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    • 2. 发明公开
    • SPECTROMETER, AND SPECTROMETER PRODUCTION METHOD
    • SPEKTROMETER UND SPEKTROMETERHERSTELLUNGSVERFAHREN
    • EP3104144A1
    • 2016-12-14
    • EP15745768.0
    • 2015-02-03
    • Hamamatsu Photonics K.K.
    • YOKINO TakafumiSHIBAYAMA Katsumi
    • G01J3/02G01J3/18G01J3/36
    • G01J3/0256G01J3/021G01J3/0286G01J3/0289G01J3/0291G01J3/04G01J3/18G01J3/36
    • A spectrometer 1A includes a light detection element 20 provided with a light passing part 21, a first light detection part 22, and a second light detection part 26, a support 30 fixed to the light detection element 20 such that a space S is formed, a first reflection part 11 provided in the support 30 and configured to reflect light L1 passing through the light passing part 21 in the space S, a second reflection part 12A provided in the light detection element 20 and configured to reflect the light L1 reflected by the first reflection part 11 in the space S, and a dispersive part 40A provided in the support 30 and configured to disperse and reflect the light L1 reflected by the second reflection part 12A to the first light detection part 22 in the space S. A plurality of second light detection parts 26 is disposed in a region surrounding the second reflection part 12A.
    • 光谱仪1A包括设置有光通过部分21的光检测元件20,第一光检测部分22和第二光检测部分26,固定到光检测元件20的支撑件30,使得形成空间S, 第一反射部分11,其设置在支撑体30中并且被配置为将通过光通过部分21的光L1反射到空间S中;第二反射部分12A,设置在光检测元件20中,并且被配置为反射由光通过部分21反射的光L1 空间S中的第一反射部分11和设置在支撑件30中并被构造成将由第二反射部分12A反射的光L1分散并反射到空间S中的第一光检测部分22的色散部分40A。 第二光检测部26配置在包围第二反射部12A的区域。
    • 3. 发明公开
    • Spectral colorimetric apparatus and image forming apparatus including the same
    • Spektralkolorimetervorrichtung und diese aufweisende Bilderstellungsvorrichtung
    • EP2869047A1
    • 2015-05-06
    • EP14190341.9
    • 2011-10-24
    • CANON KABUSHIKI KAISHA
    • Kobayashi, HisanoriKomori, ShinObara, Mitsuhiro
    • G01J3/50G01J3/20G01J3/28G01J3/02G01J3/04
    • G01J3/502G01J3/02G01J3/0237G01J3/0248G01J3/04G01J3/20G01J3/28G01J3/2803G01J3/50G01J2003/2866
    • A spectral colorimetric apparatus includes a concave surface reflection type diffraction element configured to disperse an incident light beam; a sensor including a plurality of photoelectric conversion elements, wherein the plurality of photoelectric conversion elements is arranged in a direction parallel to a tangential line of a Rowland circle of the concave surface reflection type diffraction element, each photoelectric conversion elements being configured to receive the light beam dispersed by the concave surface reflection type diffraction element; a housing configured to support the concave surface reflection type diffraction element and the sensor; and a bonding portion provided on the housing, wherein the sensor is fixed to the housing with an adhesive provided between the bonding portion and the sensor. The bonding portion is provided only at a position corresponding to a center of the plurality of photoelectric conversion elements of the sensor in the direction in which the plurality of photoelectric conversion elements is arranged.
    • 光谱比色装置包括被配置为分散入射光束的凹面反射型衍射元件; 包括多个光电转换元件的传感器,其中所述多个光电转换元件布置在与所述凹面反射型衍射元件的Rowland圆的切线平行的方向上,每个光电转换元件被配置为接收所述光 由凹面反射型衍射元件分散的光束; 壳体,其构造成支撑所述凹面反射型衍射元件和所述传感器; 以及设置在所述壳体上的接合部分,其中所述传感器通过设置在所述接合部分和所述传感器之间的粘合剂固定到所述壳体。 接合部仅在与多个光电转换元件配置的方向上的传感器的多个光电转换元件的中心对应的位置处设置。
    • 6. 发明公开
    • Low distortion spectrometer
    • Spektrometer mit geringer Verzerrung
    • EP2551655A1
    • 2013-01-30
    • EP12173022.0
    • 2012-06-21
    • Raytheon Company
    • Robinson, Ian S.Cook, Lacy G.Shaham, Yifal J.
    • G01J3/04G01J3/28G01J3/02
    • G01J3/0294G01J3/0256G01J3/04G01J3/2803G01J3/2823
    • An imaging assembly for a spectrometer includes a substrate with first and second modules thereon containing respective arrays of detector elements positioned so the arrays are elongated along a first axis with a gap therebetween. A third module including a third array of detector elements is also thereon, spaced from the first axis, at least as long as the gap, and smaller than the elongation of either of the first or second arrays. Further thereon are first and second slits elongated along a second axis spaced from and generally parallel to the first axis, each being at least as long as the respective arrays. A third slit at least as long as the gap is also therein, spaced from the first axis, second axis, and third array such that the gap, third slit, and third array are generally along a third axis generally perpendicular to the first and second axis.
    • 用于光谱仪的成像组件包括其上具有第一和第二模块的基板,其上包含相应的检测器元件阵列,所述检测器元件被定位成使得阵列沿着第一轴线在其间具有间隙而细长。 包括检测器元件的第三阵列的第三模块也在其上,与第一轴线间隔开至少等于间隙,并且小于第一或第二阵列中的任一个的伸长率。 此外,还具有沿着与第一轴线间隔开并且大致平行于第一轴线的第二轴线延伸的第一和第二狭缝,每个狭缝至少与相应的阵列一样长。 第三狭缝至少与间隙一样长,与第一轴线,第二轴线和第三阵列间隔开,使得间隙,第三狭缝和第三阵列通常沿着大致垂直于第一和第二阵列的第三轴线 轴。
    • 9. 发明公开
    • Monolithic Offner Spectrometer
    • 单片Offner光谱仪
    • EP2407761A2
    • 2012-01-18
    • EP11175172.3
    • 2007-04-23
    • Corning Incorporated
    • Comstock, Lovell
    • G01J3/28G01J3/02G01J3/18G02B5/18
    • G01J3/18G01J3/02G01J3/0208G01J3/0259G01J3/04G01J3/2823G02B5/1852
    • A monolithic Offner spectrometer is described herein as are various components like a diffraction grating and a slit all of which are manufactured by using a state-of-the-art diamond machining process. In one embodiment, a monolithic Offner spectrometer is directly manufactured by using a diamond machining process. In another embodiment, a monolithic Offner spectrometer is manufactured by using molds which are made by a diamond machining process. In yet another embodiment, a diffraction grating is directly manufactured by using a diamond machining process. In still yet another embodiment, a diffraction grating is manufactured by using a mold which is made by a diamond machining process. In yet another embodiment, a slit is directly manufactured by using a diamond machining process.
    • 本文描述了单片Offner光谱仪,如衍射光栅和狭缝一样的各种组件,所有这些都是通过使用最新的金刚石加工工艺制造的。 在一个实施例中,通过使用金刚石加工工艺直接制造单片Offner光谱仪。 在另一个实施例中,单片Offner光谱仪通过使用由金刚石机加工工艺制成的模具来制造。 在又一个实施例中,通过使用金刚石加工工艺直接制造衍射光栅。 在又一个实施例中,衍射光栅通过使用由金刚石加工工艺制成的模具来制造。 在又一个实施例中,通过使用金刚石加工工艺直接制造狭缝。