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1. 发明申请

WO2009102617A3 DEVICE HAVING POWER GENERATING BLACK MASK AND METHOD OF FABRICATING THE SAME 审中-公开
标题翻译：具有发电黑色掩模的装置及其制造方法
公开(公告)号：WO2009102617A3
公开(公告)日：2010-10-28
申请号：PCT/US2009033240
申请日：2009-02-05
申请人： QUALCOMM MEMS TECHNOLOGIES INC , BITA ION , WANG CHUN-MING , XU GANG
发明人： BITA ION , WANG CHUN-MING , XU GANG
IPC分类号： G02B26/00 , G02F1/1335
CPC分类号： G02B26/001 , G02F1/133512 , G02F2001/13324 , Y02E10/52
摘要： A power generating black mask comprising an anti-reflection layer deposited over a substrate, a first electrode layer deposited over the anti -reflection layer, a semi-conductor layer deposited over the first electrode layer and a second electrode layer deposited over the semi-conductor layer.
摘要翻译：一种功率产生黑色掩模，包括沉积在衬底上的抗反射层，沉积在抗反射层上的第一电极层，沉积在第一电极层上的半导体层和沉积在半导体上的第二电极层层。

2. 发明申请

WO2008109620A1 METHOD AND APPARATUS FOR PROVIDING A LIGHT ABSORBING MASK IN AN INTERFEROMETRIC MODULATOR DISPLAY 审中-公开
标题翻译：用于在干涉仪调制器显示中提供光吸收掩模的方法和装置
公开(公告)号：WO2008109620A1
公开(公告)日：2008-09-12
申请号：PCT/US2008/055829
申请日：2008-03-04
申请人： QUALCOMM MEMS TECHNOLOGIES, INC. , WANG, Chun-Ming
发明人： WANG, Chun-Ming
IPC分类号： G02B26/00
CPC分类号： G02B26/001
摘要： A microelectromechanical system (MEMS) device (800) is provided. In one embodiment, the MEMS device includes a transparent substrate (804), and a plurality of modulators (802). The plurality of modulators (802) includes an optical stack (806, 808, 814) coupled to the transparent substrate; in which the optical stack includes a first light absorbing area (814). The plurality of modulators further includes a reflective layer (810) over the optical stack, and one or more posts (812) to support the reflective layer (810). Each of the one or more posts (812) includes a second light absorbing area integrated in the post.
摘要翻译：提供了一种微机电系统（MEMS）装置（800）。在一个实施例中，MEMS器件包括透明衬底（804）和多个调制器（802）。多个调制器（802）包括耦合到透明基板的光学堆叠（806,808,814）其中所述光学堆叠包括第一光吸收区域（814）。多个调制器还包括在光学堆叠上方的反射层（810）和支撑反射层（810）的一个或多个柱（812）。一个或多个柱子（812）中的每一个包括集成在柱中的第二光吸收区域。

3. 发明申请

WO2008039229A3 METHOD AND APPARATUS FOR PROVIDING BACK-LIGHTING IN AN INTERFEROMETRIC MODULATOR DISPLAY DEVICE 审中-公开
标题翻译：用于在间歇式调制器显示装置中提供背光的方法和装置
公开(公告)号：WO2008039229A3
公开(公告)日：2008-06-05
申请号：PCT/US2007004277
申请日：2007-02-16
申请人： QUALCOMM MEMS TECHNOLOGIES INC , WANG CHUN-MING , TUNG MING-HAU , GANTI SURYA PRAKASH
发明人： WANG CHUN-MING , TUNG MING-HAU , GANTI SURYA PRAKASH
IPC分类号： G09F13/08
CPC分类号： G02B26/001
摘要： Methods and apparatus for providing light in an interferometric modulator device are provided. In one embodiment, a microelectromechanical system (MEMS) is provided that includes a transparent substrate and a plurality of interferometric modulators. The interferometric modulators include an optical stack coupled to the transparent substrate, a reflective layer over the optical stack, and one or more posts to support the reflective and to provide a path for light from a backlight for lighting the interferometric modulators.
摘要翻译：提供了用于在干涉式调制器装置中提供光的方法和装置。在一个实施例中，提供了包括透明基板和多个干涉式调制器的微机电系统（MEMS）。所述干涉式调制器包括耦合到所述透明衬底的光学叠层，所述光学叠层上的反射层以及用于支撑所述反射体的一个或多个柱，以及为来自所述背光源的光提供用于点亮所述干涉式调制器的路径。

4. 发明申请

WO2012138557A2 METHOD AND MASK FOR ENHANCING THE RESOLUTION OF PATTERNING 2-ROW HOLES 审中-公开
标题翻译：用于增强图案的2孔的分辨率的方法和掩模
公开(公告)号：WO2012138557A2
公开(公告)日：2012-10-11
申请号：PCT/US2012/031423
申请日：2012-03-30
申请人： SANDISK TECHNOLOGIES INC. , WANG, Chun-Ming , HUANG, Chenche , HIGASHITANI, Masaaki
发明人： WANG, Chun-Ming , HUANG, Chenche , HIGASHITANI, Masaaki
IPC分类号： G03F1/26
CPC分类号： G03F7/70433 , G03F1/26 , G03F1/32 , G03F1/36 , G03F7/70091
摘要： A photolithography mask including a plurality of mask features. Adjacent mask features are separated by a gap and are offset from each other such that individual mask features have one-side dense portions and two-side dense portions. Also a photolithography method that includes a step of providing a substantially opaque mask having N stepped rows of offset, substantially transparent, rectangular mask features, where N is an integer and N≥2. The method also includes illuminating a photoresist layer located over an underlying material with dipole illumination through the substantially transparent, rectangular mask features in the substantially opaque mask to form 2N rows of exposed regions in the photoresist layer. The exposed regions have a substantially elliptical or substantially circular shape when viewed from above the photoresist layer.
摘要翻译：一种包括多个掩模特征的光刻掩模。相邻的掩模特征由间隙分隔开并且彼此偏移，使得各个掩模特征具有单侧致密部分和两侧致密部分。还有一种光刻方法，其包括提供具有偏移的，基本上透明的矩形掩模特征的N个阶梯行的基本不透明掩模的步骤，其中N是整数，N = 2。该方法还包括通过偶极照明通过基本上不透明掩模中的基本上透明的矩形掩模特征照亮位于下层材料上的光致抗蚀剂层，以在光致抗蚀剂层中形成2N排暴露区域。当从光致抗蚀剂层的上方观察时，暴露区域具有基本上椭圆形或大致圆形形状。

5. 发明申请

WO2011002590A1 METHOD OF FORMING CONTACT HOLE ARRAYS USING A HYBRID SPACER TECHNIQUE 审中-公开
标题翻译：使用混合间隔技术形成接触孔阵列的方法
公开(公告)号：WO2011002590A1
公开(公告)日：2011-01-06
申请号：PCT/US2010/038125
申请日：2010-06-10
申请人： SANDISK 3D LLC , WANG, Chun-Ming , HUANG, Chenche , HIGASHITANI, Masaaki
发明人： WANG, Chun-Ming , HUANG, Chenche , HIGASHITANI, Masaaki
IPC分类号： H01L21/768 , H01L21/033
CPC分类号： H01L21/76816 , H01L21/0337 , H01L21/31144
摘要： One embodiment of the invention provides a method of forming a plurality of contact holes, including forming a first feature and a second feature over an underlying material, forming sidewall spacers (502) on the first and second features, removing the first and second features without removing the sidewall spacers, forming a cover mask (605,606) at least partially exposing the sidewall spacers, and etching the underlying material using the cover mask and the sidewall spacers as a mask to form the plurality of contact holes (303).
摘要翻译：本发明的一个实施例提供一种形成多个接触孔的方法，包括在下面的材料上形成第一特征和第二特征，在第一和第二特征上形成侧壁间隔物（502），去除第一和第二特征而没有移除所述侧壁间隔物，形成至少部分地暴露所述侧壁间隔物的覆盖掩模（605,606），以及使用所述覆盖掩模和所述侧壁间隔物作为掩模来蚀刻下面的材料以形成所述多个接触孔（303）。

6. 发明申请

WO2010062515A1 METHOD OF MAKING PILLARS USING PHOTORESIST SPACER MASK 审中-公开
标题翻译：使用光电隔离膜掩模制作支柱的方法
公开(公告)号：WO2010062515A1
公开(公告)日：2010-06-03
申请号：PCT/US2009/061643
申请日：2009-10-22
申请人： SANDISK 3D LLC , CHEN, Yung-Tin , WANG, Chun-Ming , RADIGAN, Steven, J.
发明人： CHEN, Yung-Tin , WANG, Chun-Ming , RADIGAN, Steven, J.
IPC分类号： H01L21/033
CPC分类号： H01L21/0337
摘要： A method of making a device includes forming a first hard mask layer over an underlying layer, forming first features over the first hard mask layer, forming a first spacer layer over the first features, etching the first spacer layer to form a first spacer pattern and to expose top of the first features, removing the first features, patterning the first hard mask using the first spacer pattern as a mask to form first hard mask features, removing the first spacer pattern. The method also includes forming second features over the first hard mask features, forming a second spacer layer over the second features, etching the second spacer layer to form a second spacer pattern and to expose top of the second features, removing the second features, etching the first hard mask features using the second spacer pattern as a mask to form second hard mask features, and etching at least part of the underlying layer using the second hard mask features as a mask.
摘要翻译：制造器件的方法包括在下层上形成第一硬掩模层，在第一硬掩模层上形成第一特征，在第一特征上形成第一间隔层，蚀刻第一间隔层以形成第一间隔图案，为了暴露第一特征的顶部，去除第一特征，使用第一间隔图案作为掩模来图案化第一硬掩模以形成第一硬掩模特征，去除第一间隔图案。该方法还包括在第一硬掩模特征上形成第二特征，在第二特征上形成第二间隔层，蚀刻第二间隔层以形成第二间隔图案并暴露第二特征的顶部，去除第二特征，蚀刻第一硬掩模使用第二间隔图案作为掩模形成第二硬掩模特征，并且使用第二硬掩模特征作为掩模蚀刻至少部分下层。

7. 发明申请

WO2009134323A1 METHOD FOR FABRICATING SELF-ALIGNED COMPLIMENTARY PILLAR STRUCTURES AND WIRING 审中-公开
标题翻译：用于制作自对准的复合支柱结构和接线的方法
公开(公告)号：WO2009134323A1
公开(公告)日：2009-11-05
申请号：PCT/US2009/002400
申请日：2009-04-17
申请人： SANDISK 3D LLC , CHEN, Yung-Tin , WANG, Chun-Ming , RADIGAN, Steven, J. , PETTI, Christopher, J. , MAXWELL, Steven
发明人： CHEN, Yung-Tin , WANG, Chun-Ming , RADIGAN, Steven, J. , PETTI, Christopher, J. , MAXWELL, Steven
IPC分类号： H01L21/033 , H01L21/308 , H01L21/311 , H01L21/3213
CPC分类号： H01L21/0337 , H01L21/0338 , H01L21/3086 , H01L21/3088 , H01L21/31144 , H01L21/32139 , H01L27/1021
摘要： A method of making a semiconductor device includes forming at least one device layer over a substrate, forming at least two spaced apart features over the at least one device layer, forming sidewall spacers on the at least two features, selectively removing the spaced apart features, filling a space between a first sidewall spacer and a second sidewall spacer with a filler feature, selectively removing the sidewall spacers to leave a plurality of the filler features spaced apart from each other, and etching the at least one device layer using the filler feature as a mask.
摘要翻译：制造半导体器件的方法包括在衬底上形成至少一个器件层，在所述至少一个器件层上形成至少两个间隔的特征，在所述至少两个特征上形成侧壁间隔物，选择性地去除间隔开的特征，用填料特征填充第一侧壁间隔物和第二侧壁间隔物之间的空间，选择性地去除侧壁间隔物以留下彼此间隔开的多个填料特征，并使用填料特征来蚀刻至少一个器件层，如一个面具

8. 发明申请

WO2009126585A1 DEVICE HAVING THIN BLACK MASK AND METHOD OF FABRICATING THE SAME 审中-公开
标题翻译：具有黑色掩模的装置及其制造方法
公开(公告)号：WO2009126585A1
公开(公告)日：2009-10-15
申请号：PCT/US2009/039680
申请日：2009-04-06
申请人： QUALCOMM MEMS TECHNOLOGIES, INC. , XU, Gang , WANG, Chun-ming , ZHONG, Fan , LUO, Qi
发明人： XU, Gang , WANG, Chun-ming , ZHONG, Fan , LUO, Qi
IPC分类号： G02B5/00
CPC分类号： G02B5/003 , G02B5/201 , G02B26/001
摘要： A thin black mask is created using a single mask process. A dielectric layer is deposited over a substrate. An absorber layer is deposited over the dielectric layer and a reflector layer is deposited over the absorber layer. The absorber layer and the reflector layer are patterned using a single mask process.
摘要翻译：使用单个掩码进程创建一个细黑色掩模。介电层沉积在衬底上。在电介质层上沉积吸收层，在吸收层上沉积反射层。使用单个掩模工艺对吸收层和反射层进行图案化。

9. 发明申请

WO2008039229A2 METHOD AND APPARATUS FOR PROVIDING BACK-LIGHTING IN AN INTERFEROMETRIC MODULATOR DISPLAY DEVICE 审中-公开
标题翻译：用于在干涉调制器显示设备中提供背照明的方法和设备
公开(公告)号：WO2008039229A2
公开(公告)日：2008-04-03
申请号：PCT/US2007/004277
申请日：2007-02-16
申请人： QUALCOMM INCORPORATED , WANG, Chun-Ming , TUNG, Ming-Hau , GANTI, Surya, Prakash
发明人： WANG, Chun-Ming , TUNG, Ming-Hau , GANTI, Surya, Prakash
IPC分类号： G02F1/01
CPC分类号： G02B26/001
摘要： Methods and apparatus for providing light in an interferometric modulator device are provided. In one embodiment, a microelectromechanical system (MEMS) is provided that includes a transparent substrate and a plurality of interferometric modulators. The interferometric modulators include an optical stack coupled to the transparent substrate, a reflective layer over the optical stack, and one or more posts to support the reflective and to provide a path for light from a backlight for lighting the interferometric modulators.
摘要翻译：提供了用于在干涉式调制器装置中提供光的方法和设备。在一个实施例中，提供了一种微机电系统（MEMS），其包括透明衬底和多个干涉式调制器。干涉式调制器包括耦合到透明衬底的光学堆叠，光学堆叠上的反射层，以及一个或多个支柱，以支持反射并为来自背光的光提供路径以照亮干涉式调制器。

10. 发明申请

WO2007078495A3 METHOD OF CREATING MEMS DEVICE CAVITIES BY A NON-ETCHING PROCESS 审中-公开
标题翻译：通过非蚀刻工艺来创建MEMS器件腔的方法
公开(公告)号：WO2007078495A3
公开(公告)日：2007-12-06
申请号：PCT/US2006045925
申请日：2006-11-30
申请人： QUALCOMM INC , WANG CHUN-MING , LAN JEFFREY , SASAGAWA TERUO
发明人： WANG CHUN-MING , LAN JEFFREY , SASAGAWA TERUO
IPC分类号： B81B3/00 , G02B26/00 , G02B26/08
CPC分类号： B81C1/00047 , B81B2201/047 , B81C2201/0108 , B81C2201/0111 , G02B26/001
摘要： MEMS devices (such as interferometric modulators) may be fabricated using a sacrificial layer that contains a heat vaporizable polymer to form a gap between a moveable layer and a substrate. One embodiment provides a method of making a MEMS device that includes depositing a polymer layer over a substrate, forming an electrically conductive layer over the polymer layer, and vaporizing at least a portion of the polymer layer to form a cavity between the substrate and the electrically conductive layer. Another embodiment provides a method for making an interferometric modulator that includes providing a substrate, depositing a first electrically conductive material over at least a portion of the substrate, depositing a sacrificial material over at least a portion of the first electrically conductive material, depositing an insulator over the substrate and adjacent to the sacrificial material to form a support structure, and depositing a second electrically conductive material over at least a portion of the sacrificial material, the sacrificial material being removable by heat-vaporization to thereby form a cavity between the first electrically conductive layer and the second electrically conductive layer.
摘要翻译： MEMS器件（诸如干涉式调制器）可以使用含有可热蒸发聚合物的牺牲层来制造，以在可移动层和衬底之间形成间隙。一个实施例提供了一种制造MEMS器件的方法，该方法包括：在衬底上沉积聚合物层;在聚合物层上形成导电层;以及蒸发至少一部分聚合物层，以在衬底和电气之间形成空腔导电层。另一个实施例提供了一种制造干涉式调制器的方法，该方法包括提供衬底，在衬底的至少一部分上沉积第一导电材料，在第一导电材料的至少一部分上沉积牺牲材料，沉积绝缘体在衬底上并且与牺牲材料相邻以形成支撑结构，以及在牺牲材料的至少一部分上沉积第二导电材料，牺牲材料通过热汽化可去除，从而在第一电气导电层和第二导电层。

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