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    • 93. 发明授权
    • Method for manufacturing a vertical bipolar transistor compatible with CMOS manufacturing methods
    • 制造与CMOS制造方法兼容的垂直双极晶体管的方法
    • US09257526B2
    • 2016-02-09
    • US14313836
    • 2014-06-24
    • STMicroelectronics SA
    • Pierre Boulenc
    • H01L29/66H01L21/8249H01L29/732H01L29/06H01L29/739H01L29/08
    • H01L29/66333H01L21/8249H01L29/0692H01L29/0821H01L29/66272H01L29/7325H01L29/7395
    • The present disclosure relates to a method for manufacturing a bipolar transistor. The method forms a trench to isolate a first region from a second region in a semiconductor wafer, and to isolate these regions from the rest of the wafer. The method forms first P-doped well in the second region and produces a collector region of second and third wells by a P doping in the first region. The second well is in contact with the first well below the trench. The method also produces an N-doped base well on the collector region and, at the wafer surface, and forms a CMOS transistor gate on the first region and delimiting a third region and a fourth region. The method also forms a P+-doped collector contact region in the first well, forms a P+ doped emitter region in the third region, and forms an N+-doped base contact region in the fourth region.
    • 本公开涉及一种用于制造双极晶体管的方法。 该方法形成沟槽以将第一区域与半导体晶片中的第二区域隔离,并将这些区域与晶片的其余部分隔离。 该方法在第二区域中形成第一P掺杂阱,并且在第一区域中通过P掺杂产生第二阱和第三阱的集电极区。 第二个井与沟槽下面的第一个井接触。 该方法还在集电极区域和晶片表面上产生N掺杂的基极阱,并在第一区域上形成CMOS晶体管栅极并限定第三区域和第四区域。 该方法还在第一阱中形成P +掺杂的集电极接触区,在第三区中形成P +掺杂的发射极区,并在第四区中形成N +掺杂的基极接触区。
    • 98. 发明授权
    • Photosite with pinned photodiode
    • 具有固定光电二极管的光电二极管
    • US09099366B2
    • 2015-08-04
    • US13529045
    • 2012-06-21
    • Francois RoyJulien Michelot
    • Francois RoyJulien Michelot
    • H01L27/146H01L31/0352
    • H01L27/14603H01L27/14607H01L27/1461H01L27/1463H01L27/14638H01L27/1464H01L31/0352
    • A photosite is formed in a semiconductor substrate and includes a photodiode confined in a direction orthogonal to the surface of the substrate. The photodiode includes a semiconductor zone for storing charge that is formed in an upper semiconductor region having a first conductivity type and includes a main well of a second conductivity type opposite the first conductivity type and laterally pinned in a first direction parallel to the surface of the substrate. The photodiode further includes an additional semiconductor zone including an additional well having the second conductivity type that is buried under and makes contact with the main well.
    • 在半导体衬底中形成有一个光电子结构,并包括一个限制在与衬底表面正交的方向上的光电二极管。 光电二极管包括用于存储形成在具有第一导电类型的上半导体区域中的电荷的半导体区,并且包括与第一导电类型相反的第二导电类型的主阱,并且在与第一导电类型的表面平行的第一方向上横向固定 基质。 光电二极管还包括另外的半导体区域,该半导体区域包括具有第二导电类型的另外的阱,该第二导电类型被埋在主阱中并与主阱接触。