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1. 发明申请

US20190190229A1 GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE 审中-公开
公开(公告)号：US20190190229A1
公开(公告)日：2019-06-20
申请号：US16232321
申请日：2018-12-26
申请人： Cymer, LLC
发明人： Tanuj Aggarwal
IPC分类号： H01S3/134 , H01S3/225 , H01S3/13 , H01S3/038 , H01S3/097 , H01S3/104 , H01S3/036
CPC分类号： H01S3/134 , H01S3/036 , H01S3/0385 , H01S3/08009 , H01S3/08036 , H01S3/09705 , H01S3/0971 , H01S3/104 , H01S3/1305 , H01S3/225 , H01S3/2308 , H01S3/2366
摘要： In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.

2. 发明授权

US09825417B2 Laser unit and non-transitory computer-readable storage medium 有权
公开(公告)号：US09825417B2
公开(公告)日：2017-11-21
申请号：US15144081
申请日：2016-05-02
申请人： GIGAPHOTON INC.
发明人： Akihiko Kurosu , Takashi Matsunaga , Hiroyuki Masuda , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro , Takeshi Ohta
IPC分类号： H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/104 , H01S3/04 , H01S3/03 , H01S3/08 , H01S3/134 , H01S3/13 , H01S3/225 , H01S3/041
CPC分类号： H01S3/036 , H01S3/03 , H01S3/0404 , H01S3/0407 , H01S3/041 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/104 , H01S3/1306 , H01S3/134 , H01S3/2258
摘要： There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

3. 发明授权

US09819139B2 Gas laser oscillator having auxiliary electrodes 有权
公开(公告)号：US09819139B2
公开(公告)日：2017-11-14
申请号：US15284749
申请日：2016-10-04
申请人： FANUC CORPORATION
发明人： Masahiro Honda
IPC分类号： H01S3/03 , H01S3/097 , H01S3/038 , H01S3/07 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/036 , H01S3/041
CPC分类号： H01S3/097 , H01S3/03 , H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/07 , H01S3/073 , H01S3/09702 , H01S3/09713 , H01S3/0975 , H01S3/104
摘要： A gas laser oscillator includes laser gas circulation paths including first and second paths; a first discharge tube provided in the first path; a second discharge tube provided in the second path; a laser power supply for supplying a first high frequency power to the first discharge tube and supplying a second high frequency power having a different phase from the first high frequency power to the second discharge tube; and a matching unit including a first coil and a first capacitor, and a second coil and a second capacitor. Each value of the first coil, the first capacitor, the second coil, and the second capacitor is determined such that the difference between the peak value of a voltage applied to the first discharge tube and the peak value of a voltage applied to the second discharge tube falls within a predetermined range.

4. 发明申请

US20170229832A1 GAS MIXTURE CONTROL IN A GAS DISCHARGE LIGHT SOURCE 审中-公开
公开(公告)号：US20170229832A1
公开(公告)日：2017-08-10
申请号：US15495455
申请日：2017-04-24
申请人： Cymer, LLC
发明人： Rahul Ahlawat , Tanuj Aggarwal
IPC分类号： H01S3/036 , H01S3/225 , H01S3/097
CPC分类号： H01S3/036 , H01S3/0014 , H01S3/097 , H01S3/0971 , H01S3/10069 , H01S3/104 , H01S3/225 , H01S3/2251 , H01S3/2253 , H01S3/2255 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.

5. 发明授权

US09653869B1 Optical surface preservation techniques and apparatus 有权
公开(公告)号：US09653869B1
公开(公告)日：2017-05-16
申请号：US14063727
申请日：2013-10-25
申请人： Xemed LLC
发明人： F. William Hersman , David W. Watt
IPC分类号： H01S3/03 , H01S3/227 , H01S3/0941 , H01S3/22 , H01S3/034 , H01S3/036
CPC分类号： H01S3/031 , H01S3/032 , H01S3/0346 , H01S3/036 , H01S3/0405 , H01S3/041 , H01S3/0941 , H01S3/0943 , H01S3/104 , H01S3/227
摘要： Techniques and architecture are disclosed for preserving optical surfaces (e.g., windows, coatings, etc.) in a flowing gas amplifier laser system, such as a diode-pumped alkali laser (DPAL) system. In some instances, the disclosed techniques/architecture can be used, for example, to protect optical surfaces in a DPAL system from: (1) chemical attack by pump-bleached alkali vapor atoms and/or ions; and/or (2) fouling by adherence thereto of reaction products/soot produced in the DPAL. Also, in some instances, the disclosed techniques/architecture can be used to substantially match the geometry of the pumping volume with that of the lasing volume, thereby minimizing or otherwise reducing the effects of amplified spontaneous emission (ASE) on DPAL output power. Furthermore, in some cases, the disclosed techniques/architecture can be used to provide a DPAL system capable of producing a beam output power in the range of about 20 kW to 10 MW, or greater.

6. 发明授权

US09634455B1 Gas optimization in a gas discharge light source 有权
公开(公告)号：US09634455B1
公开(公告)日：2017-04-25
申请号：US15044677
申请日：2016-02-16
申请人： Cymer, LLC
发明人： Tanuj Aggarwal
IPC分类号： H01S3/036 , H01S3/225 , H01S3/23 , H01S3/11
CPC分类号： H01S3/134 , H01S3/036 , H01S3/0385 , H01S3/08009 , H01S3/08036 , H01S3/09705 , H01S3/0971 , H01S3/104 , H01S3/1305 , H01S3/225 , H01S3/2308 , H01S3/2366
摘要： One or more operating characteristics of a light source are adjusted by estimating a plurality of extreme values of operating parameters of the light source while operating the light source under a set of extreme test conditions. For each extreme test condition, a group of pulses of energy is supplied to a first gas discharge chamber of the light source while operating the first gas discharge chamber under the extreme test condition to produce a first pulsed amplified light beam; a group of pulses of energy is supplied to a second gas discharge chamber of the light source while operating the second gas discharge chamber under the extreme test condition to produce a second pulsed amplified light beam. An extreme value of an operating parameter for the extreme test condition is measured to thereby estimate the extreme value of the operating parameter.

7. 发明申请

US20170077666A1 LASER OSCILLATOR COMPRISING HEAT EXCHANGER HAVING FUNCTION OF COLLECTING FOREIGN MATTERS 有权
标题翻译：包含具有收集外部功能功能的热交换器的激光振荡器
公开(公告)号：US20170077666A1
公开(公告)日：2017-03-16
申请号：US15264985
申请日：2016-09-14
申请人： FANUC CORPORATION
发明人： Risa Ito , Tetsuhisa Takazane , Yuji Nishikawa
IPC分类号： H01S3/041 , H01S3/04 , H01S3/036
CPC分类号： H01S3/041 , H01S3/036 , H01S3/04 , H01S3/0405 , H01S3/097 , H01S3/0971 , H01S3/104 , H01S3/22 , H01S3/2232
摘要： A laser oscillator comprises a heat exchanger which cools a gas medium. The heat exchanger includes a cooling part which performs heat exchange between the gas medium and a cooling medium, a tubular member fixed to a frame body, and a foreign matter collection container. The tubular member is disposed so that the gas medium which flows out of the cooling part moves along an outer surface of the tubular member and then changes a proceeding direction to flow into an inlet portion. The foreign matter collection container collects foreign matters which are separated from a flow of the gas medium.
摘要翻译：激光振荡器包括冷却气体介质的热交换器。热交换器包括在气体介质和冷却介质之间进行热交换的冷却部件，固定到框体的管状部件和异物收集容器。管状构件被设置成使得从冷却部分流出的气体介质沿管状构件的外表面移动，然后改变前进方向以流入入口部分。异物收集容器收集与气体介质的流动分离的异物。

8. 发明授权

US09583909B2 Temperature controllable gas laser oscillator 有权
标题翻译：温度可控气体激光振荡器
公开(公告)号：US09583909B2
公开(公告)日：2017-02-28
申请号：US15053152
申请日：2016-02-25
申请人： FANUC CORPORATION
发明人： Tetsuhisa Takazane
IPC分类号： H01S3/04 , H01S3/041 , H01S3/00 , H01S3/104 , H01S3/223 , H01S3/03 , H01S3/036
CPC分类号： H01S3/0407 , H01S3/0014 , H01S3/03 , H01S3/036 , H01S3/0401 , H01S3/041 , H01S3/104 , H01S3/2232
摘要： A gas laser oscillator according to the present invention comprises a resonator unit, a heat exchanger through which a fluid exchanging heat with a laser gas flows, a chiller for cooling the fluid in the heat exchanger and supplying the fluid to the heat exchanger, and a heat transfer device for transferring heat of the fluid to the resonator unit. The gas laser oscillator further comprises a first flow path for supplying the fluid used for cooling the laser gas in the heat exchanger to the heat transfer device, a second flow path for supplying the fluid cooled by the chiller to the heat transfer device prior to supplying the fluid to the heat exchanger, and a switching valve for switching either one of a first flow path and a second flow path.
摘要翻译：根据本发明的气体激光振荡器包括谐振器单元，与激光气体交换热量的热交换器，用于冷却热交换器中的流体并将流体供应到热交换器的冷却器，以及用于将流体的热量传递到谐振器单元的传热装置。气体激光振荡器还包括用于将用于冷却热交换器中的激光气体的流体供应到传热装置的第一流动路径，用于在供应之前将由冷却器冷却的流体供应到传热装置的第二流动路径到热交换器的流体，以及用于切换第一流路和第二流路中的任一个的切换阀。

9. 发明申请

US20160322776A1 CO2-N2-HE GAS DYNAMIC LASER 审中-公开
标题翻译： CO2-N2-HE气动激光
公开(公告)号：US20160322776A1
公开(公告)日：2016-11-03
申请号：US15141797
申请日：2016-04-28
申请人： Devin Benjamin Richardson , Jack Lloyd-Reilley , Pourya Samari , Jennifer Steffany Rodriguez , Arturo Alejo Ayon
发明人： Devin Benjamin Richardson , Jack Lloyd-Reilley , Pourya Samari , Jennifer Steffany Rodriguez , Arturo Alejo Ayon
IPC分类号： H01S3/0953 , H01S3/225 , H01S3/105 , H01S3/223 , H01S3/036 , H01S3/034
CPC分类号： H01S3/0953 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/104 , H01S3/2232
摘要： Disclosed herein is a CO2-N2-He gas dynamic laser. The operation of a gas dynamic laser involves heating the gas, rapidly cooling that gas in a supersonic nozzle, flowing the gas through an optical cavity wherein stimulated emission (lasing) takes place, and exhausting the gas. Isentropic equations are used to find flow properties throughout the nozzle and diffuser from the properties at their inlets in order to produce a Shock-Free minimum length nozzle.
摘要翻译：本文公开了一种CO2-N2-He气体动态激光器。气体动态激光器的操作包括加热气体，快速冷却超音速喷嘴中的气体，使气体流过其中发生受激发射（激光）的光学腔，并排出气体。等熵方程用于从其入口处的性质中发现整个喷嘴和扩散器的流动特性，以产生无冲击最小长度的喷嘴。

10. 发明申请

US20160248215A1 GAS LASER APPARATUS 有权
标题翻译：气体激光装置
公开(公告)号：US20160248215A1
公开(公告)日：2016-08-25
申请号：US15145016
申请日：2016-05-03
申请人： Gigaphoton Inc.
发明人： Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
IPC分类号： H01S3/036 , H01S3/225 , B01D53/04 , H01S3/104
CPC分类号： H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
摘要： A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
摘要翻译：气体激光装置可以包括：激光室，其通过第一控制阀连接到第一激光气体供应源，第一激光气体供应源提供含有卤素气体的第一激光气体，并通过第二控制阀连接到第二激光气体供应源，具有比第一激光气体低的卤素气体浓度的第二激光气体; 净化塔，其从至少一部分从激光室排出的气体中除去至少一部分卤素气体和卤素化合物; 增压泵，其通过第三控制阀连接到激光室，其将通过净化塔的气体的压力升高到高于激光室的工作气体压力的气体压力; 以及控制器，其基于从所述增压泵通过所述第三控制阀向所述激光室供给的第一量的气体计算第二量的所述第一激光气体，所述第一激光气体将被供给到所述激光室并控制基于计算第二量的结果的第一控制阀。

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