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    • 63. 发明申请
    • DIELECTRIC DEVICE
    • 电介质设备
    • US20070247782A1
    • 2007-10-25
    • US11563843
    • 2006-11-28
    • Tsutomu NanatakiNobuyuki Kobayashi
    • Tsutomu NanatakiNobuyuki Kobayashi
    • H04R17/00
    • H04R17/02H01L41/047H01L41/0477H01L41/0805H01L41/29H01L41/314Y10T29/42
    • The invention suppresses the occurrence of cracks in a dielectric layer, and improve yield during manufacture of a dielectric device. A dielectric device includes a substrate, a base electrode and a dielectric layer. The base electrode is fixed on the substrate. The base electrode is formed such that a surface of a base electrode edge part has an inclined part. The dielectric layer is fixed on a substrate surface so as to cover the base electrode. The dielectric layer is formed by annealing a deposited layer obtained by spraying a powdered dielectric on the substrate surface. Therefore, a triple point adjacent part, which is a part of the dielectric layer opposite the base electrode edge part, is formed so as to have a dense structure in the same way as other parts.
    • 本发明抑制了电介质层中的裂纹的发生,并且提高了在制造电介质器件期间的产率。 电介质器件包括衬底,基极和电介质层。 基极固定在基板上。 基极形成为使得基极边缘部的表面具有倾斜部。 电介质层固定在基板表面上以覆盖基极。 电介质层通过将通过在基板表面上喷涂粉末电介质而获得的沉积层退火而形成。 因此,作为与基极边缘部分相对的电介质层的一部分的三点相邻部分以与其它部分相同的方式形成为致密结构。