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1. 发明申请

US20160274595A1 FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS 审中-公开
公开(公告)号：US20160274595A1
公开(公告)日：2016-09-22
申请号：US15171333
申请日：2016-06-02
申请人： Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
发明人： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
IPC分类号： G05D7/06 , G01F1/684
CPC分类号： G01F1/6847 , G01F1/363 , G01F1/40 , G01F5/005 , G01F7/005 , G05D7/0641 , G05D7/0652 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/7761 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87298 , Y10T137/87306 , Y10T137/87314 , Y10T137/87354 , Y10T137/8741 , Y10T137/87499 , Y10T137/87539 , Y10T137/87684
摘要： A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m(P1−P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.

2. 发明申请

US20130220451A1 FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS 有权
标题翻译：流量范围可变型流量控制装置
公开(公告)号：US20130220451A1
公开(公告)日：2013-08-29
申请号：US13763178
申请日：2013-02-08
申请人： Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
发明人： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
IPC分类号： G05D7/06
CPC分类号： G05D7/0641 , G01F1/363 , G01F1/6842 , G01F1/6847 , G01F5/005 , G01F7/005 , G05D7/0635 , G05D7/0647 , G05D23/1927 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87314 , Y10T137/8741 , Y10T137/87499 , Y10T137/87684
摘要： A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1−P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
摘要翻译：提供一种压力式流量控制装置，其中通过孔口的流体流量计算为Qc = KP1（其中K是比例常数）或Qc = KP2m（P1-P2）n（其中K是比例常数，m和n常数）通过使用孔口上游侧压力P1和/或孔口下游侧压力P2。控制阀的下游侧和压力式流量控制装置的流体供给管之间的流体通道平行地包括至少2个流体通道，并且为每个这些流体通道设置具有不同流量特性的孔，其中小流量区域中的流体流向一个孔，用于在小流量区域中的流体的流量控制，而大流量区域中的流体流向另一个孔口，用于大流量区域中的流体的流量控制。

3. 发明授权

US09383758B2 Flow rate range variable type flow rate control apparatus 有权
公开(公告)号：US09383758B2
公开(公告)日：2016-07-05
申请号：US14977162
申请日：2015-12-21
申请人： Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
发明人： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
IPC分类号： G05D7/06 , G01F1/684
CPC分类号： G01F1/6847 , G01F1/363 , G01F1/40 , G01F5/005 , G01F7/005 , G05D7/005 , G05D7/0641 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/7761 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87298 , Y10T137/87306 , Y10T137/87314 , Y10T137/87354 , Y10T137/8741 , Y10T137/87499 , Y10T137/87539 , Y10T137/87684
摘要： A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m(P1−P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.

4. 发明授权

US09921089B2 Flow rate range variable type flow rate control apparatus 有权
公开(公告)号：US09921089B2
公开(公告)日：2018-03-20
申请号：US15171333
申请日：2016-06-02
申请人： Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
发明人： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
IPC分类号： G05D7/06 , G01F1/684 , G01F1/36 , G01F5/00 , G01F7/00 , G01F1/40
CPC分类号： G01F1/6847 , G01F1/363 , G01F1/40 , G01F5/005 , G01F7/005 , G05D7/0641 , G05D7/0652 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/7761 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87298 , Y10T137/87306 , Y10T137/87314 , Y10T137/87354 , Y10T137/8741 , Y10T137/87499 , Y10T137/87539 , Y10T137/87684
摘要： A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1-P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.

5. 发明申请

US20160109886A1 FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS 审中-公开
标题翻译：流量范围可变型流量控制装置
公开(公告)号：US20160109886A1
公开(公告)日：2016-04-21
申请号：US14977162
申请日：2015-12-21
申请人： Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
发明人： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
IPC分类号： G05D7/06 , G01F1/684
CPC分类号： G01F1/6847 , G01F1/363 , G01F1/40 , G01F5/005 , G01F7/005 , G05D7/005 , G05D7/0641 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/7761 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87298 , Y10T137/87306 , Y10T137/87314 , Y10T137/87354 , Y10T137/8741 , Y10T137/87499 , Y10T137/87539 , Y10T137/87684
摘要： A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m(P1−P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
摘要翻译：提供一种压力式流量控制装置，其中通过孔口的流体流量计算为Qc = KP1（其中K是比例常数）或Qc = KP2m（P1-P2）n（其中K是比例常数，m和n常数）通过使用孔口上游侧压力P1和/或孔口下游侧压力P2。控制阀的下游侧和压力式流量控制装置的流体供给管之间的流体通道平行地包括至少2个流体通道，并且为每个这些流体通道设置具有不同流量特性的孔，其中小流量区域中的流体流向一个孔，用于在小流量区域中的流体的流量控制，而大流量区域中的流体流向另一个孔口，用于大流量区域中的流体的流量控制。

6. 发明申请

US20150160662A1 FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS 审中-公开
标题翻译：流量范围可变型流量控制装置
公开(公告)号：US20150160662A1
公开(公告)日：2015-06-11
申请号：US14626128
申请日：2015-02-19
申请人： Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
发明人： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
IPC分类号： G05D7/06 , G05D23/19
CPC分类号： G05D7/0641 , G01F1/363 , G01F1/6842 , G01F1/6847 , G01F5/005 , G01F7/005 , G05D7/0635 , G05D7/0647 , G05D23/1927 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87314 , Y10T137/8741 , Y10T137/87499 , Y10T137/87684
摘要： A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1−P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
摘要翻译：提供一种压力式流量控制装置，其中通过孔口的流体流量计算为Qc = KP1（其中K是比例常数）或Qc = KP2m（P1-P2）n（其中K是比例常数，m和n常数）通过使用孔口上游侧压力P1和/或孔口下游侧压力P2。控制阀的下游侧和压力式流量控制装置的流体供给管之间的流体通道平行地包括至少2个流体通道，并且为每个这些流体通道设置具有不同流量特性的孔，其中小流量区域中的流体流向一个孔，用于在小流量区域中的流体的流量控制，而大流量区域中的流体流向另一个孔口，用于大流量区域中的流体的流量控制。

7. 发明授权

US09010369B2 Flow rate range variable type flow rate control apparatus 有权
标题翻译：流量范围可变型流量控制装置
公开(公告)号：US09010369B2
公开(公告)日：2015-04-21
申请号：US13763178
申请日：2013-02-08
申请人： Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
发明人： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
IPC分类号： G05D7/06 , G01F1/36 , G01F1/684 , G01F5/00 , G01F7/00
CPC分类号： G05D7/0641 , G01F1/363 , G01F1/6842 , G01F1/6847 , G01F5/005 , G01F7/005 , G05D7/0635 , G05D7/0647 , G05D23/1927 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87314 , Y10T137/8741 , Y10T137/87499 , Y10T137/87684
摘要： A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1−P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
摘要翻译：提供一种压力式流量控制装置，其中通过孔口的流体流量计算为Qc = KP1（其中K是比例常数）或Qc = KP2m（P1-P2）n（其中K是比例常数，m和n常数）通过使用孔口上游侧压力P1和/或孔口下游侧压力P2。控制阀的下游侧和压力式流量控制装置的流体供给管之间的流体通道平行地包括至少2个流体通道，并且为每个这些流体通道设置具有不同流量特性的孔，其中小流量区域中的流体流向一个孔，用于在小流量区域中的流体的流量控制，而大流量区域中的流体流向另一个孔口，用于大流量区域中的流体的流量控制。

8. 发明申请

US20140027278A1 MAGNETRON SPUTTERING APPARATUS 审中-公开
标题翻译： MAGNETRON喷射装置
公开(公告)号：US20140027278A1
公开(公告)日：2014-01-30
申请号：US14036183
申请日：2013-09-25
申请人： TOKYO ELECTRON LIMITED , NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
发明人： Tadahiro Ohmi , Tetsuya Goto , Takaaki Matsuoka
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , H01J37/3405 , H01J37/3455
摘要： A magnetron sputtering apparatus for processing a substrate includes a target holding member for holding a target installed to face the substrate and a magnet installed at a side opposite to the substrate across the target. In the magnetron sputtering apparatus, plasma is confined on a surface of the target by forming a magnetic field on the target surface by the magnet, on the target surface, a plasma loop is formed around a region on a loop where a vertical magnetic field component perpendicular to the target does not substantially exist while a horizontal magnetic field component parallel to the target mainly exists, and the horizontal magnetic field component at all position on the loop where the horizontal magnetic field mainly exists is in a range of about 500 Gauss to 1200 Gauss.
摘要翻译：用于处理基板的磁控管溅射装置包括：用于保持安装成面向基板的目标的目标保持构件和安装在穿过目标的基板的相对侧的磁体。在磁控管溅射装置中，通过在目标表面上通过磁体在目标表面上形成磁场，将等离子体限制在靶的表面上，在环上的区域周围形成等离子体环，其中垂直磁场分量主要存在垂直于目标的水平磁场分量，而主要存在于水平磁场的环路上的水平磁场分量在大约500高斯至1200的范围内高斯

9. 发明授权

US09767994B2 Shower plate sintered integrally with gas release hole member and method for manufacturing the same 有权
公开(公告)号：US09767994B2
公开(公告)日：2017-09-19
申请号：US14542793
申请日：2014-11-17
申请人： TOKYO ELECTRON LIMITED , NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
发明人： Masahiro Okesaku , Tadahiro Ohmi , Tetsuya Goto , Takaaki Matsuoka , Toshihisa Nozawa , Atsutoshi Inokuchi , Kiyotaka Ishibashi
IPC分类号： H01J37/32 , C23C16/455
CPC分类号： H01J37/3244 , C23C16/45565 , C23C16/45568 , H01J37/32192 , H01J37/32449 , H01J37/32477 , H01J37/3255
摘要： A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member having a plurality of gas release holes having a diameter of 20 μm to 70 μm, and/or a porous gas-communicating body having pores having a maximum diameter of not more than 75 μm communicating in the gas-communicating direction are sintered and bonded integrally with the inside of each of a plurality of vertical holes which act as release paths for the plasma excitation gas.

10. 发明申请

US20130112337A1 SHOWER PLATE, MANUFACTURING METHOD OF THE SHOWER PLATE, AND PLASMA PROCESSING APPARATUS USING THE SHOWER PLATE 审中-公开
标题翻译：淋浴板，淋浴板的制造方法和使用淋浴板的等离子体加工设备
公开(公告)号：US20130112337A1
公开(公告)日：2013-05-09
申请号：US13729547
申请日：2012-12-28
申请人： Tokyo Electron Limited , National University Corporation Tohoku University
发明人： Masahiro Okesaku , Tetsuya Goto , Tadahiro Ohmi , Kiyotaka Ishibashi
IPC分类号： B05B1/18
CPC分类号： B05B1/18 , C23C16/45565 , C23C16/45568 , C23C16/511 , H01J37/3244 , H01J37/32449
摘要： A manufacturing method of a shower plate includes inserting a green body, a degreasing body, a temporary sintered body or a sintered body of a ceramic member, which has a plurality of gas discharge holes or gas flow holes, into a longitudinal hole of a green body, a degreasing body or a temporary sintered body of the shower plate, which has been formed by power ingredients; and sintering them simultaneously.
摘要翻译：淋浴板的制造方法包括将具有多个排气孔或气体流通孔的陶瓷构件的生坯体，脱脂体，临时烧结体或烧结体插入绿色的纵向孔身体，脱脂体或淋浴板的临时烧结体，其由功率成分形成; 并同时烧结。

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