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1. 发明申请

WO2011021709A1 OBJECT MOVING APPARATUS, OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS, OBJECT INSPECTING APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：对象移动装置，对象处理装置，曝光装置，对象检查装置和装置制造方法
公开(公告)号：WO2011021709A1
公开(公告)日：2011-02-24
申请号：PCT/JP2010/064131
申请日：2010-08-17
申请人： NIKON CORPORATION , AOKI, Yasuo , HAMADA, Tomohide , SHIRASU, Hiroshi , TOGUCHI, Manabu
发明人： AOKI, Yasuo , HAMADA, Tomohide , SHIRASU, Hiroshi , TOGUCHI, Manabu
IPC分类号： G03F7/20 , B65G49/06 , H01L21/68
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate (P) is held by adsorption by a substrate holding frame (60) that is formed into a frame shape and is lightweight, and the substrate holding frame (60) is driven along a horizontal plane by a drive unit (70) that includes a linear motor. Below the substrate holding frame (60), a plurality of air levitation units (50) are placed that support by levitation the substrate (P) in a noncontact manner such that the substrate (P) is substantially horizontal, by jetting air to the lower surface of the substrate (P). Since the plurality of air levitation units (50) cover a movement range of the substrate holding frame (60), the drive unit (70) can guide the substrate holding frame (60) (substrate (P)) along the horizontal plane at high speed and with high precision.
摘要翻译：基板（P）通过被形成为框架形状的基板保持框架（60）的吸附保持，并且重量轻，并且通过驱动单元（70）沿着水平面驱动基板保持框架（60），驱动单元包括线性马达。在基板保持框架（60）的下方，设置有多个空气悬浮单元（50），其以非接触方式悬挂基板（P），使得基板（P）基本上水平，通过将空气喷射到下部（P）的表面。由于多个空气悬浮单元（50）覆盖基板保持框架（60）的移动范围，所以驱动单元（70）可以沿着水平面在高度引导基板保持框架（60）（基板（P））速度高，精度高。

2. 发明申请

WO2012033209A1 EXPOSURE APPARATUS, MOVABLE BODY APPARATUS, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，可动体装置，平板显示制造方法及装置制造方法
公开(公告)号：WO2012033209A1
公开(公告)日：2012-03-15
申请号：PCT/JP2011/070664
申请日：2011-09-05
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20 , F16C32/04 , H02K41/035
CPC分类号： G03F7/70775 , F16C29/008 , F16C39/04 , F16C39/06 , G03F7/70716 , G03F7/70816 , G03F7/709 , H02K7/09 , H02K16/00 , H02K41/031 , H02K2201/18
摘要： In a substrate stage (PST), when a Y coarse movement stage (23Y) moves in the Y-axis direction, an X coarse movement stage (23X), a weight cancellation device (40), and an X guide (102) move integrally in the Y-axis direction with the Y coarse movement stage (23Y), and when the X coarse movement stage (23X) moves in the X-axis direction on the Y coarse movement stage (23Y), the weight cancellation device (40) moves on the X guide (102) in the X-axis direction integrally with the X coarse movement stage (23X). Because the X guide (102) is provided extending in the X-axis direction while covering the movement range of the weight cancellation device (40) in the X-axis direction, the weight cancellation device (40) is constantly supported by the X guide (102), regardless of its position.
摘要翻译：在基板台（PST）中，当Y粗移动台（23Y）在Y轴方向上移动时，X粗移动台（23X），重量抵消装置（40）和X导向件（102）移动与Y粗移动台（23Y）一体地沿Y轴方向成一体，当X粗移动台（23X）在Y粗动台（23Y）上沿X轴方向移动时，重量抵消装置（40Y））与X粗动部（23X）一体地沿着X轴方向在X导向件（102）上移动。由于X引导件（102）在X轴方向上延伸，同时覆盖重量消除装置（40）在X轴方向上的移动范围，所以重量抵消装置（40）由X导轨（102），不管其位置如何。

3. 发明申请

WO2010101267A1 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体装置，曝光装置和装置制造方法
公开(公告)号：WO2010101267A1
公开(公告)日：2010-09-10
申请号：PCT/JP2010/053715
申请日：2010-03-02
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20 , H01L21/68
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70791
摘要： In a liquid crystal exposure apparatus, base pads (72A, 72B) are respectively placed on two surface plates (12A, 12B), and one step board (71) is supported by the base pads (72A, 72B). A device main body (60) of an empty-weight cancelling device (40) moves from above one (12A) of the surface plates to above the other (12B) (or in a direction opposite thereto) by moving on the step board (71), and therefore, a boundary section between the adjacent surface plates (12A, 12B) that are separately placed does not function as a guide surface used when the empty-weight cancelling device (40) moves. Accordingly, a fine movement stage (21) that holds a substrate (P) can be guided along an XY plane with high accuracy although the two surface plates (12A, 12B) are placed apart.
摘要翻译：在液晶曝光装置中，基板（72A，72B）分别放置在两个表面板（12A，12B）上，一个台板（71）被基座（72A，72B）支撑。空重物抵消装置（40）的装置主体（60）通过在台阶板上移动而从一个（12A）的表面板上方移动到另一个（12B）上方（或与其相反的方向） 71），因此，分开放置的相邻的平板（12A，12B）之间的边界部分不起到当空重量取消装置（40）移动时使用的引导表面的作用。因此，尽管两个表面板（12A，12B）分开，但是可以高精度地沿着XY平面来引导保持基板（P）的精细移动台（21）。

4. 发明申请

WO2012036252A1 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND OBJECT EXCHANGE METHOD 审中-公开
标题翻译：可移动身体装置，曝光装置，装置制造方法，平板显示制造方法和对象交换方法
公开(公告)号：WO2012036252A1
公开(公告)日：2012-03-22
申请号：PCT/JP2011/071171
申请日：2011-09-12
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20 , H01L21/677
CPC分类号： G03F7/7075 , G03F7/70791
摘要： On a +X side of a first air floating unit (69) which supports a substrate (Pa) subject to carry-out, a second air floating unit (70) which supports a substrate (Pb) subject to carry-in is placed, and a third air floating unit (75) is placed tilted in a θy direction below the second air floating unit (70). After the first air floating unit (69) has been tilted in the θy direction in accordance with the third air floating unit (75) and the substrate (Pa) has been carried from above the first air floating unit (69) onto the third air floating unit (75), the first air floating unit (69) is made horizontal and the substrate (Pb) is carried from above the second air floating unit (70) onto the first air floating unit (69). More specifically, a carry-in path and a carry-out path of the substrate with respect to the first air floating unit (69) are different.
摘要翻译：在支承被承载的基板（Pa）的第一空气浮动单元（69）的+ X侧，放置支承被承载的基板（Pb）的第二空气浮动单元（70）并且第三空气浮动单元（75）在第二空气浮动单元（70）的下方向倾斜方向倾斜放置。在第一空气浮动单元（69）根据第三空气浮动单元（75）沿着y方向倾斜并且基板（Pa）已经从第一空气浮动单元（69）的上方运送到第三空气浮动单元空气浮动单元（75），第一空气浮动单元（69）被制成水平面，并且将基板（Pb）从第二空气浮动单元（70）的上方运送到第一空气浮动单元（69）上。更具体地，基板相对于第一空气浮动单元（69）的进入路径和进出路径是不同的。

5. 发明申请

WO2011021711A1 OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：对象处理装置，曝光装置和曝光方法及装置制造方法
公开(公告)号：WO2011021711A1
公开(公告)日：2011-02-24
申请号：PCT/JP2010/064134
申请日：2010-08-17
申请人： NIKON CORPORATION , AOKI, Yasuo , HAMADA, Tomohide , SHIRASU, Hiroshi , TOGUCHI, Manabu
发明人： AOKI, Yasuo , HAMADA, Tomohide , SHIRASU, Hiroshi , TOGUCHI, Manabu
IPC分类号： G03F7/20 , B65G49/06 , H01L21/68
CPC分类号： G03F7/70716 , B65G49/065 , B65G2249/04 , G03F7/70791 , G03F7/70816 , H01L21/68 , H01L21/6838 , Y10T29/49998
摘要： A plurality of air levitation units (50) that jet air to the lower surface of a substrate (P) are placed below the substrate (P), and the substrate (P) is supported in a noncontact manner so as to be substantially horizontal. Further, a portion subject to exposure of the substrate (P) is held by a fixed-point stage (40) from below in a noncontact manner, and the surface position of the portion subject to exposure is adjusted in a pinpoint manner. Accordingly, exposure can be performed on the substrate (P) with high precision, and a configuration of a substrate stage device (PST) can be simplified.
摘要翻译：将空气喷射到基板（P）的下表面的多个空气悬浮单元（50）放置在基板（P）的下方，基板（P）以非接触方式被支撑为基本水平。此外，由基板（P）曝光的部分以非接触方式从下方由定点台（40）保持，并且以精确的方式调整曝光部分的表面位置。因此，可以高精度地对基板（P）进行曝光，并且可以简化基板台装置（PST）的构造。

6. 发明申请

WO2012033212A1 MOVABLE BODY APPARATUS, OBJECT PROCESSING DEVICE, EXPOSURE APPARATUS, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体装置，对象处理装置，曝光装置，平板显示制造方法和装置制造方法
公开(公告)号：WO2012033212A1
公开(公告)日：2012-03-15
申请号：PCT/JP2011/070667
申请日：2011-09-05
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/70716
摘要： By a substrate support member (60) moving in predetermined strokes in a scanning direction on a Y step surface plate (20), a substrate (P) held by the substrate support member (60) moves in the scanning direction in predetermined strokes in a state supported from below by an air floating device (59). Further, because a Y step guide (50) having the air floating device (59) moves in a cross-scan direction along with the substrate holding member (60), the substrate (P) can be moved optionally in the scanning direction, and/or in the cross-scan direction. In doing so, because the Y step surface plate (20) moves in the cross-scan direction with the substrate support member (60) and the Y step guide (50), the substrate support member (60) is constantly supported by the Y step surface plate (20).
摘要翻译：通过在Y台阶（20）上沿扫描方向以预定行程移动的基板支撑构件（60），由基板支撑构件（60）保持的基板（P）在预定的行程中沿扫描方向移动状态由空气浮动装置（59）从下方支撑。此外，由于具有空气浮动装置（59）的Y台阶引导件（50）与基板保持部件（60）一起沿横向扫描方向移动，所以可以在扫描方向上任意地移动基板（P），并且 /或在横扫方向。在这样做的同时，由于Y台阶面板（20）在基板支撑部件（60）和Y台阶引导件（50）的横向扫描方向上移动，基板支撑部件（60）由Y 台阶板（20）。

7. 发明申请

WO2012033211A1 MOVABLE BODY APPARATUS, OBJECT PROCESSING DEVICE, EXPOSURE APPARATUS, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体装置，对象处理装置，曝光装置，平板显示制造方法和装置制造方法
公开(公告)号：WO2012033211A1
公开(公告)日：2012-03-15
申请号：PCT/JP2011/070666
申请日：2011-09-05
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20 , F16C29/02 , H01L21/67 , H01L21/683
CPC分类号： G03F7/709 , F16C29/008 , F16C29/025 , G03F7/70716
摘要： In a substrate stage device (PST), a substrate (P) is held by a substrate support member (60) mounted on a Y step surface plate (50). The substrate support member (60) moves in the scanning direction in long strokes on the Y step surface plate (50). The part corresponding to an exposure area (IA) of the substrate (P) is held by suction in a non-contact manner from below by a fixed point stage (80), and other parts are supported by levitation by the plurality of air floating devices (70) placed on the Y step surface plate (50). The part corresponding to the exposure area (IA) of the substrate (P) is controlled so that surface position of the substrate (P) is located in the depth of focus of the projection optical system by the fixed point stage (80).
摘要翻译：在衬底载台装置（PST）中，衬底（P）由安装在Y台阶表面板（50）上的衬底支撑构件（60）保持。基板支撑构件（60）在Y台阶面板（50）上以长行程沿扫描方向移动。对应于基板（P）的曝光区域（IA）的部分通过固定点台（80）从下方以非接触的方式由吸力保持，并且其它部分由悬浮的多个空气支撑装置（70）放置在Y台阶面板（50）上。控制与基板（P）的曝光区域（IA）对应的部分，使得基板（P）的表面位置由定点台（80）位于投影光学系统的焦深位置。

8. 发明申请

WO2011122354A2 EXPOSURE APPARATUS, EXCHANGE METHOD OF OBJECT, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，物体交换方法，曝光方法及装置制造方法
公开(公告)号：WO2011122354A2
公开(公告)日：2011-10-06
申请号：PCT/JP2011/056318
申请日：2011-03-10
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20
CPC分类号： G03F7/7075 , B65G49/064 , G03F7/70791 , H01L21/67748
摘要： A first carrier unit (50a) carries out a substrate tray (90a) that supports a substrate (Pa) from below from a substrate holder (22) by sliding the substrate tray in one axis direction (Y-axis direction) parallel to the substrate surface. Meanwhile, a second carrier unit (50b) carries in a substrate tray (90b) that supports a substrate (Pb) from below onto the substrate holder (22) by sliding the substrate tray in the Y-axis direction, in parallel with the carry-out operation of the substrate (Pa) (in a state where a part of the substrate tray (90a) that supports the substrate (Pa) is located on the substrate holder (22)). Consequently, exchange of the substrate on the substrate holder can speedily be performed.
摘要翻译：第一运送单元（50a）通过在一个轴向（Y）上滑动基板托盘而从基板保持件（22）从下方执行支撑基板（Pa）的基板托盘（90a）轴方向）平行于基板表面。另一方面，第二运送部（50b）通过使基板托盘在Y轴方向上滑动，与基板托架（22）并行地载置从下方支撑基板（Pb）的基板托盘（90b）（Pa）（在支撑基板（Pa）的基板托盘（90a）的一部分位于基板支架（22）上的状态下）的操作。因此，可以快速地进行衬底支架上衬底的交换。

9. 发明申请

WO2011065589A2 SUBSTRATE CARRIER DEVICE, SUBSTRATE CARRYING METHOD, SUBSTRATE SUPPORTING MEMBER, SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：基板载体装置，基板承载方法，基板支撑构件，基板保持装置，曝光装置，曝光方法和装置制造方法
公开(公告)号：WO2011065589A2
公开(公告)日：2011-06-03
申请号：PCT/JP2010/071762
申请日：2010-11-29
申请人： NIKON CORPORATION , AOKI, Yasuo , SEKI, Tadashi , YANAGAWA, Takuya
发明人： AOKI, Yasuo , SEKI, Tadashi , YANAGAWA, Takuya
IPC分类号： H01L21/677 , G03F7/20 , B65G49/06
CPC分类号： G03F7/70733 , B65G49/064 , B65G2249/045 , H01L21/67706 , H01L21/67715 , H01L21/67748
摘要： A substrate carry-out device (70) carries out an exposed substrate (P) mounted on a substrate stage (20) from a substrate holder (50) by moving the substrate (P) in one axis direction (X-axis direction) parallel to a horizontal plane in a state where the substrate (P) is mounted on a substrate tray (90) housed in the substrate holder (50). Meanwhile, a substrate carry-in device (80) makes an unexposed substrate (P) to be carried into the substrate stage (20) wait at a substrate exchange position in a state where the unexposed substrate (P) is mounted on another substrate tray (90), and after the exposed substrate (P) is carried out from the substrate stage (20), lowers the another substrate tray (90), thereby mounting the unexposed substrate (P) onto the substrate holder (50).
摘要翻译：基板搬送装置（70）通过使基板（P）沿一个轴方向（X轴方向）平行地移动而从基板保持架（50）安装在基板台（20）上的露出基板（P）在基板（P）被安装在容纳在基板保持件（50）中的基板托盘（90）的状态下的水平面。同时，衬底搬运装置（80）使得未曝光的衬底（P）被运送到衬底台（20）中，在未曝光衬底（P）安装在另一个衬底托盘上的状态下等待衬底更换位置（90），并且在从基板台（20）进行曝光的基板（P）之后，降低另一个基板托盘（90），从而将未曝光的基板（P）安装到基板保持件（50）上。

10. 发明申请

WO2011021723A1 OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：对象处理装置，曝光装置和曝光方法及装置制造方法
公开(公告)号：WO2011021723A1
公开(公告)日：2011-02-24
申请号：PCT/JP2010/064430
申请日：2010-08-19
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20 , B65G49/06 , H01L21/68
CPC分类号： G03F7/70716 , B65G49/065 , G03F7/70791 , H01L21/67784 , H01L21/6838
摘要： A plurality of air levitation units (50) that jet air to the lower surface of a substrate (P) are placed below the substrate (P), and the substrate (P) is supported in a noncontact manner so as to be substantially horizontal. Further, a portion subject to exposure of the substrate (P) is held from below in a noncontact manner by a chuck main body (81) that a fixed-point stage (40) has, and a surface position of the portion subject to exposure is adjusted in a pinpoint manner. Consequently, exposure can be performed on the substrate (P) with high precision. Since the chuck main body (81) moves in a scanning direction according to the position of the substrate, the chuck main body can surely hold the substrate even when the substrate proceeds into an exposure area (IA).
摘要翻译：将空气喷射到基板（P）的下表面的多个空气悬浮单元（50）放置在基板（P）的下方，基板（P）以非接触方式被支撑为基本水平。此外，由基板（P）进行曝光的部分通过定位台（40）所具有的卡盘主体（81）以及暴露部分的表面位置以非接触的方式从下方保持以精确的方式进行调整。因此，可以高精度地对基板（P）进行曝光。由于卡盘主体（81）根据基板的位置沿扫描方向移动，所以即使当基板进入曝光区域（IA）时，卡盘主体也能够可靠地保持基板。

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