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1. 发明申请

WO2011062283A1 REFLECTIVE IMAGING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：反射成像光学系统，曝光装置及其制造方法
公开(公告)号：WO2011062283A1
公开(公告)日：2011-05-26
申请号：PCT/JP2010/070751
申请日：2010-11-16
申请人： NIKON CORPORATION , ONO, Takuro
发明人： ONO, Takuro
IPC分类号： G03F7/20 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0657
摘要： An imaging optical system (6) of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors (M1 to M6) and forms an image of a first plane (4) on a second plane (7). An incident pupil of the imaging optical system is positioned on a side opposite to the imaging optical system with the first plane intervening therebetween. A condition of -14.3
摘要翻译：可应用于曝光装置的远光瞳型成像光学系统（6）设置有六个反射镜（M1至M6），并在第二平面（7）上形成第一平面（4）的图像，。成像光学系统的入射光瞳位于与成像光学系统相对的一侧，其中第一平面介于其之间。通过沿入射光瞳和第一平面之间的光轴（AX）设置的距离PD来实现-14.3 <（PD / TT）/ R <-8.3的条件，沿光学器件设置的距离TT 第一平面和第二平面之间的角度以及进入第一平面的主光束的入射角R（rad）。

2. 发明申请

WO1994029860A1 DISC REPRODUCING DEVICE 审中-公开
标题翻译：光盘复制设备
公开(公告)号：WO1994029860A1
公开(公告)日：1994-12-22
申请号：PCT/JP1994000900
申请日：1994-06-03
申请人： KABUSHIKI KAISHA TOSHIBA , AOYAMA, Noboru , NAKANE, Hiroshi , ONO, Takuro
发明人： KABUSHIKI KAISHA TOSHIBA
IPC分类号： G11B17/04
CPC分类号： G11B17/056
摘要： The present invention relates to a disc reproducing device constructed such that a tray storing a disc can be loaded in and/or unloaded from a cabinet. In this disc reproducing device, a motor mounted with a disc motor and a turn table is constructed so as to be moved between the tray and a mechanical unit inside the cabinet. The tray has a pair of recessed portions as portions for holding the motor mount. The mechanical unit has as portions for holding the motor mount respective projecting portions of a pair of guide shafts for supporting a pick-up, a pair of lock levers, and a pair of guide projections. The pair of lock levers is also used as means for moving the motor mount between the tray and the mechanical unit.
摘要翻译：盘再现装置技术领域本发明涉及一种盘再现装置，其被构造成使得可以将容纳盘的托盘装载到和/或从机柜卸载。在该盘再现装置中，安装有盘马达和转台的马达被构造成在托盘和机柜内的机械单元之间移动。托盘具有一对凹部作为用于保持马达座的部分。机械单元具有用于保持电动机安装的一部分用于支撑拾取物，一对锁定杆和一对引导突起的一对引导轴的突出部分的部分。所述一对锁定杆还用作在所述托盘和所述机械单元之间移动所述马达座的装置。

3. 发明申请

WO2009069722A1 REFLECTIVE PROJECTION EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
标题翻译：反射投影曝光装置和曝光方法
公开(公告)号：WO2009069722A1
公开(公告)日：2009-06-04
申请号：PCT/JP2008/071595
申请日：2008-11-20
申请人： NIKON CORPORATION , ONO, Takuro , CHIBA, Hiroshi , KOMATSUDA, Hideki
发明人： ONO, Takuro , CHIBA, Hiroshi , KOMATSUDA, Hideki
IPC分类号： G03F7/20
CPC分类号： G03F7/70233 , G03F7/702
摘要： A reflective projection optical system comprises a first optical unit G1 having at least one reflecting optical element, and a second optical unit G2 having at least one reflecting optical element. A focal point on the second surface side of the first optical unit G1 approximately agrees with a focal point on the first surface side of the second optical unit G2. An angle between a normal to the first surface R1 and a principal ray of the illumination beam IB incident to the first surface R1 is larger than a value of arcsine of a numerical aperture on the first surface R1 side of the reflective projection optical system. All the optical elements in the projection optical system are located outside an extension surface of a ray group defining an outer edge of the illumination beam IB incident to the first surface R1.
摘要翻译：反射投影光学系统包括具有至少一个反射光学元件的第一光学单元G1和具有至少一个反射光学元件的第二光学单元G2。第一光学单元G1的第二表面侧上的焦点大致与第二光学单元G2的第一表面侧上的焦点一致。第一表面R1的法线与入射到第一表面R1的照明光束IB的主光线之间的角度大于反射投影光学系统的第一表面R1侧的数值孔径的反正弦值。投影光学系统中的所有光学元件位于限定入射到第一表面R1的照明光束IB的外边缘的光线组的延伸表面的外侧。

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