专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明授权

US09634460B2 Compensation for a disturbance in an optical source 有权
公开(公告)号：US09634460B2
公开(公告)日：2017-04-25
申请号：US15014149
申请日：2016-02-03
申请人： Cymer, LLC
发明人： Rahul Ahlawat
IPC分类号： H01S3/22 , H01S3/104 , H01S3/097 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/137 , H01S3/0971 , H01S3/1055 , H01S3/23 , H01S3/036 , H01S3/10
CPC分类号： H01S3/104 , H01S3/036 , H01S3/09705 , H01S3/0971 , H01S3/10069 , H01S3/1055 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308 , H01S2301/02
摘要： A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.

52. 发明申请

US20160365696A1 LASER CHAMBER 有权
标题翻译：激光室
公开(公告)号：US20160365696A1
公开(公告)日：2016-12-15
申请号：US15245245
申请日：2016-08-24
申请人： Gigaphoton Inc.
发明人： Hiroaki TSUSHIMA , Kouji KAKIZAKI , Takashi MATSUNAGA , Takeshi ASAYAMA , Hisakazu KATSUUMI , Hiroshi UMEDA , Hiroyuki IKEDA
IPC分类号： H01S3/036 , H01S3/225 , H01S3/038 , H01S3/041 , H01S3/04
CPC分类号： H01S3/036 , H01S3/038 , H01S3/0384 , H01S3/0407 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/09702 , H01S3/09713 , H01S3/134 , H01S3/225
摘要： A laser chamber including a first space and a second space in communication with the first space may include: a first discharge electrode disposed in the first space; a second discharge electrode disposed in the first space to face the first discharge electrode; a fan disposed in the first space and configured to flow laser gas between the first discharge electrode and the second discharge electrode; a peaking condenser disposed in the second space; and an electrical insulating member configured to partition the first space and the second space from one another, and disposed to allow the laser gas to pass through between the first space and the second space.
摘要翻译：包括与第一空间连通的第一空间和第二空间的激光室可以包括：设置在第一空间中的第一放电电极; 设置在所述第一空间中以面对所述第一放电电极的第二放电电极; 风扇，设置在所述第一空间中并且被配置为使所述第一放电电极和所述第二放电电极之间的激光气体流动; 设置在所述第二空间中的峰化冷凝器; 以及电绝缘构件，其被配置为将所述第一空间和所述第二空间彼此分隔开，并且被设置成允许所述激光气体在所述第一空间和所述第二空间之间通过。

53. 发明授权

US09490603B2 Laser apparatus and method of controlling laser apparatus 有权
标题翻译：激光设备及其控制方法
公开(公告)号：US09490603B2
公开(公告)日：2016-11-08
申请号：US14638883
申请日：2015-03-04
申请人： GIGAPHOTON INC.
发明人： Hiroaki Tsushima , Osamu Wakabayashi , Takahito Kumazaki , Takashi Matsunaga
IPC分类号： H01S3/00 , H01S3/134 , G01J11/00 , H01S3/034 , H01S3/038 , H01S3/08 , H01S3/0971 , H01S3/225 , H01S3/23 , H01S3/10
CPC分类号： H01S3/0014 , G01J1/4257 , G01J11/00 , H01S3/005 , H01S3/034 , H01S3/038 , H01S3/08009 , H01S3/0971 , H01S3/10069 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308
摘要： A laser apparatus may comprise: a laser chamber configured to include a laser gain medium; a pair of electrodes disposed in the laser chamber; an energy detector configured to measure pulse energy of laser beams outputted by discharging between the pair of the electrodes; an optical element disposed on a light path of the laser beams; and a controller configured to calculate an integration value of absorption energy at the optical element, and determine whether the integration value exceeds a lifetime integration value of the optical element based on the pulse energy of the laser beams.
摘要翻译：激光装置可以包括：激光室，被配置为包括激光增益介质; 设置在激光室中的一对电极; 能量检测器，被配置为测量在所述一对电极之间通过放电而输出的激光束的脉冲能量; 设置在激光束的光路上的光学元件; 以及控制器，其被配置为计算所述光学元件处的吸收能的积分值，并且基于所述激光束的脉冲能量来确定所述积分值是否超过所述光学元件的寿命积分值。

54. 发明申请

US20160322772A1 EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM 有权
标题翻译： EXCIMER激光设备和激光激光系统
公开(公告)号：US20160322772A1
公开(公告)日：2016-11-03
申请号：US15208637
申请日：2016-07-13
申请人： Gigaphoton Inc.
发明人： Tooru ABE , Takeshi OHTA , Hiroaki TSUSHIMA , Osamu WAKABAYASHI
IPC分类号： H01S3/036 , H01S3/225 , H01S3/134 , H01S3/097 , H01S3/13
CPC分类号： H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： Problem: to suppress the number of times complete gas replacement in a laser chamber.Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
摘要翻译：解决方案：该准分子激光装置可以包括气体供应单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器，将第一激光气体和第二激光气体提供给激光室的内部。然后，其中气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，并且气体供给单元提供气体供给单元可以选择性地执行第一激光气体和到激光室内部的第二激光气体和排气单元部分地从激光室内部排出气体。

55. 发明授权

US09478933B2 Wavelength detector and wavelength calibration system 有权
标题翻译：波长检测器和波长校准系统
公开(公告)号：US09478933B2
公开(公告)日：2016-10-25
申请号：US13535641
申请日：2012-06-28
申请人： Toru Suzuki , Shinichi Matsumoto
发明人： Toru Suzuki , Shinichi Matsumoto
IPC分类号： H01S3/13 , G01J1/42 , H01S3/137 , H01S3/225 , G01J9/00 , G01J9/02 , H01J47/00 , H01S3/08 , H01S3/10
CPC分类号： H01S3/13 , G01J1/429 , G01J9/00 , G01J9/0246 , H01J47/00 , H01S3/08004 , H01S3/08009 , H01S3/10069 , H01S3/1303 , H01S3/137 , H01S3/225
摘要： The wavelength detector includes a diffusion element that diffuses the laser beam; a light collection optical system provided downstream from the diffusion element; a member, including an aperture, provided downstream from the light collection optical system; a discharge tube that is provided downstream from the member and that includes a cylindrical anode and a cylindrical cathode that each have a through-hole formed therein, and that is configured so that an electrical property between the anode and the cathode changes due to an opto-galvanic effect when a laser beam having a predetermined wavelength passes through the through-hole of the cathode in a state in which a DC voltage is applied to the anode; and a high-voltage DC power source. The discharge tube is disposed so that the laser beam that passes through the aperture passes through the through-hole of the cathode of the discharge tube without directly irradiating the cathode.
摘要翻译：波长检测器包括扩散激光束的扩散元件; 设置在扩散元件下游的光收集光学系统; 包括孔的构件，设置在所述光收集光学系统的下游; 放电管，其设置在所述构件的下游，并且包括圆柱形阳极和圆柱形阴极，每个具有形成在其中的通孔，并且被配置为使得阳极和阴极之间的电特性由于光电而改变当具有预定波长的激光束在向阳极施加直流电压的状态下穿过阴极的通孔时，和高压直流电源。放电管被布置成使得穿过孔的激光束通过放电管的阴极的通孔而不直接照射阴极。

56. 发明授权

US09373926B2 Laser chamber and discharge excitation gas laser apparatus 有权
标题翻译：激光室和放电激发气体激光装置
公开(公告)号：US09373926B2
公开(公告)日：2016-06-21
申请号：US14694743
申请日：2015-04-23
申请人： GIGAPHOTON INC.
发明人： Hiroaki Tsushima , Hakaru Mizoguchi , Junichi Fujimoto , Hiroaki Nakarai , Natsushi Suzuki
IPC分类号： H01S3/036 , F16C33/66 , F16C32/04 , H01S3/134 , H01S3/225 , H01S3/038 , H01S3/097 , H01S3/223 , H01S3/104 , F16C19/06 , H01S3/0971 , H01S3/1055
CPC分类号： H01S3/036 , F16C19/06 , F16C32/0402 , F16C32/0406 , F16C33/6696 , F16C2204/02 , F16C2204/10 , F16C2204/52 , F16C2240/40 , F16C2360/46 , H01S3/038 , H01S3/097 , H01S3/0971 , H01S3/104 , H01S3/1055 , H01S3/134 , H01S3/2232 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： There is provided a laser chamber housing a pair of discharge electrodes and a gas circulation fun, the laser chamber including: a magnetic bearing configured to support a shaft of the gas circulation fan, with the shaft being in non-contact with the magnetic bearing; and a touchdown bearing configured to operate as a bearing when the magnetic bearing is uncontrollable, the touchdown bearing being provided with solid lubricant configured of one or more of an Au plating layer, a Ni-containing plating layer, and a Cu plating layer.
摘要翻译：提供了容纳一对放电电极和气体循环功能的激光室，所述激光室包括：支撑所述气体循环风扇的轴的磁性轴承，所述轴与所述磁性轴承不接触; 以及触控轴承，其构造为当所述磁性轴承不受控制时作为轴承进行操作，所述触地轴承设置有由Au镀层，含Ni镀层和Cu镀层中的一种或多种构成的固体润滑剂。

57. 发明授权

US09331449B2 Gas laser oscillator capable of controlling gas pressure and gas consumption amount 有权
标题翻译：气体激光振荡器能够控制气体压力和气体消耗量
公开(公告)号：US09331449B2
公开(公告)日：2016-05-03
申请号：US14797735
申请日：2015-07-13
申请人： FANUC CORPORATION
发明人： Munekazu Matsuda , Hiroyuki Yoshida
IPC分类号： H01S3/22 , H01S3/036 , H01S3/223 , H01S3/225
CPC分类号： H01S3/036 , H01S3/10069 , H01S3/104 , H01S3/22 , H01S3/2207 , H01S3/2215 , H01S3/2222 , H01S3/2232 , H01S3/2237 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A gas laser oscillator includes a first control valve for controlling an amount of laser gas supplied into a gas container, a second control valve for controlling an amount of laser gas exhausted from the gas container, and a controller for controlling openings of the first and second control valves. The controller includes a storage unit for storing data indicating a relationship between the laser gas pressure in the gas container, the opening of the second control valve, and the exhaust amount of laser gas, a gas pressure control unit for controlling the openings of the first and second control valves, respectively, such that the laser gas pressure becomes closer to a reference gas pressure, and a gas consumption amount control unit for controlling the openings of the first and second control valves, respectively, such that the exhaust amount of laser gas becomes closer to a target consumption amount.
摘要翻译：气体激光振荡器包括用于控制供给到气体容器中的激光气体的量的第一控制阀，用于控制从气体容器排出的激光气体的量的第二控制阀，以及用于控制第一和第二控制阀。控制器包括存储单元，用于存储表示气体容器中的激光气体压力，第二控制阀的开度与激光气体的排出量之间的关系的数据;气体压力控制单元，用于控制第一和第二控制阀，使得激光气体压力变得更接近参考气体压力;以及气体消耗量控制单元，用于分别控制第一和第二控制阀的开口，使得激光气体的排气量变得更接近目标消费量。

58. 发明授权

US09325143B2 Excimer laser composite cavity 有权
标题翻译：准分子激光复合腔
公开(公告)号：US09325143B2
公开(公告)日：2016-04-26
申请号：US14652223
申请日：2012-12-20
申请人： Academy of Opto-Electronics, Chinese Academy of Sciences
发明人： Yi Zhou , Yaoying Shan , Yuanyuan Fan , Xingliang Song , Lijia Zhang , Huirong Cui , Yu Wang
IPC分类号： H01S3/08 , H01S3/082 , H01S3/225 , H01S3/10
CPC分类号： H01S3/08004 , H01S3/08 , H01S3/08009 , H01S3/08036 , H01S3/082 , H01S3/10 , H01S3/225
摘要： Disclosed is an excimer laser composite cavity, comprising a laser discharge cavity, a laser output module, a line-width narrowing module, and a laser amplification module. The laser discharge cavity contains work gas for generating laser when it is activated by an excitation source. The laser discharge cavity, the laser output module, and the line-width narrowing module constitute a line-width narrowing cavity configured to narrow down a line-width of the laser generated by the work gas. The laser discharge cavity, the laser output module, and the laser amplification module constitute an amplification cavity configured to amplify power of the laser with the line-width having been narrowed down by the line-width narrowing cavity.
摘要翻译：公开了一种准分子激光复合腔，包括激光放电腔，激光输出模块，线宽窄化模块和激光放大模块。激光放电腔包含用于在激发源激活时产生激光的工作气体。激光放电腔，激光输出模块和线宽变窄模块构成了一个线宽缩窄腔，其被配置为缩小由工作气体产生的激光的线宽。激光放电腔，激光输出模块和激光放大模块构成放大腔，该放大腔被配置为放大线宽度被线宽变窄腔缩小的激光功率。

59. 发明授权

US09252557B2 Single cavity dual-electrode discharge cavity and excimer laser 有权
标题翻译：单腔双电极放电腔和准分子激光器
公开(公告)号：US09252557B2
公开(公告)日：2016-02-02
申请号：US14040490
申请日：2013-09-27
申请人： ACADEMY OF OPTO-ELECTRONICS, CHINESE ACADEMY OF SCIENCES
发明人： Yu Wang , Yi Zhou , Jinbin Ding , Bin Liu , Lijia Zhang , Jiangshan Zhao , Pengfei Sha
IPC分类号： H01S3/22 , H01S3/08 , H01S3/07 , H01S3/23 , H01S3/038 , H01S3/0971 , H01S3/225 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/10
CPC分类号： H01S3/08 , H01S3/005 , H01S3/03 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/0388 , H01S3/076 , H01S3/08068 , H01S3/09713 , H01S3/10092 , H01S3/225 , H01S3/2333 , H01S3/235 , H01S3/2383
摘要： A single-cavity dual-electrode discharge cavity and an excimer laser including such a discharge cavity are disclosed. The discharge cavity may comprise a cavity body and two sets of main discharge electrodes. The cavity body may comprise a left chamber and a right chamber arranged to form a symmetric dual-chamber cavity. The left and right chambers can interface and communicate with each other at a plane of symmetry of the entire discharge cavity. The two sets of main discharge electrodes can be disposed in the left and right chambers on the upper side, respectively. According to the present disclosure, the single-cavity configuration can be used to achieve functions of dual-cavity configurations, such as MOPA, MOPO, and MOPRA. Thus, it is possible to reduce system complexities and also ensure synchronization of discharging in the discharge cavity.
摘要翻译：公开了一种单腔双电极放电腔和包括这种放电腔的准分子激光器。放电腔可以包括空腔体和两组主放电电极。空腔体可以包括左室和右室，其布置成形成对称的双室腔。左和右室可以在整个排放腔的对称平面处彼此接合和连通。两组主放电电极可以分别设置在上侧的左右室中。根据本公开，可以使用单腔配置来实现双腔配置的功能，例如MOPA，MOPO和MOPRA。因此，可以降低系统复杂性并且还确保放电腔中的放电同步。

60. 发明授权

US09246298B2 Corrosion resistant electrodes for laser chambers 有权
标题翻译：用于激光室的耐腐蚀电极
公开(公告)号：US09246298B2
公开(公告)日：2016-01-26
申请号：US13840736
申请日：2013-03-15
申请人： Cymer, LLC
发明人： Janine Kardokus , Thomas P. Duffey , William N. Partlo
IPC分类号： H01S3/038 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/0388 , C22C9/04 , H01S3/0971 , H01S3/225
摘要： Corrosion resistant electrodes are formed of brass that has been doped with phosphorus. The electrodes are formed of brass that contains about 100 ppm to about 1,000 ppm of phosphorus, and the brass has no visible microporosity at a magnification of 400×. The brass may be cartridge brass that contains about 30 weight percent of zinc and the balance copper. Corrosion resistant electrodes also may be formed by subjecting brass to severe plastic deformation to increase the resistance of the brass to plasma corrosion. The corrosion resistant electrodes can be used in laser systems to generate laser light.
摘要翻译：耐腐蚀电极由掺杂有磷的黄铜形成。电极由含有约100ppm至约1,000ppm磷的黄铜形成，并且黄铜在400×的放大倍数下不具有可见的微孔性。黄铜可以是包含约30重量％的锌和余量铜的筒黄铜。也可以通过对黄铜进行严格的塑性变形以增加黄铜对等离子体腐蚀的阻力而形成耐腐蚀电极。耐腐蚀电极可用于激光系统产生激光。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式