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41. 发明申请

US20200161092A1 PLASMA PROCESSING APPARATUS 审中-公开
公开(公告)号：US20200161092A1
公开(公告)日：2020-05-21
申请号：US16749180
申请日：2020-01-22
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Yoshiharu Inoue , Tetsuo Ono , Michikazu Morimoto , Masaki Fujii , Masakazu Miyaji
IPC分类号： H01J37/32 , H01L21/67 , H01L21/66 , H01L21/3065 , H01L21/3213
摘要： A plasma processing method in which a stable process region can be ensured in a wide range, from low microwave power to high microwave power. The plasma processing method includes making production of plasma easy in a region in which production of plasma by continuous discharge is difficult, and plasma-processing an object to be processed, with the generated plasma, wherein the plasma is produced by pulsed discharge in which ON and OFF are repeated, radio-frequency power for producing the pulsed discharge, during an ON period, is a power to facilitate production of plasma by continuous discharge, and a duty ratio of the pulsed discharge is controlled so that an average power of the radio-frequency power per cycle is power in the region in which production of plasma by continuous discharge is difficult.

42. 发明授权

US10607825B2 Mass spectrometer 有权
公开(公告)号：US10607825B2
公开(公告)日：2020-03-31
申请号：US16060132
申请日：2016-11-09
申请人： Hitachi High-Technologies Corporation
发明人： Kiyomi Yoshinari , Yasushi Terui
IPC分类号： H01J49/00 , H01J49/06 , H01J49/42
摘要： Acceleration of decelerated ions and a reduction in the velocity dispersion width of decelerated ions are both achieved, whereby the sensitivity of detected ion sensitivity is improved and resolution is improved. The distance dx between at least one set of facing rod-shaped electrodes among rod-shaped electrodes (4-2-a) to (4-2-d) differs at the inlet part at which ions enter and the outlet part at which ions exit, and the distance dx between the at least one set of facing rod-shaped electrodes is gradually reduced or increased from the inlet part toward the outlet part.

43. 发明授权

US10604393B2 Particle suction capture mechanism and unstopping device equipped with particle suction capture mechanism 有权
公开(公告)号：US10604393B2
公开(公告)日：2020-03-31
申请号：US15327484
申请日：2015-06-29
申请人： Hitachi High-Technologies Corporation
发明人： Hideo Enoki , Shigeki Yamaguchi , Takahiro Sasaki , Tooru Inaba
IPC分类号： B67B7/00 , B08B9/032 , G01N35/04 , B01D19/00 , B01L3/00 , B01L1/04 , B67B7/02 , B65B31/00
摘要： A device for unstopping a stopped specimen vessel that contains a liquid specimen such as blood is equipped with a mechanism which sucks and captures particles floating around the opening of the specimen vessel and prevents contamination of the specimen. The unstopping device grips a vessel and the stopper of the opening of the vessel, and removes the stopper from the opening of the vessel by changing the relative distance between the vessel-gripping mechanism and the unstopping mechanism. The unstopping device is equipped with: suction holes for sucking therethrough the gas which is present around the opening and contains liquid or solid particles; a pipeline which is connected to the suction holes and through which the sucked gas and particles are led downstream; a suction device connected to the pipeline; and a spirally flexed pipeline part disposed between the pipeline and the suction device.

44. 发明授权

US10573489B2 Charged particle beam device and optical-axis adjusting method thereof 有权
公开(公告)号：US10573489B2
公开(公告)日：2020-02-25
申请号：US15780678
申请日：2016-01-29
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Shuhei Yabu
IPC分类号： H01J37/28 , H01J37/26 , H01J37/21 , H01J37/12 , H01J37/141 , H01J37/147
摘要： A charged particle beam device includes a charged particle source which emits a charged particle beam radiated on a sample; a condenser lens system which has at least one condenser lens focusing the charged particle beam at a predetermined demagnification; a deflector which is positioned between a condenser lens of a most downstream side and a charged particle source in the condenser lens system, and moves a virtual position of the charged particle source; and a control unit which controls the deflector and the condenser lens system. The control unit controls the deflector to move the virtual position of the charged particle source to a position of suppressing a deviation, which is caused by a change of the demagnification of the condenser lens system, of a center trajectory of the charged particle beam in the downstream of the condenser lens system.

45. 发明授权

US10566172B2 Charged particle beam apparatus and method for adjusting imaging conditions for the same 有权
公开(公告)号：US10566172B2
公开(公告)日：2020-02-18
申请号：US16184107
申请日：2018-11-08
申请人： Hitachi High-Technologies Corporation
发明人： Tomohito Nakano , Toshiyuki Yokosuka , Yuko Sasaki , Minoru Yamazaki , Yuzuru Mochizuki
IPC分类号： H01J37/21 , H01J37/141 , H01J37/244 , H01J37/22 , H01J37/20 , H01J37/28
摘要： A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.

46. 发明授权

US10559074B2 Sample observation device and sample observation method 有权
公开(公告)号：US10559074B2
公开(公告)日：2020-02-11
申请号：US15898366
申请日：2018-02-16
申请人： Hitachi High-Technologies Corporation
发明人： Minoru Harada , Yuji Takagi , Naoaki Kondo , Takehiro Hirai
IPC分类号： G06T5/50 , G06T5/00 , G06T7/00 , H01J37/22 , H01J37/20 , H01J37/28
摘要： A sample observation device images a sample placed on a movable table by irradiating and scanning the sample with a charged particle beam of a microscope. A degraded image having poor image quality and a high quality image having satisfactory image quality which are acquired at the same location of the sample by causing the charged particle microscope to change an imaging condition for imaging the sample are stored. An estimation process parameter is calculated for estimating the high quality image from the degraded image by using the stored degraded image and high quality image. A high quality image estimation unit processes the degraded image obtained by causing the charged particle microscope to image the desired site of the sample by using the calculated estimation process parameter. Thereby, the high quality image obtained at the desired site is estimated, and then the estimated high quality image is output.

47. 发明授权

US10545018B2 Pattern measurement device, and computer program for measuring pattern 有权
公开(公告)号：US10545018B2
公开(公告)日：2020-01-28
申请号：US15104574
申请日：2014-11-17
申请人： Hitachi High-Technologies Corporation
发明人： Satoru Yamaguchi , Norio Hasegawa , Akiyuki Sugiyama , Miki Isawa , Akihiro Onizawa , Ryuji Mitsuhashi
IPC分类号： G01B15/00 , H01L21/66 , H01J37/28 , H01L21/033
摘要： The purpose of the present invention is to provide a pattern measurement device which adequately evaluates a pattern formed by means of a patterning method for forming a pattern that is not in a photomask. In order to fulfil the purpose, the present invention suggests a pattern measurement device provided with a computation device for measuring the dimensions between patterns formed on a sample, wherein: the centroid of the pattern formed on the sample is extracted from data to be measured obtained by irradiating beams; a position alignment process is executed between the extracted centroid and measurement reference data in which a reference functioning as the measurement start point or measurement end point is set; and the dimensions between the measurement start point or the measurement end point of the measurement reference data, which was subjected to position alignment, and the edge or the centroid of the pattern contained in the data to be measured is measured.

48. 发明授权

US10541115B2 Plasma processing apparatus 有权
公开(公告)号：US10541115B2
公开(公告)日：2020-01-21
申请号：US13363427
申请日：2012-02-01
申请人： Yusaku Sakka , Ryoji Nishio , Tadayoshi Kawaguchi
发明人： Yusaku Sakka , Ryoji Nishio , Tadayoshi Kawaguchi
IPC分类号： H01J37/32
摘要： In a plasma processing apparatus that can adjust an induction magnetic field distribution of power feeding sections of an induction coil, correct a plasma distribution on a specimen, and apply uniform plasma processing to the specimen, the specimen is subjected to plasma processing, a dielectric window that forms the upper surface of the vacuum processing chamber, a gas lead-in section that leads gas into the vacuum processing chamber, a specimen table that is arranged in the vacuum processing chamber and on which the specimen is placed, an induction coil provided above the dielectric window, and a radio-frequency power supply that supplies radio-frequency power to the induction coil. The plasma processing apparatus includes a flat conductor arranged below the induction coil. The induction coil includes crossing power feeding sections. The conductor is arranged below the power feeding sections.

49. 发明授权

US10539584B2 Sampling nozzle, automatic analyzer using the same, and method of manufacturing sampling nozzle 有权
公开(公告)号：US10539584B2
公开(公告)日：2020-01-21
申请号：US15534628
申请日：2015-12-07
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Yosuke Horie , Tomohiro Inoue , Hitoshi Tokieda , Takamichi Mori
IPC分类号： G01N35/10 , G01N1/10
摘要： A CTS nozzle achieves the object of reducing rubber chips produced when the CTS nozzle is inserted into and extracted from a rubber plug of a sample container during dispensing of a sample, thereby inhibiting the wear of the tip of the CTS nozzle. The CTS nozzle has two cut surfaces at its tip, and the pressure applied from the rubber when the nozzle is inserted into the rubber plug is dispersed onto the two cut surfaces without being deflected onto one of the cut surfaces. The pressure applied to the nozzle due to the resilience of the rubber being pushed away by the nozzle is thus dispersed and the rubber chips produced by the friction between the cut surfaces of the nozzle and the rubber are reduced. As a result of the reduced friction, the wear of the tip of the nozzle is minimized.

50. 发明授权

US10527637B2 Automatic analysis device 有权
公开(公告)号：US10527637B2
公开(公告)日：2020-01-07
申请号：US15549741
申请日：2016-02-05
申请人： Hitachi High-Technologies Corporation
发明人： Hiroki Fujita , Toshiharu Suzuki
IPC分类号： G01N35/04 , G01N35/10 , G01N35/00
摘要： Provided is an automatic analysis device that enables a reagent to be reliably loaded in and loaded out within a stipulated amount of time, even during analysis and without stopping the analysis, and that enables a reagent to be exchanged without causing a long wait for the operator. Provided is the automatic analysis device that comprises the following: a reagent cooling box that cools and holds a plurality of reagent containers, and that accommodates therein a reagent holder for movably holding the reagent containers which are inside the reagent cooling box and a reagent loader for loading the reagent containers into and out of the reagent cooling box by moving in a vertical direction with respect to the reagent cooling box; a reagent cooling box cover that covers the upper surface of the reagent cooling box and that has an opening through which the reagent loader can pass; an instruction means that provides instructions for the movement of the reagent loader; and a control device that includes, within the time of one cycle, a first time slot in which an operation for analysis is carried out and a second time slot in which an operation for the loading in or out of the reagent containers is carried out, and that executes control so that the reagent loader is not moved if the driving of the reagent loader was instructed by the instruction means in the second time slot.

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