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    • 8. 发明申请
    • Enhancing planarization uniformity in optical devices
    • 提高光学器件的平坦化均匀性
    • US20140113397A1
    • 2014-04-24
    • US13694048
    • 2012-10-22
    • Wei QianJoan FongDazeng FengJay Jie Lai
    • Wei QianJoan FongDazeng FengJay Jie Lai
    • H01L31/18
    • H01L31/18G02B6/122G02B2006/12176G02F1/025
    • An optical device is formed from a device precursor having a layer of a light-transmitting medium on a base. A first feature is formed on the device precursor. The device precursor is then processed such that a stop layer protects the first feature and a portion of the device precursor is above the top of the stop layer. The first feature is between the base and the stop layer. The device precursor is planarized such that the portion of the device precursor located above the top of the stop layer becomes flush with the top of the portion of the stop layer that is present on the device precursor after the planarization. During the planarization, the stop layer acts as a planarization stop that slows or stops the rate of planarization.
    • 光学器件由在基底上具有透光介质层的器件前体形成。 在器件前体上形成第一特征。 然后处理器件前体,使得停止层保护第一特征,并且器件前体的一部分在止动层的顶部之上。 第一个特征是在底层和停止层之间。 器件前体被平坦化,使得位于停止层顶部之上的器件前体的部分在平坦化之后与存在于器件前体上的止挡层部分的顶部相平齐。 在平坦化期间,停止层用作减慢或停止平坦化速率的平坦化停止。