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    • 92. 发明授权
    • Functionalized porous poly(aryl ether ketone) materials and their use
    • 官能化多孔聚(芳醚酮)材料及其用途
    • US07176273B2
    • 2007-02-13
    • US10980019
    • 2004-11-03
    • Youxin YuanYong Ding
    • Youxin YuanYong Ding
    • C08G12/00
    • C08J9/26B01D67/0093B01D71/52B01D71/82B01D2323/36B01D2323/38B01J20/26B01J20/262B01J20/265B01J20/28033B01J20/28092B01J20/285C08J2201/0462C08J2379/08C08L71/00C08L79/08Y10T428/249953C08L2666/22
    • Functionalized porous poly(aryl ether ketone) articles are prepared by reacting ketone groups in the backbone of poly(aryl ether ketone) polymer with a primary amine reagent. Preferred functional primary amines are primary aliphatic amines or substituted hydrazines containing one or more target functional groups including polar groups, such as hydroxyl groups, ˜OH, amino groups, ˜NH2, ˜NHR, ˜NRR′, and ethylene oxide groups, ˜OCH2CH2—, negatively or positively charged ionic groups, such as ˜SO3−, ˜COO−, and ˜NH4+ groups, hydrophobic groups such as siloxane or perfluorcarbone groups, and non-polar groups, such as linear or branched hydrocarbon groups. The functionalized porous poly(aryl ether ketone) article can be prepared by reacting primary amine with a pre-formed, shaped porous poly(aryl ether ketone) article or by functionalizing the surface of a non-porous precursor article that is subsequently converted into a porous article.
    • 官能化多孔聚(芳醚酮)制品是通过使聚(芳基醚酮)聚合物的主链中的酮基与伯胺试剂反应来制备的。 优选的官能伯胺是含有一个或多个靶官能团的主要脂族胺或取代肼,包括极性基团,例如羟基,-OH,氨基,〜NH 2,〜NHR,〜NRR' ,和环氧乙烷基团,-OCH 2 CH 2 - ,带正电或带正电荷的离子基团,例如SO 3 - 和/或者NH 4基团,疏水基团如硅氧烷或全氟咔唑基团,和非极性基团 基团,例如直链或支链烃基。 官能化的多孔聚(芳醚酮)制品可以通过使伯胺与预形成的多孔聚(芳醚酮)制品反应或通过官能化无孔前体制品的表面来制备,随后将其转化为 多孔制品。
    • 93. 发明申请
    • Method for preparation of poly(o-phenylenediamine) Nano-belt
    • 聚(邻苯二胺)纳米带的制备方法
    • US20050277757A1
    • 2005-12-15
    • US11149868
    • 2005-06-10
    • Erkang WangXuping SunShaojun Dong
    • Erkang WangXuping SunShaojun Dong
    • C08G12/00C08G73/02
    • C08J3/215B82Y30/00C08G73/0266C08J2379/02C08K3/16C08K3/28
    • The present invention provides a method for preparation of poly(o-phenylenediamine) nano-belt comprising mixing aqueous solutions of o-phenylenediamine and of oxidant in a mole ratio of 1:0.1-1 under stirring; standing for 0.5-2 hrs at room temperature; and obtaining poly(o-phenylenediamine) nano-belt. The method is suitable for large-scale production. In the absence of template and surfactant, aqueous solutions of o-phenylenediamine and of oxidant are mixed in a specified mole ratio and thus obtain a poly(o-phenylenediamine) nano-belt with length of several hundred micrometers, width of several hundred nanometers and thickness of tens nanometers. The method is simple, quick and suitable for large-scale manufacture. The poly(o-phenylenediamine) nano-belt thus prepared possesses excellent semiconductor properties and is one of the most promising conductive polymer materials.
    • 本发明提供了一种制备聚(邻苯二胺)纳米带的方法,包括在搅拌下将摩尔比为1:0.1-1的邻苯二胺和氧化剂的水溶液混合; 在室温下静置0.5-2小时; 并获得聚(邻苯二胺)纳米带。 该方法适用于大规模生产。 在没有模板和表面活性剂的情况下,将邻苯二胺和氧化剂的水溶液以规定的摩尔比混合,从而得到长度为几百微米,宽度为几百纳米的聚(邻苯二胺)纳米带, 厚度为十纳米。 该方法简单,快捷,适合大规模生产。 如此制备的聚(邻苯二胺)纳米带具有优异的半导体性能,是最有希望的导电聚合物材料之一。
    • 96. 发明授权
    • Cyclic amine based polymers and process for their production
    • 循环胺基聚合物及其生产方法
    • US6111056A
    • 2000-08-29
    • US153307
    • 1998-09-15
    • Soren HildebrandtElisabeth KappesDieter BoeckhRajan PanandikerSherri RandallEugene Paul GosselinkWilliam Conrad Wertz
    • Soren HildebrandtElisabeth KappesDieter BoeckhRajan PanandikerSherri RandallEugene Paul GosselinkWilliam Conrad Wertz
    • C08G73/02C08G73/06C11D3/00C11D3/22C11D3/37C11D3/382C08G69/00C08F8/02C08G12/00C08L79/02
    • C08G73/0273C08G73/02C08G73/022C08G73/0616C11D3/0015C11D3/225C11D3/227C11D3/3723C11D3/3776
    • A cyclic amine containing polymer substantially free of primary and secondary amino groups which is prepared by reacting:a) an amine selected from the group consisting of:i) cyclic amines having at least one nitrogen atom in the ring and at least one primary amino alkyl group bonded to the nitrogen atom of the ring, andii) mixtures of cyclic amines containing at least two nitrogen atoms which react with a cross-linking agent with at least one other amine containing 1-6 nitrogen atoms which react with a cross-linking agent, withb) at least one cross-linker selected from the group consisting of at least one compound containing two groups which react with the primary amino group and said nitrogen atoms and mixtures of at least one compound containing two groups which react with the primary amino group and said nitrogen atoms with at least one compound containing at least three groups which react with the primary amino group and said nitrogen atoms in a molar ratio of (a):(b) of from 2.5:1 to 1:1.5 thereby forming a cyclic amine containing polymer containing primary or secondary amino groups and reacting said cyclic amine based polymer, withc) an alkylating agent selected from the group consisting of epoxides, alkyl halides, arylalkyl halides, dimethyl sulfate, diethyl sulfate, mixtures of formic acid and an aldehyde, and mixtures of formic acid and a ketone, to convert more than 80% of the primary and secondary nitrogen groups into tertiary nitrogen groups.
    • 一种基本上不含伯和仲氨基的含环胺的聚合物,其通过以下方法制备:a)选自以下的胺:i)环中具有至少一个氮原子的环胺和至少一个伯氨基烷基 基团与环的氮原子键合,以及ii)含有至少两个氮原子的环状胺的混合物,其与交联剂与至少一种含有1-6个氮原子的其它胺反应,其与交联反应 其中b)至少一个选自至少一种含有两个与伯氨基和所述氮原子反应的基团的化合物的交联剂以及至少一种含有两个与主要氨基反应的基团的化合物的混合物 氨基和所述氮原子与至少一种含有至少三个与伯氨基和所述氮原子反应的化合物,其摩尔比为(a):(b)为2 1.5:1至1:1.5,由此形成含有伯胺或仲氨基的含环胺的聚合物,并使所述环胺基聚合物与c)选自环氧化物,烷基卤,芳烷基卤化物,二甲基 硫酸盐,二乙基硫酸盐,甲酸和醛的混合物,以及甲酸和酮的混合物,将80%以上的初级和次级氮基团转化为叔氮基团。
    • 99. 发明授权
    • Undercoating composition for photolithographic resist
    • 光刻抗蚀剂底涂组合物
    • US5939510A
    • 1999-08-17
    • US845358
    • 1997-04-24
    • Mitsuru SatoKatsumi OomoriEtsuko IguchiKiyoshi IshikawaFumitake Kaneko
    • Mitsuru SatoKatsumi OomoriEtsuko IguchiKiyoshi IshikawaFumitake Kaneko
    • G03F7/11C09K3/00G03F7/09H01L21/027C08G8/02C08G12/00
    • G03F7/091
    • Proposed is a novel undercoating composition to form an undercoating layer interposed between the surface of a substrate and a photoresist layer with an object to decrease the adverse influences by the reflection of light on the substrate surface in the pattern-wise exposure of the photoresist layer to ultraviolet light without the undesirable phenomena of intermixing between layers and notching along with a large selectivity ratio in the etching rates between the patterned resist layer and the undercoating layer in a dry-etching treatment. The undercoating composition comprises (A) an ultraviolet absorber which is a benzophenone compound or an aromatic azomethine compound each having at least one unsubstituted or alkyl-substituted amino group on the aryl groups and (B) a crosslinking agent which is preferably a melamine compound having at least two methylol groups or alkoxymethyl groups bonded to the nitrogen atoms in a molecule in a weight proportion (A):(B) in the range from 1:1 to 1:10.
    • 提出了一种新颖的底涂层组合物,用于形成底涂层和介于光致抗蚀剂层之间的底涂层,目的在于降低光致抗蚀剂层的图案曝光中光的反射对基板表面的不利影响 在干蚀刻处理中,在图案化的抗蚀剂层和底涂层之间的蚀刻速率方面,没有不希望的层之间的混合现象和开槽以及大的选择比。 底涂层组合物包含(A)紫外线吸收剂,其为在芳基上具有至少一个未取代或烷基取代的氨基的二苯甲酮化合物或芳族偶氮甲碱化合物,(B)优选三聚氰胺化合物的交联剂,其具有 至少两个羟甲基或分子中的氮原子以重量比(A):(B))键合在1:1至1:10范围内的烷氧基甲基。