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    • 3. 发明申请
    • Lithographic Process
    • 平版印刷工艺
    • US20080241735A1
    • 2008-10-02
    • US10582033
    • 2004-12-01
    • Kyle JiangPeng Jin
    • Kyle JiangPeng Jin
    • G03F7/038G03F7/26
    • G03F7/2008G03F7/20
    • The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy density of from 18,000 to 35,000 mJ/cm2, (ii) post-baking the exposed photoresist at elevated temperature, and (iii) developing the exposed photoresist in a solvent, wherein no more than 15% of the energy density is contributed by light having a wavelength of 400 nm or less. The invention also discloses a reciprocating microengine (10) comprising a cylinder (14), piston (12) and crankshaft made by the process.
    • 本发明提供了一种用于从环氧型负型光致抗蚀剂制造高纵横比部件的光刻工艺,其特征在于包括以下步骤:(i)在总能量密度为18,000的光照射基底上的预焙掩膜的环氧型负性光致抗蚀剂 (ii)在升高的温度下后曝光曝光的光致抗蚀剂,和(iii)在溶剂中显影暴露的光致抗蚀剂,其中不超过15%的能量密度为 由波长为400nm以下的光所贡献。 本发明还公开了一种往复式微发动机(10),其包括由该过程制成的气缸(14),活塞(12)和曲轴。
    • 4. 发明授权
    • Lithographic process
    • 平版印刷工艺
    • US07910292B2
    • 2011-03-22
    • US10582033
    • 2004-12-01
    • Kyle JiangPeng Jin
    • Kyle JiangPeng Jin
    • G03F7/00
    • G03F7/2008G03F7/20
    • The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy density of from 18,000 to 35,000 mJ/cm2, (ii) post-baking the exposed photoresist at elevated temperature, and (iii) developing the exposed photoresist in a solvent, wherein no more than 15% of the energy density is contributed by light having a wavelength of 400 nm or less. The invention also discloses a reciprocating microengine (10) comprising a cylinder (14), piston (12) and crankshaft made by the process.
    • 本发明提供了一种用于从环氧型负型光致抗蚀剂制造高纵横比部件的光刻工艺,其特征在于包括以下步骤:(i)在总能量密度为18,000的光照射基底上的预焙掩膜的环氧型负性光致抗蚀剂 (iii)在升高的温度下对曝光的光致抗蚀剂进行后烘烤,以及(iii)在溶剂中显影曝光的光致抗蚀剂,其中不超过15%的能量密度由波长为400的光 nm以下。 本发明还公开了一种往复式微发动机(10),其包括由该过程制成的气缸(14),活塞(12)和曲轴。