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    • 1. 发明专利
    • DE620802C
    • 1935-10-28
    • DESC098678
    • 1932-08-21
    • OSWALD RICHARD SCHULTZ
    • B41C3/04B41C3/06B41N1/12C08L1/12
    • Plastic cellulosic compositions particularly useful in the manufacture of cellotypes or printing-plates comprise a plurality of cellulose esters of different viscosities, but containing the same acid radicles, a small amount of plasticizer, and one or more volatile solvents, in the proportions of 12--36 per cent of total solids to 64--80 per cent of solvent or solvents. The cellulose esters used may be nitrates or acetates. As the plasticizers, tricresyl phosphate, triphenyl phosphate, and dibutyl phthalate are preferred for cellulose nitrate, and triacetin, tricresyl phosphate, triphenyl phosphate, dibutyl tartrate, diamyl tartrate, diethyl phthalate, and diacetin, for cellulose acetate. Solvents specified are acetone, ethyl acetate, butyl acetate, amyl acetate, and butyl alcohol. A mixture of ethyl acetate and alcohol, methyl ethyl ketone. Methyl acetate, tetrachlorethane and diacetone alcohol may also be used for cellulose acetates. Examples are given of compositions of which the solid contents comprise from 40 to 71 per cent of \ba1/2\be-second cellulose nitrate and from 20 to 43,25 per cent of 40-second cellulose nitrate. In one example of a cellulose acetate composition, the total solids comprise 38 per cent of 5-second cellulose acetate, 57 per cent of 15-second cellulose acetate, together with 5 per cent of tricresyl phosphate, and in another example, the total solids comprise 47,5 per cent each of 1-second and 15-second cellulose acetates and 5 per cent of triacetin. There may be present also resins or gums such as gum dammar, and also colouring matter. In the production of printing plates, the composition is poured onto a water-swollen gelatine relief copy, covered with a backing of celluloid, and pressed into close contact with the gelatine surface. Hardening occurs partly by precipitation by the water in the gelatine, and partly by absorption of the solvent by the celluloid backing.ALSO:Plastic cellulosic compositions comprise a phurality of cellulose esters of different viscosities but containing the same acid radicles, a small amount of plasticizer, and one or more volatile solvents, in the proportions of 12-36 per cent of total solids to 64-80 per cent of solvent or solvents. The cellulose ester may be nitrates or acetates. As the plasticizers, tricresyl phosphate, triphenyl phosphate, and dibutyl phthalate are preferred for cellulose nitrate, and triacetin, tricresyl phosphate, triphenyl phosphate, dibutyl tartrate, diamyl tartrate, diethyl phthalate, and diacetin, for cellulose acetate. Solvents specified are acetone, ethyl acetate, butyl acetate, amyl acetate, and butyl alcohol. A mixture of ethyl acetate and alcohol, methyl ethyl ketone, methyl acetate, tetrachlorethane, and diacetone alcohol may also be used for cellulose acetates. Examples are given of compositions of which the solid contents comprise from 40 to 71 per cent of 1/2 -second cellulose nitrate and from 20 to 43,25 per cent of 40-second cellulose nitrate. In one example of a cellulose acetate composition, the total solids comprise 38 per cent of 5-second cellulose acetate, 57 per cent of 15-second cellulose acetate, together with 5 per cent of tricresyl phosphate, and in another example, the total solids comprise 47,5 per cent each of 1-second and 15-second cellulose acetates and 5 per cent of triacetin. There may be present also resins or gums such as gum dammar, and also colouring matter.
    • 2. 发明专利
    • Improvements in the manufacture of printing plates from plastic cellulosic compositions
    • GB410738A
    • 1934-05-18
    • GB2320432
    • 1932-08-18
    • OSWALD RICHARD SCHULTZ
    • B41C3/04B41C3/06B41N1/12C08L1/12
    • Plastic cellulosic compositions particularly useful in the manufacture of cellotypes or printing-plates comprise a plurality of cellulose esters of different viscosities, but containing the same acid radicles, a small amount of plasticizer, and one or more volatile solvents, in the proportions of 12--36 per cent of total solids to 64--80 per cent of solvent or solvents. The cellulose esters used may be nitrates or acetates. As the plasticizers, tricresyl phosphate, triphenyl phosphate, and dibutyl phthalate are preferred for cellulose nitrate, and triacetin, tricresyl phosphate, triphenyl phosphate, dibutyl tartrate, diamyl tartrate, diethyl phthalate, and diacetin, for cellulose acetate. Solvents specified are acetone, ethyl acetate, butyl acetate, amyl acetate, and butyl alcohol. A mixture of ethyl acetate and alcohol, methyl ethyl ketone. Methyl acetate, tetrachlorethane and diacetone alcohol may also be used for cellulose acetates. Examples are given of compositions of which the solid contents comprise from 40 to 71 per cent of \ba1/2\be-second cellulose nitrate and from 20 to 43,25 per cent of 40-second cellulose nitrate. In one example of a cellulose acetate composition, the total solids comprise 38 per cent of 5-second cellulose acetate, 57 per cent of 15-second cellulose acetate, together with 5 per cent of tricresyl phosphate, and in another example, the total solids comprise 47,5 per cent each of 1-second and 15-second cellulose acetates and 5 per cent of triacetin. There may be present also resins or gums such as gum dammar, and also colouring matter. In the production of printing plates, the composition is poured onto a water-swollen gelatine relief copy, covered with a backing of celluloid, and pressed into close contact with the gelatine surface. Hardening occurs partly by precipitation by the water in the gelatine, and partly by absorption of the solvent by the celluloid backing.ALSO:Plastic cellulosic compositions comprise a phurality of cellulose esters of different viscosities but containing the same acid radicles, a small amount of plasticizer, and one or more volatile solvents, in the proportions of 12-36 per cent of total solids to 64-80 per cent of solvent or solvents. The cellulose ester may be nitrates or acetates. As the plasticizers, tricresyl phosphate, triphenyl phosphate, and dibutyl phthalate are preferred for cellulose nitrate, and triacetin, tricresyl phosphate, triphenyl phosphate, dibutyl tartrate, diamyl tartrate, diethyl phthalate, and diacetin, for cellulose acetate. Solvents specified are acetone, ethyl acetate, butyl acetate, amyl acetate, and butyl alcohol. A mixture of ethyl acetate and alcohol, methyl ethyl ketone, methyl acetate, tetrachlorethane, and diacetone alcohol may also be used for cellulose acetates. Examples are given of compositions of which the solid contents comprise from 40 to 71 per cent of 1/2 -second cellulose nitrate and from 20 to 43,25 per cent of 40-second cellulose nitrate. In one example of a cellulose acetate composition, the total solids comprise 38 per cent of 5-second cellulose acetate, 57 per cent of 15-second cellulose acetate, together with 5 per cent of tricresyl phosphate, and in another example, the total solids comprise 47,5 per cent each of 1-second and 15-second cellulose acetates and 5 per cent of triacetin. There may be present also resins or gums such as gum dammar, and also colouring matter.
    • 5. 发明授权
    • Semiconductor device fabrication using a multiple exposure and block mask approach to reduce design rule violations
    • 半导体器件制造采用多重曝光和阻挡掩模法来减少设计违规
    • US08304172B2
    • 2012-11-06
    • US12617429
    • 2009-11-12
    • Richard Schultz
    • Richard Schultz
    • G03F7/26
    • H01L21/31144H01L21/033H01L21/76816H01L21/76895H01L21/76897H01L27/11
    • A method of fabricating a semiconductor device begins by forming a layer of hard mask material on a substrate comprising a layer of semiconductor material and a layer of insulating material overlying the layer of semiconductor material, such that the layer of hard mask material overlies the layer of insulating material. A multiple exposure photolithography procedure is performed to create a combined pattern of photoresist features overlying the layer of hard mask material, and a recess line pattern is in the hard mask material, using the combined pattern of photoresist features. The method continues by covering designated sections of the recess line pattern with a blocking pattern of photoresist features, and forming a pattern of trenches in the insulating material, where the pattern of trenches is defined by the blocking pattern of photoresist features and the hard mask material. Thereafter, an electrically conductive material is deposited in the trenches, resulting in conductive lines for the semiconductor device.
    • 制造半导体器件的方法开始于在包括半导体材料层和覆盖在半导体材料层上的绝缘材料层的衬底上形成硬掩模材料层,使得该硬掩模材料层覆盖在 绝缘材料。 执行多次曝光光刻步骤以产生覆盖在硬掩模材料层上的光致抗蚀剂特征的组合图案,并且使用光致抗蚀剂特征的组合图案在硬掩模材料中形成凹陷线图案。 该方法继续通过用光致抗蚀剂特征的阻挡图案覆盖凹槽线图案的指定部分,并且在绝缘材料中形成沟槽图案,其中沟槽图案由光致抗蚀剂特征的阻挡图案和硬掩模材料 。 此后,导电材料沉积在沟槽中,产生用于半导体器件的导线。
    • 8. 发明申请
    • APPARATUS FOR MERGING SPATIAL AUDIO STREAMS
    • 装备空间音频流的装置
    • US20110216908A1
    • 2011-09-08
    • US13026023
    • 2011-02-11
    • Giovanni Del GaldoFabian KuechMarkus KallingerVille PulkkiMikko-Ville LaitinenRichard Schultz-Amling
    • Giovanni Del GaldoFabian KuechMarkus KallingerVille PulkkiMikko-Ville LaitinenRichard Schultz-Amling
    • H04R5/00
    • H04S3/008G10L19/008H04S2420/03H04S2420/11
    • An apparatus for merging a first spatial audio stream with a second spatial audio stream to obtain a merged audio stream comprising an estimator for estimating a first wave representation comprising a first wave direction measure and a first wave field measure for the first spatial audio stream, the first spatial audio stream having a first audio representation and a first direction of arrival. The estimator being adapted for estimating a second wave representation comprising a second wave direction measure and a second wave field measure for the second spatial audio stream, the second spatial audio stream having a second audio representation and a second direction of arrival. The apparatus further comprising a processor for processing the first wave representation and the second wave representation to obtain a merged wave representation comprising a merged wave field measure and a merged direction of arrival measure, and for processing the first audio representation and the second audio representation to obtain a merged audio representation, and for providing the merged audio stream comprising the merged audio representation and the merged direction of arrival measure.
    • 一种用于将第一空间音频流与第二空间音频流合并以获得合并音频流的装置,其包括用于估计第一波形表示的估计器,所述第一波形表示包括第一空间音频流的第一波方向测量和第一波场测量, 第一空间音频流具有第一音频表示和第一到达方向。 估计器适于估计第二波形表示,其包括用于第二空间音频流的第二波方向测量和第二波场测量,所述第二空间音频流具有第二音频表示和第二方向。 该装置还包括处理器,用于处理第一波形表示和第二波形表示以获得包括合并的波场测量和合并的到达方向测量的合并波形表示,并且用于将第一音频表示和第二音频表示处理 获得合并的音频表示,并且用于提供包括合并的音频表示和合并的到达方向度量的合并音频流。
    • 9. 发明申请
    • SEMICONDUCTOR DEVICE FABRICATION USING A MULTIPLE EXPOSURE AND BLOCK MASK APPROACH TO REDUCE DESIGN RULE VIOLATIONS
    • 半导体器件制造使用多次曝光和封装掩模来减少设计规则
    • US20110111348A1
    • 2011-05-12
    • US12617429
    • 2009-11-12
    • Richard SCHULTZ
    • Richard SCHULTZ
    • G03F7/20
    • H01L21/31144H01L21/033H01L21/76816H01L21/76895H01L21/76897H01L27/11
    • A method of fabricating a semiconductor device begins by forming a layer of hard mask material on a substrate comprising a layer of semiconductor material and a layer of insulating material overlying the layer of semiconductor material, such that the layer of hard mask material overlies the layer of insulating material. A multiple exposure photolithography procedure is performed to create a combined pattern of photoresist features overlying the layer of hard mask material, and a recess line pattern is in the hard mask material, using the combined pattern of photoresist features. The method continues by covering designated sections of the recess line pattern with a blocking pattern of photoresist features, and forming a pattern of trenches in the insulating material, where the pattern of trenches is defined by the blocking pattern of photoresist features and the hard mask material. Thereafter, an electrically conductive material is deposited in the trenches, resulting in conductive lines for the semiconductor device.
    • 制造半导体器件的方法开始于在包括半导体材料层和覆盖在半导体材料层上的绝缘材料层的衬底上形成硬掩模材料层,使得该硬掩模材料层覆盖在 绝缘材料。 执行多次曝光光刻步骤以产生覆盖在硬掩模材料层上的光致抗蚀剂特征的组合图案,并且使用光致抗蚀剂特征的组合图案在硬掩模材料中形成凹陷线图案。 该方法继续通过用光致抗蚀剂特征的阻挡图案覆盖凹槽线图案的指定部分,并且在绝缘材料中形成沟槽图案,其中沟槽图案由光致抗蚀剂特征的阻挡图案和硬掩模材料 。 此后,导电材料沉积在沟槽中,产生用于半导体器件的导线。
    • 10. 发明申请
    • Interlocking Corner Joint
    • 联锁角接头
    • US20060162277A1
    • 2006-07-27
    • US10908179
    • 2005-04-30
    • Richard Schultz
    • Richard Schultz
    • E04B1/00E04G21/00
    • F16B12/125
    • A method of constructing an interlocking corner joint by combining fixed or variable sized interlocking fingers from at least two sides, full or partial feed though dowel pegs or other geometrically shaped pegs, finishing nails, pins or screws and glue or epoxy at the interface of the interlocking fingers and pegs and pins. The resulting interlocking corner joint is much stronger than a standard dovetail joint or box finger joint due to the increased surface area created by the holes, pegs and pins. Due to the interlocking fingers, holes, pegs and pins, the interlocking corner joint will not pull apart in any one dimension x,y,z in the event that the glue joint fails.
    • 通过将固定或可变尺寸的互锁手指从至少两侧组合而构成互锁角接头的方法,通过定位销或其它几何形状的钉,完成指甲,销或螺钉和胶或环氧树脂在全部或部分进给 互锁手指和钉和针。 由于孔,钉和销引起的表面积增加,所得到的互锁角接头比标准的燕尾接头或箱指接头强得多。 由于互锁的手指,孔,钉和销,在胶接头失效的情况下,互锁角接头在任何一个尺寸x,y,z中不会拉开。