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41. 发明专利

JPH09199453A METHOD FOR PROCESSING SEMICONDUCTOR WAFER 失效
公开(公告)号：JPH09199453A
公开(公告)日：1997-07-31
申请号：JP900096
申请日：1996-01-23
申请人： MITSUI TOATSU CHEMICALS
发明人： HIRAI KENTARO , OTA YASUHIKO , FUJII YASUHISA , KATAOKA MAKOTO , YAMAMORI MARIO , FUJII YASUKO
IPC分类号： B24B7/22 , C09J7/02 , C09J161/28 , C09J163/00 , C09J171/02 , C09J175/04 , C09J201/02 , H01L21/301 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method for processing a semiconductor wafer which pollutes little a semiconductor wafer face and a chip face. SOLUTION: An adhesive film is adhered to a face of a semiconductor wafer to grind a reverse face of the wafer, the adhesive film is separated after completion of grinding, and further the wafer is diced. In this case, the adhesive film has an adhesive layer containing (a) adhesive polymer having a functional group capable of reacting on crosslinking agent, (b) crosslinking agent having two or more functional groups capable of crosslinking a functional group of adhesive polymer in one molecule and (c) anionic surfactant on one face of a material film at 0.05 to 5 pts.wt. with respect to the sum of (a) and (b) described above at 100 pts.wt., and water is sprinkled on a wafer face while dicing is performed.

42. 发明专利

JPH09194588A POLYETHERPOLYOL AND ITS PRODUCTION 失效
公开(公告)号：JPH09194588A
公开(公告)日：1997-07-29
申请号：JP659296
申请日：1996-01-18
申请人： MITSUI TOATSU CHEMICALS
发明人： AKIMOTO SATORU , NAKAJIMA TOSHIKAZU , MARUYAMA MAKOTO , KAWASAKI HIROSHI
IPC分类号： C08G65/28 , C08G18/48
摘要： PROBLEM TO BE SOLVED: To obtain a polyetherpolyol without the remains and detection of an initiator and useful for a raw material, etc., for a production of a polyurethane foam by carrying out an addition reaction of a saccharide with an alkylene oxide under the existence of a catalyst using a specified polyetherpolyol as a solvent. SOLUTION: This polyetherpolyol is obtained by carrying out an addition reaction of a saccharide (e.g.; a sucrose) with an alkylene oxide (e.g.; propylene oxide) in the presence of an amine compound (e.g.; dimethylpalmitylamine) represented by the formula (R1 is a 8-18C alkyl or alkenyl; R2 and R3 are each H or a 1-18C alkyl) as a catalyst in a polyetherpolyol having >=300 molecular weight and >=3 average functional group as a solvent. The addition reaction is carried out by reacting the alkylene oxide (e.g.; propylene oxide) in 20-400 pts.wt. solvent based on 100 pts.wt. saccharide in an autoclave at the temperature of 110 deg.C for 5 hours and provides the objective polyetherpolyol, without the remains and detection of an initiator, good in quality such as having a harmless smell and useful for a raw material, etc., for a production of a polyurethane foam.

43. 发明专利

JPH09194410A PRODUCTION OF HIGHER SECONDARY ALCOHOL 失效
公开(公告)号：JPH09194410A
公开(公告)日：1997-07-29
申请号：JP726696
申请日：1996-01-19
申请人： MITSUI TOATSU CHEMICALS
发明人： INOUE YOSHIHISA , WATABE YASUYOSHI
IPC分类号： C07C29/06 , C07C29/12 , C07C31/125
摘要： PROBLEM TO BE SOLVED: To readily obtain the subject compound useful as a raw material for a detergent in high yield. SOLUTION: This method for producing a higher secondary alcohol (e.g. 2-dodecanol or 3-dodecanol) comprises reacting >=0.2mol of a 10-14C straight- chain higher olefin (e.g. decene, dodecene or tetradecene) with 1mol of sulfuric acid at -20 to 80 deg.C by any of a batch method, a semi-batch method or a continuous circulation method and reacting a formed reaction mixture with water. The sulfuric acid used in the reaction is preferably an aqueous solution containing 85-99wt.% sulfuric acid.

44. 发明专利

JPH09187818A MANUFACTURE OF THERMOPLASTIC POLYIMIDE MOLDING MATERIAL 失效
公开(公告)号：JPH09187818A
公开(公告)日：1997-07-22
申请号：JP218596
申请日：1996-01-10
申请人： MITSUI TOATSU CHEMICALS
发明人： YANO SHIGERU , YAMAKI MASAHIKO , JITOSHO HIROYUKI
IPC分类号： B29B7/20 , B29B7/84 , B29B13/06 , B29K77/00
摘要： PROBLEM TO BE SOLVED: To omit preliminary drying by a method wherein a same direction rotary biaxially extruder having two vent openings is used, and time wherein raw material is carried from a supply opening to a vent opening on the up stream side with a screw and reduction of pressure at the vent opening on the downstream side are specified. SOLUTION: A two vent type same direction rotary biannually extruder 5 has a supply opening 1 for a thermoplastic polyimide single substance or a blended material of the thermoplastic polyimide and an additive, and a supply opening 2 for a reinforcing agent, and has a vent opening 3 between the supply opening 1 and the supply opening 2 and a vent 4 on the downstream side of the supply opening 2. The vent 4 must be kept under a reduced pressure of 100Hg or under by use of a vacuum pump. Though the thermoplastic polyimide single substance or the blended material of the thermoplastic polyimide and the additive is supplied from the supply opening 1 to an extruder 5, since an inside of the extruder is kept at a high temperature, the raw material must be carried to below the vent 3 in 10sec to 12sec with a screw.

45. 发明专利

JPH09186121A METHOD FOR GRINDING BACK SURFACE OF SEMICONDUCTOR WAFER 失效
公开(公告)号：JPH09186121A
公开(公告)日：1997-07-15
申请号：JP34207495
申请日：1995-12-28
申请人： MITSUI TOATSU CHEMICALS
发明人： HIRAI KENTARO , FUJII YASUHISA , KATAOKA MAKOTO , FUKUMOTO HIDEKI
IPC分类号： B24B1/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method for grinding the back surface of the wafer by means of adhering an adhesive film having an ultraviolet hardening-type adhesive layer on the surface of the semiconductor wafer. SOLUTION: (a) An acrylic polymer 100 weight part whose quantity of polymerized carbon-carbon double bonds is 2×10 -2×10 in 1g of polymer in polymer having polymerized carbon-carbon double bond and a functional group which can become a bridge point in molecules, (b) a heat cross linking agent 0.1-10 weight part having more than two bridging functional group in one molecule and (c) an intra-molecule connection cleavage type photopolymerization start agent 0.1-3 weight part is adhered to the surface of the semiconductor wafer. The back of the wafer is ground. The ultraviolet rays whose light quantity if 300-3000mJ/cm are emitted and the adhesive film is peeled off.

46. 发明专利

JPH09176984A COMPOSITION FOR PRODUCING PAPER FOR CONSTRUCTION 失效
公开(公告)号：JPH09176984A
公开(公告)日：1997-07-08
申请号：JP33904395
申请日：1995-12-26
申请人： MITSUI TOATSU CHEMICALS
发明人： SHIIYAMA EISUKE , MORITA SHIGEHIRO , KITAHARA MITSUO , KAMATA KAZUNORI
IPC分类号： D06M11/00 , D06M101/00 , D06M101/02 , D06M101/06 , D21H17/35 , D21H17/67 , D21H21/14 , D21H27/20
摘要： PROBLEM TO BE SOLVED: To obtain a composition for producing a paper suitable for a construction not developing the fall off of an inorganic powdery material by blending the inorganic powdery material to a binder consisting of a specific copolymer latex. SOLUTION: This composition for producing a paper for a construction is obtained by preparing a binder consisting of a copolymer latex prepared by an emulsion copolymerization of 30-65wt.% aliphatic conjugated diene-based monomer such as butadiene with 70-35wt.% copolymerizable monomer such as styrene, methyl methacrylate and acrylonitrile, and blending an inorganic powdery material such as calcium carbonate with 5-30wt.% above copolymer latex having adhesive strength so as not to develop the fall off of the inorganic powdery material as the binder. By applying the composition over a paper raw material, a pasting paper for construction effective for preventing a condensed water from dripping down is obtained.

47. 发明专利

JPH09176261A CURABLE RESIN COMPOSITION 失效
公开(公告)号：JPH09176261A
公开(公告)日：1997-07-08
申请号：JP33484895
申请日：1995-12-22
申请人： MITSUI TOATSU CHEMICALS
发明人： DOI KIYOTO , UEDA KYOICHI , TANAKA KOICHI , KOTO NOBUHIKO
IPC分类号： C08G8/16 , C08G8/00 , C08G12/06 , C08G16/00
摘要： PROBLEM TO BE SOLVED: To obtain a crack-resistant tough homogeneous resin compsn. without detriment to the characteristics, such as high rigidity, resistances to heat, chemicals, solvent, scratch, and abrasion, etc., of a cured item obtd. therefrom. SOLUTION: This resin compsn. is prepd. by reacting and/or mixing a compd. represented by the formula: X1 -R1 -O-(AO)n -(BO)m -R1 -X2 (wherein at least one of X1 and X2 is a group reactive with an aldehyde and/or with a compd. cocondensable with an aldehyde; R1 is a 1-5C alkylene; AO and BO are each a 2-5C oxyalkylene provided they may form a block and/or random copolymer; and (n) and (m) are each an integer of 0-100 provided 1

48. 发明专利

JPH09176209A METHOD FOR POLYMERIZING VINYL CHLORIDE MONOMER 失效
公开(公告)号：JPH09176209A
公开(公告)日：1997-07-08
申请号：JP34214695
申请日：1995-12-28
申请人： MITSUI TOATSU CHEMICALS
发明人： MAEDA SUNAO , OZAWA MASAAKI , ONO YUZO , TAKAHASHI AKIHIKO , NAKAMURA ICHISABURO
IPC分类号： C08F14/06 , C08F2/00 , C08F14/00
摘要： PROBLEM TO BE SOLVED: To effectively inhibit polymer scales from depositing on the surfaces of those areas of a polymerizer which contact with monomers by applying a coating solution containing a reaction product obtained by oxidatively coupling a phenolic monomer to the surfaces to previously form a coating film thereon. SOLUTION: In feeding a vinyl chloride monomer alone or a mixture thereof with a monomer copolymerizable therewith into a polymerizer and copolymerizing the monomer or monomers, the surface of the polymerizer is previously coated with a reaction product (of a molecular weight of 200-35,000) obtained by oxidatively coupling a phenolic monomer represented by formula I [wherein X and Y are each H, an alkyl, an alkoxyl, an aryl, a phenylalkyl, allyl, hydroxyl or a -COOR(wherein R is H or an alkyl)] with peroxidase enzyme at 10-40 deg.C in water or a water/organic solvent. The coating fluid is prepared by dissolving 0.1-10.0wt.% reaction product in an aqueous alkali metal hydroxide solution (of a concentration of 0.05-5.0wt.% or dissolving 0.3-3.0wt.% reaction product in an organic solvent (e.g. tetrahydrofuran). The coating weight is 0.005-10g/m (in terms of the reaction product).

49. 发明专利

JPH09176147A NEW HALOHYDRIN COMPOUND AND ITS PRODUCTION 失效
公开(公告)号：JPH09176147A
公开(公告)日：1997-07-08
申请号：JP33663195
申请日：1995-12-25
申请人： MITSUI TOATSU CHEMICALS
发明人： INOMATA MASASANE , KAWAI MOTOMASU , ISHII SEIICHI
IPC分类号： C07D309/06 , C08G59/02
摘要： PROBLEM TO BE SOLVED: To obtain a new halohydrin compound useful as an important precursor enabling to extremely safely and easily produce epoxy compounds used as intermediates for resin stabilizers, reactive diluents, etc. SOLUTION: This new halohydrin compound includes monohalohydrin compound of formula I (R,R -R are each H, an alkyl; X is a halogen) and a bishalohydrin compound of formula II, e.g. 2-vinyl-5-(2-chloro-1-hydroxyethyl) tetrahydropyrane, 2.5-bis(2-chloro-1-hydroxyethyl)tetrahydropyrane. The halohydrin compounds of formulas I and II are obtained by reacting a 2,5- dialkenyltetrahydropyrane derivative of formula III with a hypohalogeneous acid. The compounds of formulas I and II are useful as precursors for an epoxy compound of formula IV and/or an epoxy compound of formula V.

50. 发明专利

JPH09174752A REFLECTING PLATE 失效
公开(公告)号：JPH09174752A
公开(公告)日：1997-07-08
申请号：JP33485295
申请日：1995-12-22
申请人： MITSUI TOATSU CHEMICALS
发明人： GOTOU MASAMI , KAWAMOTO SATOSHI , FUKUDA SHIN , FUKUDA NOBUHIRO
IPC分类号： G02B5/08 , B32B15/08 , G02B5/26
摘要： PROBLEM TO BE SOLVED: To improve the stability of a reflecting plate in a high temperature environment using silver by using the reflecting plate. SOLUTION: This reflecting plate comprises a transparent polymer film 10, at least one metal layer 20 selected from titanium, tungsten and copper, a silver thin film layer 30, an adhesive layer 40 and a support 50, wherein the reflectivity measured from the polymer film side even after heating at 150 deg.C for 500 hours in the atmosphere is 90% or more.

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