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61. 发明专利

JP5339819B2 Magnetic recording media and a method of manufacturing the same 有权
公开(公告)号：JP5339819B2
公开(公告)日：2013-11-13
申请号：JP2008220185
申请日：2008-08-28
申请人：シーゲートテクノロジーインターナショナルSeagate Technology International
发明人：明馥李 , 鎭昇孫 , 厚山李
IPC分类号： G11B5/66 , G11B5/65 , G11B5/667 , G11B5/84 , G11B5/851
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/66 , G11B5/743 , G11B5/746 , G11B5/855
摘要： A magnetic recording medium and a method of manufacturing the magnetic recording medium are provided. In order to increase the recording density of the magnetic recording medium, the magnetic recording medium is configured to multiple magnetic layers by consecutively forming a first magnetic layer having a thin film shape and a second magnetic layer comprising patterned magnetic bits. The first magnetic layer has a magnetic anisotropic coefficient greater than that of the second magnetic layer.

62. 发明专利

JP5336151B2 Method of manufacturing a thin film forming apparatus and a magnetic recording medium 有权
公开(公告)号：JP5336151B2
公开(公告)日：2013-11-06
申请号：JP2008282384
申请日：2008-10-31
申请人：キヤノンアネルバ株式会社
发明人：アインシタインノエルアバラ
IPC分类号： C23C14/34 , C23C14/14 , G11B5/851
CPC分类号： C23C14/568 , C23C14/34 , C23C14/541 , G11B5/851 , H01F41/18
摘要： The present invention provides a thin film formation apparatus which includes a plurality of chambers, and performs processing for forming thin films on two surfaces of a substrate transferred to the plurality of chambers, wherein a first sputtering chamber of the plurality of chambers includes a first sputtering film formation unit configured to perform a sputtering film formation process on a first surface of the substrate, and a first heating unit configured to heat a second surface opposite to the first surface of the substrate, and a second sputtering chamber of the plurality of chambers includes a second heating unit configured to heat the first surface of the substrate having undergone the sputtering film formation process performed by the first sputtering chamber, and a second sputtering film formation unit configured to perform a sputtering film formation process on the second surface of the substrate heated by the first sputtering chamber.

63. 发明专利

JP5294048B2 A method for manufacturing of alumina nano-hole array and the magnetic recording medium 有权
公开(公告)号：JP5294048B2
公开(公告)日：2013-09-18
申请号：JP2007314774
申请日：2007-12-05
申请人：富士電機株式会社
发明人：孝一津田
IPC分类号： G11B5/851 , G11B5/65 , G11B5/84 , G11B5/858
CPC分类号： C25D11/045 , B82Y10/00 , C25D11/16 , C25D11/18 , G11B5/743 , G11B5/82 , G11B5/855 , G11B5/858
摘要： An alumina nanohole array and a method of fabricating the same includes the steps of forming an aluminum thin-film on a substrate at a substrate temperature of -80° C. or below so that crystal grain growth is suppressed, even when a high-purity aluminum material is used, thus providing improved surface smoothness; and anodizing the aluminum thin-film. Preferably, the method additionally includes texturing by pressing a mold having an orderly array of projections against the aluminum thin-film to form pits on the aluminum thin-film which enables a larger array area to be formed. When the mold and the aluminum thin-film are held at a temperature of 150 to 200° C., the pressure used for pit formation is reduced. A magnetic recording medium manufactured by a method therefore includes forming a magnetic layer within the nanoholes so that the medium is suitable as a bit patterned media for a perpendicular recording system.

64. 发明专利

JP5290468B2 Fe-Pt based sputtering target C particles are dispersed 有权
公开(公告)号：JP5290468B2
公开(公告)日：2013-09-18
申请号：JP2012511850
申请日：2011-11-14
申请人： Jx日鉱日石金属株式会社
发明人：敦佐藤 , 真一荻野
IPC分类号： G11B5/851 , C23C14/34
CPC分类号： C23C14/3407 , B22F3/14 , C22C33/0228 , C23C14/3414 , G11B5/851 , H01B1/02
摘要： A sintered compact sputtering target in which a composition ratio based on atomicity is represented by a formula of (Fe100-X-PtX)100-A-CA (provided A is a number which satisfies 20@A@50 and X is a number which satisfies 35@X@55), wherein C grains are finely dispersed in an alloy, and the relative density is 90% or higher. An object of this invention is to enable the production of a magnetic thin film with granular structure without using an expensive simultaneous sputtering device, as well as provide a high-density sputtering target capable of reducing the amount of particles generated during sputtering.

65. 发明专利

JP2013174020A Sputtering apparatus 有权
标题翻译：溅射装置
公开(公告)号：JP2013174020A
公开(公告)日：2013-09-05
申请号：JP2013091769
申请日：2013-04-24
申请人： Canon Anelva Corp , キヤノンアネルバ株式会社
发明人： ERNULT FRANCK
IPC分类号： C23C14/34 , G11B5/851
CPC分类号： C23C14/505 , C23C14/351 , H01J37/32761 , H01J37/34 , H01L21/68764 , H01L21/68785 , H01L21/68792
摘要： PROBLEM TO BE SOLVED: To keep a direction of a substrate in a desired fixed direction when viewed from a target set at a position facing the substrate, in diagonal sputtering.SOLUTION: A sputtering apparatus includes a substrate holder, a magnetic field supplying means, and a target mounting table. The substrate holder includes a first stage 1 which can mount a substrate and can rotate about a first rotating shaft, a second stage 2 which can rotate about a second rotating shaft shifted from the first rotating shaft of the first stage, a rotational movement means which rotates the first stage about the first rotating shaft, and an orbital motion means which revolves the first stage about the second rotating shaft by rotating the second stage about the second rotating shaft. The magnetic field applying means applies a magnetic field in a specific direction to the substrate. The target mounting table mounts a target configured to deposit a film on the substrate. The rotational movement means rotates the first stage in a direction opposite to that of the rotation of the orbital motion means, and rotates the first stage so as to maintain the specific direction of the magnetic field supplied to the substrate from the magnetic field supplying means.
摘要翻译：要解决的问题：在对角溅射中，从设置在面向基板的位置的目标观察时，将基板的方向保持在期望的固定方向。解决方案：溅射装置包括基板保持器，磁场供给装置，和目标安装台。衬底保持器包括第一级1，其可以安装衬底并且可围绕第一旋转轴旋转，第二级2可围绕从第一级的第一旋转轴偏移的第二旋转轴旋转;旋转运动装置，围绕第一旋转轴旋转第一级，以及轨道运动装置，其围绕第二旋转轴旋转第二级，围绕第二旋转轴旋转第一级。磁场施加装置将特定方向的磁场施加到基板。目标安装台安装配置成在基板上沉积膜的目标。旋转运动装置以与轨道运动装置的旋转方向相反的方向旋转第一级，并且使第一级旋转，以便保持从磁场供应装置提供给衬底的磁场的特定方向。

66. 发明专利

JP2013149320A Method for manufacturing magnetic recording medium 有权
标题翻译：制造磁记录介质的方法
公开(公告)号：JP2013149320A
公开(公告)日：2013-08-01
申请号：JP2012009323
申请日：2012-01-19
申请人： Fuji Electric Co Ltd , 富士電機株式会社
发明人： UCHIDA SHINJI
IPC分类号： G11B5/851 , G11B5/65 , G11B5/738
CPC分类号： G11B5/84 , C23C14/34 , C23C14/3414 , C23C14/3464 , C23C14/568 , G11B5/65 , G11B5/851
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a magnetic recording medium which includes reducing and eliminating impurity gas present in a chamber for improving the crystallinity of a magnetic recording layer and is excellent in electromagnetic conversion characteristics.SOLUTION: The method for manufacturing a magnetic recording medium includes a step in which an active material layer is formed sequentially immediately below or immediately above a magnetic recording layer, and a step in which the active material layer is formed while forming the magnetic recording layer in the same chamber or with a gate opened between the magnetic recording layer chamber and the active material layer. The active material layer is mainly composed of any of Ti, Cr, Mn and Si or at least one of these elements.
摘要翻译：要解决的问题：提供一种制造磁记录介质的方法，其包括减少和消除存在于腔室中的杂质气体，以改善磁记录层的结晶度，并且电磁转换特性优异。磁记录介质包括在磁记录层的正下方或紧接上方依次形成活性物质层的步骤，其中在形成磁记录层的情况下形成活性物质层的步骤，在磁记录层室和活性物质层之间打开。活性物质层主要由Ti，Cr，Mn和Si中的任一种或这些元素中的至少一种构成。

67. 发明专利

JP5253513B2 Multilayer film sputtering apparatus and a multilayer film forming method 有权
公开(公告)号：JP5253513B2
公开(公告)日：2013-07-31
申请号：JP2010535749
申请日：2009-10-13
申请人：キヤノンアネルバ株式会社
发明人：雅弘芝本
IPC分类号： C23C14/34 , C23C14/35 , G11B5/851
CPC分类号： G11B5/851 , C23C14/3464 , H01J37/3405 , H01J37/3429 , H01J37/347

68. 发明专利

JP5238143B2 Target material and methods for their production, including the Cr-Mo-Cu 有权
公开(公告)号：JP5238143B2
公开(公告)日：2013-07-17
申请号：JP2006132420
申请日：2006-05-11
申请人：山陽特殊製鋼株式会社
发明人：俊之澤田 , 彰彦柳谷
IPC分类号： C23C14/34 , C22C1/04 , C22C27/06 , G11B5/851

69. 发明专利

JP2013084322A Soft magnetic film for thermally assisted magnetic recording medium and manufacturing method therefor 审中-公开
标题翻译：用于热辅助磁记录介质的软磁膜及其制造方法
公开(公告)号：JP2013084322A
公开(公告)日：2013-05-09
申请号：JP2011222712
申请日：2011-10-07
申请人： Hitachi Metals Ltd , 日立金属株式会社
发明人： YAKABE HIDETAKA , FUKUOKA ATSUSHI , SAITO KAZUYA , SAKAMAKI KOICHI
IPC分类号： G11B5/667 , G11B5/851 , H01F10/26
摘要： PROBLEM TO BE SOLVED: To provide a soft magnetic film for a thermally assisted magnetic recording medium and a method for producing the magnetic film capable of maintaining an amorphous or minute crystalline structure even in a heating treatment.SOLUTION: The soft magnetic film for a thermally assisted magnetic recording medium comprises a material expressed by composition formula of Fe-Cu-Nb-(Si+B)in terms of atomic ratio, with x, y and z satisfying 0.5≤x≤3.0, 1≤y≤15 and 20≤z≤30, and the balance of inevitable impurities. The production method of a soft magnetic film for a thermally assisted magnetic recording medium comprises forming the film by sputtering by use of an alloy target comprising a material expressed by composition formula of Fe-Cu-Nb-(Si+B)in terms of atomic ratio, with x, y and z satisfying 0.5≤x≤3.0, 1≤y≤15 and 20≤z≤30, and the balance of inevitable impurities.
摘要翻译：要解决的问题：提供一种用于热辅助磁记录介质的软磁膜以及即使在加热处理中也能够保持无定形或微小结晶结构的磁膜的制造方法。解决方案：用于热辅助磁记录介质的软磁膜包括由组成式表示的材料，由Fe 100-xyz -Cu x -Nb y - （Si + B） z 以原子比计，x，y和 z满足0.5≤x≤3.0,1≤y≤15和20≤z≤30，余量为不可避免的杂质。用于热辅助磁记录介质的软磁膜的制造方法包括通过使用包含由组成式表示的材料的合金靶通过溅射来形成膜，所述组成式为Fe-SB POS =“POST”> 100-xyz x -Nb y - （Si + B） z 以原子比计，x，y和z满足0.5≤x≤3.0,1≤y≤15和20≤z≤30，余量为不可避免的杂质。版权所有（C）2013，JPO＆INPIT

70. 发明专利

JP5192993B2 Method of forming a magnetic layer 有权
公开(公告)号：JP5192993B2
公开(公告)日：2013-05-08
申请号：JP2008291031
申请日：2008-11-13
申请人：昭和電工株式会社
发明人：貴士田中
IPC分类号： G11B5/851 , C23C14/08 , C23C14/34 , G11B5/65 , G11B5/82
CPC分类号： G11B5/851 , C23C14/0036 , C23C14/0688 , C23C14/3492 , G11B5/65 , H01F41/18

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