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1. 发明申请

US20210261825A1 CHEMICAL MECHANICAL POLISHING COMPOSITION, CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD FOR POLISHING SUBSTRATE 有权
公开(公告)号：US20210261825A1
公开(公告)日：2021-08-26
申请号：US17260641
申请日：2019-07-17
申请人： DONGJIN SEMICHEM CO., LTD
发明人： Hyejung PARK , Mingun LEE , Jongdai PARK , Jaehyun KIM
IPC分类号： C09G1/04 , C09K13/00 , H01L21/306
摘要： There are provided a chemical mechanical polishing composition, a chemical mechanical polishing slurry and a method for polishing a substrate that can realize a polishing rate equivalent to or higher than that of the existing polishing agent even if total metal content is decreased, or can realize remarkably higher polishing rate than that of the existing polishing agent when using total metal content identical as before. The chemical mechanical polishing composition comprises an iron-based metal catalyst, and a magnesium-based metal catalyst, wherein the metal content of the iron-based metal catalyst is equal to or greater than the metal content of the magnesium-based metal catalyst.

2. 发明授权

US11005066B2 Organic electronic device using adhesive film encapsulation technology, and method of manufacturing same 有权
公开(公告)号：US11005066B2
公开(公告)日：2021-05-11
申请号：US16067648
申请日：2016-12-29
申请人： Dongjin Semichem Co., Ltd.
发明人： Dong Hyun Lee
IPC分类号： H01L51/52 , H01L51/56 , H01L21/764 , H01L51/50 , H01L51/00
摘要： This organic electronic device using an adhesive film encapsulation technology includes: a substrate; an electrode layer formed of a transparent conductive material on the top surface of the substrate; an active region layer which is an active layer that induces the flow of holes or electrons in a portion of the electrode layer; a counter electrode formed of a conductive material on the top surface of the electrode layer and the active region layer; an adhesive film attached to cover a region including the active region layer; and a cover material disposed at a certain distance vertically upward and apart from the adhesive film, and sealing the space between counter electrodes by using an encapsulating material along both edges thereof, wherein a gap is formed between the adhesive film and the cover material.

3. 发明申请

US20200310249A1 POLYMER AND COMPOSITION FOR FORMING AN ANTI-REFLECTIVE FILM AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT DEVICE USING THE ANTI-REFLECTIVE FILM 审中-公开
公开(公告)号：US20200310249A1
公开(公告)日：2020-10-01
申请号：US16695569
申请日：2019-11-26
申请人： SAMSUNG ELECTRONICS CO., LTD. , Dongjin Semichem Co., Ltd.
发明人： Miyeong KANG , Sukkoo Hong , Hyereun Kim , Jihyun Kim , Hyunjin Kim , Hyojung Roh , Jongkyoung Park , Jungyoul Lee
IPC分类号： G03F7/09 , C08G18/79 , C08G18/38 , C09D175/04 , G03F7/038 , G03F7/039
摘要： A polymer having a repeating unit represented by Formula 1: wherein each of R1, R2, and R3 is independently selected from a substituted or unsubstituted C1-C6 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms or a substituted or unsubstituted C3-C6 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms, wherein at least one of R1, R2, and R3 is a hydrocarbon group substituted with a fluorine atom. R4 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms. R5 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms.

4. 发明申请

US20190326066A1 DYE-SENSITIZED SOLAR CELL 审中-公开
公开(公告)号：US20190326066A1
公开(公告)日：2019-10-24
申请号：US16456552
申请日：2019-06-28
申请人： Dongjin Semichem Co., Ltd.
发明人： Young Mi Kim , Jong Bok Kim , Jong Gyu Baek , Kyu Soon Shin
IPC分类号： H01G9/20
摘要： The present invention relates to a dye-sensitized solar cell electrode and a dye-sensitized solar cell including the same. A membrane is formed on a surface of a working electrode, thereby preventing a dye from being separated from an oxide semiconductor layer. The membrane is formed on a surface of a counter electrode, thereby enabling electrolyte elements (I−, I3−, etc.) to be passed therethrough while not allowing the dye to be adsorbed. The reliability and efficiency of a dye-sensitized solar cell be improved.

5. 发明授权

US09976082B2 Liquid crystal composition having easily adjustable rotational viscosity 有权
公开(公告)号：US09976082B2
公开(公告)日：2018-05-22
申请号：US15380680
申请日：2016-12-15
申请人： DONGJIN SEMICHEM CO., LTD.
发明人： Bo Ra Hong , Sun-Hee Lee , Mi Kyoung Lee , Bong Hee Kim , Young Kuk Kim
IPC分类号： C09K19/30
CPC分类号： C09K19/3003 , C09K19/12 , C09K19/20 , C09K19/44 , C09K2019/0466 , C09K2019/123 , C09K2019/3004 , C09K2019/301 , C09K2019/3016 , C09K2019/3019 , C09K2019/3422
摘要： The present invention provides a liquid crystal composition having easily adjustable rotational viscosity while maintaining stability at low temperature, a clearing point and dielectric anisotropy (positive value) in an optimal condition according to an exemplary embodiment of the present invention, including: at least one liquid crystal compound selected from the group consisting of liquid crystal compounds represented by the following Chemical Formula 1, as a first component; at least one liquid crystal compound selected from the group consisting of liquid crystal compounds represented by the following Chemical Formula 2, as a second component; and at least one liquid crystal compound selected from the group consisting of liquid crystal compounds represented by the following Chemical Formula 3, as a third component.The liquid crystal composition according to the present invention has high clearing point and refractive index anisotropy, a controllable modulus of elasticity, and high specific resistance, and the rotational viscosity thereof is easily adjustable to be low. Thus, the liquid crystal composition satisfying various liquid crystal display (LCD) device characteristics is provided.

6. 发明授权

US09783735B2 Liquid crystal display device and liquid crystal composition used therefor 有权
公开(公告)号：US09783735B2
公开(公告)日：2017-10-10
申请号：US15059871
申请日：2016-03-03
申请人： Samsung Display Co., Ltd. , DONGJIN SEMICHEM CO., LTD.
发明人： Si Heun Kim , Beom Soo Shin , Keun Chan Oh , Bong Hee Kim , Young Ho Seo
IPC分类号： C09K19/44 , C09K19/34 , C09K19/04 , C09K19/20 , C09K19/30 , C07C43/29 , C07D309/06 , C07D319/06 , C09K19/54 , C09K19/12
CPC分类号： C09K19/3402 , C07C43/29 , C07D309/06 , C07D319/06 , C09K19/0403 , C09K19/20 , C09K19/3066 , C09K19/54 , C09K2019/0466 , C09K2019/123 , C09K2019/3004 , C09K2019/301 , C09K2019/3016 , C09K2019/3019 , C09K2019/3422
摘要： A liquid crystal display device comprises a first substrate, a second substrate which faces the first substrate, an electrode part which is provided on at least one of the first substrate and the second substrate, and a liquid crystal layer which comprises a liquid crystal composition and is provided between the first substrate and the second substrate. The liquid crystal composition includes a liquid crystal compound of Formula 1. wherein R1, R2, A11, A12, A13, A21, A22, Z11, Z12, Z13, Z21, Z22, a, b, c, d, and e are as described herein.

7. 发明授权

US09593241B2 Resin composition for encapsulating optical element 有权
标题翻译：用于封装光学元件的树脂组合物
公开(公告)号：US09593241B2
公开(公告)日：2017-03-14
申请号：US14769155
申请日：2014-02-24
申请人： DONGJIN SEMICHEM Co., Ltd.
发明人： Han Bok Joo , Sun Sik Song , Hyeok Yong Kwon , Eun Ju Park , Jae Hyun Kim , Young Je Kwark , Hee Chun Eun , Hee Eun Im
IPC分类号： C08L83/04 , H01L23/29 , C08L83/06 , C08G77/00 , C08G77/62 , C08G77/04 , C08G77/20 , H01L33/56
CPC分类号： C08L83/06 , C08G77/045 , C08G77/20 , C08G77/62 , C08G77/80 , C08K5/56 , C08L83/00 , C08L83/04 , H01L23/296 , H01L33/56
摘要： The present invention relates to a resin composition for encapsulating an optical device and more particularly, the resin composition for encapsulating optical device of the invention comprising a polyhedral oligomeric silsesquioxane (POSS) of which the compatibility with resins is enhanced by its cross-linking ability and an organic polysilazane compound has excellent mechanical properties, and enhanced adhesive strengths to a base material and barrier properties against moisture or oxygen by having excellent solubility with siloxane resins and significantly improved outgassing phenomenon, thus being able to be applied to encapsulation process for various optical devices, especially the encapsulation process of thick films.
摘要翻译：本发明涉及一种用于封装光学器件的树脂组合物，更具体地说，涉及包含多面体低聚倍半硅氧烷（POSS）的本发明封装光学器件用树脂组合物，其与树脂的相容性通过其交联能力增强，有机聚硅氮烷化合物具有优异的机械性能，并且通过与硅氧烷树脂具有优异的溶解性并显着改善脱气现象，从而提高了对基材的粘合强度和对水分或氧气的阻隔性能，因此能够应用于各种光学装置的封装工艺，特别是厚膜的封装过程。

8. 发明申请

US20160307660A1 Carbon-Metal Composite and Method for Preparing the Same 审中-公开
标题翻译：碳 - 金属复合材料及其制备方法
公开(公告)号：US20160307660A1
公开(公告)日：2016-10-20
申请号：US15192613
申请日：2016-06-24
申请人： DONGJIN SEMICHEM CO., LTD.
发明人： Seon Yeong GONG , Soo Yeon LEE , Hyeonseong CHOE , Chongchan LEE
IPC分类号： H01B1/04 , C09D5/24 , C09D167/00 , C09D11/52
CPC分类号： H01B1/04 , C08K3/041 , C08K3/042 , C08K3/08 , C09D5/24 , C09D7/61 , C09D11/037 , C09D11/10 , C09D11/52 , C09D167/00
摘要： The present invention relates to a carbon-metal composite and a method for preparing carbon-metal composite, and more particularly to a method for preparing carbon-metal composite, which: is capable of reducing graphene oxide; which is capable of decreasing the steps and the time for hybridization of graphene which is obtained from the reduction, graphene or carbon nanotube, with metal; which is done under mild condition and; also which is capable of lowering resistivity of the carbon-metal composite. The method for preparing the carbon-metal composite comprises the steps of: reacting a composition containing a carbon compound selected from a group consisting of graphene, graphene oxide and carbon nanotube, a metallic precursor, a reducing agent and a solvent; and removing solvent partially or wholly from the composition reaction-completed. Wherein the reducing agent is selected from a group consisting of ethylene glycol, diethylene glycol, 1,2-propylene glycol, triethylene glycol, tetraethylene glycol, 1,3-propylene glycol, glycerol, and mixtures thereof.
摘要翻译：本发明涉及碳 - 金属复合材料和碳 - 金属复合材料的制备方法，更具体地说，涉及一种能够还原石墨烯氧化物的碳 - 金属复合材料的制备方法。其能够降低从还原性，石墨烯或碳纳米管获得的石墨烯与金属的杂交步骤和时间; 这是在温和的条件下完成的; 也能够降低碳 - 金属复合材料的电阻率。制备碳 - 金属复合材料的方法包括以下步骤：使含有选自石墨烯，氧化石墨烯和碳纳米管，金属前体，还原剂和溶剂的碳化合物的组合物反应; 并从组合物反应完成部分或全部除去溶剂。其中还原剂选自乙二醇，二甘醇，1,2-丙二醇，三甘醇，四甘醇，1,3-丙二醇，甘油及其混合物。

9. 发明申请

US20160053132A1 RESIST UNDERLAYER COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME 有权
标题翻译：耐蚀组合物和使用其形成图案的方法
公开(公告)号：US20160053132A1
公开(公告)日：2016-02-25
申请号：US14779769
申请日：2014-03-24
申请人： DONGJIN SEMICHEM CO., LTD.
发明人： Jung-Youl LEE , Young Bae LIM , Jong-Won KIM , Jae Woo LEE , Jae Hyun KIM
IPC分类号： C09D165/02 , G03F7/40
CPC分类号： C09D165/02 , C08G2261/124 , C08G2261/1422 , C08G2261/314 , C08G2261/3142 , C08G2261/3424 , C08G2261/45 , G03F7/094 , G03F7/40 , C08L61/06
摘要： An under-layer composition of resist having superior thermal stability, etching resistance, gap-filling property and void-preventing property, and a method for forming pattern using the same are disclosed. The under-layer composition of resist comprises: an aromatic ring containing polymer having the repeating unit of the following Formula 1; a compound of the following Formula 4; and an organic solvent. in Formula 1, R1 is a monocyclic or polycyclic aromatic hydrocarbon group having 5 to 20 carbon atoms, R2 and R3 is independently a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 14 carbon atoms, a is an integer of 1 to 3, and b is an integer of 0 to 2. in Formula 4, n is an integer of 1 to 250.
摘要翻译：公开了具有优异的热稳定性，耐蚀刻性，间隙填充性和防空气性的抗蚀剂的底层组合物，以及使用其形成图案的方法。抗蚀剂的底层组合物包含：含有下式1的重复单元的含芳环的聚合物; 下式4的化合物; 和有机溶剂。在式1中，R 1为碳原子数为5〜20的单环或多环芳香族烃基，R 2和R 3独立地为碳原子数4〜14的单环或多环芳香族烃基，a为1〜3的整数，b为1〜是0〜2的整数。在式4中，n为1〜250的整数。

10. 发明申请

US20160004159A1 COMPOSITION FOR FORMING RESIST PROTECTION FILM FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN OF SEMICONDUCTOR DEVICE USING THE SAME 有权
标题翻译：用于形成耐蚀保护膜的组合物及其形成使用其的半导体器件的图案的方法
公开(公告)号：US20160004159A1
公开(公告)日：2016-01-07
申请号：US14851934
申请日：2015-09-11
申请人： Dongjin Semichem Co., Ltd.
发明人： Man Ho Han , Jong Kyoung Park , Hyun Jin Kim , Jae Hyun Kim
IPC分类号： G03F7/11 , G03F7/16 , C09D133/16 , G03F7/38 , G03F7/32 , G03F7/34 , G03F7/004 , G03F7/20
CPC分类号： G03F7/11 , C08L2203/16 , C09D4/06 , C09D133/16 , G03F7/0045 , G03F7/168 , G03F7/2041 , G03F7/32 , G03F7/34 , G03F7/38
摘要： Provided are a composition for forming a resist protection film for lithography and a method for forming a pattern of a semiconductor device using the same. The composition comprises a repeat unit having a fluorine-containing functional group on a side chain thereof and contains a polymer having a weight average molecular weight of 2,000-100,000 and a solvent. The solvent containing 10-100 parts by weight of a material has a Hildebrand solubility parameter of 12.5-22.0, based on 100 parts by weight of the total weight thereof.
摘要翻译：提供一种用于形成用于光刻的抗蚀剂保护膜的组合物和使用其形成半导体器件的图案的方法。该组合物包含在其侧链上具有含氟官能团的重复单元，并且含有重均分子量为2,000-100,000的聚合物和溶剂。含有10-100重量份的材料的溶剂基于其总重量的100重量份，其Hildebrand溶解度参数为12.5-22.0。

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