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    • 3. 发明申请
    • MOVING APPARATUS AND CHARGED PARTICLE BEAM DRAWING SYSTEM
    • 移动装置和充电颗粒光束绘图系统
    • US20150348744A1
    • 2015-12-03
    • US14725557
    • 2015-05-29
    • CANON KABUSHIKI KAISHA
    • Shinji UchidaNobushige Korenaga
    • H01J37/20G03F7/20H01J37/317
    • H01J37/20H01J37/3174H01J2237/202H01J2237/20228H01J2237/20257H01J2237/20278
    • A moving apparatus includes a moving member movable in a first direction, a drive unit that drives the moving member, and a magnetic field shielding unit made of a magnetic material to shield at least part of a magnetic field emanating from the drive unit. The drive unit includes a stator and a movable element connected to the moving member. The magnetic field shielding unit includes a first plate connected to the moving member and disposed between the moving member and the movable element, two side plates connected to the first plate and having end portions extending in the first direction, and a second plate connected to the stator and extending in the first direction to surround the movable element and at least part of the stator at plural positions in accordance with movement of the moving member in the first direction together with the first plate and side plates.
    • 移动装置包括可沿第一方向移动的移动构件,驱动移动构件的驱动单元和由磁性材料制成的磁屏蔽单元,以屏蔽从驱动单元发出的至少一部分磁场。 驱动单元包括定子和连接到移动构件的可动元件。 磁场屏蔽单元包括连接到移动构件并且设置在移动构件和可动元件之间的第一板,与第一板连接并具有沿第一方向延伸的端部的两个侧板,以及连接到第一板的第二板 定子并且沿着第一方向延伸以围绕可移动元件和根据移动构件在第一方向上与第一板和侧板的移动而在多个位置处的定子的至少一部分。
    • 4. 发明申请
    • Moving module of a wafer ion-implanting machine
    • 晶圆离子注入机的移动模块
    • US20100218720A1
    • 2010-09-02
    • US12457929
    • 2009-06-25
    • Ting-Wei Lin
    • Ting-Wei Lin
    • B05C5/00
    • H01J37/3171H01J37/023H01J37/20H01J2237/0216H01J2237/20221H01J2237/20257
    • A moving module of a wafer ion-implanting machine includes a wafer carrier, a moving shaft, a base, a pair of first magnets, a fixture body, and a plurality of second magnets. One end of the wafer carrier is pivotally connected to a wafer tray; and the other end is fixed onto one end of the moving shaft. The base is fixed to the other end of the moving shaft. The moving shaft drives the wafer carrier and the base to move lengthwise. The pair of first magnets is fixed to the base. The fixture body is located between the pair of first magnets. The second magnets are fixed onto the fixture body and one of them forms compelling magnetic force between one of the first magnets. Thereby, the friction generated by contacting any of the first magnets with the fixture body can be prevented, thus increasing the production yield.
    • 晶片离子注入机的移动模块包括晶片载体,移动轴,基座,一对第一磁体,固定体和多个第二磁体。 晶片载体的一端枢转地连接到晶片托盘; 另一端固定在移动轴的一端。 底座固定在移动轴的另一端。 移动轴驱动晶片载体和基座纵向移动。 一对第一磁体固定在基座上。 夹具本体位于一对第一磁体之间。 第二磁体被固定在夹具本体上,其中之一在第一磁体之间形成强制磁力。 因此,可以防止通过使任何第一磁体与夹具本体接触而产生的摩擦,从而提高产量。
    • 5. 发明授权
    • Moving module of a wafer ion-implanting machine
    • 晶圆离子注入机的移动模块
    • US07956333B2
    • 2011-06-07
    • US12457929
    • 2009-06-25
    • Ting-Wei Lin
    • Ting-Wei Lin
    • G21K5/10
    • H01J37/3171H01J37/023H01J37/20H01J2237/0216H01J2237/20221H01J2237/20257
    • A moving module of a wafer ion-implanting machine includes a wafer carrier, a moving shaft, a base, a pair of first magnets, a fixture body, and a plurality of second magnets. One end of the wafer carrier is pivotally connected to a wafer tray; and the other end is fixed onto one end of the moving shaft. The base is fixed to the other end of the moving shaft. The moving shaft drives the wafer carrier and the base to move lengthwise. The pair of first magnets is fixed to the base. The fixture body is located between the pair of first magnets. The second magnets are fixed onto the fixture body and one of them forms compelling magnetic force between one of the first magnets. Thereby, the friction generated by contacting any of the first magnets with the fixture body can be prevented, thus increasing the production yield.
    • 晶片离子注入机的移动模块包括晶片载体,移动轴,基座,一对第一磁体,夹具本体和多个第二磁体。 晶片载体的一端枢转地连接到晶片托盘; 另一端固定在移动轴的一端。 底座固定在移动轴的另一端。 移动轴驱动晶片载体和基座纵向移动。 一对第一磁体固定在基座上。 夹具本体位于一对第一磁体之间。 第二磁体被固定在夹具本体上,其中之一在第一磁体之间形成强制磁力。 因此,可以防止通过使任何第一磁体与夹具本体接触而产生的摩擦,从而提高产量。
    • 7. 发明授权
    • Device for positioning objects within a sealed chamber
    • 用于将物体定位在密封室内的装置
    • US5139383A
    • 1992-08-18
    • US734473
    • 1991-07-23
    • Alexander PolyakThu Huynh
    • Alexander PolyakThu Huynh
    • H01J37/20H01L21/68
    • H01J37/20H01L21/68H01J2237/20257Y10S403/01Y10T464/30Y10T74/18992
    • A device for positioning objects within a sealed vacuum chamber (112) comprises a stationay housing (114), which is sealingly attached to the vacuum chamber (112). Located within the housing (114) is a tubular body (158) capable of rotating and translating within the stationary housing (114) through the interaction of an outer magnet (116), which slides and rotates on the surface of the stationary housing, and an inner magnet (118), which is attached to the tubular body (158). A shaft (198) is located inside the tubular body, but cannot be shifted axially with respect to this body. The front end of shaft (198) extends into the vacuum chamber (112) and may carry a specimen or any other object to be treated or tested in the vacuum chamber. The shaft (198) is driven from an external drive mechanism (124). Rotation of the shaft can be converted into opening and closing movements of the jaws (218 and 220). Thus, the object can be clamped by the jaws, rotated, and linearly moved inside a sealed chamber under the control of external drive means.
    • 一种用于将物体定位在密封真空室(112)内的装置包括一个与真空室(112)密封连接的台架壳体(114)。 位于壳体(114)内部的管状体(158)能够通过在固定壳体的表面上滑动并旋转的外部磁体(116)的相互作用而在固定壳体(114)内旋转和平移,并且 内部磁体(118),其连接到管状体(158)上。 轴(198)位于管状体内部,但不能相对于本体轴向移动。 轴(198)的前端延伸到真空室(112)中,并且可以携带在真空室中待处理或测试的样品或任何其它物体。 轴(198)从外部驱动机构(124)驱动。 轴的旋转可以转换成夹爪(218和220)的打开和关闭运动。 因此,物体可以在外部驱动装置的控制下被夹爪夹持,在密封室内旋转和线性移动。
    • 9. 发明授权
    • Apparatus for ion implantation including contactless cooling and beam
current measurement means
    • 用于离子注入的装置,包括非接触式冷却和束电流测量装置
    • US5338940A
    • 1994-08-16
    • US917208
    • 1992-07-21
    • Kunihiko Takeyama
    • Kunihiko Takeyama
    • H01J37/317H01J37/30G21K5/08
    • H01J37/3171H01J2237/2001H01J2237/20257H01J2237/31703
    • Wafer disk holds wafers in position by centrifugal force and its rotating shaft is supported by a bearing capable of magnetic levitation that has a thrust bearing and radial bearings. An annular groove providing a heat radiating zone is formed under the wafer receiving faces of the wafer disk. A cooling plate cooled to a temperature not exceeding the temperature of liquid nitrogen is inserted into the groove in a contactless manner so that the wafer disk is cooled by heat radiation. In the absence of any area of physical contact in the mechanisms for axially supporting and cooling the wafer disk, ions can be implanted in low dose into wafers on the fast rotating disk while improving the quality of wafers after implantation. Further, no triboelectricity will develop, thereby contributing to an improvement in the precision of ion beam current measurement.
    • 晶圆盘通过离心力将晶片保持在适当位置,其旋转轴由具有推力轴承和径向轴承的磁悬浮轴承支撑。 在晶片盘的晶片接收面的下方形成设置散热区的环状槽。 将冷却至不超过液氮温度的冷却板以非接触的方式插入槽中,从而通过热辐射冷却晶片盘。 在用于轴向支撑和冷却晶片盘的机构中没有任何物理接触区域的情况下,可以将离子以低剂量注入快速旋转盘上的晶片中,同时改善植入后晶片的质量。 此外,不会产生摩擦电,从而有助于提高离子束电流测量的精度。