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    • 1. 发明申请
    • OVERWRITE-TYPE MAGNETOOPTICAL RECORDING MEDIUM CARTRIDGE
    • OVERWRITE型磁记录记录盒
    • WO1990001772A1
    • 1990-02-22
    • PCT/JP1989000816
    • 1989-08-11
    • NIKON CORPORATIONSATO, MasatoshiKAWAI, Toshihiko
    • NIKON CORPORATION
    • G11B23/28
    • G11B23/288G11B11/105G11B19/04G11B23/0302
    • The overwrite (OW)-type cartridge is provided with a mark for discriminating if it is of the OW type or the non-OW type. Any mark can be used if it can be easily identified by a man. The mark may be the one that is recognized electrically, magnetically or by any other means. In such a case, a sensor for detecting the mark should be provided for either one or both of the magnetooptical recording devices. Alternatively, a protrusion as the mark can be provided on the outer side of the OW-type cartridge may be used as a mark. The protrusion stops this cartridge from entering the slot in the conventional non-OW-type magnetooptical recording device, thereby causing no trouble. Instead, the OW-type magnetooptical recording device must have slot that permits even the cartridge with a protrusion to be inserted.
    • 覆盖(OW)型盒带有用于区分OW型或非OW型的标记。 任何标记可以被使用,如果它可以很容易地由一个男人识别。 该标记可以是电学,磁性或任何其他方式识别的标记。 在这种情况下,应为磁光记录装置中的一个或两者提供用于检测标记的传感器。 或者,可以在OW型盒的外侧设置作为标记的突起作为标记。 该突出部阻止该盒式磁体进入常规非OW型磁光记录装置中的狭槽,从而不产生问题。 相反,OW型磁光记录装置必须具有允许插入具有突起的盒的插槽。
    • 3. 发明申请
    • LIQUID MATERIAL FEEDING APPARATUS AND LIQUID MATERIAL FEEDING METHOD
    • 液体材料进料装置和液体材料进料方法
    • WO1998007509A1
    • 1998-02-26
    • PCT/JP1996002360
    • 1996-08-23
    • NIKON CORPORATIONNAKAGAWA, KazuhiroHIRAIWA, Hiroyuki
    • NIKON CORPORATION
    • B01J04/00
    • B01J4/00C01B32/40Y10T137/0396Y10T137/1729Y10T137/3124Y10T137/8326Y10T137/86035Y10T137/86083Y10T137/86163
    • A liquid material apparatus comprising: A) containers (150, 250) provided with gas introduction pipes (151, 251), discharge pipes (153, 253), and connection pipes (155, 255) capable of connecting the gas introduction pipes (151, 251) and discharge pipes (153, 253) to each other, and containing therein a liquid material; B) a permanent line (P) provided with: 1) gas line connection pipes (113, 213) detachably connected to the gas introduction pipes (151, 251), 2) a gas feed pipe (111) connected to the gas line connection pipes (113, 213) and a pressurized gas supply source (70), 3) material line connection pipes (123, 223) detachably connected to the discharge pipes (153, 253), 4) a material feeding pipe (127) connected to the material line connection pipes (123, 223) and a vaporizer (91), and 5) bypass pipes (129, 229) capable of allowing communication between the gas feed pipe (111) and the material line connection pipes (123, 223); and C) a harm removing line (30) provided with exhaust pipes (131, 231) connected to the gas line connection pipes (113, 213) or the material line connection pipes (123, 223), and a vacuum pump (135) connected to the exhaust pipes (131, 231).
    • 一种液体材料装置,包括:A)设有气体导入管(151,251),排出管(153,253)和能够连接气体导入管(151,251)的连接管(155,255)的容器(150,250) ,251)和排出管(153,253),并且容纳液体材料; B)永久管线(P),其具有:1)可拆卸地连接到气体引入管(151,251)的气体管路连接管(113,213); 2)连接到气体管线连接 管道(113,213)和加压气体供应源(70),3)可拆卸地连接到排放管(153,253)的材料管线连接管(123,223); 4)材料供给管(127) 材料线连接管(123,223)和蒸发器(91),以及5)能够允许气体供给管(111)和材料管线连接管(123,223)之间的连通的旁通管(129,229) ; 和C)设置有连接到气体管线连接管(113,213)或材料管线连接管(123,223)的排气管(131,231)的危险消除管线(30),以及真空泵(135) 连接到排气管(131,231)。
    • 4. 发明申请
    • OPTICAL WAVEGUIDE DEVICE AND OPTICAL INSTRUMENT USING THE SAME
    • 光学波导装置和使用该光学仪器的光学仪器
    • WO1994006041A1
    • 1994-03-17
    • PCT/JP1993001264
    • 1993-09-07
    • NIKON CORPORATIONSHIONOYA, TakashiIWASAKI, JunOHKI, HiroshiDOI, Masaaki
    • NIKON CORPORATION
    • G02B06/12
    • G01B11/306G02B6/125G02B6/126G02B6/1342G02B6/1345G02B6/2804G02B6/2843G02B21/0024G02B21/0056G02B21/0068G02F1/3137
    • An optical waveguide device formed out of a material the refractive index of which has anisotropy, and an optical instrument using the same device. The device comprises an electrooptic single-crystal substrate on which are formed a first core portion the refractive index of which is higher than that of the substrate with respect to both ordinary and extraordinary rays of light, and a second core portion the refractive index of which is higher than that of the substrate with respect to extraordinary rays of light only. The overlapping region of the first and second core portions constitutes a double mode waveguide for extraordinary rays of light. This optical waveguide device is used in place of a pinhole element in an optical system in a confocal scanning optical microscope so as to guide illuminating light into an object to be detected, and to guide the reflected light from the object into a detector. This microscope is provided with a polarization conversion element for use in setting the polarization direction of illuminating light different from that of reflected light. The optical waveguide device functions as a single-mode waveguide with respect to illuminating light, and as a double mode waveguide with respect to reflected light.
    • 由折射率为各向异性的材料形成的光波导器件,以及使用该器件的光学仪器。 该器件包括电光单晶衬底,其上形成有相对于普通和非常光线的折射率高于衬底的折射率的第一芯部分,其第二芯部分的折射率为 相对于非常光线仅比基板高。 第一和第二芯部的重叠区域构成用于非常光线的双模波导。 该光波导装置用于代替共焦扫描光学显微镜中的光学系统中的针孔元件,以将照射光引导到被检测物体中,并将​​来自物体的反射光引导到检测器中。 该显微镜设置有用于设定与反射光不同的照明光的偏振方向的偏振转换元件。 光波导器件用作相对于照明光的单模波导,并且作为相对于反射光的双模波导。
    • 5. 发明申请
    • POSITIONING METHOD
    • 定位方法
    • WO1997001184A1
    • 1997-01-09
    • PCT/JP1996001715
    • 1996-06-20
    • NIKON CORPORATIONSHIRATA, Yosuke
    • NIKON CORPORATION
    • H01L21/027
    • G03F7/70358G03F7/70425G03F9/7003
    • A wafer mark of each shot region is measured by an alignment sensor, and a linear coordinate value of a reference point of each shot region is determined from this measurement result and from design data by an EGA method (steps 101 to 109). Curvilinear array coordinates are determined (step 110) by using an approximate expression on the basis of the linear coordinate value by taking non-linear components of the shot array, and a profile curve expressing the profile of each shot region is determined from the curvilinear array coordinates by interpolation (step 111). Exposure is carried out while changing a reticle stage scanning direction, rotating direction and the height of a wafer stage in such a manner as to correspond to distortion of each shot region expressed by the profile curve (step 114).
    • 通过对准传感器测量每个拍摄区域的晶片标记,并根据该测量结果和通过EGA方法从设计数据确定每个拍摄区域的参考点的线性坐标值(步骤101至109)。 通过采用射出阵列的非线性分量,通过使用基于线性坐标值的近似表达式来确定曲线阵列坐标(步骤110),并且从曲线阵列确定表示每个拍摄区域的轮廓的轮廓曲线 通过插值进行坐标(步骤111)。 以与对应于由轮廓曲线表示的每个拍摄区域的失真的方式改变标线片台扫描方向,旋转方向和晶片台的高度来进行曝光(步骤114)。
    • 6. 发明申请
    • MAGNETOOPTIC RECORDING METHOD, MAGNETOOPTIC RECORDING MEDIUM AND MAGENTOOPTIC RECORDING APPARATUS
    • 磁记录记录方法,磁记录介质和磁记录记录装置
    • WO1994022139A1
    • 1994-09-29
    • PCT/JP1994000411
    • 1994-03-15
    • NIKON CORPORATIONSAITO, JunKURITA, ShinichiYAMANAKA, YoshihiroMIYATA, Kazutomo
    • NIKON CORPORATION
    • G11B11/10
    • G11B11/1053G11B11/10506G11B11/10584G11B11/10595G11B20/1258
    • In magnetooptic recording, this invention compensates for the change of temperature rise/drop characteristics of a medium in a heating/cooling process with rise/fall of a laser beam depending on a relative speed between the laser beam and the recording medium. This invention accomplishes a high recording density and high access performance as the advantages of a Z-CAV system, and improves reliability when a high density recording is made in a CAV system, too. Specifically, the relative speed of the laser beam to the medium, that is, the linear velocity of the medium is related to the thermal time constant of the medium to determine the thermal time constant tau at that linear velocity. Information to be recorded is converted to a binary signal, and the magnetooptic medium is irradiated with an intensity-modified laser beam according to the binary signal so as to record information. Information of thermal time constants relating to the temperature change of the magnetooptic recording medium due to the laser irradiation are in advance recorded in the magnetooptic recording medium. A clock frequency (f) is controlled so that T/ tau , the ratio of the reciprocal T of the clock frequency (f) to the thermal time constant tau of the medium can be kept constant. The start and end positions of a mark can be accurately formed.
    • 在磁光记录中,本发明根据激光束和记录介质之间的相对速度补偿加热/冷却过程中介质的升温/降温特性随激光束的上升/下降的变化。 本发明作为Z-CAV系统的优点而实现了高记录密度和高访问性能,并且在CAV系统中进行高密度记录时提高了可靠性。 具体地,激光束到介质的相对速度,即介质的线速度与介质的热时间常数有关,以确定在该线速度下的热时间常数τ。 要记录的信息被转换为二进制信号,并且根据二进制信号用强度修正的激光束照射磁光介质以便记录信息。 关于由于激光照射引起的磁光记录介质的温度变化的热时间常数的信息被预先记录在磁光记录介质中。 控制时钟频率(f),使得T / tau可以将时钟频率(f)的倒数T与介质的热时间常数τ的比率保持为常数。 可以准确地形成标记的开始和结束位置。
    • 8. 发明申请
    • DEVICE AND METHOD FOR REPRODUCING INFORMATION
    • 用于复制信息的设备和方法
    • WO1997000517A1
    • 1997-01-03
    • PCT/JP1996001617
    • 1996-06-13
    • NIKON CORPORATIONTANAKA, ToshihisaARAI, HiroshiMATSUZAKI, TakakoISHII, Yuwa
    • NIKON CORPORATION
    • G11B07/085
    • G11B7/08505G11B7/005G11B11/10563
    • A magneto-optical reproducing device of land/group reproduction system capable of reproducing arbitrarily information recorded on both tracks. A method for the reproduction is also disclosed. The information reproducing device reproduces information from an information recording medium on which first and second groups of information tracks on which information is recorded are alternately provided concentrically or spirally. The height of the tracks of the first group is different from that of the second group. The device is provided with an optical head which projects a light beam upon an information track of the first or second group and a moving mechanism which moves the position of the spot of the light beam in the radial direction of the medium. The moving mechanism moves the spot of the light beam from one track to another of the first group or from one track of one group to another of another group.
    • 一种陆/群复制系统的磁光再现装置,其能够再现任意记录在两个轨道上的信息。 还公开了一种再现方法。 信息再现装置从信息记录介质再现信息,信息记录介质上记录有信息的第一和第二组信息轨道以同心或螺旋方式交替地设置。 第一组的轨道的高度与第二组的轨迹的高度不同。 该装置设置有将光束投射到第一组或第二组的信息轨道上的光学头,以及沿着介质的径向移动光束的位置的移动机构。 移动机构将光束的光点从第一组的一个轨道移动到另一个轨迹,或者将一组的一个轨道移动到另一个组的另一个轨道。
    • 10. 发明申请
    • ALIGNER AND METHOD FOR EXPOSURE
    • 对准器和接触方法
    • WO1998024115A1
    • 1998-06-04
    • PCT/JP1997004350
    • 1997-11-28
    • NIKON CORPORATIONNISHI, KenjiOTA, Kazuya
    • NIKON CORPORATION
    • H01L21/027
    • G03F7/70216G03F7/70358G03F7/70425G03F7/70716G03F7/70733G03F9/70G03F9/7003G03F9/7015G03F9/7026G03F9/7088
    • Two stages (WS1, WS2), each of which supports a wafer, can individually move between a position information measuring section (PIS) below an alignement system (24a) and an exposure section (EPS) below a projection optical system (PL). While a wafer is replaced and aligned on the stage (WS1), a wafer (W2) is exposed on the stage (WS2). The position of a wafer (W1) in each shot region on the stage (WS1) is found, by the section (PIS), as a relative position to a reference mark formed on the stage (WS1). The information about the relative position is used for alignment in relation to an alignment pattern, when the stage (WS1) moves to the section (EPS) and the wafer (W1) is exposed. Therefore, the position of the stage need not be monitored continuously during movement. By parallel processing of exposures using the two wafer stages (WS1, WS2), a throughput can be increased.
    • 每个支撑晶片的两个级(WS1,WS2)可以单独地在对准系统(24a)下方的位置信息测量部分(PIS)和投影光学系统(PL)下方的曝光部分(EPS)之间移动。 当晶片在载物台(WS1)上被替换和对准时,晶片(W2)暴露在载物台(WS2)上。 通过部分(PIS),找到台架(WS1)上的每个拍摄区域中的晶片(W1)的位置,作为形成在平台(WS1)上的参考标记的相对位置。 当阶段(WS1)移动到部分(EPS)并且晶片(W1)被暴露时,关于相对位置的信息被用于相对于对准图案的对准。 因此,在运动期间不需要连续地监视舞台的位置。 通过使用两个晶片台(WS1,WS2)的曝光的并行处理,可以增加吞吐量。