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    • 32. 发明授权
    • Laser system able to estimate hermetic seal of laser gas container
    • 激光系统能够估计激光气体容器的密封
    • US09490602B2
    • 2016-11-08
    • US14196608
    • 2014-03-04
    • FANUC CORPORATION
    • Akihiko Nishio
    • H01S3/00H01S3/036
    • H01S3/0014H01S3/036
    • A laser system including a pressure adjusting part adjusting the laser gas pressure in the laser gas container, a pressure control unit controlling the pressure adjusting part so that before startup of the laser oscillator, the laser gas pressure becomes a first gas pressure lower than atmospheric pressure and so that at a preparatory stage after startup of the laser oscillator and before radiation of the laser light, the laser gas pressure becomes a second gas pressure capable of oscillating laser light, a laser control unit controlling the laser oscillator so that the laser oscillator executes an initial operation, a laser detector detecting the laser light output by the initial operation, and a hermetic seal estimating part estimating an extent of hermetic seal of the laser gas container based on a detection value obtained by the laser detector.
    • 一种激光系统,包括调整激光气体容器中的激光气体压力的压力调节部件,控制压力调节部件的压力控制部件,使得在激光振荡器启动之前激光气体压力变为低于大气压的第一气体压力 并且使得在激光振荡器起动之后并且在激光照射之前的准备阶段,激光气体压力变为能够激发激光的第二气体压力,激光控制单元控制激光振荡器,使得激光振荡器执行 初始操作,激光检测器检测由初始操作输出的激光,以及气密密封估计部,其基于由激光检测器获得的检测值来估计激光气体容器的气密密封的程度。
    • 34. 发明申请
    • GAS LASER APPARATUS
    • 气体激光装置
    • US20160248215A1
    • 2016-08-25
    • US15145016
    • 2016-05-03
    • Gigaphoton Inc.
    • Natsushi SUZUKIOsamu WAKABAYASHIHiroaki TSUSHIMAMasanori YASHIRO
    • H01S3/036H01S3/225B01D53/04H01S3/104
    • H01S3/036B01D53/0446B01D53/346B01D53/685B01D53/82B01D53/86B01D2251/404B01D2251/602B01D2253/108B01D2255/20753B01D2255/20761B01D2257/2027B01D2258/0216B01D2259/40003H01S3/104H01S3/225
    • A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
    • 气体激光装置可以包括:激光室,其通过第一控制阀连接到第一激光气体供应源,第一激光气体供应源提供含有卤素气体的第一激光气体,并通过第二控制阀连接到第二激光气体供应源, 具有比第一激光气体低的卤素气体浓度的第二激光气体; 净化塔,其从至少一部分从激光室排出的气体中除去至少一部分卤素气体和卤素化合物; 增压泵,其通过第三控制阀连接到激光室,其将通过净化塔的气体的压力升高到高于激光室的工作气体压力的气体压力; 以及控制器,其基于从所述增压泵通过所述第三控制阀向所述激光室供给的第一量的气体计算第二量的所述第一激光气体,所述第一激光气体将被供给到所述激光室并控制 基于计算第二量的结果的第一控制阀。
    • 36. 发明授权
    • Method and system for performing automatic gas refills for a gas laser
    • 对气体激光进行自动气体补充的方法和系统
    • US09356414B2
    • 2016-05-31
    • US14585062
    • 2014-12-29
    • Teledyne Instruments, Inc.
    • John Roy
    • H01S3/22H01S3/036H01S3/225
    • H01S3/036H01S3/225
    • An apparatus to automatically refill a gas laser is disclosed. The apparatus includes a computing device coupled to a memory. The memory storing instructions that when executed by the computing device cause the computing device to monitor a time elapsed since a last recorded gas refill and when a predetermined time interval is reached since the last recorded gas refill, effectuate a gas refill process to refill the gas laser with gas from a gas supply coupled to the gas laser by automatically controlling the gas laser and the gas supply; and upon completing the gas refill process, record a time stamp of the completed gas refill process. A method and system to automatically refill a gas laser also are disclosed.
    • 公开了一种自动重新填充气体激光器的装置。 该装置包括耦合到存储器的计算装置。 存储指令的存储器,当由计算装置执行时,使计算装置监视从上次记录的气体再填充以来经过的时间,并且当从最后记录的气体再填充到达预定的时间间隔时,执行气体补充处理以再填充气体 通过自动控制气体激光器和气体供应,通过与气体激光器连接的气体供应气体进行激光; 在完成气体补充处理之后,记录完成的气体补充过程的时间戳。 还公开了一种自动重新填充气体激光器的方法和系统。
    • 39. 发明申请
    • LASER OSCILLATOR PROVIDED WITH LASER MEDIUM FLOW PATH
    • 激光振荡器提供激光介质流路
    • US20160056602A1
    • 2016-02-25
    • US14833479
    • 2015-08-24
    • FANUC CORPORATION
    • Tetsuhisa Takazane
    • H01S3/032H01S3/223H01S3/041H01S3/036
    • H01S3/032H01S3/03H01S3/036H01S3/041H01S3/076H01S3/2232
    • A laser oscillator which can keep distributions of pressure of a laser medium inside of a plurality of discharge tubes constant while making the laser medium circulate without stagnating. The laser oscillator is comprised of a first discharge tube, second discharge tube, first light guide, laser medium flow path, and blower. A flow resistance of a laser medium flow path between the blower and the first discharge tube and a flow resistance of the laser medium flow path between the blower and second discharge tube are the same as each other. A flow resistance of the laser medium flow path between the blower and a first end of the first light guide and a flow resistance of the laser medium flow path between the blower and a second end of the first light guide differ from each other.
    • 激光振荡器可以使激光介质在多个放电管内部的压力分布恒定,同时使激光介质循环而不停滞。 激光振荡器包括第一放电管,第二放电管,第一光导,激光介质流路和鼓风机。 鼓风机和第一放电管之间的激光介质流路的流动阻力和鼓风机与第二放电管之间的激光介质流路的流动阻力彼此相同。 鼓风机与第一导光体的第一端之间的激光介质流路的流动阻力和鼓风机与第一导光体的第二端之间的激光介质流路的流动阻力彼此不同。
    • 40. 发明授权
    • Laser device for exposure apparatus
    • 用于曝光设备的激光装置
    • US09257809B2
    • 2016-02-09
    • US13401734
    • 2012-02-21
    • Hidenori WatanabeHiroshi TanakaOsamu Wakabayashi
    • Hidenori WatanabeHiroshi TanakaOsamu Wakabayashi
    • H01S3/223H01S3/03H01S3/134H01S3/23H01S3/036G03F7/20
    • H01S3/03G03F7/70025H01S3/036H01S3/134H01S3/2316H01S3/2366
    • A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.
    • 用于曝光装置的激光装置可以包括:MOPA型或MOPO型激光装置,其包括种子激光器和至少一个气体放电泵浦放大器级,其接收来自种子激光器的输出光作为输入,放大光, 并输出放大的光; 以及激光气体控制装置中的至少一个,所述激光气体控制装置至少根据所要求的能量来改变所述放大器级中的激光气体的总压力,激光电源控制装置至少改变放大器级中的放电电极的泵浦强度 根据所述要求的能量,在来自所述激光装置的激光输出光的能量将根据来自曝光装置的请求而不连续地改变的情况下。