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91. 发明授权

US09586240B2 Method of cleaning food and beverage manufacturing and handling equipment 有权
标题翻译：清洁食品和饮料制造和处理设备的方法
公开(公告)号：US09586240B2
公开(公告)日：2017-03-07
申请号：US14173236
申请日：2014-02-05
申请人： Delaval Holding AB
发明人： Fahim U. Ahmed , Bruno Van Den Bossche
IPC分类号： B08B3/00 , B08B3/08 , C11D3/30 , C11D7/32 , C11D11/00
CPC分类号： B08B3/08 , C11D3/30 , C11D7/3209 , C11D11/0041
摘要： The present invention is generally directed toward methods of cleaning and descaling surfaces contaminated with food soils, especially clean-in-place systems. More particularly, the methods according to the present invention also provide for sanitizing of surfaces contaminated with food soils. Thus, there is provided a single cleaning cycle that may clean, sanitize, and descale food-soiled surfaces, and in certain embodiments, without the need for a pre-rinse step, using a non-chlorine detergent composition. The methods comprise a cleaning step and a post-rinsing step. In certain embodiments, a pre-rinse step is utilized, in which the volume of pre-rinse fluid used is less than 50% of the volume of cleaning solution used in the cleaning step.
摘要翻译：本发明一般涉及清洁和除垢表面污染食物土壤，特别是现场清洁系统的方法。更具体地，根据本发明的方法还提供了用食物污染物污染的表面的消毒。因此，提供了可以清洁，消毒和除垢食物污染的表面的单个清洁循环，并且在某些实施方案中，使用非氯洗涤剂组合物不需要预漂洗步骤。该方法包括清洗步骤和漂洗后步骤。在某些实施方案中，使用预漂洗步骤，其中使用的预漂洗液的体积小于清洗步骤中使用的清洗溶液体积的50％。

92. 发明授权

US09576789B2 Apparatus, method, and composition for far edge wafer cleaning 有权
标题翻译：用于远边晶圆清洗的装置，方法和组成
公开(公告)号：US09576789B2
公开(公告)日：2017-02-21
申请号：US13752415
申请日：2013-01-29
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Hsin-Hsien Lu , Ting-Kui Chang , Jung-Tsan Tsai
IPC分类号： B08B3/00 , H01L21/02 , H01L21/67
CPC分类号： H01L21/02087 , H01L21/02057 , H01L21/30625 , H01L21/67046 , H01L21/67051 , H01L21/67219
摘要： A wafer cleaning apparatus includes a polishing unit used in chemical mechanical polishing (CMP) of a wafer and a cleaning dispensing unit arranged to direct cleaning fluids toward a far edge of the wafer after the CMP of the wafer. A wafer cleaning method includes CMP of a wafer by a polishing unit and directing cleaning fluids toward a far edge of the wafer after the CMP of the wafer by a cleaning dispensing unit. Another method can include CMP, applying deionized water, and applying pH adjuster having a pH range from about 2 to about 13.
摘要翻译：晶片清洁装置包括用于晶片的化学机械抛光（CMP）的抛光单元和布置成在晶片的CMP之后将清洁流体引向晶片的远边缘的清洁分配单元。晶片清洗方法包括通过抛光单元对晶片进行CMP，并且通过清洁分配单元在晶片的CMP之后将清洁流体导向晶片的远边缘。另一种方法可以包括CMP，施加去离子水和施加pH范围为约2至约13的pH调节剂。

93. 发明授权

US09555450B2 Vacuum cleaning apparatus and vacuum cleaning method 有权
标题翻译：真空清洗装置和真空清洗方法
公开(公告)号：US09555450B2
公开(公告)日：2017-01-31
申请号：US14274883
申请日：2014-05-12
申请人： IHI Corporation , IHI Machinery and Furnace Co., Ltd.
发明人： Noboru Hiramoto , Masatoshi Mitsuzuka , Hiroyuki Konishi
IPC分类号： B08B3/10 , B08B5/04 , C23G5/00 , B08B3/04 , F26B5/04 , B08B3/02 , B08B3/08 , B08B3/00
CPC分类号： B08B3/04 , B08B3/00 , B08B3/02 , B08B3/08 , B08B3/10 , B08B5/04 , B08B2230/01 , C23G5/00 , F26B5/04
摘要： Vacuum cleaning apparatus (1, 51) includes a vapor generating member (8, 8a, 53, 53a) for generating vapor of a petroleum-based solvent, a cleaning chamber (2) allowing a workpiece to be cleaned under reduced pressure by the vapor fed from the vapor generating member, a condensing chamber (21) that is connected to the cleaning chamber and is maintained in a depressurized state, a temperature maintaining member (22) that maintains the condensing chamber at a lower temperature than the cleaning chamber, and an opening/closing member (20) that provides or cuts off communication between the condensing chamber and the cleaning chamber.
摘要翻译：真空清洁装置（1,51）包括用于产生石油基溶剂的蒸汽的蒸汽产生部件（8,8a，53,53a），清洁室（2），允许工件在减压下被蒸汽从所述蒸汽发生部件供给的冷凝室（21），其与所述清洗室连接并保持在减压状态;将所述冷凝室保持在比所述清洗室低的温度的保温部件（22），以及提供或切断冷凝室和清洁室之间的连通的打开/关闭构件（20）。

94. 发明授权

US09550139B2 Apparatus and system for cleaning a filter 有权
标题翻译：用于清洁过滤器的设备和系统
公开(公告)号：US09550139B2
公开(公告)日：2017-01-24
申请号：US14600254
申请日：2015-01-20
申请人： Vincent James Madonia , Gerald Madonia
发明人： Vincent James Madonia , Gerald Madonia
IPC分类号： B08B3/00 , B01D41/04 , A47L9/20 , B08B1/00 , A47J31/08 , B01D35/02 , B01D35/16 , B01D35/22 , B01D46/00 , B01D46/02 , B01D25/00 , B01D29/11 , D06F39/10 , D01H11/00 , F04B39/16 , F04B53/20 , F02M35/08 , F02M35/024 , B08B9/00
CPC分类号： B01D41/04 , A47J31/08 , A47L9/20 , B01D25/00 , B01D29/11 , B01D35/02 , B01D35/16 , B01D35/22 , B01D46/00 , B01D46/02 , B08B1/00 , B08B9/00 , D01H11/00 , D06F39/10 , F02M35/02416 , F02M35/02483 , F02M35/08 , F04B39/16 , F04B53/20
摘要： A filter cleaning apparatus has a top section and a base section. The top section rests on a housing support. A lid in the top section is connected to the top section by a hinge. Internally, there is a threaded rod supporting a cone and a positioning nut. The positioning nut is used to secure the position of the cone. When a filter is to be placed in the apparatus, the position of the cone is adjusted with the positioning nut. A filter is then placed thereon and the lid closed. A locking mechanism secured the lid in place. A textured disk is positioned on the underside of the lid. When a crank handle on top of the lid is turned, the textured disk is turned thereby turning the filter resting on the cone. As the filter turns, cleaning mechanisms remove debris which pass through openings for removal.
摘要翻译：过滤器清洁装置具有顶部和底部。顶部位于外壳支架上。顶部的盖子通过铰链连接到顶部部分。在内部，有一个支撑锥体和定位螺母的螺纹杆。定位螺母用于固定锥体的位置。将过滤器放置在设备中时，用定位螺母调节锥体的位置。然后将过滤器放置在其上，盖子关闭。锁定机构将盖子固定就位。纹理盘位于盖的下侧。当盖顶部的曲柄手柄转动时，纹理盘转动，从而转过滤器搁在锥体上。当过滤器转动时，清洁机构会清除通过开口去除的碎屑。

95. 发明申请

US20160353928A1 ROASTING AND GLAZING APPARATUS AND METHOD OF CLEANING THEREOF 有权
标题翻译：抛光和玻璃清洗装置及其清洁方法
公开(公告)号：US20160353928A1
公开(公告)日：2016-12-08
申请号：US15066450
申请日：2016-03-10
申请人： CALICO COTTAGE, INC.
发明人： Thomas Montoya , Mark Wurzel , David Sank , Lawrence Wurzel , Steven Nagle , Robert Delauro , Barbara Riordan , Hanif Chung-Ying , Judith Levin , Christa Harrison , Andrew Irwin , Duane Saxton , Kevin Blakelock , Kenneth Antes , Mark Whatley , Ronald Beilin , Barnett Tessler
IPC分类号： A47J37/06 , A47J36/00 , B08B1/00 , B08B3/00 , B08B9/087
CPC分类号： A47J37/06 , A23G3/26 , A23L1/01 , A23L1/0128 , A23L1/09 , A23L1/364 , A23L5/10 , A23L5/15 , A23L25/00 , A23L25/25 , A23L29/30 , A23N12/083 , A23N12/10 , A23V2002/00 , A47J27/21175 , A47J27/21191 , A47J36/00 , A47J36/06 , A47J36/14 , A47J36/165 , A47J37/0664 , B08B1/001 , B08B3/00 , B08B3/106 , B08B9/08 , B08B9/087 , B08B2230/01
摘要： An apparatus/method of cleaning a roaster bowl having a pouring lip and a cover (e.g., sugar or other coating is adhered to the bowl, its pouring lip and the cover). Water is added to the roaster bowl and the cover is placed over the roaster bowl. An appropriately sized and located steam vent is disposed between the cover and roaster bowl, adjacent to the bowl's pouring lip. The roaster bowl is heated to boil the water to produce steam that dissolves the sugar adhered to the roaster bowl and to the underside of the cover. Steam exiting the bowl via the vent condenses on the pouring lip to dissolve the sugar that is adhered to the pouring lip, and the sugar-laden steam drips back into the bowl thus cleaning the pouring lip.
摘要翻译：清洗具有倾倒唇缘和盖子（例如，糖或其它涂层）的烘焙碗的装置/方法粘附到碗，其倾倒唇缘和盖子上。将水加入烘焙碗中，将盖子放在烘焙碗上。适当尺寸和位置的蒸汽通风口设置在盖和烘焙碗之间，与碗的倾倒唇相邻。烘烤碗被加热以煮沸水以产生蒸汽，其溶解附着在烤盘上的糖和盖的下侧。通过排气口离开碗的蒸汽在倾倒的唇部上冷凝，以溶解粘附到倾倒唇缘上的糖，并且将含糖的蒸汽滴回到碗中，从而清洁倾倒的唇缘。

96. 发明授权

US09505034B2 Electrode washing method and system 有权
标题翻译：电极清洗方法及系统
公开(公告)号：US09505034B2
公开(公告)日：2016-11-29
申请号：US14192896
申请日：2014-02-28
申请人： EPCM SERVICES LTD.
发明人： Robert Stanley Jickling , Gordon Steven Iverson
IPC分类号： B08B3/00 , B08B3/02 , C25C7/06 , C25C7/08
CPC分类号： B08B3/022 , C25C7/06 , C25C7/08
摘要： A conveyor conveys electrodes edgewise along a path, and may include a conveyor belt for supporting a bottom peripheral edge of each electrode. The conveyor belt may include support cleats and safety stops. A plurality of wash nozzles are positioned adjacent to the path on opposing sides thereof. Wash spray from the nozzles is directed to impinge sides of the electrode. An enclosure for enclosing a washing section associated with the wash nozzles includes an entrance and an exit. An exhaust system may maintain the space within the enclosure at negative pressure. A drying system may be located at the exit of the enclosure and may include a pair of plenums. The plenums may include vertically extending longitudinal slots for drawing air along side surfaces of the electrode, and the plenums may be connected to the exhaust system for venting the air.
摘要翻译：输送机沿着路径沿边沿传送电极，并且可以包括用于支撑每个电极的底部周边边缘的输送带。输送带可以包括支撑夹板和安全止动件。多个洗涤喷嘴位于与其相对侧上的路径相邻的位置。从喷嘴洗涤喷雾被引导到电极的两侧。用于封闭与洗涤喷嘴相关联的洗涤部分的外壳包括入口和出口。排气系统可以将外壳内的空间保持在负压。干燥系统可以位于外壳的出口处并且可以包括一对增压室。增压室可以包括用于沿着电极的侧表面抽吸空气的垂直延伸的纵向狭槽，并且气室可以连接到排气系统以排出空气。

97. 发明授权

US09499133B2 Method for washing a vehicle window 有权
标题翻译：清洗车窗的方法
公开(公告)号：US09499133B2
公开(公告)日：2016-11-22
申请号：US14896514
申请日：2014-06-13
申请人： Valeo Systèmes d'Essuyage
发明人： Giuseppe Grasso , Grégory Kolanowski , Pierre-Emmanuel Negre , Marcel Trebouet
IPC分类号： B08B7/00 , B60S1/52 , B60S1/50 , B60S1/46 , B60S1/48 , B08B1/00 , B08B3/00 , B08B3/02
CPC分类号： B60S1/524 , B08B1/00 , B08B1/006 , B08B3/00 , B08B3/02 , B60S1/46 , B60S1/48 , B60S1/481 , B60S1/482 , B60S1/485 , B60S1/50
摘要： The invention relates to a method for washing a motor vehicle wind shield (10) using a washing device (1) comprising reservoirs (2, 3) of first and second fluids, a channel (5) connecting the reservoirs (2, 3) to orifices (15) for ejecting the fluids onto the wind shield, at least one pump (20) intended to circulate the fluids in the channel (5), and at least one wiper blade (30), characterized in that, when the channel contains the first fluid, the method comprises the following steps: a) activating the pump system (20) so as to cause the second fluid to circulate in the channel system (5) so as to purge the channel of the first fluid, and b) deactivating the pump system (20) when the second fluid reaches the orifices (15).
摘要翻译：本发明涉及一种使用包括第一和第二流体的储存器（2,3）的清洗装置（1）来清洗机动车辆挡风板（10）的方法，将储存器（2,3）连接到用于将流体喷射到挡风板上的喷嘴（15），用于使流体在通道（5）中循环的至少一个泵（20）和至少一个刮水片（30），其特征在于，当通道包含第一流体，该方法包括以下步骤：a）激活泵系统（20）以使第二流体在通道系统（5）中循环，以便清洗第一流体的通道，以及b）当第二流体到达孔口（15）时，使泵系统（20）停用。

98. 发明授权

US09492850B2 Method and apparatus for removing labels from wine and beverage bottles 有权
标题翻译：从葡萄酒和饮料瓶中取出标签的方法和设备
公开(公告)号：US09492850B2
公开(公告)日：2016-11-15
申请号：US13690384
申请日：2012-11-30
申请人： EVER GREEN ENVIRONMENTAL CORPORATION
发明人： Nicholas Krouglicof , Andrew Fisher , Gerard Tracey , Christopher Hynes
IPC分类号： B08B3/00 , B08B1/00 , B08B1/04 , B08B9/08 , B08B9/36 , B08B9/42
CPC分类号： B08B1/002 , B08B1/04 , B08B9/083 , B08B9/36 , B08B9/42
摘要： There is provided a system for removing a glued-on label from a wine bottle or other container, comprising in spatial sequence a brushing station for dry-brushing the container surface, a solvent station for applying a liquid solvent for removal of adhesive from the container surface, a container support, a drive for imparting relative motion between the brush and a containers when aligned with the brushing station, and a indexing system for imparting relative motion between the container support and stations whereby each of said containers on said support is brought into alignment and contact with the respective stations for sequential mechanical and solvent-based label removing steps.
摘要翻译：提供了一种用于从葡萄酒瓶或其他容器中去除胶合标签的系统，其中空间地包括用于干燥容器表面的刷洗站，用于施加液体溶剂以从容器中去除粘合剂的溶剂站表面，容器支撑件，用于在与刷洗台对准时在刷子和容器之间施加相对运动的驱动器，以及用于在容器支撑件和工位之间施加相对运动的分度系统，由此将所述支撑件上的每个所述容器带入对准并与各个站接触，以进行顺序的机械和溶剂型标签去除步骤。

99. 发明授权

US09462921B2 Broken wafer recovery system 有权
标题翻译：破碎晶圆回收系统
公开(公告)号：US09462921B2
公开(公告)日：2016-10-11
申请号：US13912126
申请日：2013-06-06
申请人： ORBOTECH LT SOLAR, LLC.
发明人： Craig Lyle Stevens , David Eric Berkstresser , Wendell Thomas Blonigan
IPC分类号： B08B3/00 , A47L9/28 , H01L21/67 , H01L21/683
CPC分类号： A47L9/28 , H01L21/67271 , H01L21/67288 , H01L21/6838
摘要： An apparatus and method for recovery and cleaning of broken substrates, especially beneficial for fabrication systems using silicon wafer carried on trays. Removal of broken wafers and particles from within the fabrication system is enabled without requiring disassembly of the system and without requiring manual labor. A placing mechanism moves a suction head to location of the broken substrate and a suction pump coupled to a flexible hose is used to remove the broken pieces. A hood is positioned at the inlet of the suction head, and setback extensions are provided at the bottom of the hood to allow air flow into the inlet and prevent thermal conductance from the tray to the hood. Pins are extendable about the inlet of the suction head to enable breakage of the wafer to smaller pieces for easy removal.
摘要翻译：用于回收和清洁破碎的基底的装置和方法，特别有利于使用托盘上运载硅晶片的制造系统。能够在制造系统内除去破碎的晶片和颗粒，而无需拆卸系统并且不需要人工劳动。放置机构将吸头移动到破碎的基底的位置，并且使用耦合到柔性软管的抽吸泵去除破碎的碎片。发动机盖定位在吸头的入口处，并且在罩的底部设置有遏制延伸部，以允许空气流入入口并防止从托盘到罩的热传导。引脚可以围绕吸头的入口延伸，以使得能够将晶片破裂成更小的部件以便于移除。

100. 发明申请

US20160270621A1 SURFACE-CLEANING APPARATUS 审中-公开
标题翻译：表面清洁装置
公开(公告)号：US20160270621A1
公开(公告)日：2016-09-22
申请号：US15034595
申请日：2014-02-07
申请人： TECHTRONIC FLOOR CARE TECHNOLOGY LIMITED
发明人： Phil Grove
IPC分类号： A47L13/22 , B08B1/00 , B08B3/00
CPC分类号： A47L13/225 , A47L13/258 , B08B1/001 , B08B3/00
摘要： A surface cleaning apparatus including a cleaning head having a body that defines a footprint to sit adjacent a surface to be cleaned, the body including first and second parts that are moveable relative to one another between a first configuration and a second configuration, such that the area of the footprint is greater when in the first configuration than when in the second configuration.
摘要翻译：一种表面清洁装置，其包括清洁头，所述清洁头具有限定占地面积以邻近待清洁表面的主体的主体，所述主体包括可在第一构造和第二构造之间相对于彼此移动的第一和第二部分，在第一配置中，足迹的面积比在第二配置中大。

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