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    • 52. 发明申请
    • WAFER POLISHING APPARATUS AND WAFER POLISHING METHOD
    • 波浪抛光装置和波浪抛光方法
    • US20070161338A1
    • 2007-07-12
    • US11560952
    • 2006-11-17
    • Takashi FUJITA
    • Takashi FUJITA
    • B24B7/30B24B1/00B24B29/00B24B57/00
    • B24B37/04B24B57/02
    • The present invention provides a wafer polishing apparatus, comprising: a polishing pad to which a polishing liquid is supplied for polishing a wafer; a carrier head to carry the wafer; and one or more polishing liquid supplying device which supplies the polishing liquid onto the polishing pad, wherein the polishing liquid supplying device has a polishing liquid supplying member which is positioned close to or in contact with the polishing pad, and is relatively moved against the polishing pad, so that the polishing liquid supplied to the upper portion of the polishing liquid supplying member flows down along the polishing liquid supplying member to be painted on a surface of the polishing pad.
    • 本发明提供了一种晶片抛光装置,包括:抛光垫,抛光液体被供给到抛光液晶片; 载体头承载晶片; 以及一个或多个抛光液体供应装置,其将研磨液供给到抛光垫上,其中抛光液供给装置具有与抛光垫接近或接触的抛光液供给部件,并相对于抛光而相对移动 衬垫,使得供给到抛光液供给部件的上部的研磨液沿着研磨液供给部件向下流动,涂布在研磨垫的表面上。
    • 55. 发明申请
    • SHEET CONVEYING APPARATUS AND IMAGE FORMING APPARATUS
    • 输送装置和图像形成装置
    • US20070052162A1
    • 2007-03-08
    • US11468474
    • 2006-08-30
    • TAKASHI FUJITANoriaki Koyanagi
    • TAKASHI FUJITANoriaki Koyanagi
    • B65H7/02
    • B65H9/163
    • A sheet conveying path is constituted by a fixed guide portion and a movable guide portion movable in a width direction orthogonal to the conveyance direction of a sheet for regulating the position of one side edge of the sheet by a skew feed correcting portion, and an auxiliary guide for guiding the sheet is provided between the fixed guide portion and the movable guide portion for movement in the width direction. When the skew feed of the conveyed sheet is corrected, the movable guide portion is moved in advance to a position corresponding to the size of the sheet, and in operative association with the movable guide portion, the auxiliary guide is moved to a guide position corresponding to the size of the sheet.
    • 纸张传送路径由固定引导部分和可移动引导部分构成,该引导部分和可移动引导部分可在与片材的传送方向正交的宽度方向上移动,用于通过歪斜进给校正部分调节片材的一个侧边缘的位置, 用于引导片材的引导件设置在固定引导部分和可移动引导部分之间,用于在宽度方向上移动。 当输送的纸张的歪斜进给被校正时,可移动的引导部分预先移动到与片材的尺寸相对应的位置,并且与可动引导部分可操作地相关联,辅助引导件被移动到对应的引导位置 到纸张的大小。
    • 56. 发明申请
    • POLISHING PAD, PAD DRESSING EVALUATION METHOD, AND POLISHING APPARATUS
    • 抛光垫,垫子评估方法和抛光装置
    • US20070049168A1
    • 2007-03-01
    • US11466489
    • 2006-08-23
    • Takashi Fujita
    • Takashi Fujita
    • B24B49/00
    • B24B53/017B24B49/12
    • The present invention provides: a polishing apparatus for polishing a workpiece, comprising a polishing pad whose surface or surface layer part is colored with a color different from a color inside the polishing pad, a pad dresser which performs dressing of the polishing pad, and an observing device which observes the surface of the polishing pad; and a method for simply and accurately monitoring the uniformity of dressing state of a polishing pad in dressing the polishing pad of a polishing apparatus such as a CMP device, in order to prolong the life of the polishing pad, and to reduce the number of dummy wafers used in the pad dressing.
    • 本发明提供一种用于研磨工件的抛光装置,其特征在于,包括抛光垫,其抛光垫的表面或表面层部分被着色为与抛光垫内的颜色不同的颜色;抛光修整器,其执行抛光垫的修整;以及 观察装置,其观察抛光垫的表面; 以及用于简单且准确地监测抛光垫的修整状态的均匀性的方法,以修整诸如CMP装置的抛光装置的抛光垫,以便延长抛光垫的寿命,并且减少假人的数量 用于衬垫敷料的晶片。
    • 58. 发明申请
    • Specific component measuring method by spectral measurement
    • 通过光谱测量的特定成分测量方法
    • US20060170914A1
    • 2006-08-03
    • US10561538
    • 2004-06-21
    • Takashi FujitaSachiko YamamotoHiroyuki YamadaWataru Akahane
    • Takashi FujitaSachiko YamamotoHiroyuki YamadaWataru Akahane
    • G01N1/10
    • G01N21/76G01N2201/023
    • The present invention discloses a method for measuring an amount of an objective component to be measured in a sample, which comprises; preventing an electric charge in an atmosphere in a photometry chamber from transferring to the surface of a solution which generates light due to an energy variation of a substance induced by the objective component in the sample, measuring value of the light, and determining an amount of the objective component in the sample on the basis of the measured value thus obtained, and an instrument used for the method. According to the present invention, in measurement of an objective component in a sample using a spectrophotometer, problems such as between-day variation of signal values or increase of background value, etc. can be solved, and a trace component can be measured in high accuracy and high sensitivity.
    • 本发明公开了一种测定样品中要测量的目标成分的量的方法,包括: 防止测光室中的气氛中的电荷转移到由于样品中的目标成分引起的物质的能量变化而产生光的溶液的表面,测量光的量, 基于由此获得的测量值的样品中的客观成分,以及用于该方法的仪器。 根据本发明,在使用分光光度计测定样品中的目标成分的情况下,可以解决信号值的日间变化或背景值的增加等问题,并且可以高度地测量痕量成分 精度高,灵敏度高。