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1. 发明授权

US09074170B2 Copper cleaning and protection formulations 有权
标题翻译：铜清洗和保护配方
公开(公告)号：US09074170B2
公开(公告)日：2015-07-07
申请号：US13124942
申请日：2009-10-20
申请人： Jeffrey A. Barnes , Brian Benac , Karl E. Boggs , Lin Feng , Jun Liu , Melissa A. Petruska , Xiaodong Yan , Peng Zhang
发明人： Jeffrey A. Barnes , Brian Benac , Karl E. Boggs , Lin Feng , Jun Liu , Melissa A. Petruska , Xiaodong Yan , Peng Zhang
IPC分类号： C11D11/00 , C11D1/72 , C11D3/04 , C11D3/24 , C11D3/30 , C11D3/33
CPC分类号： C11D3/0073 , B08B3/08 , C11D1/72 , C11D3/042 , C11D3/2096 , C11D3/245 , C11D3/28 , C11D3/30 , C11D3/33 , C11D7/3209 , C11D7/3218 , C11D7/329 , C11D11/0047 , C23G1/20 , H01L21/02074
摘要： A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include novel corrosion inhibitors. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.
摘要翻译：一种清洁组合物和用于从具有所述残余物和污染物的微电子装置清洁后化学机械抛光（CMP）残留物和污染物的清洁组合物和方法。清洁组合物包括新的腐蚀抑制剂。该组合物可以在不影响低k电介质材料或铜互连材料的情况下从微电子器件的表面高效地清洁后CMP残留物和污染物质。

2. 发明申请

US20120283163A1 COPPER CLEANING AND PROTECTION FORMULATIONS 有权
标题翻译：铜清洁和保护制剂
公开(公告)号：US20120283163A1
公开(公告)日：2012-11-08
申请号：US13124942
申请日：2009-10-20
申请人： Jeffrey A. Barnes , Brian Benac , Karl E. Boggs , Lin Feng , Jun Liu , Melissa A. Petruska , Xiaodong Yan , Peng Zhang
发明人： Jeffrey A. Barnes , Brian Benac , Karl E. Boggs , Lin Feng , Jun Liu , Melissa A. Petruska , Xiaodong Yan , Peng Zhang
IPC分类号： C11D7/60
CPC分类号： C11D3/0073 , B08B3/08 , C11D1/72 , C11D3/042 , C11D3/2096 , C11D3/245 , C11D3/28 , C11D3/30 , C11D3/33 , C11D7/3209 , C11D7/3218 , C11D7/329 , C11D11/0047 , C23G1/20 , H01L21/02074
摘要： A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include novel corrosion inhibitors. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.
摘要翻译：一种清洁组合物和用于从具有所述残余物和污染物的微电子装置清洁后化学机械抛光（CMP）残留物和污染物的清洁组合物和方法。清洁组合物包括新的腐蚀抑制剂。该组合物可以在不影响低k电介质材料或铜互连材料的情况下从微电子器件的表面高效地清洁后CMP残留物和污染物质。

3. 发明申请

US20100087065A1 STABILIZATION OF POLYMER-SILICA DISPERSIONS FOR CHEMICAL MECHANICAL POLISHING SLURRY APPLICATIONS 审中-公开
标题翻译：用于化学机械抛光浆料的聚合物二氧化硅分散体的稳定性
公开(公告)号：US20100087065A1
公开(公告)日：2010-04-08
申请号：US12525325
申请日：2008-01-31
申请人： Karl E. Boggs , Jeffrey Giles , Michael S. Darsillo , Melissa A. Petruska , Peter Wrschka
发明人： Karl E. Boggs , Jeffrey Giles , Michael S. Darsillo , Melissa A. Petruska , Peter Wrschka
IPC分类号： C09K13/00 , H01L21/461
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463
摘要： Chemical mechanical polishing (CMP) compositions and single CMP platen process for the removal of copper and barrier layer material from a microelectronic device substrate having same thereon. The process includes the in situ transformation of a copper removal CMP composition, which is used to selectively remove and planarize copper, into a barrier removal CMP composition, which is used to selectively remove barrier layer material, on a single CMP platen pad.
摘要翻译：化学机械抛光（CMP）组合物和用于从其上具有其的微电子器件衬底去除铜和阻挡层材料的单CMP压板工艺。该方法包括将铜去除CMP组合物原位转化成单层CMP压板用于选择性去除阻挡层材料的屏障去除CMP组合物，其用于选择性地去除和平坦化铜。

4. 发明申请

US20090253072A1 NANOPARTICLE REVERSIBLE CONTRAST ENHANCEMENT MATERIAL AND METHOD 审中-公开
标题翻译：纳米材料可逆对比增强材料与方法
公开(公告)号：US20090253072A1
公开(公告)日：2009-10-08
申请号：US12416805
申请日：2009-04-01
申请人： Melissa A. Petruska , Guiquan Pan , Thomas H. Baum , Karl E. Boggs
发明人： Melissa A. Petruska , Guiquan Pan , Thomas H. Baum , Karl E. Boggs
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/2022 , G03F7/0042 , G03F7/091
摘要： The invention is to a reversible photobleachable material comprised of nanoparticles of indium gallium oxide or gallium oxide, and a method of exposing a substrate, such as in semiconductor manufacture, using same.
摘要翻译：本发明涉及一种由铟镓氧化物或氧化镓的纳米颗粒构成的可逆光可漂白材料，以及使用其在半导体制造中曝光基板的方法。

5. 发明申请

US20110117751A1 NON-SELECTIVE OXIDE ETCH WET CLEAN COMPOSITION AND METHOD OF USE 审中-公开
标题翻译：非选择性氧化物蚀刻清洁组合物及其使用方法
公开(公告)号：US20110117751A1
公开(公告)日：2011-05-19
申请号：US12921262
申请日：2009-03-06
申请人： Prerna Sonthalia , Emanuel I. Cooper , David Minsek , Peng Zhang , Melissa A. Petruska , Brittany Serke , Trace Quentin Hurd
发明人： Prerna Sonthalia , Emanuel I. Cooper , David Minsek , Peng Zhang , Melissa A. Petruska , Brittany Serke , Trace Quentin Hurd
IPC分类号： H01L21/306 , C09K13/00 , C09K13/06
CPC分类号： C11D7/10 , C11D1/62 , C11D3/2044 , C11D3/2068 , C11D3/33 , C11D3/3719 , C11D7/263 , C11D7/3245 , C11D11/0047 , H01L21/02063 , H01L21/31111
摘要： Composition and method to remove undoped silicon-containing materials from microelectronic devices at rates greater than or equal to the removal of doped silicon-containing materials.
摘要翻译：从微电子器件以大于或等于去除掺杂含硅材料的速率除去未掺杂的含硅材料的组合物和方法。

6. 发明申请

US20110006269A1 SOLVENT-FREE SYNTHESIS OF SOLUBLE NANOCRYSTALS 有权
标题翻译：无溶剂合成可溶性纳米晶体
公开(公告)号：US20110006269A1
公开(公告)日：2011-01-13
申请号：US12743099
申请日：2008-11-14
申请人： Melissa A. Petruska , Guiquan Pan
发明人： Melissa A. Petruska , Guiquan Pan
IPC分类号： H01B1/02 , C01G15/00 , C01F5/06
CPC分类号： B01J13/00 , B82Y30/00 , C01B13/18 , C01F5/06 , C01G15/00 , C01P2002/72 , C01P2002/82 , C01P2002/88 , C01P2004/03 , C01P2004/04 , C01P2004/64 , Y10S516/922 , Y10S977/773 , Y10S977/84 , Y10S977/90
摘要： Methods for preparing high quality and high yields of nanocrystals, i.e., metal-oxide-based nanocrystals, using a novel solvent-free method. The nanocrystals advantageously comprise organic alkyl chain capping groups and are stable in air and in nonpolar solvents.
摘要翻译：使用新的无溶剂方法制备高质量和高产率的纳米晶体即金属氧化物基纳米晶体的方法。纳米晶体有利地包括有机烷基封端基团，并且在空气和非极性溶剂中是稳定的。

7. 发明申请

US20100317150A1 ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS 有权
标题翻译：用于金属薄膜CVD / ALD的抗反应和锗复合物
公开(公告)号：US20100317150A1
公开(公告)日：2010-12-16
申请号：US12860906
申请日：2010-08-22
申请人： William Hunks , Tianniu Chen , Chongying Xu , Jeffrey F. Roeder , Thomas H. Baum , Melissa A. Petruska , Matthias Stender , Philip S.H. Chen , Gregory T. Stauf , Bryan C. Hendrix
发明人： William Hunks , Tianniu Chen , Chongying Xu , Jeffrey F. Roeder , Thomas H. Baum , Melissa A. Petruska , Matthias Stender , Philip S.H. Chen , Gregory T. Stauf , Bryan C. Hendrix
IPC分类号： H01L21/205
CPC分类号： H01L45/1616 , C07C251/08 , C07F7/003 , C07F7/10 , C07F7/28 , C07F9/90 , C07F9/902 , C07F17/00 , C23C16/18 , C23C16/305 , H01L45/06 , H01L45/1233 , H01L45/144 , H01L45/1683
摘要： Antimony, germanium and tellurium precursors useful for CVD/ALD of corresponding metal-containing thin films are described, along with compositions including such precursors, methods of making such precursors, and films and microelectronic device products manufactured using such precursors, as well as corresponding manufacturing methods. The precursors of the invention are useful for forming germanium-antimony-tellurium (GST) films and microelectronic device products, such as phase change memory devices, including such films.
摘要翻译：描述了可用于相应的含金属薄膜的CVD / ALD的锑，锗和碲前体，以及包含这些前体的组合物，制备这些前体的方法，以及使用这种前体制备的膜和微电子器件产品，以及相应的制造方法。本发明的前体可用于形成锗 - 锑 - 碲（GST）膜和微电子器件产品，例如包括这种膜的相变存储器件。

8. 发明授权

US07723394B2 Nanocrystal/sol-gel nanocomposites 失效
标题翻译：纳米晶体/溶胶 - 凝胶纳米复合材料
公开(公告)号：US07723394B2
公开(公告)日：2010-05-25
申请号：US10715733
申请日：2003-11-17
申请人： Victor L. Klimov , Melissa A. Petruska
发明人： Victor L. Klimov , Melissa A. Petruska
IPC分类号： C08J7/00 , C08J7/16
CPC分类号： B82Y30/00 , C08K3/08 , C08K2201/011 , Y10S977/773
摘要： The present invention is directed to a process for preparing a solid composite having colloidal nanocrystals dispersed within a sol-gel matrix, the process including admixing colloidal nanocrystals with an amphiphilic polymer including hydrophilic groups selected from the group consisting of —COOH, —OH, —SO3H, —NH2, and —PO3H2 within a solvent to form an alcohol-soluble colloidal nanocrystal-polymer complex, admixing the alcohol-soluble colloidal nanocrystal-polymer complex and a sol-gel precursor material, and, forming the solid composite from the admixture. The present invention is also directed to the resultant solid composites and to the alcohol-soluble colloidal nanocrystal-polymer complexes.
摘要翻译：本发明涉及一种制备具有分散在溶胶 - 凝胶基体内的胶态纳米晶体的固体复合物的方法，该方法包括将胶态纳米晶体与包括亲水基团的两亲性聚合物混合，所述亲水基团选自-COOH，-OH， - SO 3 H，-NH 2和-PO 3 H 2在溶剂中形成醇溶性胶体纳米晶体 - 聚合物复合物，混合醇溶性胶态纳米晶体 - 聚合物复合物和溶胶 - 凝胶前体材料，并从混合物形成固体复合物。本发明还涉及所得固体复合物和醇可溶性胶体纳米晶体 - 聚合物复合物。

9. 发明申请

US20220144675A1 COMBINED VOC MITIGATING AND ANTIMICROBIAL SYSTEMS 有权
公开(公告)号：US20220144675A1
公开(公告)日：2022-05-12
申请号：US17579558
申请日：2022-01-19
申请人： Jeffrey F. Roeder , Trevor E. James , Melissa A. Petruska , Peter C. Van Burkirk , Robert T. Henderson, III
发明人： Jeffrey F. Roeder , Trevor E. James , Melissa A. Petruska , Peter C. Van Burkirk , Robert T. Henderson, III
IPC分类号： C02F1/72
摘要： Fluid purification systems employing a monolithic composite photocatalyst to remove volatile organic compounds (VOCs) and/or pathogenic organisms are disclosed. Pairing of systems tuned to abate each of these materials are discussed in different configurations such as series and parallel, as well as combining systems to target both materials simultaneously. System configurations that allow a portion of the fluid stream to be purified are also disclosed as are configurations that allow regeneration of the photocatalyst. These features may be augmented by sensors that allow closed loop control of bypass and regeneration cycles in the systems.

10. 发明申请

US20210337804A1 ANTIMICROBIAL SURFACE SYSTEMS 有权
公开(公告)号：US20210337804A1
公开(公告)日：2021-11-04
申请号：US17343723
申请日：2021-06-09
申请人： Jeffrey F. Roeder , Melissa A. Petruska , Trevor E. James , Thomas J. Spoonmore , Peter C. Van Buskirk
发明人： Jeffrey F. Roeder , Melissa A. Petruska , Trevor E. James , Thomas J. Spoonmore , Peter C. Van Buskirk
IPC分类号： A01N59/20 , A01N25/10 , A01N59/06
摘要： Polymer coatings and surfaces are disclosed with antimicrobial properties. The antimicrobial action is provided by high surface area materials contained within the coating or surface. The high surface area materials may contain photocatalysts that create reactive oxygen species upon exposure to visible light or transition metals that create reactive oxygen species upon exposure to hydrogen peroxide. The high surface area materials may also sorb disinfecting liquids and desorb them over time to provide disinfection.

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