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1. 发明授权

US08728241B2 Combinatorial site-isolated deposition of thin films from a liquid source 有权
标题翻译：从液体源组合沉积薄膜
公开(公告)号：US08728241B2
公开(公告)日：2014-05-20
申请号：US12963237
申请日：2010-12-08
申请人： Rajesh Kelekar
发明人： Rajesh Kelekar
IPC分类号： C23C18/00 , B01J19/00 , C23C26/00
CPC分类号： B01J19/0046 , B01J2219/00274 , B01J2219/0043 , B01J2219/00443 , B01J2219/00527 , B01J2219/00585 , B01J2219/00659 , C23C18/00 , C23C18/06 , C23C26/00
摘要： An apparatus for combinatorial site-isolated thin film deposition may include a source of a liquid precursor, a nebulizer configured to convert the liquid precursor to an aerosolized mist of particles, a first deposition cell configured to direct an aerosolized mist of particles onto a first selected region of the substrate, and a second deposition cell configured to direct an aerosolized mist of particles onto a second selected region of the substrate. A method for combinatorial site-isolated thin film deposition may include providing a liquid precursor, converting the liquid precursor to an aerosolized mist of particles, transporting the aerosolized mist of particles to a first deposition cell and a second deposition cell in proximity to a surface of a substrate, and depositing the transported aerosolized mist of particles onto a first selected region and a second selected region of the surface of the substrate.
摘要翻译：用于组合位置分离的薄膜沉积的装置可以包括液体前体的源，构造成将液体前体转化为雾化的颗粒雾的喷雾器，第一沉积单元，被配置为将颗粒的雾化雾引导到第一选定的以及第二沉积单元，其被配置为将颗粒的雾化雾引导到基板的第二选定区域上。用于组合位置分离的薄膜沉积的方法可以包括提供液体前体，将液体前体转化成雾化的颗粒雾，将雾化的颗粒物雾输送到第一沉积池和第二沉积池附近，衬底，并将所输送的雾化的颗粒雾沉积到衬底表面的第一选定区域和第二选定区域上。

2. 发明授权

US08298621B2 Stirring apparatus for combinatorial processing 失效
标题翻译：用于组合处理的搅拌装置
公开(公告)号：US08298621B2
公开(公告)日：2012-10-30
申请号：US13283444
申请日：2011-10-27
申请人： Rajesh Kelekar
发明人： Rajesh Kelekar
IPC分类号： H01L21/66 , C25D5/02 , C25B15/08 , B05B7/06
CPC分类号： C25D21/10 , C23C18/1628 , C23C18/1669 , C25D5/08 , C25D17/001 , C25D17/008 , H01L21/67023
摘要： An apparatus and system for stirring liquid inside a flow cell. In one implementation, the apparatus includes a rotatable disc configured to receive liquid at a top side of the disc and distribute the liquid substantially evenly around a periphery of the flow cell. The disc has a triangular cross sectional area. The apparatus may further include a set of fins attached to a bottom side of the disc, wherein the set of fins is configured to draw the liquid from the periphery of the flow cell into the center of the flow cell.
摘要翻译：用于在流动池内搅拌液体的装置和系统。在一个实施方案中，该装置包括可旋转盘，其构造成在盘的顶侧处接收液体，并将液体基本均匀地分布在流动池的周边周围。盘具有三角形横截面积。该装置还可以包括附接到盘的底侧的一组翅片，其中所述翅片组被配置为将液体从流动池的周边抽吸到流动池的中心。

3. 发明授权

US08220502B1 Measuring volume of a liquid dispensed into a vessel 有权
标题翻译：测量分配到容器中的液体的体积
公开(公告)号：US08220502B1
公开(公告)日：2012-07-17
申请号：US11966654
申请日：2007-12-28
申请人： Rajesh Kelekar , Gaurav Verma , Kurt Weiner
发明人： Rajesh Kelekar , Gaurav Verma , Kurt Weiner
IPC分类号： G01F22/02
CPC分类号： G01F22/02 , Y10T137/86035
摘要： A pressure gauge may be coupled to a vessel into which a liquid chemical is to be dispensed. The volume of the vessel may be known and a control device may determine an initial pressure of the vessel using the pressure gauge. A volume of liquid chemical may be dispensed into the vessel which may cause the pressure within the vessel to increase to a second pressure. The control device may determine the second pressure using the pressure gauge may calculate the volume of liquid chemical dispensed into the vessel using the volume of the vessel, the initial pressure of the vessel, and the second pressure of the vessel.
摘要翻译：压力计可以连接到要分配液体化学品的容器中。容器的体积可以是已知的，并且控制装置可以使用压力计来确定容器的初始压力。液体化学品的体积可以分配到容器中，这可能导致容器内的压力增加到第二压力。控制装置可以使用压力计来确定第二压力可以使用容器的体积，容器的初始压力和容器的第二压力来计算分配到容器中的液体化学品的体积。

4. 发明授权

US08058171B1 Stirring apparatus for combinatorial processing 有权
标题翻译：用于组合处理的搅拌装置
公开(公告)号：US08058171B1
公开(公告)日：2011-11-15
申请号：US12140926
申请日：2008-06-17
申请人： Rajesh Kelekar
发明人： Rajesh Kelekar
IPC分类号： H01L21/66 , C25D5/02 , C25B15/08 , B05B7/06
CPC分类号： C25D21/10 , C23C18/1628 , C23C18/1669 , C25D5/08 , C25D17/001 , C25D17/008 , H01L21/67023
摘要： An apparatus and system for stirring liquid inside a flow cell. In one implementation, the apparatus includes a rotatable disc configured to receive liquid at a top side of the disc and distribute the liquid substantially evenly around a periphery of the flow cell. The disc has a triangular cross sectional area. The apparatus may further include a set of fins attached to a bottom side of the disc, wherein the set of fins is configured to draw the liquid from the periphery of the flow cell into the center of the flow cell.
摘要翻译：用于在流动池内搅拌液体的装置和系统。在一个实施方案中，该装置包括可旋转盘，其构造成在盘的顶侧处接收液体，并将液体基本均匀地分布在流动池的周边周围。盘具有三角形横截面积。该装置还可以包括附接到盘的底侧的一组翅片，其中所述翅片组被配置为将液体从流动池的周边抽吸到流动池的中心。

5. 发明授权

US08883607B2 Full wafer processing by multiple passes through a combinatorial reactor 有权
标题翻译：通过多次通过组合反应器的全晶片处理
公开(公告)号：US08883607B2
公开(公告)日：2014-11-11
申请号：US13337425
申请日：2011-12-27
申请人： Rajesh Kelekar , Aaron Francis , Gregory Lim
发明人： Rajesh Kelekar , Aaron Francis , Gregory Lim
IPC分类号： H01L21/76
CPC分类号： H01L21/76 , H01L21/02 , H01L21/306 , H01L21/67017
摘要： Overlapping combinatorial processing can offer more processed regions, better particle performance and simpler process equipment. In overlapping combinatorial processing, one or more regions are processed in series with some degrees of overlapping between regions. In some embodiments, overlapping combinatorial processing can be used in conjunction with non-overlapping combinatorial processing and non-combinatorial processing to develop and investigate materials and processes for device processing and manufacturing.
摘要翻译：重叠组合处理可以提供更多的处理区域，更好的粒子性能和更简单的工艺设备。在重叠组合处理中，一个或多个区域与区域之间的一些重叠程度串联处理。在一些实施例中，重叠的组合处理可以结合非重叠的组合处理和非组合处理来使用，以开发和研究用于设备处理和制造的材料和过程。

6. 发明申请

US20130164906A1 FULL WAFER PROCESSING BY MULTIPLE PASSES THROUGH A COMBINATORIAL REACTOR 有权
标题翻译：通过多个通过组合反应器进行全面加工
公开(公告)号：US20130164906A1
公开(公告)日：2013-06-27
申请号：US13337425
申请日：2011-12-27
申请人： Rajesh Kelekar , Aaron Francis , Gregory Lim
发明人： Rajesh Kelekar , Aaron Francis , Gregory Lim
IPC分类号： H01L21/76
CPC分类号： H01L21/76 , H01L21/02 , H01L21/306 , H01L21/67017
摘要： Overlapping combinatorial processing can offer more processed regions, better particle performance and simpler process equipment. In overlapping combinatorial processing, one or more regions are processed in series with some degrees of overlapping between regions. In some embodiments, overlapping combinatorial processing can be used in conjunction with non-overlapping combinatorial processing and non-combinatorial processing to develop and investigate materials and processes for device processing and manufacturing.
摘要翻译：重叠组合处理可以提供更多的处理区域，更好的粒子性能和更简单的工艺设备。在重叠组合处理中，一个或多个区域与区域之间的一些重叠程度串联处理。在一些实施例中，重叠的组合处理可以结合非重叠的组合处理和非组合处理来使用，以开发和研究用于设备处理和制造的材料和过程。

7. 发明申请

US20130126477A1 MAGNETICALLY LEVITATED GAS CELL FOR TOUCHLESS SITE-ISOLATED WET PROCESSING 失效
标题翻译：用于无缝网站隔离湿法加工的磁力检测气囊
公开(公告)号：US20130126477A1
公开(公告)日：2013-05-23
申请号：US13302178
申请日：2011-11-22
申请人： Rajesh Kelekar , Kent Riley Child
发明人： Rajesh Kelekar , Kent Riley Child
IPC分类号： C23F1/02 , B23B31/28 , B05D1/18 , B05C3/02 , B05D5/00 , B05C11/00
CPC分类号： H01L21/67086 , H01L21/67057 , Y10T279/23
摘要： A protective chuck is magnetically levitated on a substrate with a gas layer between the bottom surface of the protective chuck and the substrate surface. The gas layer protects a surface region of the substrate against a fluid layer covering the remaining of the substrate surface without contacting the substrate, reducing or eliminating potential damage to the substrate surface. The magnetically levitated protective chuck can enable combinatorial processing of a substrate, providing multiple isolated processing regions on a single substrate with different material and processing conditions.
摘要翻译：保护卡盘在衬底上磁悬浮，在保护卡盘的底表面和衬底表面之间具有气层。气体层保护衬底的表面区域免受覆盖衬底表面剩余部分的流体层的影响，而不接触衬底，减少或消除对衬底表面的潜在损害。磁悬浮保护卡盘可以实现基板的组合处理，在单个基板上提供具有不同材料和加工条件的多个隔离加工区域。

8. 发明申请

US20120285819A1 Combinatorial and Full Substrate Sputter Deposition Tool and Method 审中-公开
标题翻译：组合和全基板溅射沉积工具和方法
公开(公告)号：US20120285819A1
公开(公告)日：2012-11-15
申请号：US13103951
申请日：2011-05-09
申请人： Kent Riley Child , Hong Sheng Yang , Rajesh Kelekar
发明人： Kent Riley Child , Hong Sheng Yang , Rajesh Kelekar
IPC分类号： C23C14/34
CPC分类号： C23C14/3464 , C23C14/04
摘要： A dual purpose processing chamber is provided. The dual purpose processing chamber includes a lid disposed over a top surface of a processing region of the processing chamber. A plurality of sputter guns with a target affixed to one end of each of the sputter guns is included. The plurality of sputter guns extend through the lid of the process chamber, wherein each of the plurality of sputter guns is oriented such that a surface of the target affixed to each gun is angled toward an outer periphery of a substrate. In another embodiment, each of the sputter guns is affixed to an extension arm and the extension arm is configured to enable movement in four degrees of freedom. A method of performing a deposition process is also included.
摘要翻译：提供了一个双重目的的处理室。双用途处理室包括设置在处理室的处理区域的顶表面上的盖子。包括固定在每个溅射枪的一端的目标的多个溅射枪。多个溅射枪延伸穿过处理室的盖，其中多个溅射枪中的每一个被定向成使得固定到每个喷枪的靶的表面朝向基板的外周边成角度。在另一个实施例中，每个溅射枪被固定到延伸臂上，并且延伸臂构造成能够以四个自由度运动。还包括执行沉积工艺的方法。

9. 发明授权

US08037894B1 Maintaining flow rate of a fluid 有权
标题翻译：保持流体的流速
公开(公告)号：US08037894B1
公开(公告)日：2011-10-18
申请号：US11965442
申请日：2007-12-27
申请人： Rajesh Kelekar , Gaurav Verma , Kurt Weiner
发明人： Rajesh Kelekar , Gaurav Verma , Kurt Weiner
IPC分类号： F17D3/00
CPC分类号： G05D7/0635 , B01J19/0046 , B01J2219/00286 , B01J2219/00306 , B01J2219/00337 , B01J2219/00389 , B01J2219/00418 , B01J2219/00479 , B01J2219/00585 , B01J2219/00698 , B01J2219/0072 , B01J2219/00756 , Y10T137/0379 , Y10T137/3115 , Y10T137/3127 , Y10T137/4807
摘要： A pressure gauge may be coupled to a supply line which carries liquid from a bottle to either one or more mixing vessels and/or one or more reactors in a combinatorial processing tool. A control device may monitor the pressure measured by the pressure gauge, and the control device may be configured to change the pressure supplied to the bottle based on a comparison of the measured pressure to a pre-determined pressure value. The control device may adjust the pressure provided to the bottle using a pressure regulator coupled to the pressure source. By changing the pressure provided to the bottle, the control device may maintain a relatively constant flow rate of fluids from the liquid source into one or more mixing vessels and/or the one or more reactors.
摘要翻译：压力计可以耦合到供应管线，其将液体从瓶运送到组合加工工具中的一个或多个混合容器和/或一个或多个反应器。控制装置可以监测由压力计测量的压力，并且控制装置可以被配置成基于测量的压力与预定压力值的比较来改变供给到瓶子的压力。控制装置可以使用耦合到压力源的压力调节器来调节提供给瓶子的压力。通过改变提供给瓶子的压力，控制装置可以保持流体从液体源到一个或多个混合容器和/或一个或多个反应器的相对恒定的流速。

10. 发明授权

US08561627B1 Calibration of a chemical dispense system 失效
标题翻译：化学分配系统的校准
公开(公告)号：US08561627B1
公开(公告)日：2013-10-22
申请号：US12239555
申请日：2008-09-26
申请人： Rajesh Kelekar
发明人： Rajesh Kelekar
IPC分类号： F16K31/02
CPC分类号： B67D7/085 , F04B49/065 , H01L21/67017 , Y10T137/0379 , Y10T137/0396 , Y10T137/7761 , Y10T137/85986 , Y10T137/86002
摘要： Method for providing a fluid at a target pressure. In one implementation, the method may include providing a semiconductor solution at a velocity to a supply line through a dispenser, measuring a pressure of the semiconductor solution flowing through the supply line, comparing the measured pressure with the target pressure, and adjusting the velocity based on the results of the comparison.
摘要翻译：在目标压力下提供流体的方法。在一个实施方案中，该方法可以包括以速度通过分配器提供半导体溶液到供应管线，测量流过供应管线的半导体溶液的压力，将测量的压力与目标压力进行比较，并且基于对比结果。

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