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    • 1. 发明申请
    • HYBRID ELECTROSTATIC CHUCK
    • 混合静电卡盘
    • WO2011083751A1
    • 2011-07-14
    • PCT/JP2010/073898
    • 2010-12-28
    • NIKON CORPORATIONSOGARD Micheal
    • SOGARD Micheal
    • H01L21/683
    • H01L21/6831G03F7/70708H01L21/6833
    • An electrostatic chuck (230) for holding a device (200) includes a chuck body (244), a Coulomb electrode assembly (246), a Johnsen-Rahbek (J-R) electrode assembly (248), and a control system (224). The chuck body (244) includes a chucking surface (250) that engages the device (200), and the chuck body (244) is made of a dielectric having a relatively high resistance. The J-R electrode assembly (248) is positioned spaced apart from the chucking surface (250). The Coulomb electrode assembly (246) is also positioned spaced apart from the chucking surface (250). The control system (224) selectively directs a first voltage to the J-R electrode assembly (248) to generate a J-R type force that attracts the device (200) towards the chucking surface (250), and selectively directs a second voltage to the Coulomb electrode assembly (246) to generate a Coulomb type force that also attracts the device (200) towards the chucking surface (250). With this design, both the J-R type force and the Coulomb type force are used to concurrently attract the device (200) against the chucking surface (2500. As a result thereof, the electrostatic chuck (230) is better able to reduce non-flatness of the device (200), and/or crush any particles positioned between the device (200) and the chucking surface (250).
    • 用于保持装置(200)的静电卡盘(230)包括卡盘主体(244),库仑电极组件(246),约翰 - 拉贝克(J-R)电极组件(248)和控制系统(224))。 卡盘主体(244)包括与装置(200)接合的卡盘表面(250),卡盘主体(244)由具有较高阻力的电介质制成。 J-R电极组件(248)定位成与夹紧表面(250)间隔开。 库仑电极组件(246)也位于与夹紧表面(250)间隔开的位置。 所述控制系统(224)选择性地将第一电压引导到所述JR电极组件(248)以产生将所述装置(200)吸引到所述夹紧表面(250)的JR型力,并且选择性地将第二电压引导到所述库仑电极 组件(246)以产生也吸引装置(200)朝向夹紧表面(250)的库仑型力。 通过这种设计,JR型力和库仑型力均被用于同时将装置(200)吸引在卡盘表面(2500)上。因此,静电卡盘(230)能够更好地降低非平坦度 的装置(200),和/或压碎位于装置(200)和夹紧表面(250)之间的任何颗粒。