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51. 发明授权

US11268915B2 Charged particle beam device, method for processing sample, and observation method 有权
公开(公告)号：US11268915B2
公开(公告)日：2022-03-08
申请号：US17053296
申请日：2018-05-15
申请人： Hitachi High-Tech Corporation
发明人： Tsunenori Nomaguchi , Hiromi Mise
IPC分类号： G01N23/04 , G01N23/06 , H01J37/20 , H01J37/244 , H01J37/26
摘要： To provide, in observation of a sample that requires a movement between various devices, a charged particle beam device, a method for processing the sample, and an observation method which facilitate the movement between the devices. The charged particle beam device that processes an observation target on the sample using a charged particle beam includes: a sample stage on which the sample is placed; an observation unit configured to observe the observation target; and a writing unit configured to write information of the observation target in a writing position of the sample.

52. 发明申请

US20220059314A1 SAMPLE HOLDER FOR ELECTRON MICROSCOPY 有权
公开(公告)号：US20220059314A1
公开(公告)日：2022-02-24
申请号：US17518926
申请日：2021-11-04
申请人： ZoNexus LLC
发明人： Alpesh Khushalchand Shukla , John Fischer , Alexander Park
IPC分类号： H01J37/20 , H01J37/28
摘要： A sample holder for electron microscopy of air-sensitive samples for use in electron microscopy incorporates a housing and a closure assembly. The closure assembly comprises a lid comprising at least one closure arm receiving portions recessed within a flat, planar upper surface thereof. The housing comprises one or more closure arm(s) corresponding to one or more closure arm receiving portion(s). In a fully closed position, the closure arm(s) share contact with the closure arm receiving portion(s). The lid is flexibly coupled to a motor cover plate which can be actuated by a motor assembly configured to open and close the lid. The sample holder also includes an elevator assembly with a vertically adjustable sample stage which sits below the lid. The sample stage is vertically adjusted by actuation of a bellows assembly which sits beneath the sample stage.

53. 发明授权

US11251014B2 Sample holder for a charged particle microscope 有权
公开(公告)号：US11251014B2
公开(公告)日：2022-02-15
申请号：US16782784
申请日：2020-02-05
申请人： FEI Company
发明人： Mathijs Petrus Wilhelmus van den Boogaard , Martijn LaGrange , Nestor Hernandez Rodriguez
IPC分类号： H01J37/20 , H01J37/26
摘要： The disclosure relates to a sample holder for a charged particle microscope, comprising a holder body with a recess for releasably receiving a sample carrier with a sample therein; and at least one fixing element that is connectable to said holder body for fixing said sample carrier in said recess of said holder body. As described herein, said fixing element comprises a clamping member that is movably connected to said holder body, wherein said clamping member is movable between a closed and an open position, wherein in the open position said sample carrier can be placed in said recess, and wherein in said closed position said sample carrier can be locked in said recess. With this, a more reliable mounting of a sample carrier onto the sample holder can be established.

54. 发明申请

US20220037109A1 CHARGED PARTICLE BEAM DEVICE AND METHOD OF MEASURING ELECTRICAL NOISE 有权
公开(公告)号：US20220037109A1
公开(公告)日：2022-02-03
申请号：US17388704
申请日：2021-07-29
申请人： Hitachi High-Tech Corporation
发明人： Takayasu Iwatsuka , Tomoyo Sasaki , Wen Li , Ryo Kadoi , Makoto Suzuki
IPC分类号： H01J37/244 , H01J37/20 , H01J37/24 , G01R29/26
摘要： To provide a technique capable of measuring high-frequency electrical noise in a charged particle beam device. A charged particle beam device 100 includes an electron source 2 for generating an electron beam EB1, a stage 4 for mounting a sample 10, a detector 5 for detecting secondary electrons EB2 emitted from the sample 10, and a control unit 7 electrically connected to the electron source 2, the stage 4, and the detector 5 and can control the electron source 2, the stage 4, and the detector 5. Here, when the sample 10 is mounted on the stage 4, and a specific portion 11 of the sample 10 is continuously irradiated with the electron beam EB1 from the electron source 2, the control unit 7 can calculate a time-series change in irradiation position of the electron beam EB1 based on an amount of the secondary electrons EB2 emitted from the specific portion 11, and can calculate a feature quantity for a shake of the electron beam EB1 based on the time-series change in irradiation position. Further, the feature quantity includes a frequency spectrum.

55. 发明申请

US20220013325A1 CARRIER DEVICE AND CARRIER KIT 有权
公开(公告)号：US20220013325A1
公开(公告)日：2022-01-13
申请号：US17026317
申请日：2020-09-21
申请人： Materials Analysis Technology Inc.
发明人： HUNG-JEN CHEN
IPC分类号： H01J37/20
摘要： A carrier device and a carrier kit are provided. The carrier kit includes the carrier device and a specimen carrier. The carrier device carries the specimen carrier and is configured to be fixedly disposed on a specimen holder. The specimen carrier has two observation grooves and a containing channel that is formed therein, and the two observation grooves are configured to expose a part of the containing channel The carrier device has a containing groove that is recessed on a side of a main body and an observation port. When the specimen carrier is disposed in the containing groove, one of the observation grooves is exposed from the main body through the observation port. At least one limiting element is configured to limit a range of movement of the specimen carrier disposed in the containing groove relative to the main body.

56. 发明授权

US11217425B2 System and method for preparation and delivery of biological samples for charged particle analysis 有权
公开(公告)号：US11217425B2
公开(公告)日：2022-01-04
申请号：US16914924
申请日：2020-06-29
申请人： FEI Company
发明人： Marcus Straw , Alexander Makarov , Josh Gilbert , Aaron Torok , Joseph Christian , Alan Bahm , Kun Liu , Tom Nichols , Jeff Kosmoski , Dmitry Grinfeld
IPC分类号： H01J37/295 , H01J37/20 , H01J49/42
摘要： Systems and method for the preparation and delivery of biological samples for charged particle analysis are disclosed herein. An example system at least includes an ion filter coupled to select a sample ion from an ionized sample supply, the ion filter including a quadrupole filter to select the sample ion from the sample supply, an energy reduction cell coupled to receive the selected sample ion and reduce a kinetic energy of the sample ion, a validation unit coupled to receive the sample ion and determine whether the sample ion is a target sample ion, a substrate coupled to receive the sample, wherein the substrate is electron transparent, an ion transport module coupled to receive the sample ion from the ion filter and transport the sample ion to the substrate, and an imaging system arranged to image, with a low energy charged particle beam, the sample located on the substrate, wherein the substrate is arranged in an analysis location. The imaging system including a charge particle emitter coupled to direct coherent charged particles toward the sample; and a detector arranged to detect interference patterns formed from interaction of the coherent charged particles and the sample.

57. 发明申请

US20210391139A1 REPLACEABLE MODULE FOR A CHARGED PARTICLE APPARATUS 有权
公开(公告)号：US20210391139A1
公开(公告)日：2021-12-16
申请号：US17344446
申请日：2021-06-10
申请人： ASML Netherlands B.V.
发明人： Christiaan OTTEN , Peter-Paul CRANS , Marc SMITS , Laura DEL TIN , Christan TEUNISSEN , Yang-Shan HUANG , Stijn Wilem, Herman, Karel STEENBRINK , Xuerang HU , Qingpo XI , Xinan LUO , Xuedong LIU
IPC分类号： H01J37/20 , H01J37/28 , H01J37/18 , H01J37/14 , H01J37/147 , H01J37/244
摘要： Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

58. 发明授权

US11195688B2 Adjusting mechanism for adjusting deformation of panel and electron beam detection apparatus comprising the same 有权
公开(公告)号：US11195688B2
公开(公告)日：2021-12-07
申请号：US16730394
申请日：2019-12-30
申请人： Zhongke Jingyuan Electron Limited, Beijing (CN)
发明人： Lei Jiang
IPC分类号： H01J37/20 , H01J37/26 , H01J37/28
摘要： An adjusting mechanism for adjusting a deformation of a panel and an electron beam detection apparatus comprising the same are disclosed, the adjusting mechanism including: a support plate, which is provided opposite to the panel, with a periphery of the support plate being in positive fit with a periphery of the panel; and at least one screw set, each screw set comprising: at least one first screw, each first screw penetrating through the support plate, and in turn being connected to the panel by being screwed into the panel; and at least one second screw, each second screw being screwed to penetrate through the support plate and to abut against the panel; the support has its structural rigidity larger than a structural rigidity of the panel.

59. 发明申请

US20210375579A1 FRAME MEMBER FOR ELECTRON BEAM LITHOGRAPHY DEVICE AND ELECTRON BEAM LITHOGRAPHY DEVICE 有权
公开(公告)号：US20210375579A1
公开(公告)日：2021-12-02
申请号：US17288321
申请日：2019-10-23
申请人： KYOCERA Corporation
发明人： Shigenobu FURUKAWA , Koji AKASHI
IPC分类号： H01J37/20 , H01J37/305 , G03F7/20
摘要： A frame member for an electron beam lithography device of the present disclosure includes a frame body comprising sapphire or aluminum oxide-based ceramics having an open porosity of 0.2% or less and a conductive film disposed at least on a main surface of an electron gun side of the frame body.

60. 发明授权

US11189455B2 Cryogenic ultra-high vacuum suitcase 有权
公开(公告)号：US11189455B2
公开(公告)日：2021-11-30
申请号：US17287173
申请日：2019-02-06
申请人： FERROVAC AG
发明人： Urs Maier , David Von Gunten
IPC分类号： H01J37/20 , H01J37/26
摘要： The present invention relates to a transportable device, for the transport and transfer of a sample under ultra-high vacuum conditions and at low temperature, comprising a vacuum chamber, a cooling system, a transfer rod by means of which the sample positon can be adjusted, a valve by means of which the chamber can be opened or closed and attached to another vacuum apparatus, a pump designed to maintain in the chamber a pressure below 10−9 mbar all the time a sample is inside the chamber and/or all the time the sample is being transferred, a cooling shield defining a volume inside the chamber in which the sample is kept during transport, wherein the cooling shield (106) is thermally contacted to the cooling system, a sample holder removably attached to the transfer rod and configured to carry the sample during transport, a cooling block thermally contacted to the cooling shield, wherein the cooling block and the sample holder are configured such that they can be brought in thermal contact inside the volume defined by the cooling shield, wherein the cooling system is configured to be able cool the cooling shield to a temperature below 80 K. and wherein the thermal contacts between the cooling shield and the cooling block and/or between the cooling block and the sample holder are configured such that the sample is kept at a temperature higher than the cooling shield all the time the temperature of the cooling shield is lower titan the temperature of the chamber. The present invention relates also to the use of a hexapod port aligner for the transfer of a sample front a vacuum transport device to an electron microscope, especially a transmission electron microscope.

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