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41. 发明授权

US11232929B2 Method for determining irradiation conditions for charged particle beam device and charged particle beam device 有权
公开(公告)号：US11232929B2
公开(公告)日：2022-01-25
申请号：US17040141
申请日：2018-04-25
申请人： Hitachi High-Tech Corporation
发明人： Heita Kimizuka , Natsuki Tsuno , Muneyuki Fukuda , Katsura Takaguchi
IPC分类号： H01J37/22 , H01J37/147 , H01J37/244 , H01J37/28
摘要： The purpose of the present disclosure is to propose a charged particle beam device capable of allowing specifying of a distance between irradiation points for a pulsed beam and a time between irradiation points. Proposed is a charged particle beam device equipped with a beam column which has a scanning deflector for sweeping a beam and directs the beam swept by the scanning deflector onto a sample in pulses, wherein: the distance between irradiation points of the pulsed beam is set such that feature quantities of one or more specific regions of an image obtained on the basis of an output of a detector satisfy a predetermined state; the duration of time between irradiation points for the pulsed beam is changed when in a state in which the set distance between irradiation points is set or in a state in which multiple distances between irradiation points determined on the basis of the specified distance between irradiation points are set; and the beam emission is carried out according to the duration of time between irradiation points whereby the feature quantities of the multiple specific regions of the image obtained on the basis of the output of the detector satisfy the predetermined state.

42. 发明申请

US20220020559A1 TIME-RESOLVED CATHODOLUMINESCENCE SAMPLE PROBING 有权
公开(公告)号：US20220020559A1
公开(公告)日：2022-01-20
申请号：US17379815
申请日：2021-07-19
申请人： ATTOLIGHT AG
发明人： Christian Monachon , Matthew John Davies , Fabrice Grondin
IPC分类号： H01J37/22 , H01J37/04 , H01J37/28
摘要： Method for investigating samples by time-series emission of cathodoluminescence (CL) microscope having electron beam and light sensor. In discovery scan, changes caused by the electron beam are unknown, in an inspection scan changes have already been identified in similar sample. Discovery scan starts by setting parameters of the electron beam to irradiate at a first rate of dose; flushing the buffer of the light sensor; scanning the electron beam over an area of interest on the sample while collecting CL emission with the light sensor, while preventing any reading of the data from the buffer until the entire scanning has been completed; once the entire scanning has been completed, blanking the electron beam and interrogating the buffer to identify a first CL image; and then interrogating the buffer to fetch all remaining CL images and tagging all fetched CL images according to time sequence starting from the first CL image.

43. 发明授权

US11217422B2 Charged particle beam system and method of measuring sample using scanning electron microscope 有权
公开(公告)号：US11217422B2
公开(公告)日：2022-01-04
申请号：US16776039
申请日：2020-01-29
申请人： JEOL Ltd.
发明人： Yoshikazu Nemoto , Yuta Murakami , Takakuni Maeda , Akira Abe , Masatsugu Kawamoto , Hiroki Mezaki
IPC分类号： H01J37/22 , H01J37/20 , H01J37/28
摘要： First shape data representing a three-dimensional shape of a sample unit including a sample is generated based on a result of three-dimensional shape measurement of the sample. Second shape data representing a three-dimensional shape of a structure which exists in a sample chamber is generated. Movement of the sample unit is controlled based on the first shape data and the second shape data such that collision of the sample unit with the structure does not occur.

44. 发明授权

US11205559B2 System and method for alignment of cathodoluminescence optics 有权
公开(公告)号：US11205559B2
公开(公告)日：2021-12-21
申请号：US17077217
申请日：2020-10-22
申请人： Gatan, Inc.
发明人： John Andrew Hunt , Michael Bertilson
IPC分类号： H01J37/22 , H01J37/20 , H01J37/244 , H01J37/29
摘要： Systems and methods for automated alignment of cathodoluminescence (CL) optics in an electron microscope relative to a sample under inspection are described. Accurate placement of the sample and the electron beam landing position on the sample with respect to the focal point of a collection mirror that reflects CL light emitted by the sample is critical to optimizing the amount of light collected and to preserving information about the angle at which light is emitted from the sample. Systems and methods are described for alignment of the CL mirror in the XY plane, which is orthogonal to the axis of the electron beam, and for alignment of the sample with respect to the focal point of the CL mirror along the Z axis, which is coincident with the electron beam.

45. 发明申请

US20210391140A1 Charged Particle Beam Device 有权
公开(公告)号：US20210391140A1
公开(公告)日：2021-12-16
申请号：US17330500
申请日：2021-05-26
申请人： Hitachi High-Tech Corporation
发明人： Yohei MINEKAWA , Kohei CHIBA , Muneyuki FUKUDA , Takanori KISHIMOTO
IPC分类号： H01J37/22 , H01J37/28 , H01J37/26
摘要： Provided is a technique capable of achieving both throughput and robustness for a function of adjusting brightness (B) and contrast (C) of a captured image in a charged particle beam device. The charged particle beam device includes a computer system having a function (ABCC function) of adjusting the B and the C of an image obtained by imaging a sample. The computer system determines whether adjustment is necessary based on a result obtained by evaluating a first image obtained by imaging an imaging target of the sample (step S2), executes, when the adjustment is necessary based on a result of the determination, the adjustment on a second image of the imaging target to set an adjusted B value and an adjusted C value (step S4), and captures a third image of the imaging target based on the adjusted setting values to generate an image for observation (step S5).

46. 发明申请

US20210384003A1 Charged Particle Beam Device 有权
公开(公告)号：US20210384003A1
公开(公告)日：2021-12-09
申请号：US17287249
申请日：2019-02-22
申请人： Hitachi High-Tech Corporation
发明人： Anoru SUGA , Shuhei YABU
IPC分类号： H01J37/073 , H01J37/244 , H01J37/22
摘要： An object of the present invention is to reduce the possibility that a filament is broken during observation and a re-measurement is required, to reduce the running cost of an apparatus, and to improve the operating efficiency of the apparatus. The charged particle beam apparatus according to the present invention calculates an imaging time required to generate an observation image of a sample and estimates a remaining usable time of the filament, and when the imaging time is longer than the remaining usable time, presents the fact (see FIG. 3)

47. 发明授权

US11195692B2 System for electron diffraction analysis 有权
$System for electron diffraction analysis$
公开(公告)号：US11195692B2
公开(公告)日：2021-12-07
申请号：US16646502
申请日：2018-09-28
申请人： OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED
发明人： Peter Statham , Angus Bewick
IPC分类号： H01J37/244 , H01J37/26 , H01J37/22 , H01J37/295
摘要： A method and system for processing a diffraction pattern image obtained in an electron microscope are disclosed. The method comprises, according to a first set of microscope conditions, causing an electron beam to impinge upon a calibration specimen so as to cause resulting electrons to be emitted therefrom and monitoring the resulting electrons using a detector device so as to obtain a calibration image comprising a plurality of pixels having values, the first set of microscope conditions being configured such that the calibration image includes substantially no electron diffraction pattern; obtaining, from the calibration image, a gain variation image comprising a plurality of pixels, each having a value representing relative detector device gain for a corresponding pixel of the calibration image; according to a second set of microscope conditions, causing an electron beam to impinge upon a target specimen so as to cause resulting electrons to be emitted therefrom and monitoring the resulting electrons using the detector device so as to obtain a target image comprising a plurality of pixels having values, the second set of microscope conditions being configured such that the target image includes an electron diffraction pattern; and for each pixel of the target image, removing from the pixel value, in accordance with the value of the corresponding pixel of the gain variation image, the contribution to the pixel value of the relative detector device gain, so as to obtain a gain variation-corrected image.

48. 发明授权

US11195691B2 Method of automatically focusing a charged particle beam on a surface region of a sample, method of calculating a converging set of sharpness values of images of a charged particle beam device and charged particle beam device for imaging a sample 有权
公开(公告)号：US11195691B2
公开(公告)日：2021-12-07
申请号：US16978157
申请日：2019-04-12
申请人： Applied Materials, Inc. , Robert Trauner , Bernhard Schüler , Bernhard G. Mueller , Nikolai Knaub , Kulpreet Singh Virdi
发明人： Robert Trauner , Bernhard Schüler , Bernhard G. Mueller , Nikolai Knaub , Kulpreet Singh Virdi
IPC分类号： H01J37/22 , H01J37/21 , H01L21/67 , G06T7/00
摘要： A method of automatically focusing a charted particle beam on a surface region of a sample is provided. The method includes acquiring a plurality of images for a corresponding plurality of focusing strength values; calculating a plurality of sharpness values based on the plurality of images, the plurality of sharpness values are calculated with a sharpness function provided as a sum in a frequency space based on the plurality of images; and determining subsequent focusing strength values of the plurality of focusing strength values with a golden ratio search algorithm based one the calculated sharpness values.

49. 发明授权

US11152186B2 Charged particle beam device 有权
公开(公告)号：US11152186B2
公开(公告)日：2021-10-19
申请号：US16354670
申请日：2019-03-15
申请人： Hitachi High-Technologies Corporation
发明人： Wataru Yamane , Minoru Yamazaki , Yuko Sasaki , Wataru Mori , Takashi Doi
IPC分类号： H01J37/147 , H01J37/244 , H01J37/22 , H01J37/10 , H01J37/28
摘要： An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.

50. 发明授权

US11133149B2 Focused ion beam apparatus 有权
公开(公告)号：US11133149B2
公开(公告)日：2021-09-28
申请号：US17028381
申请日：2020-09-22
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Toshihiro Mochizuki , Haruyuki Ishii , Atsushi Uemoto
IPC分类号： H01J37/22 , H01J37/20 , H01J37/10
摘要： A focused ion beam apparatus (100) includes: a focused ion beam lens column (20); a sample table (51); a sample stage (50); a memory (6M) configured to store in advance three-dimensional data on the sample table and an irradiation axis of the focused ion beam, the three-dimensional data being associated with stage coordinates of the sample stage; a display (7); and a display controller (6A) configured to cause the display to display a virtual positional relationship between the sample table (51v) and the irradiation axis (20Av) of the focused ion beam, which is exhibited when the sample stage is operated to move the sample table to a predetermined position, based on the three-dimensional data on the sample table and the irradiation axis of the focused ion beam.

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