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    • 3. 发明授权
    • Formulations with unexpected cleaning performance incorporating a biodegradable chelant
    • 具有意想不到的清洁性能的配方,包含可生物降解的螯合剂
    • US08080508B2
    • 2011-12-20
    • US13190553
    • 2011-07-26
    • Druce K. CrumpDavid A. Wilson
    • Druce K. CrumpDavid A. Wilson
    • C11D1/02C11D1/66C11D1/62C11D3/20B08B3/04
    • C11D3/33C02F1/683C02F5/12C02F2101/20C02F2209/02C02F2305/04C11D3/046
    • A chelating composition suitable for low-temperature use or storage is disclosed. The chelating compositions include 20 to 70 wt. percent of a polar solvent and 30 to 80 wt. percent of a first component of the formula: wherein R is a hydroxyalkyl group and each R′ is individually selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups, carbonyl-containing alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; R″ is selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups; carbonyl-substituted alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; M1 and M2 are alkali metal ions, wherein the M1 has a higher atomic weight than M2; wherein x+y=n and the mole fraction of M1 is greater than 0.70 to 1. Methods of suppressing crystallization and methods of cleaning surfaces employing the compositions described herein are also disclosed.
    • 公开了适用于低温使用或储存的螯合组合物。 螯合组合物包含20至70wt。 极性溶剂的百分比和30至80wt。 百分数的下式的第一组分:其中R是羟烷基,每个R'分别选自氢,未取代或惰性取代的烷基,含羰基的烷基,含羧酸的烷基,羟基烷基 和烷氧基; R“选自氢,未取代或惰性取代的烷基; 羰基取代的烷基,含羧酸的烷基,羟基烷基和烷氧基; M1和M2是碱金属离子,其中M1具有比M2更高的原子量; 其中x + y = n,M1的摩尔分数大于0.70至1.还公开了使用本文所述的组合物抑制结晶的方法和清洁表面的方法。
    • 4. 发明授权
    • Formulations with unexpected cleaning performance incorporating a biodegradable chelant
    • 具有意想不到的清洁性能的配方,包含可生物降解的螯合剂
    • US08034756B2
    • 2011-10-11
    • US12297386
    • 2007-04-03
    • Druce K. CrumpDavid A. Wilson
    • Druce K. CrumpDavid A. Wilson
    • C11D7/26C11D7/32C11D7/10
    • C11D3/33C02F1/683C02F5/12C02F2101/20C02F2209/02C02F2305/04C11D3/046
    • A chelating composition suitable for low-temperature use or storage is disclosed. The chelating compositions include 20 to 70 wt. percent of a polar solvent and 30 to 80 wt. percent of a first component of the formula: (I) wherein R is a hydroxyalkyl group and each R′ is individually selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups, carbonyl-containing alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; R″ is selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups; carbonyl-substituted alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; M1 and M2 are alkali metal ions, wherein the M1 has a higher atomic weight than M2; wherein x+y=n and the mole fraction of M1 is greater than 0.70 to 1. Methods of suppressing crystallization and methods of cleaning surfaces employing the compositions described herein are also disclosed.
    • 公开了适用于低温使用或储存的螯合组合物。 螯合组合物包含20至70wt。 极性溶剂的百分比和30至80wt。 百分数的下式的第一组分:(I)其中R是羟烷基,每个R'分别选自氢,未取代或惰性取代的烷基,含羰基的烷基,含羧酸的烷基 ,羟基烷基和烷氧基; R“选自氢,未取代或惰性取代的烷基; 羰基取代的烷基,含羧酸的烷基,羟基烷基和烷氧基; M1和M2是碱金属离子,其中M1具有比M2更高的原子量; 其中x + y = n,M1的摩尔分数大于0.70至1.还公开了使用本文所述的组合物抑制结晶的方法和清洁表面的方法。
    • 9. 发明申请
    • FORMULATIONS WITH UNEXPECTED CLEANING PERFORMANCE INCORPORATING A BIODEGRADABLE CHELANT
    • 具有不可预见清洁性能的配方,包括可生物降解的连接器
    • US20110281784A1
    • 2011-11-17
    • US13190553
    • 2011-07-26
    • Druce K. CrumpDavid A. Wilson
    • Druce K. CrumpDavid A. Wilson
    • C11D3/60
    • C11D3/33C02F1/683C02F5/12C02F2101/20C02F2209/02C02F2305/04C11D3/046
    • A chelating composition suitable for low-temperature use or storage is disclosed. The chelating compositions include 20 to 70 wt. percent of a polar solvent and 30 to 80 wt. percent of a first component of the formula: wherein R is a hydroxyalkyl group and each R′ is individually selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups, carbonyl-containing alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; R″ is selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups; carbonyl-substituted alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; M1 and M2 are alkali metal ions, wherein the M1 has a higher atomic weight than M2; wherein x+y=n and the mole fraction of M1 is greater than 0.70 to 1. Methods of suppressing crystallization and methods of cleaning surfaces employing the compositions described herein are also disclosed.
    • 公开了适用于低温使用或储存的螯合组合物。 螯合组合物包含20至70wt。 极性溶剂的百分比和30至80wt。 百分数的下式的第一组分:其中R是羟烷基,每个R'分别选自氢,未取代或惰性取代的烷基,含羰基的烷基,含羧酸的烷基,羟基烷基 和烷氧基; R“选自氢,未取代或惰性取代的烷基; 羰基取代的烷基,含羧酸的烷基,羟基烷基和烷氧基; M1和M2是碱金属离子,其中M1具有比M2更高的原子量; 其中x + y = n,M1的摩尔分数大于0.70至1.还公开了使用本文所述的组合物抑制结晶的方法和清洁表面的方法。