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1. 发明申请

WO2012029998A2 MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开
标题翻译：电磁驱动器的微通道冷却线圈显示降低的涡流电流
公开(公告)号：WO2012029998A2
公开(公告)日：2012-03-08
申请号：PCT/JP2011070669
申请日：2011-09-05
申请人： NIPPON KOGAKU KK , BINNARD MICHAEL B , COAKLEY SCOTT , POON ALEX , TOTSU MASAHIRO , COON DEREK , KHO LEONARD , KESWANI GAURAV , COOPER ALEXANDER , PHARAND MICHEL , BJORK MATT
发明人： BINNARD MICHAEL B , COAKLEY SCOTT , POON ALEX , TOTSU MASAHIRO , COON DEREK , KHO LEONARD , KESWANI GAURAV , COOPER ALEXANDER , PHARAND MICHEL , BJORK MATT
IPC分类号： H02K3/24
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70875 , H02K9/19 , H02K41/031 , H02K2201/18
摘要： Linear and planar motors, as exemplary electromagnetic actuators, are disclosed that have at least one actively cooled coil assembly. An exemplary assembly includes a coil having first and second main surfaces. Also included is a respective thermally conductive cooling plate in thermal contact with at least one main surface of the coil. A coolant passageway is defined in or on each cooling plate, and a liquid coolant passes through the coolant passageway. The coolant passageway has a primary pattern that is coextensive with at least part of the main surface of the coil. The primary pattern can include a secondary pattern producing coolant flow through the coolant passageway in a manner that reduces eddy-current losses in the cooling plate. The coolant passageway desirably includes. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices provide more effective cooling, with better reliability and ease of maintenance, and reduced eddy-current drag than conventional actuators.
摘要翻译：作为示例性电磁致动器，公开了线性和平面电机，其具有至少一个主动冷却的线圈组件。示例性组件包括具有第一和第二主表面的线圈。还包括与线圈的至少一个主表面热接触的相应导热冷却板。冷却剂通路限定在每个冷却板中或上，并且液体冷却剂穿过冷却剂通路。冷却剂通道具有与线圈的主表面的至少一部分共同延伸的主要图案。主要模式可以包括次要模式，以减少冷却板中的涡流损失的方式产生通过冷却剂通道的冷却剂流。冷却剂通道理想地包括。示例性的次级模式是蛇形。示例性主要图案是径向或具有径向方面，诸如X形图案。该设备提供更有效的冷却，具有更好的可靠性和易于维护，并且比传统执行器减少了涡流阻力。

2. 发明申请

WO2012008620A2 LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM 审中-公开
标题翻译：液体回收装置，曝光装置，液体回收方法，装置制造方法，程序和存储介质
公开(公告)号：WO2012008620A2
公开(公告)日：2012-01-19
申请号：PCT/JP2011066644
申请日：2011-07-14
申请人： NIPPON KOGAKU KK , HOSHINO TADASHI
发明人： HOSHINO TADASHI
CPC分类号： G03F7/70341 , Y10T137/2931
摘要： A liquid recovery apparatus is used in an immersion exposure apparatus and is connected to a liquid immersion member, which is disposed at least partly around an optical path of exposure light that passes through an optical member and a liquid between the optical member and an object. The liquid recovery apparatus comprises: a first passageway, which is connected to a discharge part of the liquid immersion member that separately discharges the liquid and a gas from a recovery passageway of the liquid immersion member wherethrough the liquid recovered via a recovery port of the liquid immersion member flows, into which the liquid discharged via a first discharge port of the discharge part flows; a second passageway, into which the gas discharged via a second discharge port of the discharge part flows; and a first detection apparatus, which is disposed in at least part of the second passageway and detects the amount of the gas discharged via the second discharge port.
摘要翻译：在浸渍曝光装置中使用液体回收装置，并且连接到液浸部件，该液浸部件至少部分地设置在通过光学部件的曝光光的光路和光学部件与物体之间的液体的周围。液体回收装置包括：第一通道，其连接到液浸部件的排出部分，其分别排出液体，并且从液浸部件的回收通道排出气体，通过液体经由回收口回收的液体浸没部件流动，经由排出部的第一排出口排出的液体流入其中; 第二通道，通过排出部件的第二排出口排出的气体流入其中; 以及第一检测装置，其设置在所述第二通道的至少一部分中，并且检测经由所述第二排出口排出的气体的量。

3. 发明申请

WO2011068249A3 EXPOSURE APPARATUS, LIQUID IMMERSION MEMBER, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，液体注入部件和装置制造方法
公开(公告)号：WO2011068249A3
公开(公告)日：2011-08-18
申请号：PCT/JP2010072063
申请日：2010-12-02
申请人： NIPPON KOGAKU KK , SHIBAZAKI YUICHI
发明人： SHIBAZAKI YUICHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70858
摘要： Liquid (Lq) is held between a tip lens (42) of a projection optical system and a wafer (W) on a wafer stage, using a nozzle member (32) which has a shape enclosing an optical path of an illumination light (IL), and a bottom surface to which the wafer is placed facing via a predetermined clearance that has an annular recess section (32n, 32h) formed having multiple projecting sections (32b1, 32b2, 32d). This prevents adhesion of contamination and liquid from remaining that become factors of defects of a pattern formed on the wafer. The nozzle member preferably has an annular shaped inclined surface(32c) whose gap with the wafer surface becomes smaller from the inner side to the outer side, formed on an inner bottom surface facing the wafer of an outer recess section (32h) formed on the bottom surface of the nozzle member.
摘要翻译：使用具有包围照明光的光路（IL）的喷嘴构件（32）将液体（Lq）保持在投影光学系统的前端透镜（42）和晶圆台（W））和通过具有形成有多个突出部（32b1,32b2,32d）的环形凹部（32n，32h）的预定间隙而面对晶片的底面。这样可防止成为晶片上形成的图案缺陷的因素的污染物和液体残留。喷嘴构件优选具有环形倾斜面（32c），其与晶片表面的间隙从内侧到外侧变小，形成在与形成在其上的外部凹部（32h）的晶片相对的内底面上喷嘴构件的底面。

4. 发明申请

WO2010147244A3 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：WO2010147244A3
公开(公告)日：2011-08-04
申请号：PCT/JP2010060924
申请日：2010-06-21
申请人： NIPPON KOGAKU KK , ICHINOSE GO
发明人： ICHINOSE GO
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70825 , G03F7/7085
摘要： Positional information of each of wafer stages (WST1 and WST2) during exposure and during alignment is measured directly under a projection optical system (PL) and directly under a primary alignment system (AL1), respectively, by a plurality of encoder heads, Z heads and the like, which a measurement bar (71) placed below surface plates (14A and 14B) has, using gratings placed on the lower surfaces of fine movement stages (WFS1 and WFS2). Consequently, high-precision measurement of the positional information of the wafer stages (WST1 and WST2) can be performed.
摘要翻译：在曝光和对准期间每个晶片台（WST1和WST2）的位置信息直接在投影光学系统（PL）下直接在主对准系统（AL1）下由多个编码器头，Z头使用放置在微动台（WFS1和WFS2）的下表面上的光栅，其中放置在表面板（14A和14B）之下的测量棒（71）具有。因此，可以进行晶片台（WST1和WST2）的位置信息的高精度测量。

5. 发明申请

WO2010140597A3 TRANSPORTING METHOD, TRANSPORTING APPARATUS, EXPOSURE METHOD, AND EXPOSURE APPARATUS 审中-公开
标题翻译：运输方式，运输工具，曝光方法和曝光装置
公开(公告)号：WO2010140597A3
公开(公告)日：2011-01-27
申请号：PCT/JP2010059292
申请日：2010-05-26
申请人： NIPPON KOGAKU KK , YAMAGUCHI MAIKO
发明人： YAMAGUCHI MAIKO
IPC分类号： G03F7/20
CPC分类号： G03F7/70791 , B65H20/00 , B65H23/1886 , B65H2403/942 , B65H2406/344 , B65H2701/1719 , H01L21/67706 , H01L21/67721
摘要： A ladder type stage apparatus (28) that transports a film-shaped substrate (P) includes a plurality of rods (30A-30L) whose longitudinal directions are aligned in a direction that is orthogonal to the moving direction of the film-shaped substrate in order to support the film-shaped substrate; chains (32A,32B) that join the rods along a closed-loop trajectory; and a drive motor (36A,36B) that moves the rods along this loop-shaped trajectory via the chains.
摘要翻译：传送薄膜状基板（P）的梯型台装置（28）具有多个杆（30A-30L），其长度方向与膜状基板的移动方向正交的方向排列为了支撑膜状基板; 链条（32A，32B），沿着闭环轨迹连接杆; 以及驱动马达（36A，36B），其通过链条沿着该环形轨迹移动杆。

6. 发明申请

WO2010032878A3 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可动体装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：WO2010032878A3
公开(公告)日：2010-06-17
申请号：PCT/JP2009066848
申请日：2009-09-18
申请人： NIPPON KOGAKU KK , SHIBAZAKI YUICHI
发明人： SHIBAZAKI YUICHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70716 , G03F7/70775 , H01L21/681
摘要： In measurement of a positional information in the XY plane of a fine movement stage (WFS) held by a coarse movement stage(WCS), an encoder system is used including a head which is placed facing a grating (RG) placed on a surface substantially parallel to the XY plane of the fine movement stage and irradiates a measurement beam on the grating. Then, the fine movement stage is driven individually or integrally with the coarse movement stage by a drive system, based on the positional information measured by the encoder system. In this case, the head of the encoder system can be placed in proximity to the fine movement stage (the grating), which allows a highly precise measurement of the positional information of the fine movement stage by the encoder system.
摘要翻译：在测量由粗动载台（WCS）保持的微动载台（WFS）的XY平面中的位置信息时，使用编码器系统，该编码器系统包括面向放置在表面上的光栅（RG）放置的光头平行于微动台的XY平面并将测量光束照射在光栅上。然后，基于由编码器系统测量的位置信息，通过驱动系统单独地或整体地与粗动载台一起驱动微动载台。在这种情况下，编码器系统的头部可以放置在精细运动平台（光栅）附近，从而可以通过编码器系统高精度测量精细运动平台的位置信息。

7. 发明申请

WO2009067097A3 WHITE BALANCE ADJUSTMENT FOR SCENES WITH VARYING ILLUMINATION 审中-公开
标题翻译：白平衡调整与变化的照明
公开(公告)号：WO2009067097A3
公开(公告)日：2009-09-17
申请号：PCT/US2007024229
申请日：2007-11-20
申请人： NIPPON KOGAKU KK , HONG LI
发明人： HONG LI
IPC分类号： G03B7/00
CPC分类号： H04N1/6027 , H04N1/56
摘要： An image apparatus (10) for providing an adjusted image (218) of a scene (12) includes a capturing system (226) and a control system (232). The capturing system (226) captures a captured image (316) of the scene (12). The control system (232) evaluates the captured image (316) and determines if the scene (12) is illuminated by more than one illuminant (14). With this design, the image apparatus (1 0) is particularly suited to capture scenes (12) that are illuminated by multiple illuminants (14). The control system (232) can evaluate the captured image (316) and estimate which portion of the captured image (316) was toned by a first illuminant (14A) and which portio of the captured image (316) was toned by the second illuminant (14B). Further, the control system (232) can evaluate the captured image (316) to estimate the characteristics of the first illuminant (14A) and the second illuminant (14B).
摘要翻译：一种用于提供场景（12）的调整图像（218）的图像设备（10）包括捕获系统（226）和控制系统（232）。捕获系统（226）捕获场景（12）的捕获图像（316）。控制系统（232）评估所捕获的图像（316）并确定场景（12）是否由多于一个的光源（14）照亮。利用这种设计，图像装置（10）特别适用于捕获由多个发光体（14）照明的场景（12）。控制系统（232）可以评估所捕获的图像（316）并且估计由第一光源（14A）调整拍摄图像（316）的哪一部分，并且捕获图像（316）的哪一个被第二光源调色（14B）。此外，控制系统（232）可以评估拍摄图像（316）以估计第一光源（14A）和第二光源（14B）的特性。

8. 发明申请

WO2009069817A3 ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：照明光学装置，曝光装置及其制造方法
公开(公告)号：WO2009069817A3
公开(公告)日：2009-08-06
申请号：PCT/JP2008071992
申请日：2008-11-27
申请人： NIPPON KOGAKU KK , NISHIKAWA JIN
发明人： NISHIKAWA JIN
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/702 , G03F7/70841 , G03F7/70883
摘要： A reflection type illumination optical apparatus, which guides an exposure light EL to a reticle surface Ra via a curved mirror 24, a concave mirror 25, etc. includes a vacuum chamber 1 which accommodates the curved mirror 24, the concave mirror 25, etc,; and a subchamber 4D which is arranged in the vacuum chamber 1 and which accommodates the curved mirror 24. The subchamber 4D has openings 4Da, 4Db through which the exposure light EL coming into the curved mirror 24 and the exposure light EL exiting from the curved mirror 24 pass, respectively. Each of the openings 4Da, 4Db is arranged in the vicinity of a position at which the cross-sectional area of the light flux is smallest. It is possible to decrease the amount of adhesion of minute particles such as debris to the reflecting optical element, without unnecessarily enhancing the ability of the vacuum gas discharge mechanism.
摘要翻译：通过曲面镜24，凹面镜25等将曝光用光EL引导到标线片表面Ra的反射型照明光学装置包括容纳曲面镜24，凹面镜25等的真空室1， ; 以及设置在真空室1中并容纳曲面镜24的子室4D。子室4D具有开口4Da，4Db，来自弯曲反射镜24的曝光光EL和从曲面镜出射的曝光光EL 24通，分别。每个开口4Da，4Db布置在光束的横截面积最小的位置附近。可以在不必要地增强真空气体排出机构的能力的情况下，将诸如碎屑的微小颗粒附着到反射光学元件上。

9. 发明申请

WO2008050482A9 MICROSCOPIC DEVICE AND MICROSCOPIC IMAGE ANALYSIS METHOD 审中-公开
标题翻译： MICROSCOPIC设备和微观图像分析方法
公开(公告)号：WO2008050482A9
公开(公告)日：2008-06-12
申请号：PCT/JP2007001151
申请日：2007-10-22
申请人： NIPPON KOGAKU KK , SHIBATA HIROMASA
发明人： SHIBATA HIROMASA
IPC分类号： G02B21/36 , G02B21/24 , G06T5/20 , H04N5/225
CPC分类号： G02B21/365 , G06T5/003 , G06T5/20 , G06T7/0004 , G06T2207/10056 , G06T2207/20192 , G06T2207/30148
摘要： [PROBLEMS] To provide a microscopic device capable of resolving a fine pattern exceeding the
摘要翻译： [问题]提供能够分辨超过该细微图案的微观装置

10. 发明申请

WO2005111722A3 APPARATUS AND METHOD FOR PROVIDING FLUID FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：用于提供流体液体的设备和方法
公开(公告)号：WO2005111722A3
公开(公告)日：2006-06-15
申请号：PCT/US2005014200
申请日：2005-04-27
申请人： NIPPON KOGAKU KK , POON ALEX KA TIM , KHO LEONARD WAI FUNG
发明人： POON ALEX KA TIM , KHO LEONARD WAI FUNG
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity (34) in a direction that is different than a direction in which the nozzle (20) moves. The immersion fluid can also be injected at different rates into the inner cavity at different sides. A wafer substrate (16) is then exposed by light through the immersion fluid.
摘要翻译：公开了一种用于提供用于浸没光刻的流体的装置和方法。浸入流体沿与喷嘴（20）移动方向不同的方向注入内腔（34）。浸没流体也可以以不同的速率注入到不同侧的内腔中。晶片衬底（16）然后通过浸入液曝光。

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