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1. 发明授权

US07382540B2 Refractive projection objective 有权
$Refractive projection objective$
标题翻译：折射投影物镜
公开(公告)号：US07382540B2
公开(公告)日：2008-06-03
申请号：US11716679
申请日：2007-03-12
申请人： Hans-Juergen Rostalski , Karl-Heinz Schuster , Russell Hudyma , Wilhelm Ulrich , Rolf Freimann
发明人： Hans-Juergen Rostalski , Karl-Heinz Schuster , Russell Hudyma , Wilhelm Ulrich , Rolf Freimann
IPC分类号： G02B9/00 , G02B9/60
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译：具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8 2 <1.1。

2. 发明申请

US20070247722A1 Refractive projection objective 有权
$Refractive projection objective$
标题翻译：折射投影物镜
公开(公告)号：US20070247722A1
公开(公告)日：2007-10-25
申请号：US11716679
申请日：2007-03-12
申请人： Hans-Juergen Rostalski , Karl-Heinz Schuster , Russell Hudyma , Wilhelm Ulrich , Rolf Freimann
发明人： Hans-Juergen Rostalski , Karl-Heinz Schuster , Russell Hudyma , Wilhelm Ulrich , Rolf Freimann
IPC分类号： G02B9/60 , G02B3/00
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译：具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。第一凸度具有由D 1表示的最大直径，并且第二凸度具有由D 2表示的最大直径和0.8

3. 发明授权

US07151592B2 Projection system for EUV lithography 有权
标题翻译： EUV光刻投影系统
公开(公告)号：US07151592B2
公开(公告)日：2006-12-19
申请号：US10454830
申请日：2003-06-04
申请人： Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
发明人： Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
IPC分类号： G03B27/54 , G03B27/72 , G02B5/10
CPC分类号： G03F7/70233 , G02B17/0652 , G02B17/0657 , G03F7/70275
摘要： An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
摘要翻译： EUV光学投影系统包括用于将物体（OB）成像到图像（IM）的至少六个反射镜（M 1，M 2，M 3，M 4，M 5，M 6）。优选地，至少一个镜对配置为至少相位补偿镜对。该系统优选地被配置成沿着从物体（OB）到第二反射镜（M 2）和第三反射镜（M 3）之间的图像（IM））的光路形成中间图像（IMI），使得第一反射镜（M 1）和第二反射镜（M 2）形成第一光学组（G 1）和第三反射镜（M 3），第四反射镜（M 4），第五反射镜（M5）和第六反射镜（M 6）形成第二光学组（G 1）。该系统还优选地包括沿着从物体（OB）到第一反射镜（M 1）和第二反射镜（M 2）之间的图像（IM））的光路定位的孔径光阑（APE）。第二镜（M 2）优选为凸面，第三镜（M 3）优选为凹面。该系统优选地形成数值孔径大于0.18的图像（IM）。

4. 发明申请

US20060171040A1 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 有权
标题翻译：投影物镜包括多个镜子，前视镜M3
公开(公告)号：US20060171040A1
公开(公告)日：2006-08-03
申请号：US11356525
申请日：2006-02-16
申请人： Hans-Juergen Mann , Russell Hudyma , Alexander Epple
发明人： Hans-Juergen Mann , Russell Hudyma , Alexander Epple
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/0844 , G02B17/0856 , G03F7/70225
摘要： According to one exemplary embodiment, a projection objective is provided and includes at least two non-planar (curved) mirrors, wherein an axial distance between a next to last non-planar mirror and a last non-planar mirror, as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.
摘要翻译：根据一个示例性实施例，提供了一种投影物镜，并且包括至少两个非平面（弯曲）反射镜，其中，沿着光线定义的下一个至最后的非平面镜与最后的非平面镜之间的轴向距离路径大于最后的非平面镜与在光路中跟随的透镜的第一折射表面之间的轴向距离。在一个示例性实施例中，第一折射表面与单遍型透镜相关联。当前目标形成具有至少约0.80或更高（例如0.95）的数值孔径的图像。优选地，该目的不包括折叠反射镜，并且在两个反射镜之间不存在中间图像，以及物镜的瞳孔没有遮蔽。

5. 发明授权

US07085075B2 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 失效
公开(公告)号：US07085075B2
公开(公告)日：2006-08-01
申请号：US10639780
申请日：2003-08-12
申请人： Hans-Juergen Mann , Russell Hudyma , Alexander Epple
发明人： Hans-Juergen Mann , Russell Hudyma , Alexander Epple
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/0844 , G02B17/0856 , G03F7/70225
摘要： According to one exemplary embodiment, a projection objective is provided and includes at least two non-planar (curved) mirrors, wherein an axial distance between a next to last non-planar mirror and a last non-planar mirror, as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.

6. 发明申请

US20060050258A1 Projection system for EUV lithography 有权
公开(公告)号：US20060050258A1
公开(公告)日：2006-03-09
申请号：US11243407
申请日：2005-10-04
申请人： Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
发明人： Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
IPC分类号： G03B27/54
CPC分类号： G02B17/0657 , G02B17/0652 , G03B27/54 , G03F7/70233 , G03F7/70275
摘要： An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).

7. 发明申请

US20050231813A1 Refractive projection objective 有权
$Refractive projection objective$
标题翻译：折射投影物镜
公开(公告)号：US20050231813A1
公开(公告)日：2005-10-20
申请号：US10931051
申请日：2004-09-01
申请人： Hans-Juergen Rostalski , Karl-Heinz Schuster , Russell Hudyma , Wilhelm Ulrich , Rolf Freimann
发明人： Hans-Juergen Rostalski , Karl-Heinz Schuster , Russell Hudyma , Wilhelm Ulrich , Rolf Freimann
IPC分类号： G02B3/00 , G02B9/00 , G02B13/14 , G02B13/24 , G03F7/20
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译：具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8 2 <1.1。

8. 发明授权

US6033079A High numerical aperture ring field projection system for extreme ultraviolet lithography 有权
标题翻译：用于极紫外光刻的高数值孔径环形场投影系统
公开(公告)号：US6033079A
公开(公告)日：2000-03-07
申请号：US270127
申请日：1999-03-15
申请人： Russell Hudyma
发明人： Russell Hudyma
IPC分类号： G02B17/06 , G03F7/20 , G02B5/08
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 .mu.m.
摘要翻译：用于投影光刻照相机的全反射光学系统具有EUV辐射源，要在晶片上成像的晶片和掩模。光学系统包括第一凹面镜，第二镜，第三凸面镜，第四凹面镜，第五凸面镜和第六凹面镜。该系统被配置为使得六个反射镜中的五个以小于大致12度的入射角接收主光线，并且六个反射镜中的每一个以大于15°的入射角接收主光线。六个反射面中的四个具有小于大约7μm的非球面偏离。六个反射面中的五个具有小于14μm的非球面偏离。六个反射面中的每一个都具有小于16.0μm的非球面偏离。

9. 发明授权

US08362391B2 Laser thin film poly-silicon annealing optical system 有权
标题翻译：激光薄膜多晶硅退火光学系统
公开(公告)号：US08362391B2
公开(公告)日：2013-01-29
申请号：US12979292
申请日：2010-12-27
申请人： William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
发明人： William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
IPC分类号： B23K26/00
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/02686 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.
摘要翻译：公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统，激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数侧壁允许场停止在工件处保持足够陡峭的梁轮廓。

10. 发明申请

US20110163077A1 LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM 有权
标题翻译：激光薄膜聚硅氧烷退火光学系统
公开(公告)号：US20110163077A1
公开(公告)日：2011-07-07
申请号：US12979292
申请日：2010-12-27
申请人： William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
发明人： William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
IPC分类号： B23K26/06 , B23K26/00
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/02686 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.
摘要翻译：公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统，激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数侧壁允许场停止在工件处保持足够陡峭的梁轮廓。

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