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1. 发明申请

WO2012011613A2 CLEANING METHOD, CLEANING APPARATUS, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM 审中-公开
标题翻译：清洁方法，清洁装置，装置制造方法，程序和存储介质
公开(公告)号：WO2012011613A2
公开(公告)日：2012-01-26
申请号：PCT/JP2011/067186
申请日：2011-07-21
申请人： NIKON CORPORATION , TANAKA Ryo , IKEDA Yutaka
发明人： TANAKA Ryo , IKEDA Yutaka
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70916 , G03F7/70975
摘要： A liquid immersion member cleaning method used in an immersion exposure apparatus exposes a substrate with exposure light that transits an exposure liquid, wherein the liquid immersion member is disposed at least partly around an optical member and an optical path of the exposure light, which passes through the exposure liquid between the optical member and the substrate. The cleaning method comprises: loading a cleaning tool into the immersion exposure apparatus and disposing the cleaning tool at a position at which it opposes a first recovery port of the liquid immersion member, which is capable of recovering the exposure liquid; and supplying a cleaning liquid to a recovery passageway of the liquid immersion member, wherethrough the exposure liquid from the first recovery port flows. The liquid immersion member has a first discharge port, which is for discharging the exposure liquid from the recovery passageway, and a second discharge port, which is for discharging a gas from the recovery passageway and hinders the discharge of the exposure liquid more than the first discharge port does; and the cleaning liquid is recovered from a recovery part of the cleaning tool via the first recovery port.
摘要翻译：在浸没曝光装置中使用的液浸部件清洗方法，使曝光用曝光液曝光基板，其中，所述浸液部件至少部分地设置在光学部件周围，所述光学部件和曝光光线的光路通过光学构件和基板之间的曝光液体。清洗方法包括：将清洁工具装入浸没曝光装置中，并将清洁工具设置在能够回收曝光液体的与液浸部件的第一回收口相对的位置处; 并且将清洗液供给到液浸部件的回收通道，通过来自第一回收口的曝光液体流过。液浸部件具有用于从回收通道排出曝光液体的第一排出口和用于从回收通道排出气体并阻止曝光液体排出的第二排出口比第一排出口多排放口; 并且清洁液体经由第一回收口从清洁工具的回收部分回收。

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