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1. 发明授权

US4878376A Method and apparatus for testing sputter targets 失效
标题翻译：用于测试溅射靶的方法和装置
公开(公告)号：US4878376A
公开(公告)日：1989-11-07
申请号：US290163
申请日：1988-12-27
申请人： Mark Leonov , Jan Kordel
发明人： Mark Leonov , Jan Kordel
IPC分类号： G01M3/34
CPC分类号： G01M3/34
摘要： A test fixture for sputter targets used in the manufacture of semiconductor devices and a method of testing sputter targets. The test fixture comprises a specially shaped piece of material which is adapted to receive a sputter target. The test fixture generally conforms to the shape of the sputter target. The interface between the test fixture and the sputter target is carefully manufactured so as to maintain an airtight seal. A passageway is disposed within one sidewall of the test fixture. A vacuum tubing is disposed within the passageway and valve is connected to the tubing so that the cavity within the test fixture can be evacuated. The size of the cavity is kept small so that it may be quickly evacuated. The present invention provides an efficient and cost effective method of testing sputter targets prior to their being placed in the sputter machine.
摘要翻译：用于制造半导体器件的溅射靶的测试夹具和测试溅射靶的方法。测试夹具包括适于接收溅射靶的特殊形状的材料片。测试夹具通常符合溅射靶的形状。仔细地制造测试夹具和溅射靶之间的界面，以保持气密密封。通道设置在测试夹具的一个侧壁内。真空管道设置在通道内，阀门连接到管道，使得测试夹具内的空腔可以被排空。空腔的尺寸保持较小，从而可以快速抽真空。本发明提供了一种在溅射靶被放置在溅射机中之前测试溅射靶的有效且成本有效的方法。

2. 发明授权

US4682396A Centering/positioning apparatus for wafer and vacuum chuck 失效
标题翻译：晶圆和真空吸盘定心/定位装置
公开(公告)号：US4682396A
公开(公告)日：1987-07-28
申请号：US872022
申请日：1986-06-09
申请人： Mark Leonov
发明人： Mark Leonov
IPC分类号： B25B11/00 , B25B27/14 , H01L21/68 , H01L21/683 , G01B3/30
CPC分类号： H01L21/6838 , B25B11/005 , B25B27/14 , H01L21/68 , Y10T29/49902 , Y10T29/53913 , Y10T29/53983
摘要： A method for centering a semiconductor wafer on a vacuum chuck having a centered shaft. A shaft centering tool which is contained in pre-existing openings in a housing surrounding the shaft is used to define the desired location of the shaft. A second device having the same circumference as the wafer, is employed on the chuck in order that teflon guides can be set into position around the chuck. Once the guides are set, wafers introduced into the guides will be centered on the chuck.
摘要翻译：一种将半导体晶片定心在具有中心轴的真空吸盘上的方法。用于围绕轴的壳体中包含在预先存在的开口中的轴对中工具用于限定轴的期望位置。具有与晶片相同圆周的第二装置被用于卡盘上，以便聚四氟乙烯导向件能够被设置在卡盘周围的位置。一旦设置了导轨，导入引导件的晶片将以卡盘为中心。

3. 发明授权

US4976002A Tube particle vacuum cleaner 失效
标题翻译：管颗粒吸尘器
公开(公告)号：US4976002A
公开(公告)日：1990-12-11
申请号：US279412
申请日：1988-12-02
申请人： Mark Leonov , Roy de Groot
发明人： Mark Leonov , Roy de Groot
IPC分类号： A47L9/02 , B08B5/04 , B08B9/035 , H01L21/00
CPC分类号： H01L21/67028 , A47L9/02 , B08B5/04
摘要： The present invention overcomes the aforementioned difficulties by providing a vacuum device to clean the interior surface of particle tubes used in the manufacture of semiconductor wafers. The vacuum device consists of a head which is designed to closely fit with the interior surface of the particle tube to be cleaned. Guide wheels are provided to align the head with the particle tube and to allow the vacuum device to easily roll in and out of the particle tube. The wheels are made of material which does not scratch the interior surface of the particle tube. The head is attached to vacuum tubing by means of flexible bellows. The vacuum tubing and head may be rotated to allow the head to clean the entire interior surface of the particle tube.
摘要翻译：本发明通过提供真空装置来清洁用于制造半导体晶片的颗粒管的内表面来克服上述困难。真空装置由设计成与待清洁的颗粒管的内表面紧密配合的头部组成。提供导轮以使头部与颗粒管对准，并允许真空装置容易地卷入和流出颗粒管。轮子由不会刮擦颗粒管内表面的材料制成。头部通过柔性波纹管连接到真空管上。可以旋转真空管和头部以允许头部清洁颗粒管的整个内表面。

4. 发明授权

US4676699A Semiconductor wafer guides 失效
标题翻译：半导体晶圆导轨
公开(公告)号：US4676699A
公开(公告)日：1987-06-30
申请号：US930012
申请日：1986-11-05
申请人： Mark Leonov
发明人： Mark Leonov
IPC分类号： B65G51/03 , H01L21/677
CPC分类号： B65G51/03 , H01L21/67784
摘要： A device for positioning and proving movement to a semiconductor wafer. A pair of elongated members are attached to either side of a plate which is used during the processing of semiconductor wafers. The members are angled away from the center of the plate at the end which receives the wafer. Angled openings in the members are connected to a gas source which shoots a gas, such as air, from the openings to a assist in propelling the wafer and to prevent the wafer from contacting the member itself. The openings may also be used to introduce different atmospheres to the environment of the wafers during processing.
摘要翻译：用于定位和证明运动到半导体晶片的装置。一对细长构件附接到在半导体晶片的处理期间使用的板的任一侧。这些构件在接收晶片的端部处远离板的中心成角度。构件中的有角度的开口连接到从开口射出气体（例如空气）的气体源，以帮助推动晶片并防止晶片与构件本身接触。开口也可用于在处理期间将不同的气氛引入晶片的环境。

5. 发明授权

US4659094A Centering/positioning apparatus for wafer and vacuum chuck 失效
公开(公告)号：US4659094A
公开(公告)日：1987-04-21
申请号：US730374
申请日：1985-05-03
申请人： Mark Leonov
发明人： Mark Leonov
IPC分类号： B25B11/00 , B25B27/14 , H01L21/68 , H01L21/683 , B23B31/00 , G01B5/08
CPC分类号： B25B11/005 , B25B27/14 , H01L21/68 , H01L21/6838 , Y10T279/11 , Y10T279/26
摘要： A method for centering a semiconductor wafer on a vacuum chuck having a centered shaft. A shaft centering tool which is contained in pre-existing openings in a housing surrounding the shaft is used to define the desired location of the shaft. A second device having the same circumference as the wafer, is employed on the chuck in order that teflon guides can be set into position around the chuck. Once the guides are set, wafers introduced into the guides will be centered on the chuck.

6. 发明授权

US4790661A Cross-mask holder device 失效
标题翻译：交叉面具座设备
公开(公告)号：US4790661A
公开(公告)日：1988-12-13
申请号：US98523
申请日：1987-09-18
申请人： Mark Leonov
发明人： Mark Leonov
IPC分类号： G01B11/03 , G03F7/20 , G01B11/00
CPC分类号： G03F7/707
摘要： A cross-mask and cross-mask holder with improved adjustment means. A cross-mask holder allows adjustment of a cross-mask in the x, y and theta directions. The cross-mask may be adjusted in the x and the y directions through use of screws on the side of the holder and may be adjusted in the theta direction by turning a tube which contains the cross-mask. The invention further discloses the use of an umbrella and cover assembly to reduce light source background noise which improves the alignment signal on an oscilloscope during processing of semiconductor wafers in a stepper machine.
摘要翻译：具有改进调整手段的十字面罩和十字面罩座。交叉掩模支架允许在x，y和θ方向调整交叉掩模。可以通过使用保持器侧面的螺钉在x和y方向上调整十字掩模，并且可以通过转动包含交叉掩模的管来在θ方向上调节。本发明进一步公开了使用伞和盖组件来减少光源背景噪声，其在步进机中处理半导体晶片期间改善了示波器上的对准信号。

7. 发明授权

US5507614A Holder mechanism for simultaneously tilting and rotating a wafer cassette 失效
标题翻译：用于同时倾斜和旋转晶片盒的支架机构
公开(公告)号：US5507614A
公开(公告)日：1996-04-16
申请号：US397561
申请日：1995-03-02
申请人： Mark Leonov , Emile N. Kerba , Jack Aknin
发明人： Mark Leonov , Emile N. Kerba , Jack Aknin
IPC分类号： H01L21/677 , B25J11/00
CPC分类号： H01L21/67775 , Y10S414/136 , Y10S414/137 , Y10S414/14
摘要： A holder mechanism tilts and rotates a vertically oriented wafer-loaded cassette for proper presentation in a horizontal orientation to the robotic arm of a workstation. The mechanism includes a cassette holder, a support member, and a motor. The cassette holder has first and second supports that define orthogonal first and second planes. In two embodiments, the support member connects the cassette holder to the motor shaft and, as the motor shaft rotates, the cassette holder is rotated about a single pivot axis that is oblique to the first and second planes. This rotation tilts a cassette placed in the holder through a tilt angle of about 45.degree. to 90.degree., and simultaneous rotates the cassette through an angle .theta. about the vertical axis. The support member shape determines whether tilting and rotation is away from or toward the motor, and also determines the angle of rotation .theta. and the tilt angle. After workstation processing, the motor rotates in the opposite direction to produce a counter-tilt and counter-rotation that returns the cassette to a vertical orientation. In a third embodiment, the support member is coupled to a horizontal shaft that is coupled to a worm gear assembly. Vertical motor shaft rotation rotates the horizontal shaft through a tilt angle, and simultaneously rotates the cassette holder through the rotation angle .theta..
摘要翻译：保持器机构倾斜并旋转垂直定向的装载晶片的盒，以便以水平方向正确地呈现到工作站的机器人手臂。该机构包括盒座，支撑构件和马达。盒座具有限定正交的第一和第二平面的第一和第二支撑件。在两个实施例中，支撑构件将盒保持器连接到电动机轴，并且随着电动机轴旋转，盒座围绕与第一和第二平面倾斜的单个枢转轴线旋转。这种旋转将放置在保持器中的盒倾斜约45°至90°的倾斜角度，同时使该盒绕垂直轴旋转角度θ。支撑构件形状确定倾斜和旋转是否远离或朝向电动机，并且还确定旋转角θ和倾斜角。在工作站处理之后，电机沿相反方向旋转以产生反倾斜和反向旋转，使盒带返回垂直方向。在第三实施例中，支撑构件联接到联接到蜗轮组件的水平轴。垂直马达轴旋转水平轴通过倾斜角度旋转，同时使盒座旋转旋转角度θ。

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