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1. 发明申请

WO2010032878A2 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体装置，曝光装置，曝光方法和装置制造方法
公开(公告)号：WO2010032878A2
公开(公告)日：2010-03-25
申请号：PCT/JP2009/066848
申请日：2009-09-18
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70716 , G03F7/70775 , H01L21/681
摘要： In measurement of a positional information in the XY plane of a fine movement stage (WFS) held by a coarse movement stage(WCS), an encoder system is used including a head which is placed facing a grating (RG) placed on a surface substantially parallel to the XY plane of the fine movement stage and irradiates a measurement beam on the grating. Then, the fine movement stage is driven individually or integrally with the coarse movement stage by a drive system, based on the positional information measured by the encoder system. In this case, the head of the encoder system can be placed in proximity to the fine movement stage (the grating), which allows a highly precise measurement of the positional information of the fine movement stage by the encoder system.
摘要翻译：在测量由粗移动台（WCS）保持的微动载台（WFS）的XY平面中的位置信息时，使用编码器系统，该编码器系统包括面向放置在表面上的光栅（RG）的头部平行于微动载台的XY平面，并将测量光束照射在光栅上。然后，基于由编码器系统测量的位置信息，通过驱动系统单独地或与粗动部分一体地驱动精细运动级。在这种情况下，编码器系统的头部可以靠近精细移动台（光栅）放置，这允许通过编码器系统高精度地测量精细移动台的位置信息。

2. 发明申请

WO2011081215A1 MOVABLE BODY DRIVE METHOD, MOVABLE BODY APPARATUS, EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体驱动方法，可移动身体装置，接触方法，曝光装置和装置制造方法
公开(公告)号：WO2011081215A1
公开(公告)日：2011-07-07
申请号：PCT/JP2010/073871
申请日：2010-12-24
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi , OKUTOMI, Akira , HIRANO, Kazuhiro
发明人： SHIBAZAKI, Yuichi , OKUTOMI, Akira , HIRANO, Kazuhiro
IPC分类号： G05B19/19 , G03F7/20
CPC分类号： G03F7/70775
摘要： A stage is driven (position control) using a hybrid signal (F HY ) which is obtained by synthesizing an output signal (F IY ) of an interferometer (16) (an interferometer system (118)) and an output signal (F EY ) of an encoder (70A) (an encoder system (150)) that are made to pass through a high pass filter (H fc ) and a low pass filter (L fc ), respectively. A cutoff frequency (fc) is set to a frequency corresponding to a speed slightly smaller than the speed of the stage at the time of scanning exposure. This allows the stage to be driven using the interferometer whose linear measurement is high at the time of scanning exposure, and using the encoder whose measurement reproducibility is high at the time of stepping.
摘要翻译：使用通过合成干涉仪（16）的输出信号（FIY）（干涉仪系统（118））和编码器的输出信号（FEY）获得的混合信号（FHY）来驱动级（位置控制）（70A）（编码器系统（150）），分别通过高通滤波器（Hfc）和低通滤波器（Lfc）。截止频率（fc）被设定为与扫描曝光时的阶段的速度稍小的速度对应的频率。这允许使用在扫描曝光时线性测量高的干涉仪并使用在步进时测量重现性高的编码器来驱动平台。

3. 发明申请

WO2010030018A2 PATTERN FORMING METHOD AND DEVICE PRODUCTION METHOD 审中-公开
标题翻译：图案形成方法和装置生产方法
公开(公告)号：WO2010030018A2
公开(公告)日：2010-03-18
申请号：PCT/JP2009/065977
申请日：2009-09-07
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi , HIRUKAWA, Shigeru
发明人： SHIBAZAKI, Yuichi , HIRUKAWA, Shigeru
IPC分类号： G03F7/095
CPC分类号： G03F7/265 , G03F7/095 , G03F7/405 , H01L21/0274
摘要： A pattern forming method includes coating, on a wafer W, a negative resist 3 and a positive resist 4 which has a higher sensitivity; exposing the positive resist 4 and the negative resist 3 on the wafer W with an image of a line-and-space pattern; and developing the positive resist 4 and the negative resist 3 in a direction parallel to a normal line of a surface of the wafer W. A fine pattern, which exceeds the resolution limit of an exposure apparatus, can be formed by using the lithography process without performing the overlay exposure.
摘要翻译：图案形成方法包括在晶片W上涂布具有较高灵敏度的负光刻胶3和正光刻胶4; 用线间距图案的图像将正的抗蚀剂4和负的抗蚀剂3暴露在晶片W上; 并且在平行于晶片W的表面的法线的方向显影正型抗蚀剂4和负型抗蚀剂3.可以通过使用光刻工艺形成超过曝光装置的分辨率极限的精细图案，而不需要执行叠加曝光。

4. 发明申请

WO2009028698A1 DRIVE METHOD AND DRIVE SYSTEM FOR MOVABLY BODY 审中-公开
标题翻译：驱动方式和驱动系统的MOVABLY身体
公开(公告)号：WO2009028698A1
公开(公告)日：2009-03-05
申请号：PCT/JP2008/065613
申请日：2008-08-25
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70775 , G03F9/7034
摘要： A position of a stage (WST) in a perpendicular (Z) direction with respect to a movement plane and a tilt (θy) direction is measured, using a surface position sensor (72 k , 74 i , 76 j ) and a Z interferometer (43A, 43B). And, the stage is driven in a stable manner and also with high precision, by appropriately switching between three control modes; servo control using a measurement result of the surface position sensor (a first control mode), servo control using a measurement result of the Z interferometer (a second control mode), and servo control using measurement results of both measurement systems (a third control mode), or by appropriately switching between two control modes out of the three control modes.
摘要翻译：使用表面位置传感器（72k，74i，76j）和Z干涉仪（43A）测量相对于运动平面和倾斜（θy）方向在垂直（Z）方向上的平台（WST）的位置，43B）。而且，通过适当地切换三种控制模式，稳定地驱动舞台，同时以高精度驱动舞台; 使用表面位置传感器（第一控制模式）的测量结果的伺服控制，使用Z干涉仪的测量结果的伺服控制（第二控制模式）和使用两个测量系统的测量结果的伺服控制（第三控制模式），或者通过在三种控制模式之间适当地切换两种控制模式。

5. 发明申请

WO2009028697A1 DRIVE METHOD AND DRIVE SYSTEM FOR A MOVABLE BODY 审中-公开
标题翻译：用于可移动体的驱动方法和驱动系统
公开(公告)号：WO2009028697A1
公开(公告)日：2009-03-05
申请号：PCT/JP2008/065612
申请日：2008-08-25
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi , KANAYA, Yuho
发明人： SHIBAZAKI, Yuichi , KANAYA, Yuho
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70725 , G03F7/70775 , G03F9/7026 , G03F9/7034 , G03F9/7049
摘要： A wafer stage (WST) is moved while monitoring a position using an X interferometer (127) and a Y interferometer (16), and a Z position of a Y scale (39Y 1 , 39Y 2 ) arranged on the wafer stage upper surface is measured using a sensor (72a to 72d). In this case, for example, from a difference of measurement results of two sensors (72a, 72b), tilt of the Y scale (39Y 2 ) in the Y-axis direction is obtained. By measuring the tilt of the entire surface of Y scales (39Y 1 , 39Y 2 ), two-dimensional unevenness data of the scales are made. By correcting the measurement results of the sensor using the unevenness data, and then using the corrected measurement results, it becomes possible to drive the wafer stage two-dimensionally with high precision.
摘要翻译：在使用X干涉仪（127）和Y干涉仪（16）监视位置的同时移动晶片台（WST），并且使用布置在晶片台上表面上的Y标尺（39Y1,39Y2）的Z位置来测量传感器（72a〜72d）。在这种情况下，例如，根据两个传感器（72a，72b）的测量结果的差异，可以获得Y标尺（39Y2）在Y轴方向上的倾斜。通过测量Y标尺（39Y1,39Y2）的整个表面的倾斜度，进行刻度的二维不均匀性数据。通过使用不均匀性数据校正传感器的测量结果，然后使用校正的测量结果，可以高精度地驱动晶片台。

6. 发明申请

WO2011068249A2 EXPOSURE APPARATUS, LIQUID IMMERSION MEMBER, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，液体浸渍部件和装置制造方法
公开(公告)号：WO2011068249A2
公开(公告)日：2011-06-09
申请号：PCT/JP2010/072063
申请日：2010-12-02
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70858
摘要： Liquid (Lq) is held between a tip lens (42) of a projection optical system and a wafer (W) on a wafer stage, using a nozzle member (32) which has a shape enclosing an optical path of an illumination light (IL), and a bottom surface to which the wafer is placed facing via a predetermined clearance that has an annular recess section (32n, 32h) formed having multiple projecting sections (32b 1 , 32b 2 , 32d). This prevents adhesion of contamination and liquid from remaining that become factors of defects of a pattern formed on the wafer. The nozzle member preferably has an annular shaped inclined surface(32c) whose gap with the wafer surface becomes smaller from the inner side to the outer side, formed on an inner bottom surface facing the wafer of an outer recess section (32h) formed on the bottom surface of the nozzle member.
摘要翻译：液体（Lq）使用喷嘴构件（32）保持在投影光学系统的顶端透镜（42）和晶片台上的晶片（W）之间，所述喷嘴构件具有包围照明光（IL）的光路以及晶片所经过的预定间隙所面对的底面，所述预定间隙具有形成为具有多个突出部（32b，1 / sub）的环形凹部（32n，32h） 32b 2，32d）。这防止了污染和液体残留的附着，这成为晶片上形成的图案的缺陷的因素。喷嘴构件优选具有环形形状的倾斜表面（32c），其与晶片表面的间隙从内侧向外侧变小，形成在形成在外侧凹槽部分（32h）的与晶片相对的内底表面上喷嘴部件的底面。

7. 发明申请

WO2011024985A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：WO2011024985A1
公开(公告)日：2011-03-03
申请号：PCT/JP2010/064663
申请日：2010-08-24
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70108 , G03F7/70058 , G03F7/70191 , G03F7/70516 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70975 , G03F9/70 , G03F9/7046 , Y10T29/49004
摘要： An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage (WST1) by irradiating a measurement beam using four heads (60 1 to 60 4 ) installed on the wafer stage (WST1) on a scale plate (21) which covers the movement range of the wafer stage (WST1) except for the area right under a projection optical system (PL). Placement distances (A, B) of the heads (60 1 to 60 4 ) here are each set to be larger than width (a i , b i ) of the opening of the scale plates (21), respectively. This allows the positional information of the wafer stage to be measured, by switching and using the three heads facing the scale plate out of the four heads according to the position of the wafer stage.
摘要翻译：曝光装置配备有通过使用安装在晶片台（WST1）上的四个头（601〜604）照射测量光束来测量晶片台（WST1）的位置信息的编码器系统，该刻度盘（21）覆盖除了投影光学系统（PL）正下方的区域之外的晶片台（WST1）的移动范围。这里的头部（601〜604）的放置距离（A，B）分别设定为大于刻度板（21）的开口部的宽度（ai，bi）。这允许根据晶片台的位置，通过切换和使用面向刻度板的三个磁头来测量晶片台的位置信息。

8. 发明申请

WO2011024984A1 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光方法，曝光装置和装置制造方法
公开(公告)号：WO2011024984A1
公开(公告)日：2011-03-03
申请号：PCT/JP2010/064662
申请日：2010-08-24
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/20 , G01B11/27 , G03F7/70133 , G03F7/70358 , G03F7/70483 , G03F7/70516 , G03F7/70725 , G03F7/70775 , G03F9/70 , H01L21/681 , Y10T29/49002
摘要： Within an area (A 0 ) where of four heads (60 1 to 60 4 ) installed on a stage (WST1), heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the stage (WST1) is driven based on positional information which is obtained using the first head group, as well as obtaining the displacement (displacement of position, rotation, and scaling) between the first and second reference coordinate systems (C 1 , C 2 ) corresponding to the first and second head groups using the positional information obtained using the first and second head groups. By using the results and correcting measurement results obtained using the second head group, the displacement between the first and second reference coordinate systems (C 1 , C 2 ) is calibrated, which allows the measurement errors that come with the displacement between the areas on the scale plates where each of the four heads (60 1 to 60 4 ) face to be corrected.
摘要翻译：在安装在平台（WST1）上的四个磁头（601至604）的区域（A0）内，包括在第一磁头组中的磁头和每个所属的三个磁头的第二磁头组包括一个彼此不同的磁头基于标尺板上的对应区域，基于使用第一头组获得的位置信息来驱动平台（WST1），以及获得第一和第二参考点之间的位移（位置，旋转和缩放位移）使用使用第一和第二头组获得的位置信息对应于第一和第二头组的坐标系（C1，C2）。通过使用结果并校正使用第二头组获得的测量结果，校准第一和第二参考坐标系（C1，C2）之间的位移，这允许在刻度板上的区域之间的位移所带来的测量误差其中四个头（601至604）中的每一个面都要被校正。

9. 发明申请

WO2010134644A1 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体装置，曝光装置和方法以及装置制造方法
公开(公告)号：WO2010134644A1
公开(公告)日：2010-11-25
申请号：PCT/JP2010/058947
申请日：2010-05-20
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20 , H01L21/67
CPC分类号： G03F7/70725 , G03F7/70775 , G03F7/7085
摘要： A fine movement stage (WFS) is driven by a controller, based on positional information of the fine movement stage (WFS) in a measurement direction measured by a measurement system (70)and correction information of a measurement error caused by a tilt of the fine movement stage (WFS) included in the positional information. Accordingly, driving the fine movement stage (WFS) with high precision becomes possible, which is not affected by a measurement error included in the positional information in a measurement direction of the measurement system that occurs due to a tilt of the fine movement stage (WFS).
摘要翻译：基于由测量系统（70）测量的测量方向上的精细运动级（WFS）的位置信息和由倾斜的测量误差引起的测量误差的校正信息，由控制器驱动精细运动级（WFS）精细运动阶段（WFS）包含在位置信息中。因此，可以高精度地驱动精细运动级（WFS），不受由精细运动级（WFS）倾斜引起的测量系统的测量方向上的位置信息中包含的测量误差的影响）。

10. 发明申请

WO2010071238A1 MOVABLE BODY APPARATUS 审中-公开
标题翻译：可移动身体装置
公开(公告)号：WO2010071238A1
公开(公告)日：2010-06-24
申请号：PCT/JP2009/071721
申请日：2009-12-18
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/7055 , G01B11/002 , G03F7/70341 , G03F7/70716 , G03F7/70733 , G03F7/70775 , G03F7/708 , Y10T29/49826
摘要： In an exposure station (200), positional information of a stage (WFS1) holding a wafer is measured by a first fine movement stage position measurement system including a measurement arm (71A), and in a measurement station (300), positional information of a stage (WFS2) holding a wafer is measured by a second fine movement stage position measurement system including another measurement arm (71B). An exposure apparatus (100) has a third fine movement stage position measurement system which can measure positional information of the stage (WFS2) when the stage (WFS2) is carried from the measurement station (300) to the exposure station (200). The third fine movement stage measurement system includes an encoder system including a plurality of Y heads (96, 97) and a laser interferometer system including laser interferometers (76a to 76d).
摘要翻译：在曝光台（200）中，通过包括测量臂（71A）的第一微动台位置测量系统测量保持晶片的台（WFS1）的位置信息，在测量台（300）中，位置信息通过包括另一个测量臂（71B）的第二微动台位置测量系统测量保持晶片的平台（WFS2）。曝光装置（100）具有第三精细移动台位置测量系统，其能够测量当从测量站（300）向曝光站（200）传送载物台（WFS2）时的载物台（WFS2）的位置信息。第三精细运动台测量系统包括包括多个Y头（96,97）和包括激光干涉仪（76a至76d）的激光干涉仪系统的编码器系统。

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