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1. 发明授权

US5926203A Image recording method and apparatus using multiple laser beams 失效
标题翻译：使用多个激光束的图像记录方法和装置
公开(公告)号：US5926203A
公开(公告)日：1999-07-20
申请号：US751732
申请日：1996-11-18
申请人： Akira Shimura , Shuichi Yamazaki , Tomohiro Nakajima , Masaki Narita
发明人： Akira Shimura , Shuichi Yamazaki , Tomohiro Nakajima , Masaki Narita
IPC分类号： B41J2/44 , B41J2/47 , G03G21/00 , G03G21/14 , G06K15/12 , H04N1/113 , B41J2/45 , B41J2/435
CPC分类号： G06K15/1261 , B41J2/473
摘要： A method and apparatus that prevent degradation of an image quality due to a change of a beam pitch in a subscanning direction of each optical beam on a record medium. At a given time, for example, when power is first turned on, a CPU detects a beam pitch on a record medium, e.g., a photosensitive drum, by using a CCD line image sensor. If the detected value differs from a value set according to a currently-selected scanning density, an LD arrangement change motor is rotated via a motor driver so that the beam pitch matches the set value so as to change an arrangement of laser diodes in a laser diode array. Control over the beam pitch occurs for a variety of conditions including control at regular intervals, power-on events, or when a scanning density specification signal indicates a different beam pitch than the detected beam pitch. Similarly, adjustment over the beam pitch is not typically made during a copying operation.
摘要翻译：一种防止由于每个光束在记录介质上的副扫描方向上的光束间距变化引起的图像质量劣化的方法和装置。在给定的时间，例如，当电源首次打开时，CPU通过使用CCD线图像传感器来检测诸如感光鼓的记录介质上的光束间距。如果检测值与根据当前选择的扫描浓度设定的值不同，则通过马达驱动器旋转LD布置改变马达，使得波束间距与设定值匹配，以便改变激光器中的激光二极管的布置二极管阵列。波束间距的控制发生在各种条件下，包括规则间隔的控制，上电事件，或当扫描浓度指示信号表示与检测的光束间距不同的光束间距时。类似地，在复印操作期间通常不会对光束间距进行调整。

2. 发明授权

US5786594A Multi-beam pitch adjustment system and method 失效
标题翻译：多光束调谐系统及方法
公开(公告)号：US5786594A
公开(公告)日：1998-07-28
申请号：US786203
申请日：1997-01-21
申请人： Tatsuya Ito , Tomohiro Nakajima , Katsumi Yamaguchi , Akira Shimura , Masaki Narita , Shuichi Yamazaki , Satoru Ito
发明人： Tatsuya Ito , Tomohiro Nakajima , Katsumi Yamaguchi , Akira Shimura , Masaki Narita , Shuichi Yamazaki , Satoru Ito
IPC分类号： B41J2/47 , G02B26/12 , H04N1/113 , H04N1/12 , H04N1/191 , H04N1/36
CPC分类号： H04N1/1916 , B41J2/473 , G02B26/123 , H04N1/1911 , H04N1/1135 , H04N1/12
摘要： The current disclosure discloses methods of and systems for automatically adjusting or selecting a pitch between beams in a multi-beam scanning system. An array of light sources is mounted on a rotatable housing and emits light in a direction perpendicular to the rotational plane. The system or method measures a pitch on or near an intermediate image-forming surface. In response to the measured pitch, the scanning as well as sub-scanning pitch is automatically adjusted or selected by rotating a housing unit to maintain a desired pitch.
摘要翻译：本公开公开了一种用于在多光束扫描系统中自动调节或选择光束间距的方法和系统。光源阵列安装在可旋转外壳上，并沿与旋转平面垂直的方向发光。该系统或方法测量中间图像形成表面上或附近的间距。响应于测量的间距，通过旋转壳体单元以保持期望的间距来自动调整或选择扫描以及副扫描间距。

3. 发明授权

US5753907A Multiple beam scanning apparatus 失效
标题翻译：多光束扫描装置
公开(公告)号：US5753907A
公开(公告)日：1998-05-19
申请号：US653694
申请日：1996-05-23
申请人： Tomohiro Nakajima , Masaki Narita , Akira Shimura , Shuichi Yamazaki
发明人： Tomohiro Nakajima , Masaki Narita , Akira Shimura , Shuichi Yamazaki
IPC分类号： G02B26/12 , H04N1/113 , H04N1/191 , G01D9/42 , H01J3/14
CPC分类号： H04N1/1911 , B41J2/473 , G02B26/123 , H01S5/02212 , H01S5/4012 , H04N1/1135
摘要： A multiple beam scanning apparatus in which a plurality of light beams are repeatedly scanned at the same time, including a light source unit defining an optical axis and including plural laser diodes, collimator lenses for respectively converting light beams emitted by the laser diodes to respective parallel light fluxes, and a beam composing unit for superposing the light beams and emitting the superposed light beams therefrom. The light source unit is rotatively adjustable around the optical axis and is constructed such that respective light fluxes emitted from the beam composing unit are emitted with predetermined respective different angles at least in a main scanning direction.
摘要翻译：一种多光束扫描装置，其中同时重复扫描多个光束，包括限定光轴的光源单元，并且包括多个激光二极管，准直透镜，用于将激光二极管发射的光束分别转换为各自的平行光束和用于叠加光束并从其发射叠加的光束的光束组合单元。光源单元围绕光轴可旋转地调节，并且被构造成使得从光束组合单元发射的各个光束至少在主扫描方向上以预定的各个不同的角度发射。

4. 发明申请

US20060137988A1 Semiconductor manufacturing apparatus and manufacturing method of semiconductor device 审中-公开
标题翻译：半导体制造装置及半导体装置的制造方法
公开(公告)号：US20060137988A1
公开(公告)日：2006-06-29
申请号：US11080944
申请日：2005-03-16
申请人： Katsunori Yahashi , Keiichi Takenaka , Masaki Narita , Itsuko Sakai
发明人： Katsunori Yahashi , Keiichi Takenaka , Masaki Narita , Itsuko Sakai
IPC分类号： C25D21/12
CPC分类号： H01J37/32642 , H01J37/32935 , H01L21/67748 , H01L21/681
摘要： According to an aspect of the present invention, a semiconductor manufacturing apparatus, including: a treatment chamber configured to house a substrate; an electrode which is disposed in said treatment chamber and on which the substrate is placed; a robot arm configured to convey the substrate to said electrode; and a sensor configured to detect a detection pattern of a focus ring which is disposed on an outer peripheral edge portion of said electrode, surrounds an peripheral edge of the substrate placed on said electrode and has the detection pattern, wherein clearance between the substrate and the focus ring is adjusted based on detection result of said sensor, is provided.
摘要翻译：根据本发明的一个方面，一种半导体制造装置，包括：处理室，其构造成容纳基板; 电极，设置在所述处理室中，所述基板被放置在所述电极上; 机器人臂构造成将所述基板传送到所述电极; 以及传感器，被配置为检测设置在所述电极的外周边缘部分上的聚焦环的检测图案，所述传感器包围放置在所述电极上的所述基板的周缘，并具有所述检测图案，其中，所述基板和提供了基于所述传感器的检测结果来调整聚焦环的方法。

5. 发明授权

US06989073B2 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge 失效
公开(公告)号：US06989073B2
公开(公告)日：2006-01-24
申请号：US10742881
申请日：2003-12-23
申请人： Takanori Matsumoto , Satoshi Shimonishi , Fumio Sato , Masaki Narita
发明人： Takanori Matsumoto , Satoshi Shimonishi , Fumio Sato , Masaki Narita
IPC分类号： H01L21/306
CPC分类号： H01J37/32082
摘要： A semiconductor device manufacturing system has a vacuum chamber which is provided with a cathode electrode for holding a substrate to be processed and into which a reactive gas for generating discharging plasma by the application of a high-frequency electric power is introduced, a measuring circuit which measures at least one of the impedance of a system including the plasma, the peak-to-peak voltage of a high-frequency signal applied to the plasma, and a self-bias voltage applied to the cathode electrode, and a sense circuit which compares the measured value from the measuring circuit with previously prepared data and senses the change of processing characteristics with time for the substrate in using the discharging plasma or the cleaning time of the inside of the vacuum chamber.

6. 发明授权

US6014963A Method and apparatus for controlling the air-fuel ratio in an internal combustion engine 有权
标题翻译：用于控制内燃机中的空燃比的方法和装置
公开(公告)号：US6014963A
公开(公告)日：2000-01-18
申请号：US203847
申请日：1998-12-02
申请人： Masaki Narita
发明人： Masaki Narita
IPC分类号： F02D45/00 , F02D41/14 , F02D41/00
CPC分类号： F02D41/2454 , F02D41/2445 , F02D41/2448
摘要： A method and apparatus for controlling the air-fuel ratio in an internal combustion engine wherein, when the operating condition of the internal combustion engine has shifted between learning zones, a learning control updates a correction value after the shift is made in accordance with a stand-by function of a control unit to reduce the occurrence of mislearning, perform the correction value updating learning control efficiently and effect the purification of exhaust gases. In the air-fuel ratio controlling method for the internal combustion engine, when the operating condition of the engine has shifted between learning zones, a learning control updates a correction value in accordance with a stand-by function. In the air-fuel ratio controlling apparatus for the internal combustion engine, a stand-by function is added to the control unit so that, when the operating condition of the engine has shifted between learning zones, a learning control for updating a correction value after the shift is conducted in a delayed manner in accordance with a preset wait count. Further, a stand-by function is added to the control unit so that the correction value updates learning control after the shift is performed, in a delayed manner in accordance with a preset wait time.
摘要翻译：一种用于控制内燃机中的空燃比的方法和装置，其中，当所述内燃机的运行状态在学习区之间移动时，学习控制在根据支架进行换档之后更新校正值 - 通过控制单元的功能来减少误学的发生，有效地执行校正值更新学习控制并且实现废气的净化。在内燃机的空燃比控制方法中，当发动机的运转状态在学习区域之间移动时，学习控制根据待机功能更新校正值。在内燃机的空燃比控制装置中，向控制单元添加备用功能，使得当发动机的运转状态在学习区域之间移动时，用于更新校正值之后的校正值的学习控制根据预设的等待计数，以延迟的方式进行移位。此外，将备用功能添加到控制单元，使得校正值根据预设的等待时间以延迟的方式更新移位之后的学习控制。

7. 发明授权

US5610724A Image forming system 失效
标题翻译：图像形成系统
公开(公告)号：US5610724A
公开(公告)日：1997-03-11
申请号：US490011
申请日：1995-06-13
申请人： Masaru Kaneko , Shigeru Yamazaki , Akihiko Motegi , Masaki Narita , Hiroshi Komai
发明人： Masaru Kaneko , Shigeru Yamazaki , Akihiko Motegi , Masaki Narita , Hiroshi Komai
IPC分类号： B65H39/11 , B41J13/10 , B65H31/24 , G03G15/00 , G06F3/12 , G06K15/00 , G03G21/00
CPC分类号： G03G15/6538 , B41J13/106 , G06K15/00 , B65H2407/33 , G03G2215/00907 , G03G2215/00911 , G06K2215/0082
摘要： In an image forming system, an image forming apparatus with an optional main box having a plurality of bins prevents the cover of each bin from being locked in its closed position unless papers output to all the bins are taken out. Hence, all the bins are empty when they are used later, and can be used by any users. This implements a mail box which can be efficiently used by many users.
摘要翻译：在图像形成系统中，具有多个箱的可选主箱的图像形成装置防止每个仓的盖被锁定在其关闭位置，除非输出到所有箱的纸被取出。因此，当以后使用时，所有的空箱都是空的，可以由任何用户使用。这实现了一个可以被许多用户有效使用的邮箱。

8. 发明申请

US20060128093A1 Method of manufacturing semiconductor device 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：US20060128093A1
公开(公告)日：2006-06-15
申请号：US11105465
申请日：2005-04-14
申请人： Keiichi Takenaka , Katsunori Yahashi , Itsuko Sakai , Masaki Narita
发明人： Keiichi Takenaka , Katsunori Yahashi , Itsuko Sakai , Masaki Narita
IPC分类号： H01L21/8242
CPC分类号： H01L27/1087 , H01L29/945
摘要： A method of manufacturing a semiconductor device is provided. The method comprises forming a mask member on a surface of a semiconductor substrate; and forming a trench in the semiconductor substrate by selectively etching the semiconductor substrate with a mask of the mask member under a certain pressure. The pressure is changed on arrival of (Etching Depth)/(Aperture Width in said surface) at 30 or more for the remainder of the etching by a factor ranging from 1/2 to 9/10 relative to the pressure at the time of the arrival.
摘要翻译：提供一种制造半导体器件的方法。该方法包括在半导体衬底的表面上形成掩模构件; 以及通过在一定压力下用掩模构件的掩模选择性地蚀刻半导体衬底，在半导体衬底中形成沟槽。在蚀刻的其余部分（蚀刻深度）/（所述表面的孔径宽度）为30度以上时，压力变化为相对于到达。

9. 发明授权

US06911398B2 Method of sequentially processing a plurality of lots each including semiconductor substrates 失效
标题翻译：顺序处理包括半导体衬底的多个批次的方法
公开(公告)号：US06911398B2
公开(公告)日：2005-06-28
申请号：US10107434
申请日：2002-03-28
申请人： Masaki Narita , Katsuya Okumura , Tokuhisa Ohiwa
发明人： Masaki Narita , Katsuya Okumura , Tokuhisa Ohiwa
IPC分类号： H01L21/302 , H01L21/00 , H01L21/205 , H01L21/304 , H01L21/3065 , H01L21/66
CPC分类号： H01L21/67271 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method of making a semiconductor device, comprises preparing a plurality of lots each including semiconductor substrates to be processed, the plurality of lots including at least first and second lots, processing the plurality of lots for every one lot, using a semiconductor manufacturing apparatus, judging whether or not the semiconductor manufacturing apparatus is subjected to cleaning before the second lot is processed, depending upon both a first processing type of the first lot to be processed and a second processing type of the second lot to be processed after the first lot, and processing the second lot without the cleaning in the case where the second lot does not require the cleaning.
摘要翻译：一种制造半导体器件的方法，包括制备多个批次，每个批次包括要处理的半导体衬底，所述多个批次至少包括第一批次和第二批次，使用半导体制造装置处理每批的多个批次，根据第一批次的待处理的第一处理类型和第一批次之后的待处理的第二批次的第二处理类型，判断半导体制造装置是否在处理第二批次之前进行清洁，并且在第二批次不需要清洁的情况下处理第二批而不进行清洁。

10. 发明授权

US06685797B2 Semiconductor device manufacturing system for etching a semiconductor by plasma discharge 失效
公开(公告)号：US06685797B2
公开(公告)日：2004-02-03
申请号：US09527681
申请日：2000-03-17
申请人： Takanori Matsumoto , Satoshi Shimonishi , Fumio Sato , Masaki Narita
发明人： Takanori Matsumoto , Satoshi Shimonishi , Fumio Sato , Masaki Narita
IPC分类号： H05H100
CPC分类号： H01J37/32082
摘要： A semiconductor device manufacturing system has a vacuum chamber which is provided with a cathode electrode for holding a substrate to be processed and into which a reactive gas for generating discharging plasma by the application of a high-frequency electric power is introduced, a measuring circuit which measures at least one of the impedance of a system including the plasma, the peak-to-peak voltage of a high-frequency signal applied to the plasma, and a self-bias voltage applied to the cathode electrode, and a sense circuit which compares the measured value from the measuring circuit with previously prepared data and senses the change of processing characteristics with time for the substrate in using the discharging plasma or the cleaning time of the inside of the vacuum chamber.

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