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1. 发明申请

WO1997050121A1 METHOD FOR TRANSFERRING CONDUCTOR PATTERN TO FILM CARRIER, MASK USED FOR THE METHOD AND FILM CARRIER 审中-公开
标题翻译：用于传输导体图案到薄膜载体的方法，用于方法和薄膜载体的掩模
公开(公告)号：WO1997050121A1
公开(公告)日：1997-12-31
申请号：PCT/JP1997001889
申请日：1997-06-04
申请人： SEIKO EPSON CORPORATION , YUZAWA, Hideki
发明人： SEIKO EPSON CORPORATION
IPC分类号： H01L21/60
CPC分类号： H01L23/49572 , H01L21/4821 , H01L2223/54473 , H01L2924/0002 , H05K1/0266 , H01L2924/00
摘要： A method for transferring a conductor pattern to a film carrier for mounting electronic parts thereon, wherein a mask pattern is preliminarily transferred to the film carrier coated with a photoresist by using a mask having the conductor pattern and two or more conductor pattern alignment marks, the deviation between the transferred positions of the alignment marks on a reference coordinate system of the film carrier and a designed position is measured, the position of the mask relative to the film carrier is adjusted, and the mask pattern is transferred to the film carrier. A mask with a conductor pattern and two or more conductor pattern alignment marks used for executing the above-mentioned method is also disclosed. In addition, a film carrier in which two or more conductor pattern alignment marks for film are transferred to the surface of a conductor layer in addition to the conductor pattern is also disclosed.
摘要翻译：一种用于将导体图案转印到用于在其上安装电子部件的胶片载体的方法，其中通过使用具有导体图案的掩模和两个或多个导体图案对准标记，将掩模图案预先转印到涂覆有光致抗蚀剂的胶片载体上，测量胶片载体的基准坐标系上的对准标记的转印位置与设计位置之间的偏差，调整掩模相对于胶片载体的位置，并将掩模图案转印到胶片载体上。还公开了具有导体图案的掩模和用于执行上述方法的两个或多个导体图案对准标记。此外，还公开了除了导体图案之外还将两个或更多个用于膜的导体图案对准标记转印到导体层的表面的膜载体。

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