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21. 发明授权

US09459159B2 Heat-flux measuring method, substrate processing system, and heat-flux measuring member 有权
标题翻译：热通量测量方法，基板处理系统和热通量测量部件
公开(公告)号：US09459159B2
公开(公告)日：2016-10-04
申请号：US14580460
申请日：2014-12-23
申请人： TOKYO ELECTRON LIMITED
发明人： Chishio Koshimizu , Tatsuo Matsudo
IPC分类号： G01K17/20 , H05H1/24 , H05H1/00 , H01J37/32 , G01J5/58
CPC分类号： G01K17/20 , G01J2005/583 , H01J37/32724 , H01J37/32917 , H01J37/32935 , H05H1/0043 , H05H1/24
摘要： In a heat-flux measuring method for measuring an ion flux of plasma generated in a substrate processing chamber using a heat flux, a heat-flux measuring member is exposed to the plasma and irradiated with a low coherent light. The heat-flux measuring member has a three-layered structure in which a first length and a second length of optical paths of the low-coherent light in the first layer and the third layer are measured using optical interference of reflected lights from the heat-flux measuring member. Current temperatures of the first layer and the third layer are obtained based on the measured first length, the measured second length, and data representing thermal-optical path length relationship. A heat flux flowing through the heat-flux measuring member is calculated based on the obtained temperatures, and a thickness and a thermal conductivity of the second layer.
摘要翻译：在利用热通量测量在基板处理室中产生的等离子体的离子通量的热通量测量方法中，将热量测量部件暴露于等离子体并用低相干光照射。热通量测量部件具有三层结构，其中使用来自热交换器的反射光的光学干涉来测量第一层和第三层中的低相干光的第一长度和第二长度的光路，焊剂测量部件。基于所测量的第一长度，测量的第二长度和表示热 - 光路长度关系的数据，获得第一层和第三层的当前温度。基于获得的温度，第二层的厚度和热导率计算流过热通量测量部件的热通量。

22. 发明授权

US09268194B2 Method and technique to control laser effects through tuning of parameters such as repetition rate 有权
标题翻译：通过调整重复率等参数来控制激光效果的方法和技术
公开(公告)号：US09268194B2
公开(公告)日：2016-02-23
申请号：US13567809
申请日：2012-08-06
申请人： Kevin Kremeyer , Jeremy Yeak , Matthias Lenzner
发明人： Kevin Kremeyer , Jeremy Yeak , Matthias Lenzner
IPC分类号： G21K1/08 , G02F1/35 , H05H1/00 , F41H13/00 , G01S7/495 , H04K3/00 , H05G2/00 , G01S7/38 , F41H11/02
CPC分类号： G21K1/08 , F41H11/02 , F41H13/0056 , G01S7/38 , G01S7/495 , G02F1/3511 , G02F2001/3528 , H04K3/60 , H04K3/825 , H05G2/008 , H05H1/0012
摘要： A technique for controlling the effects generated by the interaction of a plurality of laser pulses with a medium by selecting or varying the successive pulse parameters comprising: generating a plurality of laser pulses interacting with a medium; and selecting or varying the properties/parameters characterizing said laser pulses to control the effects resulting from the interaction among said plurality of laser pulses and said medium.
摘要翻译：一种用于通过选择或改变连续脉冲参数来控制由多个激光脉冲与介质的相互作用产生的影响的技术，包括：产生与介质相互作用的多个激光脉冲; 以及选择或改变表征所述激光脉冲的性质/参数，以控制由所述多个激光脉冲和所述介质之间的相互作用产生的影响。

23. 发明授权

US09210790B2 Systems and methods for calibrating a switched mode ion energy distribution system 有权
标题翻译：用于校准开关模式离子能量分配系统的系统和方法
公开(公告)号：US09210790B2
公开(公告)日：2015-12-08
申请号：US13597032
申请日：2012-08-28
申请人： Daniel J. Hoffman , Daniel Carter , Victor Brouk , William J. Hattel
发明人： Daniel J. Hoffman , Daniel Carter , Victor Brouk , William J. Hattel
IPC分类号： H01J7/24 , H05H1/46 , C23C14/34 , H01J37/32 , H05H1/00
CPC分类号： H05H1/46 , C23C14/345 , H01J37/32082 , H01J37/32422 , H01J37/32706 , H01J37/32926 , H01J37/32935 , H01J37/3299 , H05H1/0081
摘要： Systems, methods and apparatus for regulating ion energies and ion energy distributions along with calibrating a bias source and a plasma processing chamber are disclosed. An exemplary method includes applying a periodic voltage function to a load emulator, which emulates electrical characteristics of a plasma load and associated electronics such as an e-chuck. The load emulator can be measured for various electrical parameters and compared to expected parameters generated by the bias source. Differences between measured and expected values can be used to identify and correct faults and abnormalities in the bias supply, the chamber, or a power source used to ignite and sustain the plasma. Once the bias supply is calibrated, the chamber can be calibrated by measuring and calculating an effective capacitance comprising a series and parallel capacitance of the substrate support and optionally the substrate.
摘要翻译：公开了用于调节离子能量和离子能量分布以及校准偏压源和等离子体处理室的系统，方法和装置。一种示例性方法包括将周期性电压函数应用于负载仿真器，负载仿真器模拟等离子体负载的电特性和相关联的电子设备例如电动卡盘。可以测量负载仿真器的各种电气参数，并与偏置源产生的预期参数进行比较。测量值和预期值之间的差异可用于识别和纠正偏置电源，腔室或用于点燃和维持等离子体的电源的故障和异常。一旦偏置电源被校准，可以通过测量和计算包括衬底支撑件和任选的衬底的串联和并联电容的有效电容来校准腔室。

24. 发明授权

US09155180B1 System and method of simultaneously fueling and mitigating debris for a plasma-based illumination source 有权
标题翻译：同时加油和减轻等离子体照明光源碎片的系统和方法
公开(公告)号：US09155180B1
公开(公告)日：2015-10-06
申请号：US13647826
申请日：2012-10-09
申请人： KLA-Tencor Corporation
发明人： Karl R. Umstadter
IPC分类号： H05H1/00 , H01J27/08 , G03F7/20 , H01J17/30
CPC分类号： H05H1/00 , G03F7/70916 , H01J17/30 , H01J27/08 , H05G2/003
摘要： The disclosure is directed to a system and method of fueling and mitigating debris for an illumination source. An illumination system may include a plasma-based illumination source. The illumination system may provide illumination along an illumination path emanating from an illumination origin of the illumination source. A gas jet nozzle may be disposed at a selected distance from the illumination origin or proximate to the illumination origin. The gas jet nozzle may be configured to provide fuel gas to fuel the plasma-based illumination source. The gas jet nozzle may be further configured to provide fuel gas in a selected direction substantially opposite to a direction of illumination emanating from the illumination origin to remove at least a portion of debris from the illumination path.
摘要翻译：本公开涉及一种用于加注和减轻照明源的碎屑的系统和方法。照明系统可以包括基于等离子体的照明源。照明系统可以沿着从照明源的照明原点发出的照明路径提供照明。气体喷嘴可以设置在距照明原点或接近照明原点的选定距离处。气体喷嘴可以被配置为提供燃料气体来燃料基于等离子体的照明源。气体喷嘴可以进一步构造成在与从照明原点发出的照明方向基本相反的选定方向上提供燃料气体，以从照明路径去除至少一部分碎片。

25. 发明授权

US08974868B2 Post deposition plasma cleaning system and method 有权
标题翻译：后沉积等离子体清洗系统及方法
公开(公告)号：US08974868B2
公开(公告)日：2015-03-10
申请号：US11084176
申请日：2005-03-21
申请人： Tadahiro Ishizaka , Audunn Ludviksson
发明人： Tadahiro Ishizaka , Audunn Ludviksson
IPC分类号： H05H1/00 , C23C16/455 , H01J37/32 , C23C16/34 , H01L21/768 , C23C16/30 , H01L21/314 , H01L21/285 , H01L21/3205 , C23C16/14 , C23C16/509 , H01L21/316 , H01L21/318
CPC分类号： H01L21/76843 , C23C16/14 , C23C16/303 , C23C16/34 , C23C16/45538 , C23C16/45544 , C23C16/5096 , H01J37/32082 , H01J37/32192 , H01J2237/335 , H01L21/02271 , H01L21/02274 , H01L21/0228 , H01L21/28562 , H01L21/3141 , H01L21/31608 , H01L21/31616 , H01L21/31637 , H01L21/31641 , H01L21/31645 , H01L21/318 , H01L21/32051
摘要： A method for processing a substrate includes disposing the substrate in a deposition chamber configured to perform a deposition process and depositing a film on the substrate using the deposition process. The substrate having the film thereon is then transferred from the deposition chamber into a treatment chamber and a plasma cleaning process is performed on the substrate in the treatment chamber. Further processing of the substrate is performed after the plasma cleaning process.
摘要翻译：一种用于处理衬底的方法包括将衬底设置在沉积室中，其被配置为执行沉积工艺，并使用沉积工艺在衬底上沉积膜。然后将其上具有膜的基板从沉积室转移到处理室中，并且在处理室中的基板上进行等离子体清洁处理。在等离子体清洗处理之后进行基板的进一步处理。

26. 发明授权

US08907578B2 Autonomous method and system for minimizing the magnitude of plasma discharge current oscillations in a hall effect plasma device 有权
标题翻译：用于最小化霍尔效应等离子体装置中的等离子体放电电流振荡的幅度的自动方法和系统
公开(公告)号：US08907578B2
公开(公告)日：2014-12-09
申请号：US13621342
申请日：2012-09-17
申请人： Vladimir Hruby , Nathaniel Demmons , Eric Ehrbar , Bruce Pote , Nathan Rosenblad
发明人： Vladimir Hruby , Nathaniel Demmons , Eric Ehrbar , Bruce Pote , Nathan Rosenblad
IPC分类号： H05H1/00 , H05B41/14 , H05H1/54 , F03H1/00
CPC分类号： H05H1/00 , F03H1/0075 , H05H1/54
摘要： An autonomous method for minimizing the magnitude of plasma discharge current oscillations in a Hall effect plasma device includes iteratively measuring plasma discharge current oscillations of the plasma device and iteratively adjusting the magnet current delivered to the plasma device in response to measured plasma discharge current oscillations to reduce the magnitude of the plasma discharge current oscillations.
摘要翻译：用于最小化霍尔效应等离子体装置中的等离子体放电电流振荡的幅度的自主方法包括迭代地测量等离子体装置的等离子体放电电流振荡，并且响应于测量的等离子体放电电流振荡迭代地调整输送到等离子体装置的磁体电流以减少等离子体放电电流振荡的幅度。

27. 发明授权

US08895888B2 Anti-smudging, better gripping, better shelf-life of products and surfaces 有权
标题翻译：防污，更好的抓握，更好的保质期的产品和表面
公开(公告)号：US08895888B2
公开(公告)日：2014-11-25
申请号：US13519611
申请日：2010-09-20
申请人： Venkata Burada , Jainagesh Sekhar , Jerod Batt , Ganta S. Reddy , Brian Kandell
发明人： Venkata Burada , Jainagesh Sekhar , Jerod Batt , Ganta S. Reddy , Brian Kandell
IPC分类号： B23K10/00 , H05H1/00 , H05H1/30 , B08B7/00 , B29C59/14
CPC分类号： H05H1/00 , B08B7/00 , B29C59/14 , H05H1/30
摘要： A device to provide improved anti-smudging, better gripping and longer shelf-life to products and surfaces includes an electric superheated steam generator and an electric low-ion plasma generator to provide superheated steam and low-ion plasma to the surfaces of products including plastics. One embodiment envisions the superheated steam generator and the low-ion plasma generator being contained in a housing while another embodiment anticipates a conveyor means positioned in front of the superheated steam generator and the low-ion plasma generator. A method for the improving of anti-smudging, gripping and shelf-life for properties includes the application of superheated steam and low-ion plasma by means of a superheated steam generator and a low-ion plasma generator to products for specific periods of time and at specific distances to attain desired surface and bulk properties. The superheated steam and low-ion plasma may be applied individually, simultaneously or sequentially.
摘要翻译：为产品和表面提供改进的防污染，更好的夹持和更长的保存期限的装置包括电过热蒸汽发生器和电动低离子等离子体发生器，以向包括塑料在内的产品的表面提供过热蒸汽和低离子等离子体。一个实施方案设想，过热蒸汽发生器和低离子等离子体发生器被包含在壳体中，而另一个实施例预期位于过热蒸汽发生器和低离子等离子体发生器前面的输送机装置。用于改善防污染，夹持和保存性能的方法包括通过过热蒸汽发生器和低离子等离子体发生器将过热蒸汽和低离子等离子体应用于产品特定的时间段，以达到所需的表面和体积特性。过热蒸汽和低离子等离子体可以单独，同时或顺序地施加。

28. 发明授权

US08890537B2 Harmonic derived arc detector 有权
标题翻译：谐波导出电弧检测器
公开(公告)号：US08890537B2
公开(公告)日：2014-11-18
申请号：US12764145
申请日：2010-04-21
申请人： John Valcore, Jr. , Yufeng Han , Jonathan Smyka , Salvatore Polizzo , Aaron T. Radomski
发明人： John Valcore, Jr. , Yufeng Han , Jonathan Smyka , Salvatore Polizzo , Aaron T. Radomski
IPC分类号： H01J37/00 , H05H1/00 , H01J37/32
CPC分类号： H05H1/0062 , H01J37/32082 , H01J37/32935 , H01J37/32944 , H01J2237/0206
摘要： An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber.
摘要翻译：电弧检测系统包括射频（RF）信号探针，其感测RF等离子体室的输入处的RF信号，并且基于RF信号的电压，电流和功率中的至少一个产生信号。信号分析仪接收信号，对频率分量的信号进行监视，频率成分的频率大于或等于RF信号的基频，并根据频率成分产生输出信号。输出信号表示在等离子体室内发生电弧。

29. 发明授权

US08866111B2 Radiation source and method for lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备及其制造方法的辐射源及方法
公开(公告)号：US08866111B2
公开(公告)日：2014-10-21
申请号：US14233116
申请日：2012-07-04
申请人： Erik Roelof Loopstra , Johan Frederik Dijksman
发明人： Erik Roelof Loopstra , Johan Frederik Dijksman
IPC分类号： H05G2/00 , G01N21/33 , H05H1/00 , B05B17/06 , B05B1/24 , B05B1/08
CPC分类号： H05G2/003 , B05B1/086 , B05B1/24 , B05B17/0607 , H05G2/005 , H05G2/006
摘要： A radiation source for generating EUV from a stream of molten fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporize at least some of the droplets of fuel, whereby radiation is generated. The fuel droplet generator has a nozzle, a feed chamber, and a reservoir, with a pumping device arranged to supply a flow of fuel in molten state from the reservoir through the feed chamber and out of the nozzle as a stream of droplets. The feed chamber has an outer face in contact with a drive cavity filled with a liquid, and the liquid is driven to oscillate by a vibrator with the oscillation transmissible to the molten fuel in the feed chamber from the outer face of the feed chamber through the liquid.
摘要翻译：用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融燃料液滴流产生EUV的辐射源具有燃料液滴发生器，该燃料液滴发生器布置成提供燃料液滴流和至少一个被配置为至少蒸发的激光一些燃料液滴，从而产生辐射。燃料液滴发生器具有喷嘴，进料室和储存器，其中泵送装置被布置成以熔融流状态从储存器通过进料室提供并且作为液滴流从喷嘴流出。进料室具有与填充有液体的驱动腔接触的外表面，并且液体被振动器驱动，振动器通过振动器从进料室的外表面通过进料室的熔融燃料传播到熔融燃料中液体。

30. 发明授权

US08854790B1 Electrostatic chuck assembly 有权
标题翻译：静电吸盘组件
公开(公告)号：US08854790B1
公开(公告)日：2014-10-07
申请号：US10127084
申请日：2002-04-22
申请人： David Hsieh
发明人： David Hsieh
IPC分类号： H02N13/00 , H05H1/00
CPC分类号： H01L21/68735 , H01L21/6831
摘要： The present invention generally relates to an electrostatic chuck assembly for uniformly processing a wafer in a semiconductor wafer processing process, more particularly to prevent a byproduct formed from leakage of wafer processing materials from depositing between a wafer and the electrostatic chuck assembly.The electrostatic chuck assembly has a wafer holding member for holding a wafer; a shadow ring in engagement with the wafer holding member; and an insert ring disposed between the shadow ring and the wafer holding member.The wafer holding member has a wafer mounting surface and may preferably have a conical head having a tapered peripheral wall and a cylindrical portion. Alternatively, the wafer holding member is cylindrical and extends downwardly from the wafer mounting surface. The insert ring has an inner wall for sealably engaging the wafer holding member and preferably, is removable to allow for easy cleaning of the electrostatic chuck assembly.
摘要翻译：本发明一般涉及一种用于在半导体晶片加工工艺中均匀加工晶片的静电卡盘组件，更具体地说，涉及防止由晶片处理材料的泄漏形成的副产物在晶片和静电卡盘组件之间的沉积。静电吸盘组件具有用于保持晶片的晶片保持部件; 与晶片保持构件接合的阴影环; 以及设置在所述阴影环和所述晶片保持构件之间的插入环。晶片保持构件具有晶片安装表面，并且可以优选地具有锥形头部，其具有锥形周壁和圆柱形部分。或者，晶片保持构件是圆柱形的并且从晶片安装表面向下延伸。插入环具有用于密封地接合晶片保持构件的内壁，并且优选地是可移除的，以允许容易地清洁静电卡盘组件。

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