专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06372301B1 Method of improving adhesion of diffusion layers on fluorinated silicon dioxide 有权
标题翻译：改善氟化二氧化硅上扩散层粘附性的方法
公开(公告)号：US06372301B1
公开(公告)日：2002-04-16
申请号：US09218703
申请日：1998-12-22
申请人： Murali Narasimhan , Vikram Pavate , Kenny King-Tai Ngan , Xiangbing Li
发明人： Murali Narasimhan , Vikram Pavate , Kenny King-Tai Ngan , Xiangbing Li
IPC分类号： C23C1402
CPC分类号： H01L21/76826 , H01L21/3105 , H01L21/31629 , H01L21/76841
摘要： The present invention generally provides a method for stabilizing a halogen-doped silicon oxide film, particularly a fluorinated silicon oxide film. The invention also provides a method for preventing loosely bonded halogen atoms from reacting with components of the barrier layer during subsequent processing of the substrate. The invention provides a hydrogen plasma treatment of the halogen-doped silicon oxide film without subjecting the substrate to a heated environment that may damage the substrate and the structures formed on the substrate. The invention also improves the adhesion strength between the halogen-doped silicon oxide film and the barrier layer. Furthermore, the hydrogen plasma treatment can be practiced in a variety of plasma processing chambers of an integrated process sequence, including pre-clean chambers, physical vapor deposition chambers, chemical vapor deposition chambers, etch chambers and other plasma processing chambers.
摘要翻译：本发明通常提供一种稳定卤素掺杂氧化硅膜，特别是氟化氧化硅膜的方法。本发明还提供一种防止松散键合的卤素原子在随后的衬底加工过程中与阻挡层的组分发生反应的方法。本发明提供了卤素掺杂氧化硅膜的氢等离子体处理，而不会使基板受到可能损坏基板和形成在基板上的结构的加热环境。本发明还改善了卤素掺杂氧化硅膜和阻挡层之间的粘合强度。此外，氢等离子体处理可以在包括预清洁室，物理气相沉积室，化学气相沉积室，蚀刻室和其它等离子体处理室的综合处理顺序的各种等离子体处理室中实施。

2. 发明授权

US06216631B1 Robotic manipulation system utilizing patterned granular motion 有权
标题翻译：利用图案化粒状运动的机器人操纵系统
公开(公告)号：US06216631B1
公开(公告)日：2001-04-17
申请号：US09372619
申请日：1999-08-12
申请人： Alexander D. Wissner-Gross
发明人： Alexander D. Wissner-Gross
IPC分类号： C23C1402
CPC分类号： B05D3/12 , B05D5/00 , B05D2401/32 , B82Y10/00 , B82Y30/00 , C30B35/00 , Y10S977/724 , Y10S977/84 , Y10S977/88 , Y10S977/882 , Y10S977/888 , Y10S977/89 , Y10S977/932
摘要： A system (100, 100′, 100″) and method for robotic manipulation of objects (130) is provided wherein particulates (110, 110′) are agitated by the transfer of energy thereto to establish patterned granular motion of the particulates (110, 110′). The patterned granular motion of the particulates (110, 110′) forms standing waves (112). The objects (130) align themselves with the standing waves (112) and thus are dynamically arranged in a configuration established by the location of the standing waves (112). The location of the standing waves (112) can be predetermined by controlling the waveform of the signals applied to the energy application system (140). The predetermined waveforms are supplied from the signal source (150, 154) to the energy application system (140).
摘要翻译：提供了一种用于机器人操纵物体（130）的系统（100,100'，100“）和方法，其中微粒（110,110'）通过向其中的能量传递而被搅动以建立微粒（110 ，110'）。颗粒（110,110'）的图案化颗粒运动形成驻波（112）。物体（130）将其自身与驻波（112）对准，并因此以由驻波（112）的位置建立的配置动态地布置。可以通过控制施加到能量施加系统（140）的信号的波形来预定驻波（112）的位置。预定波形从信号源（150,154）提供给能量施加系统（140）。

3. 发明授权

US06821571B2 Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers 失效
标题翻译：等离子体处理以增强附着力并使含碳层的氧化最小化
公开(公告)号：US06821571B2
公开(公告)日：2004-11-23
申请号：US09336525
申请日：1999-06-18
申请人： Judy Huang
发明人： Judy Huang
IPC分类号： C23C1402
CPC分类号： H01L21/02126 , C23C16/325 , C23C16/56 , H01L21/02211 , H01L21/02274 , H01L21/02323 , H01L21/0234 , H01L21/3105 , H01L21/314 , H01L21/3146 , H01L21/31633
摘要： The present invention generally provides improved adhesion and oxidation resistance of carbon-containing layers without the need for an additional deposited layer. In one aspect, the invention treats an exposed surface of carbon-containing material, such as silicon carbide, with an inert gas plasma, such as a helium (He), argon (Ar), or other inert gas plasma, or an oxygen-containing plasma such as a nitrous oxide (N2O) plasma. Other carbon-containing materials can include organic polymeric materials, amorphous carbon, amorphous fluorocarbon, carbon containing oxides, and other carbon-containing materials. The plasma treatment is preferably performed in situ following the deposition of the layer to be treated. Preferably, the processing chamber in which in situ deposition and plasma treatment occurs is configured to deliver the same or similar precursors for the carbon-containing layer(s). However, the layer(s) can be deposited with different precursors. The invention also provides processing regimes that generate the treatment plasma and systems which use the treatment plasma. The carbon-containing material can be used in a variety of layers, such as barrier layers, etch stops, ARCs, passivation layers, and dielectric layers.
摘要翻译：本发明通常提供了改进的含碳层的粘附性和抗氧化性，而不需要额外的沉积层。一方面，本发明使用诸如氦（He），氩（Ar）或其它惰性气体等离子体或惰性气体等离子体的惰性气体等离子体处理含碳材料如碳化硅的暴露表面，含有等离子体，如一氧化二氮（N2O）等离子体。其它含碳材料可以包括有机聚合材料，无定形碳，无定形碳氟化合物，含碳氧化物和其它含碳材料。等离子体处理优选在沉积待处理层之后原位进行。优选地，其中发生原位沉积和等离子体处理的处理室被配置为递送含碳层的相同或相似的前体。然而，该层可以用不同的前体沉积。本发明还提供了产生处理等离子体的处理方案和使用处理等离子体的系统。含碳材料可以用于各种层，例如阻挡层，蚀刻停止层，ARC，钝化层和电介质层。

4. 发明授权

US06821570B2 Method for preparing a polymer for chemical mechanical polishing 失效
标题翻译：制备化学机械抛光用聚合物的方法
公开(公告)号：US06821570B2
公开(公告)日：2004-11-23
申请号：US10218869
申请日：2002-08-14
申请人： Yaw S. Obeng , Edward M. Yokley
发明人： Yaw S. Obeng , Edward M. Yokley
IPC分类号： C23C1402
CPC分类号： B24B37/24 , B24B37/013 , B24B37/042 , B24B49/003 , B24B49/16 , B24D3/26 , B24D18/0063 , B24D18/009 , B29C44/56 , B29C59/14 , B29K2105/04 , Y10T428/249952 , Y10T428/249953 , Y10T428/249987 , Y10T428/24999 , Y10T428/249991 , Y10T428/31507 , Y10T428/31551 , Y10T428/31725 , Y10T428/31743 , Y10T428/31765 , Y10T428/31786
摘要： The present invention is directed to a method for preparing a polymer for chemical mechanical polishing of a semiconductor substrate. The method comprises providing a thermoplastic foam substrate and exposing the substrate to an initial plasma reactant to produce a modified surface thereon. The method also includes exposing the modified surface to a secondary plasma reactant to create a grafted surface on the modified surface. An electrode temperature is maintained between about 20° C. and about 100° C. during the exposures of the substrate and the modified surface.
摘要翻译：本发明涉及制备用于半导体衬底的化学机械抛光的聚合物的方法。该方法包括提供热塑性泡沫基材并将基底暴露于初始等离子体反应物以在其上产生改性表面。该方法还包括将改性表面暴露于次级等离子体反应物以在改性表面上产生接枝表面。在基材和改性表面的曝光期间，电极温度保持在约20℃至约100℃之间。

5. 发明授权

US06171712B2 Palladium and palladium/copper thin flat membranes 失效
标题翻译：钯和钯/铜薄平膜
公开(公告)号：US06171712B2
公开(公告)日：2001-01-09
申请号：US09525364
申请日：2000-03-15
申请人： Peter Howard Thornton
发明人： Peter Howard Thornton
IPC分类号： C23C1402
CPC分类号： H01M8/0631 , C23C14/0005 , C23C14/14 , Y02P70/56 , Y10T428/12431
摘要： This invention is a method for making a thin, flat metal membrane of palladium or palladium/copper alloy. It involves sputtering the metal onto a flat surface of a substrate under conditions such that a deposited film is essentially free of compressive and tensile stresses. The membrane that results upon removal of the film from the substrate, as by dissolving a parting layer therebetween, does not curl up.
摘要翻译：本发明是制备钯或钯/铜合金薄的平坦金属膜的方法。它涉及将金属溅射到基板的平坦表面上，使得沉积膜基本上没有压缩和拉伸应力。导致膜从基板上移除的膜，如通过在其间溶解分离层而不会卷曲。

6. 发明授权

US06797314B2 Method of handling organic material in making an organic light-emitting device 有权
标题翻译：在制造有机发光装置时处理有机材料的方法
公开(公告)号：US06797314B2
公开(公告)日：2004-09-28
申请号：US09898369
申请日：2001-07-03
申请人： Steven A. Van Slyke , Dilip K. Chatterjee , Syamal K. Ghosh , Donn B. Carlton
发明人： Steven A. Van Slyke , Dilip K. Chatterjee , Syamal K. Ghosh , Donn B. Carlton
IPC分类号： C23C1402
CPC分类号： H01L51/5012 , C23C14/12 , H01L51/001
摘要： A method of handling powders of organic materials in making an organic light-emitting device (OLED) is disclosed. The method includes forming solid pellets from powders of organic materials and using such pellets in a thermal physical vapor deposition source for making an organic layer on a structure which will form part of an OLED.
摘要翻译：公开了一种在制造有机发光器件（OLED）中处理有机材料粉末的方法。该方法包括从有机材料的粉末形成固体颗粒，并在热物理气相沉积源中使用这种颗粒，以在将形成OLED的一部分的结构上形成有机层。

7. 发明授权

US06562416B2 Method of forming low resistance vias 有权
公开(公告)号：US06562416B2
公开(公告)日：2003-05-13
申请号：US09846187
申请日：2001-05-02
申请人： Minh Van Ngo , Robert A. Huertas , Dawn Hopper
发明人： Minh Van Ngo , Robert A. Huertas , Dawn Hopper
IPC分类号： C23C1402
CPC分类号： H01L21/76814 , H01L21/02063 , H01L21/76807
摘要： Low resistant vias are formed by sequentially treating an opening in an interlayer dielectric and the exposed surface of a lower metal feature with an NH3 plasma followed by a N2/H2 plasma, thereby removing any oxide on the metal surface and removing residual polymers or polymeric deposits generated during etching to form the opening. Embodiments include forming a dual damascene opening in a low-k interlayer dielectric exposing the upper surface of a lower Cu or Cu alloy feature, sequentially treating the opening and the upper surface of the lower metal feature with an NH3 plasma and then with a N2/H2 plasma, Ar sputter etching, depositing a barrier layer lining the opening, depositing a seedlayer and filling the opening with Cu or a Cu alloy.

8. 发明授权

US06224972B1 Method of making a PVD-coated HSS drill 失效
标题翻译：制造PVD涂层HSS钻头的方法
公开(公告)号：US06224972B1
公开(公告)日：2001-05-01
申请号：US09254539
申请日：1999-06-07
申请人： Anders Nordgren , Peter Littecke , Hans Johansson
发明人： Anders Nordgren , Peter Littecke , Hans Johansson
IPC分类号： C23C1402
CPC分类号： C23C14/028 , C25F3/24 , Y10T428/265 , Y10T428/31707
摘要： The present invention discloses an HSS tool with a PVD coating and with at least one cutting edge. The cutting edge has a radius of 15-25 &mgr;m and the carbides in the HSS are in contact with the coating. The present invention also relates to a method of making an HSS tool provided with a PVD coating with improved wear resistance. The improvement is obtained by subjecting the tool prior to the deposition of the coating to an electropolishing treatment such that a cutting edge radius of 15-25 &mgr;m is obtained and that the carbides in the HSS are revealed.
摘要翻译：本发明公开了一种具有PVD涂层并具有至少一个切削刃的HSS工具。刀刃的半径为15-25μm，HSS中的碳化物与涂层接触。本发明还涉及制备具有改进耐磨性的PVD涂层的HSS工具的方法。通过在将涂层沉积之前对该工具进行电抛光处理从而获得15-25μm的切削刃半径并且显露出HSS中的碳化物来获得改进。

9. 发明授权

US06723390B2 Laser deposition of elements onto medical devices 有权
标题翻译：将元件激光沉积在医疗器械上
公开(公告)号：US06723390B2
公开(公告)日：2004-04-20
申请号：US10192343
申请日：2002-07-10
申请人： Kenneth M. Merdan , Vitaliy N. Shapovalov
发明人： Kenneth M. Merdan , Vitaliy N. Shapovalov
IPC分类号： C23C1402
CPC分类号： C23C14/048 , B41M5/0052 , C23C14/28 , H05K3/046
摘要： Devices and methods for fabricating medical devices are disclosed. A device in accordance with the present inventions includes a laser beam source capable of producing a laser beam, a carrier coupled to a carrier motion actuator capable of moving the carrier relative to the laser beam, and a workpiece motion actuator capable of moving a workpiece relative the laser beam. A method in accordance with the present invention includes the steps of positioning the carrier between the laser beam source and the workpiece, illuminating a portion of the carrier with the laser beam, moving the carrier relative to the laser beam, and moving the workpiece relative to the laser beam.
摘要翻译：公开了用于制造医疗装置的装置和方法。根据本发明的装置包括能够产生激光束的激光束源，耦合到能够相对于激光束移动载体的载体运动致动器的载体和能够移动工件相对位置的工件运动致动器激光束。根据本发明的方法包括以下步骤：将载体定位在激光束源和工件之间，用激光束照射载体的一部分，使载体相对于激光束移动，并使工件相对于激光束。

10. 发明授权

US06565913B2 Non-irritating antimicrobial coatings and process for preparing same 有权
标题翻译：无刺激性抗微生物涂料及其制备方法
公开(公告)号：US06565913B2
公开(公告)日：2003-05-20
申请号：US09912694
申请日：2001-07-24
申请人： James Arps , Geoffrey Dearnaley
发明人： James Arps , Geoffrey Dearnaley
IPC分类号： C23C1402
CPC分类号： A61L29/16 , A61L27/54 , A61L2300/102 , A61L2300/104 , A61L2300/404 , A61L2300/606 , Y10T428/24942 , Y10T428/30
摘要： An adherent antimicrobial coating and method of making same comprising hydrogenated amorphous carbon and a dispersion of antimicrobial metal ions adapted to maintain a therapeutically effective zone of inhibition.
摘要翻译：粘附抗微生物涂层及其制备方法包括氢化无定形碳和抗微生物金属离子的分散体，其适于维持治疗有效的抑制区。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式