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11. 发明申请

US20180331365A1 HIGH PERFORMANCE ELECTRODES 审中-公开
公开(公告)号：US20180331365A1
公开(公告)日：2018-11-15
申请号：US15775758
申请日：2016-11-10
申请人： Cornell University , Dongjin Semichem Co., Ltd.
发明人： Yong Lak JOO , Ling FEI , Sunchan PARK , Seon Yeong GONG
IPC分类号： H01M4/62 , H01M4/04 , H01M4/134 , H01M4/1395 , H01M4/38 , H01M4/48 , H01M10/0525 , H01M12/08
CPC分类号： H01M4/625 , H01M4/0404 , H01M4/0419 , H01M4/134 , H01M4/1395 , H01M4/386 , H01M4/48 , H01M10/0525 , H01M12/08 , Y02E60/128
摘要： Provided herein are high performance direct deposit electrodes that do not require the use of a binder, as well as processes of manufacturing the same by an electrospray process.

12. 发明授权

US10011739B2 Coating composition comprising bis-type silane compound 有权
公开(公告)号：US10011739B2
公开(公告)日：2018-07-03
申请号：US14779372
申请日：2014-04-01
申请人： DONGJIN SEMICHEM Co., Ltd.
发明人： Seung-Sock Choi , Jae-Won Yoo , Doo-Shik Kim , Dong-Jin Nam , Kyung-Min Park , Seong-Yeon Oh
IPC分类号： C08K3/04 , C09D183/00 , C09D183/04 , C09D183/14 , H01L51/00 , C09D5/00 , C08G77/50 , C09D165/00
CPC分类号： C09D183/00 , C08G77/50 , C08G2261/1424 , C08G2261/3223 , C08G2261/51 , C08G2261/794 , C08K3/042 , C08K3/045 , C09D5/00 , C09D165/00 , C09D183/04 , C09D183/14 , H01L51/0037 , H01L51/0094 , C08L65/00
摘要： The present invention relates to a coating composition comprising a bis-type silane compound, and particularly relates to a coating composition which has high storage stability and can form a highly transparent and high-strength coating film, a preparation method thereof and a coating film formed using the same.

13. 发明授权

US09651867B2 Compound and composition for forming lower film of resist pattern, and method for forming lower film using same 有权
公开(公告)号：US09651867B2
公开(公告)日：2017-05-16
申请号：US14427010
申请日：2013-09-12
申请人： DONGJIN SEMICHEM CO., LTD.
发明人： Su-Young Han , Jung-Youl Lee , Jae-Woo Lee , Jae-Hyun Kim
IPC分类号： G03F7/11 , H01L21/027 , G03F7/09 , G03F7/00 , G03F7/16 , G03F7/40
CPC分类号： G03F7/091 , G03F7/0002 , G03F7/168 , G03F7/40 , H01L21/0271
摘要： Disclosed are a compound and composition for forming a lower film, which are used in a process for forming a resist pattern by means of the directed self-assembly of a block copolymer (BCP). Also disclosed is a method for forming a lower film using same. The compound for forming a lower film of a resist pattern according to the present invention has the structure of formula 1 of claim 1.

14. 发明授权

US09469763B2 Photo-curable organic-inorganic hybrid resin composition 有权
标题翻译：光固化型有机 - 无机杂化树脂组合物
公开(公告)号：US09469763B2
公开(公告)日：2016-10-18
申请号：US14161778
申请日：2014-01-23
申请人： Dongjin Semichem Co., Ltd.
发明人： Jae-Won Yoo , Dong-Jin Nam , Doo-shick Kim , Kyung-Min Park
IPC分类号： C08L83/10 , C08G77/20 , C08G77/442 , C08G77/24 , C09J4/00 , C08K5/549
CPC分类号： C08L83/10 , C08G77/20 , C08G77/24 , C08G77/442 , C08K5/549 , C09J4/00
摘要： The present invention relates to a photo-curable organic-inorganic hybrid composition, more particularly to a photo-curable organic-inorganic hybrid resin composition having superior physical properties such as UV resistance, chemical resistance, light transmittance, adhesive property, insulating property, heat resistance, flatness and water resistance and in particular, having excellent heat resistance and adhesive property enabling the composition to endure a thermal deformation caused by a processing temperature change during post-process after a film is cured. Thus, the composition of the invention is suitable for use as an insulating material and an encapsulating material for a protective film of optical devices including display devices and semiconductors.
摘要翻译：本发明涉及可光固化的有机 - 无机杂化组合物，更具体地说涉及具有优异的物理性质如耐紫外线性，耐化学性，透光性，粘合性，绝缘性，热性的光固化型有机 - 无机杂化树脂组合物耐电阻，平坦度和耐水性，特别是具有优异的耐热性和粘合性，使得组合物能够在膜固化后耐受后期处理中的加工温度变化引起的热变形。因此，本发明的组合物适合用作包括显示装置和半导体的光学装置的保护膜的绝缘材料和封装材料。

15. 发明授权

US09068941B2 Apparatus for monitoring a dye solution to be adsorbed to a dye-sensitized solar cell, and apparatus for adjusting the dye solution 有权
标题翻译：用于监测要吸附到染料敏化太阳能电池的染料溶液的装置，以及用于调节染料溶液的装置
公开(公告)号：US09068941B2
公开(公告)日：2015-06-30
申请号：US13255451
申请日：2010-03-08
申请人： Chong-chan Lee , Yoon-Gil Yim
发明人： Chong-chan Lee , Yoon-Gil Yim
IPC分类号： B65B3/04 , G01N21/00 , G01N31/00 , G01N21/59 , G01N21/84 , H01G9/20 , H01L51/00
CPC分类号： G01N21/5907 , G01N2021/8416 , H01G9/2031 , H01G9/2059 , H01G9/2068 , H01L51/0086 , Y02E10/542
摘要： This disclosure relates to a dye solution monitoring device and a dye solution controlling device for a dye-sensitized solar cell, more particularly, to a dye solution monitoring device for a dye-sensitized solar cell comprising a light-absorption device for measuring absorbance of a dye solution for a dye-sensitized solar cell, and a pH measuring device for measuring pH of a dye solution for a dye-sensitized solar cell; and, a dye solution controlling device for a dye-sensitized solar cell further comprising a dye supply device supplying dye of high concentration, and an acid or base supply device for pH control, in addition to the monitoring device.According to the present invention, a dye adsorption process may be optimized in real time to manufacture a solar cell of high quality with high productivity, maximize utilization of expensive dye, and minimize the waste, thereby reducing production cost.
摘要翻译：本发明涉及一种用于染料敏化太阳能电池的染料溶液监测装置和染料溶液控制装置，更具体地涉及用于染料敏化太阳能电池的染料溶液监测装置，其包括用于测量吸光度的吸光装置用于染料敏化太阳能电池的染料溶液和用于测量染料敏化太阳能电池的染料溶液的pH的pH测量装置; 以及用于染料敏化太阳能电池的染料溶液控制装置，除了监测装置之外，还包括供给高浓度染料的染料供给装置和用于pH控制的酸或碱供应装置。根据本发明，可以实时优化染料吸附过程，以高生产率制造高质量的太阳能电池，最大限度地利用昂贵的染料，并最大限度地降低生产成本。

16. 发明申请

US20140287587A1 Method for Forming Fine Patterns of Semiconductor Device Using Directed Self-Assembly Process 审中-公开
标题翻译：使用定向自组装工艺形成半导体器件精细图案的方法
公开(公告)号：US20140287587A1
公开(公告)日：2014-09-25
申请号：US14346080
申请日：2012-09-27
申请人： DONGJIN SEMICHEM CO., LTD
发明人： Jung-Youl Lee , Eu-Jean Jang , Jae-Woo Lee , Jae-Hyun Kim
IPC分类号： H01L21/308
CPC分类号： H01L21/3086 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , H01L21/0271 , H01L21/0337
摘要： Provided herein is a method for forming fine patterns of semiconductor devices capable of forming patterns with 20 nm-level line width without bulk-exposure and hardening of guide patterns. Method steps include (a) forming a photoresist layer over a wafer on which an organic anti-reflection coating layer is formed; (b) exposing and developing the photoresist layer to form guide patterns; (c) forming a neutral layer over the wafer; (d) developing the guide patterns to remove them and form neutral layer patterns having an opening part; (e) coating block copolymer of directed self assembly material on the substrate and heating the substrate over a glass transition temperature (Tg) to form directed self-assembly patterns; and (f) selectively etching a part having relatively small etching resistivity (or high etching rate) among the directed self-assembly patterns by using O2 plasma to form fine patterns.
摘要翻译：本文提供了一种用于形成能够形成具有20nm级线宽的图案的半导体器件的精细图案的方法，而不引导图案的体积曝光和硬化。方法步骤包括（a）在其上形成有机抗反射涂层的晶片上形成光致抗蚀剂层; （b）曝光和显影光致抗蚀剂层以形成引导图案; （c）在所述晶片上形成中性层; （d）显影引导图案以去除它们并形成具有开口部分的中性层图案; （e）将定向自组装材料的嵌段共聚物涂覆在基材上并在玻璃化转变温度（Tg）下加热基材以形成定向的自组装图案; 和（f）通过使用O 2等离子体来选择性地蚀刻定向自组装图案中具有相对小的蚀刻电阻率（或高蚀刻速率）的部分以形成精细图案。

17. 发明申请

US20130115733A1 ETCHANT COMPOSITION AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR USING THE SAME 审中-公开
标题翻译：蚀刻组合物和使用该薄膜晶体管制造薄膜晶体管的方法
公开(公告)号：US20130115733A1
公开(公告)日：2013-05-09
申请号：US13547783
申请日：2012-07-12
申请人： Bong-Kyun KIM , Hong Sick PARK , Wang Woo LEE , Young Woo PARK , Shin Il CHOI , Sang-Woo KIM , Ki-Beom LEE , Dae-Woo LEE , Sam-Young CHO , Jeong-Heon CHOI
发明人： Bong-Kyun KIM , Hong Sick PARK , Wang Woo LEE , Young Woo PARK , Shin Il CHOI , Sang-Woo KIM , Ki-Beom LEE , Dae-Woo LEE , Sam-Young CHO , Jeong-Heon CHOI
IPC分类号： H01L21/465 , C09K13/06 , C09K13/00
CPC分类号： H01L21/32134 , C09K13/06 , C09K13/08 , C09K13/10 , H01L21/465 , H01L29/7869
摘要： Provided is an etchant composition. The etchant composition according to an exemplary embodiment of the present invention includes ammonium persulfate ((NH4)2)S2O8, an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, and water.
摘要翻译：提供了一种蚀刻剂组合物。根据本发明的示例性实施方案的蚀刻剂组合物包括过硫酸铵（（NH 4）2）S2O8，唑类化合物，水溶性胺化合物，含磺酸化合物，含硝酸盐化合物和水。

18. 发明授权

US08299304B2 Alignment material for liquid crystal display device of vertical alignment mode and method of preparing the same 有权
标题翻译：垂直取向模式的液晶显示装置的对准材料及其制备方法
公开(公告)号：US08299304B2
公开(公告)日：2012-10-30
申请号：US12281326
申请日：2007-02-09
申请人： Jin wook Choi , Dal bong Seo , Jae cheol Park , Yong bae Kim
发明人： Jin wook Choi , Dal bong Seo , Jae cheol Park , Yong bae Kim
IPC分类号： C07C209/00 , C07C291/00 , C07C211/00
CPC分类号： C09K19/56 , C07C211/50 , C07C217/76 , C07C2601/14 , C08G73/10 , G02F1/133723
摘要： This invention provides alignment materials for liquid crystal display device of vertical alignment mode and methods for the preparation of the same, and more particularly, it provides diaminobenzene derivatives represented by the following formula 1 (shown in description), capable of aligning liquid crystal in uniform and vertical way and remarkably improving clarity and solubility against organic solvents, methods for the preparation of the same and liquid crystal alignment films using the same.
摘要翻译：本发明提供了用于垂直取向模式的液晶显示装置的取向材料及其制备方法，更具体地，提供了由下式1（表示的说明）表示的二氨基苯衍生物，其能够使液晶均匀和垂直方式，并显着提高了对有机溶剂的透明度和溶解性，制备该溶液的方法和使用其的液晶取向膜。

19. 发明授权

US08124311B2 Photosensitive molecular compound and photoresist composition including the same 失效
标题翻译：光敏分子化合物和包含其的光致抗蚀剂组合物
公开(公告)号：US08124311B2
公开(公告)日：2012-02-28
申请号：US12361833
申请日：2009-01-29
申请人： Jung-Youl Lee , Jeong-Sik Kim , Eu-Jean Jang , Jae-Woo Lee , Jae-Hyun Kim
发明人： Jung-Youl Lee , Jeong-Sik Kim , Eu-Jean Jang , Jae-Woo Lee , Jae-Hyun Kim
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C07C251/68 , C07C2601/14 , C07C2603/74 , C07C2603/92 , C07D209/48 , C07D209/86 , C07D221/14 , G03F7/0045 , G03F7/039
摘要： Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula. In Formula, R1 is hydrogen atom or methyl group (CH3); Ra and Rb each is independently alkyl group of 1-6 carbon atoms, alkylcarbonyl group of 2-7 carbon atoms, aryl group of 6-10 carbon atoms or arylcarbonyl group of 7-11 carbon atoms, and Ra and Rb form one group as an united body, alkyl or cycloalkyl group of 1-20 carbon atoms or arylalkyl group of 7-20 carbon atoms which are doubly bonded to nitrogen atom.
摘要翻译：公开了含有肟基的感光性化合物，其通过暴露于光直接分解，其是尺寸小于用于光致抗蚀剂的常规聚合物的分子抗蚀剂，以及包含其的光致抗蚀剂组合物。光敏分子化合物具有由下式表示的结构。在式中，R 1是氢原子或甲基（CH 3）; Ra和Rb各自独立地为1-6个碳原子的烷基，2-7个碳原子的烷基羰基，6-10个碳原子的芳基或7-11个碳原子的芳基羰基，Ra和Rb形成一个基团 1〜20个碳原子的烷基或环烷基或7-20个碳原子的芳基烷基与氮原子双键结合。

20. 发明授权

US07927781B2 Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same 失效
标题翻译：感光树脂组合物，其制备方法和含有该组合物的干膜抗蚀剂
公开(公告)号：US07927781B2
公开(公告)日：2011-04-19
申请号：US12328037
申请日：2008-12-04
申请人： In-Ho Yoon , Bong-Gi Kim , Chang-Seok Rho , Sang-Ki Kang , Kyung-Rock Byun , Chan-Seok Park
发明人： In-Ho Yoon , Bong-Gi Kim , Chang-Seok Rho , Sang-Ki Kang , Kyung-Rock Byun , Chan-Seok Park
IPC分类号： G03F7/029 , G03F7/033
CPC分类号： G03F7/0007 , G03F7/029 , G03F7/033 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/124 , Y10S430/127
摘要： The present invention relates to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at least two ethylenic double bonds, and c) a phosphinoxide based photopolymerization initiator and an acridon based photopolymerization initiator; a preparation method thereof; and a dry film resist comprising the same.
摘要翻译：本发明涉及一种感光性树脂组合物，其包含a）碱溶性丙烯酸酯树脂，b）具有至少两个烯键式双键的交联单体，以及c）基于氧化膦的光聚合引发剂和吖啶系光聚合引发剂; 其制备方法和含有它的干膜抗蚀剂。

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