, etching and development of the semiconductor surface, increase of surface microroughness can be reduced. Thus, electrical characteristics and yield of the semiconductor device are improved.
摘要翻译：用液体进行表面处理，同时将半导体表面从光屏蔽。当在诸如清洁，蚀刻和半导体表面的显影的湿法中使用该方法进行表面处理时，可以降低表面微粗糙度的增加。因此，提高了半导体器件的电特性和产量。

4. 发明授权

US08226924B2 Method for producing boehmite particles and method for producing alumina particles 有权
标题翻译：勃姆石颗粒的制造方法和氧化铝粒子的制造方法
公开(公告)号：US08226924B2
公开(公告)日：2012-07-24
申请号：US12542852
申请日：2009-08-18
申请人： Hitoshi Morinaga , Muneaki Tahara , Keiji Ashitaka
发明人： Hitoshi Morinaga , Muneaki Tahara , Keiji Ashitaka
IPC分类号： C01F7/02
CPC分类号： C01F7/448 , C01F7/02 , C01P2004/30 , C01P2004/38 , C01P2004/39 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C09K3/1409
摘要： A method for producing boehmite particles includes subjecting powder of aluminum hydroxide to hydrothermal reaction together with a nucleation agent, thereby obtaining boehmite particles having an average primary particle size of 0.6 μm or less and including primary particles each having a hexahedral shape. A method for producing alumina particles includes: drying the boehmite particles produced by the above described method; calcining the boehmite particles, which have been dried, to obtain alumina particles; and disintegrating the obtained alumina particles.
摘要翻译：勃姆石粒子的制造方法包括将氢氧化铝粉末与成核剂一起进行水热反应，得到平均一次粒径为0.6μm以下的勃姆石粒子，并且包含各自具有六面体形状的一次粒子。一种生产氧化铝颗粒的方法包括：干燥由上述方法生产的勃姆石颗粒; 煅烧已经干燥的勃姆石颗粒，得到氧化铝颗粒; 并使得到的氧化铝颗粒分解。

5. 发明申请

US20100003821A1 WETTING AGENT FOR SEMICONDUCTORS, AND POLISHING COMPOSITION AND POLISHING METHOD EMPLOYING IT 有权
标题翻译：半导体润湿剂，抛光组合物和抛光方法
公开(公告)号：US20100003821A1
公开(公告)日：2010-01-07
申请号：US12496314
申请日：2009-07-01
申请人： Hitoshi Morinaga , Shuhei Takahashi , Shogaku Ide , Tomohiro Imao , Naoyuki Ishihara
发明人： Hitoshi Morinaga , Shuhei Takahashi , Shogaku Ide , Tomohiro Imao , Naoyuki Ishihara
IPC分类号： H01L21/306 , C09K13/00 , C08L29/04 , C08L39/06
CPC分类号： C09G1/02 , H01L21/02024 , H01L21/02052
摘要： To provide a wetting agent for semiconductors and a polishing composition whereby the wettability of a semiconductor substrate surface can be improved, and microdefects such as particle attachments can be remarkably reduced.A wetting agent for semiconductors, comprising a water soluble polymer compound having a low viscosity and water, and a polishing composition. A 0.3 wt % aqueous solution of the water soluble polymer compound has a viscosity of less than 10 mPa·s at 25° C.
摘要翻译：为了提供用于半导体的润湿剂和可以提高半导体衬底表面的润湿性的抛光组合物，并且可以显着降低诸如颗粒附着物的微缺陷。一种用于半导体的润湿剂，其包含具有低粘度和水的水溶性聚合物化合物和抛光组合物。水溶性聚合物化合物的0.3重量％水溶液在25℃下的粘度小于10mPa.s

6. 发明授权

US06228179B1 Surface treatment composition and method for treating surface of substrate by using the same 有权
标题翻译：表面处理组合物及其使用方法
公开(公告)号：US06228179B1
公开(公告)日：2001-05-08
申请号：US09523144
申请日：2000-03-10
申请人： Hitoshi Morinaga
发明人： Hitoshi Morinaga
IPC分类号： C23G114
CPC分类号： H01L21/02052 , C11D3/33 , C11D3/3418 , C11D3/3472 , C11D3/349 , C11D3/364 , C11D3/365 , C23G1/14
摘要： A surface treatment composition containing a complexing agent as a metal deposition preventive in a liquid medium, in which the complexing agent is an ethylenediaminephenol derivative of the following general formula (1) or its salt: wherein X1 and X2 are hydroxyl groups; Y1 to Y8 are respectively independently a hydrogen atom, a hydroxyl group, a halogen atom, a carboxyl group, a phosphonic acid group, a sulfonic acid group, a carbonyl group, a nitro group, a nitroso group, an amino group, an imino group, a nitrilo group, a nitrile group, a thiocyanate group, a hydroxyamino group, a hydroxyimino group, or an alkyl or alkoxy group which may have a substituent, provided that at least one of Y1 to Y8 is not a hydrogen atom; Z1 to Z4 are respectively independently a hydrogen atom, a carboxyl group or a sulfonic acid group; and R1 to R4 are respectively independently a hydrogen atom or an alkyl group which may have a substituent.
摘要翻译：在液体介质中含有络合剂作为金属沉积防止剂的表面处理组合物，其中络合剂是下列通式（1）的乙二胺苯酚衍生物或其盐：其中X1和X2是羟基; Y 1〜Y 8分别独立地表示氢原子，羟基，卤素原子，羧基，膦酸基，磺酸基，羰基，硝基，亚硝基，氨基，亚氨基基团，次氮基，腈基，硫氰酸酯基，羟基氨基，羟基亚氨基或可以具有取代基的烷基或烷氧基，条件是Y 1至Y 8中的至少一个不是氢原子; Z1至Z4分别独立地为氢原子，羧基或磺酸基; R 1〜R 4分别独立地为氢原子或可具有取代基的烷基。

7. 发明授权

US6143706A Surface treatment composition and method for treating surface of substrate by using the same 失效
标题翻译：表面处理组合物及其使用方法
公开(公告)号：US6143706A
公开(公告)日：2000-11-07
申请号：US13066
申请日：1998-01-26
申请人： Hitoshi Morinaga
发明人： Hitoshi Morinaga
IPC分类号： C11D3/33 , C11D3/34 , C11D3/36 , C23G1/14 , H01L21/304 , H01L21/306 , C11D3/30
CPC分类号： H01L21/02052 , C11D3/33 , C11D3/349 , C11D3/364 , C11D3/365 , C23G1/14 , C11D3/3418 , C11D3/3472
摘要： A surface treatment composition containing a complexing agent as a metal deposition preventive in a liquid medium, in which the complexing agent is an ethylenediaminephenol derivative of the following general formula (1) or its salt: ##STR1## wherein X.sub.1 and X.sub.2 are hydroxyl groups; Y.sub.1 to Y.sub.8 are respectively independently a hydrogen atom, a hydroxyl group, a halogen atom, a carboxyl group, a phosphonic acid group, a sulfonic acid group, a carbonyl group, a nitro group, a nitroso group, an amino group, an imino group, a nitrilo group, a nitrile group, a thiocyanate group, a hydroxyamino group, a hydroxyimino group, or an alkyl or alkoxy group which may have a substituent, provided that at least one of Y.sub.1 to Y.sub.8 is not a hydrogen atom; Z.sub.1 to Z.sub.4 are respectively independently a hydrogen atom, a carboxyl group or a sulfonic acid group; and R.sub.1 to R.sub.4 are respectively independently a hydrogen atom or an alkyl group which may have a substituent.
摘要翻译：在液体介质中含有络合剂作为金属沉积防止剂的表面处理组合物，其中络合剂是下列通式（1）的乙二胺苯酚衍生物或其盐：其中X 1和X 2是羟基; Y 1〜Y 8分别独立地表示氢原子，羟基，卤素原子，羧基，膦酸基，磺酸基，羰基，硝基，亚硝基，氨基，亚氨基基团，次氮基，腈基，硫氰酸酯基，羟基氨基，羟基亚氨基或可以具有取代基的烷基或烷氧基，条件是Y 1至Y 8中的至少一个不是氢原子; Z1至Z4分别独立地为氢原子，羧基或磺酸基; R 1〜R 4分别独立地为氢原子或可具有取代基的烷基。

8. 发明授权

US5885362A Method for treating surface of substrate 失效
标题翻译：处理基材表面的方法
公开(公告)号：US5885362A
公开(公告)日：1999-03-23
申请号：US809147
申请日：1997-05-14
申请人： Hitoshi Morinaga , Masaya Fujisue
发明人： Hitoshi Morinaga , Masaya Fujisue
IPC分类号： C11D3/39 , C11D7/06 , C11D7/26 , C11D7/32 , C11D7/34 , C11D11/00 , H01L21/02 , H01L21/306 , C03C23/00
CPC分类号： H01L21/02054 , C11D11/0047 , C11D3/3947 , C11D7/06 , C11D7/261 , C11D7/263 , C11D7/264 , C11D7/265 , C11D7/266 , C11D7/267 , C11D7/32 , C11D7/3227 , C11D7/3245 , C11D7/34 , H01L21/02052
摘要： A method for treating the surface of a substrate with a surface treatment composition, wherein the surface treatment composition comprises a liquid medium containing a complexing agent as a metal deposition preventive.
摘要翻译： PCT No.PCT / JP96 / 02077 Sec。 371日期1997年5月14日 102（e）日期1997年5月14日PCT提交1996年7月25日PCT公布。公开号WO97 / 05228 日期1997年2月13日利用表面处理组合物处理基材表面的方法，其中表面处理组合物包含含有络合剂作为金属沉积预防剂的液体介质。

9. 发明授权

US4848867A Rotary joint for polarization plane maintaining optical fibers 失效
标题翻译：用于偏振平面保持光纤的旋转接头
公开(公告)号：US4848867A
公开(公告)日：1989-07-18
申请号：US247784
申请日：1988-09-22
申请人： Hiroshi Kajioka , Toshio Fukahori , Noribumi Shiina , Hitoshi Morinaga
发明人： Hiroshi Kajioka , Toshio Fukahori , Noribumi Shiina , Hitoshi Morinaga
IPC分类号： G02B6/26 , G02B6/32 , G02B6/36 , G02B6/38
CPC分类号： G02B6/3812 , G02B6/32 , G02B6/3604
摘要： A rotary joint for polarization plane maintaining optical fibers which can couple two polarization plane maintaining optical fibers to each other while maintaining the polarization plane maintaining property. The rotary joint comprises a rotary member, a fixed member, two optical fiber collimators and a 1/2 wavelength plate for coupling a polarization plane maintaining optical fiber connected to the rotary member with another polarization plane maintaining optical fiber connected to the fixed member, and gears for rotating the 1/2 wavelength plate at a speed equal to one half the rotational speed of the polarization plane maintaining optical fiber on the rotary member side.
摘要翻译：一种用于维持偏振平面的光纤的旋转接头，其可以将维持光纤的两个偏振面彼此耦合，同时保持偏振面的维持性。旋转接头包括旋转构件，固定构件，两个光纤准直器和用于将维持连接到旋转构件的维持光纤的偏振面保持连接到固定构件的另一偏振面的1/2波长板，以及用于以等于将旋转构件侧保持光纤的偏振面的旋转速度的一半的速度旋转1/2波片的齿轮。

10. 发明授权

US09028574B2 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US09028574B2
公开(公告)日：2015-05-12
申请号：US13878362
申请日：2011-10-06
申请人： Keiji Ashitaka , Hitoshi Morinaga , Akihito Yasui
发明人： Keiji Ashitaka , Hitoshi Morinaga , Akihito Yasui
IPC分类号： C09K3/14 , C09G1/02 , H01L21/3105
CPC分类号： C09K3/1409 , C09G1/02 , C09K3/1463 , H01L21/31053
摘要： A polishing composition contains colloidal silica particles having protrusions on the surfaces thereof. The average of values respectively obtained by dividing the height of a protrusion on the surface of each particle belonging to the part of the colloidal silica particles that has larger particle diameters than the volume average particle diameter of the colloidal silica particles by the width of a base portion of the same protrusion is no less than 0.245. Preferably, the part of the colloidal silica particles that has larger particle diameter than the volume average particle diameter of the colloidal silica particles has an average aspect ratio of no less than 1.15. Preferably, the protrusions on the surfaces of particles belonging to the part of the colloidal silica particles that has larger particle diameters than the volume average particle diameter of the colloidal silica particles have an average height of no less than 3.5 nm.
摘要翻译：抛光组合物包含其表面上具有突起的胶体二氧化硅颗粒。分别通过将属于粒径比胶体二氧化硅粒子的体积平均粒径大的胶体二氧化硅粒子的一部分的粒子的表面上的突起的高度除以碱的宽度而得到的值的平均值相同突起的部分不小于0.245。优选地，粒径比胶体二氧化硅粒子的体积平均粒径大的胶态二氧化硅粒子的平均长径比优选为1.15以上。优选地，粒径比胶态二氧化硅粒子的体积平均粒径大的胶体二氧化硅粒子的粒子的表面上的突起的平均高度优选为3.5nm以上。

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