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    • 91. 发明申请
    • Silver alloys for use in medical, surgical and microsurgical instruments and process for producing the alloys
    • 用于医疗,手术和显微外科仪器的银合金和用于生产合金的方法
    • US20080118392A1
    • 2008-05-22
    • US11811395
    • 2007-06-08
    • Francesco Di Salvo
    • Francesco Di Salvo
    • C22C5/06C22F1/02C22F1/14
    • C22C5/06A61B18/14C22F1/14
    • Alloys for medical, surgical and microsurgical instruments are proposed which comprise 0.01% to 20% by weight of germanium, from 0-25% of shallow hydrogenic and/or non-hydrogenic acceptor dopants in terms of weight ratio in relation to germanium, from 0% up to 20% by weight of one or more of the following compounds such as platinum, gold, palladium, iridium, ruthenium, osmium, rhodium, niobium, tantalum, tungsten, aluminium, silicon, hafnium, yttrium, lanthanum, zirconium with the remainder, up to 100% by weight, constituted by silver and inevitable impurities, wherein instruments from these alloys possess properties such as no capacitive impedance in relation to the electrode-tissue interface; a Far Infrared Radiation (FIR) emitting capacity when energized by any form of energy; sulfurization, corrosion and oxidation resistant and have suitable hardness for their intended use; emit anions and may possess fractal surfaces.
    • 提出了用于医疗,手术和显微外科手术器械的合金,其包含0.01重量%至20重量%的锗,0-25重量%的浅氢和/或非氢受体掺杂剂,以锗的重量比计,0 %至多20重量%的一种或多种以下化合物如铂,金,钯,铱,钌,锇,铑,铌,钽,钨,铝,硅,铪,钇,镧,锆,其中 其余为高达100重量%,由银和不可避免的杂质构成,其中来自这些合金的仪器具有相对于电极 - 组织界面没有电容性阻抗的性质; 当通过任何形式的能量通电时,远红外辐射(FIR)发射能力; 硫化,腐蚀和抗氧化,并具有适合其预期用途的硬度; 发出阴离子并且可能具有分形表面。
    • 92. 发明申请
    • Silver alloy for reflective film
    • 银合金用于反光膜
    • US20060093510A1
    • 2006-05-04
    • US10534288
    • 2004-10-29
    • Tomokazu ObataHiroshi Yanagihara
    • Tomokazu ObataHiroshi Yanagihara
    • C22C5/06
    • C22C5/06C22C5/08G11B7/258G11B7/2585G11B7/259G11B7/268
    • The present invention provides a silver alloy for use in a reflection film in an optical recording medium, comprising silver as a main component, and at least one metal element as a first additive element having lower melting point than that of silver. Preferable first additive elements in the present invention are aluminum, indium, tin, bismuth, gallium, zinc, strontium, calcium and germanium. Further, second additive elements in the present invention are preferable if they contain at least one of elements comprising platinum, gold, rhodium, iridium, ruthenium, palladium, lead, copper, manganese, silicon, nickel, chrome, cobalt, yttrium, iron, scandium, zirconium, titanium, niobium, molybdenum, tantalum, tungsten, hafnium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, thulium, ytterbiumm, magnesium, and boron.
    • 本发明提供一种用于光记录介质中的反射膜的银合金,其包含银作为主要成分,以及至少一种作为第一添加元素的金属元素,其熔点低于银。 本发明中优选的第一添加元素是铝,铟,锡,铋,镓,锌,锶,钙和锗。 另外,本发明的第二添加元素如果含有铂,金,铑,铱,钌,钯,铅,铜,锰,硅,镍,铬,钴,钇,铁等的至少一种元素, 钪,锆,钛,铌,钼,钽,钨,铪,镧,铈,镨,钕,钐,铕,钆,铽,镝,钬,ium,镱,镁和硼。
    • 95. 发明授权
    • Metal strip for epitaxial coatings and method for the production thereof
    • 用于外延涂层的金属带及其制造方法
    • US06908691B2
    • 2005-06-21
    • US10432445
    • 2001-12-05
    • Bernd De BoerBernhard HolzapfelGunter Risse
    • Bernd De BoerBernhard HolzapfelGunter Risse
    • C22F1/08C22C1/10C22C5/06C22C9/00C22C19/03C22F1/00C22F1/10C22F1/14C30B11/00C30B25/18H01B12/06H01B13/00B32B15/00C23C8/00
    • C30B25/18C22C1/1094C22C2204/00C30B11/00C30B29/52Y10S428/929Y10T428/12229Y10T428/12493Y10T428/12576Y10T428/12646Y10T428/12861Y10T428/12882Y10T428/12993
    • The aim of the invention is to provide a metal strip for epitaxial coating with a biaxially textured layer, this metal strip, however, being able to be produced in an uncomplicated manner and having a high tensile strength, low magnetic losses and/or a high electrical conductivity. According to the invention, the metal strip is comprised of Nj, Cu, Ag or alloys thereof all serving as basic material, whereby the one-layer metal strip and, in the instance of a multilayer metal strip, at least one of its layers contains 10 nm to 5 μm large, strength-increasing dispersoids comprised of carbides, borides, oxides and/or nitrides with a volume proportion ranging from 0.1 to 5%. In the instance of a multilayer metal strip, the layers form a composite, and at least one of the layers does not contain any dispersoids and has a biaxial texture. For the production, a starting material is used, which is comprised of Ni, Cu, Ag or of alloys thereof all serving as basic material and which contains 0.2 to 5 atom percent of an additive comprised of oxidizable, nitridable, boridable and/or carbidable elements. A one-layer or a multilayer strip is produced from this starting material by means of deforming methods, whereby for producing the multilayer metal strip, a basic material that does not contain the aforementioned additive is used as one of its layers. Afterwards, the strip is subjected to a recrystallization annealing in order to form a cubical texture. Finally, the strip is subjected to an annealing under an oxygen, nitrogen, boron or carbon partial pressure, which is greater than the equilibrium partial pressure of oxides, nitrides, borides and carbides of the additive elements contained in the alloy, but is less than the equilibrium partial pressure of oxides, nitrides, borides and carbides of the basic elements Ni, Cu and Ag of the strip alloy.
    • 本发明的目的是提供一种用于具有双轴纹理层的外延涂层的金属条,然而,该金属条能够以不复杂的方式制造并且具有高拉伸强度,低磁损耗和/或高 电导率。 根据本发明,金属带由Nj,Cu,Ag或其合金组成,其全部用作基本材料,由此单层金属带,并且在多层金属带的情况下,其至少一层包含 体积比为0.1〜5%的碳化物,硼化物,氧化物和/或氮化物的10〜5μm大的强度增加分散体。 在多层金属条的情况下,这些层形成复合材料,并且至少一个层不含有任何分散质并具有双轴织构。 对于生产,使用由Ni,Cu,Ag或其合金组成的起始材料,所有这些材料都用作基本材料,并且包含0.2至5原子%的可氧化,可氮化,可硼化和/或可卡住的添加剂 元素。 通过变形方法从该起始材料制造单层或多层条,由此,为了制造多层金属条,不使用上述添加剂的基本材料作为其一层。 然后,对带材进行再结晶退火,以形成立方体织构。 最后,条带在氧,氮,硼或碳分压下进行退火,其大于合金中所含的添加元素的氧化物,氮化物,硼化物和碳化物的平衡分压,但小于 条状合金的基本元素Ni,Cu和Ag的氧化物,氮化物,硼化物和碳化物的平衡分压。