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    • 6. 发明申请
    • Gain-coupled distributed feedback semiconductor laser device and production method therefor
    • 增益耦合分布反馈半导体激光器件及其制作方法
    • US20030039287A1
    • 2003-02-27
    • US10221363
    • 2002-09-12
    • Koji Takahashi
    • H01S005/00H01S003/08
    • B82Y20/00H01S5/1228H01S5/1231H01S5/3202H01S5/32366H01S5/34306H01S5/34313H01S5/3432H01S5/3434H01S5/34346H01S5/3438
    • The presence or absence and the intensity of refractive index distribution are easily controlled with high reproducibility without depending on the fabricating process accuracy. InGaAs well layers (14a) and (14b), which have a narrow bandgap and a high refractive index, are enclosed by a lower barrier layer (13), an intermediate barrier layer (15), an upper barrier layer (16) and a buried layer (18) of GaAsN-based materials of a wide bandgap. Then, by adjusting the nitrogen crystal mixture ratio of the GaAsN-based materials that constitute the barrier layers (13), (15) and (16) and the buried layer (18), the presence or absence and the intensity of the refractive index distribution are controlled. Thus, the refractive index distribution is easily controlled with high reproducibility without considering the configuration of a diffraction grating (17), a refractive index balance with respect to the buried layer (18) and so on, i.e., without depending on the fabricating process accuracy.
    • 折射率分布的存在或不存在和强度易于以高再现性进行控制,而不依赖于制造工艺的精度。 具有窄带隙和高折射率的InGaAs阱层(14a)和(14b)被下阻挡层(13),中间阻挡层(15),上阻挡层(16)和 具有宽带隙的GaAsN基材料的埋层(18)。 然后,通过调整构成阻挡层(13),(15)和(16)和掩埋层(18)的GaAsN基材料的氮结晶混合比,折射率的存在或不存在和强度 分配受到控制。 因此,不考虑衍射光栅(17)的构造,相对于掩埋层(18)的折射率平衡等,即不依赖于制造工艺精度,可以以高再现性容易地控制折射率分布 。